JP2001524019A - ケミカルマイクロリアクタとその製造のための方法 - Google Patents
ケミカルマイクロリアクタとその製造のための方法Info
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F3/00—Plate-like or laminated elements; Assemblies of plate-like or laminated elements
- F28F3/02—Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations
- F28F3/04—Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations the means being integral with the element
- F28F3/048—Elements or assemblies thereof with means for increasing heat-transfer area, e.g. with fins, with recesses, with corrugations the means being integral with the element in the form of ribs integral with the element or local variations in thickness of the element, e.g. grooves, microchannels
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0093—Microreactors, e.g. miniaturised or microfabricated reactors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D9/00—Heat-exchange apparatus having stationary plate-like or laminated conduit assemblies for both heat-exchange media, the media being in contact with different sides of a conduit wall
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
- G03F7/2043—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00822—Metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00824—Ceramic
- B01J2219/00828—Silicon wafers or plates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00831—Glass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00835—Comprising catalytically active material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00873—Heat exchange
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/0095—Control aspects
- B01J2219/00952—Sensing operations
- B01J2219/00968—Type of sensors
- B01J2219/0097—Optical sensors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2260/00—Heat exchangers or heat exchange elements having special size, e.g. microstructures
- F28F2260/02—Heat exchangers or heat exchange elements having special size, e.g. microstructures having microchannels
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Micromachines (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.プラスチック成形法を使用しない、流体経路並びに流体のための導入路と導 出路を備えた少なくとも1つのサブストレートを有するケミカルマイクロリアク タのための製造方法にして、 a.サブストレート上にある金属表面に、フォトレジスト層又はスクリーン印刷 ニス層を用いて流体経路構造を形成して、部分的に上記層によって金属表面を覆 うこと; b.上記サブストレートの露出表面から少なくとも部分的に金属を非電着性及び /又は電気化学的に腐食除去すること; c.フォトレジスト層又はスクリーン印刷ニス層の全面的な除去; d.接着層及び/又は鑞付け層の形成; e.上記サブストレートと上記流体経路を閉じる閉鎖セグメントとの重ね合わせ と、接着及び/又は鑞付けによるサブストレートと閉鎖セグメントの相互連結 の各方法ステップを備える製造方法。 2.プラスチック成形法を使用しない、流体経路並びに流体のための導入路と導 出路を備えた少なくとも1つのサブストレートを有するケミカルマイクロリアク タのための製造方法にして、 a.サブストレート上にある金属表面に、フォトレジスト層又はスクリーン印刷 ニス層を用いて流体経路構造を形成して、部分的に上記層によって金属表面を覆 うこと; b.サブストレートの露出表面に非電着性及び/又は電気化学的に金属層を析出 すること; c.フォトレジスト層又はスクリーン印刷ニス層の全面的な除去; d.流体経路を形成し、少なくとも部分的にサブストレートの金属を非電着性及 び/又は電気化学的に腐食除去すること; e.接着層及び/又は鑞付け層の形成; f.上記サブストレートと上記流体経路を閉じる閉鎖セグメントとの重ね合わせ と、接着及び/又は鑞付けによるサブストレートと閉鎖セグメントの相互連結 の各方法ステップを備える製造方法。 3.プラスチック成形法を使用しない、流体経路並びに流体のための導入路と導 出路を備えた少なくとも1つのサブストレートを有するケミカルマイクロリアク タのための製造方法にして、 a.サブストレートに、フォトレジスト層又はスクリーン印刷ニス層を用いて流 体経路構造を形成して、部分的に上記層によってサブストレート表面を覆うこと ; b.上記サブストレートの露出表面に金属層を析出すること; c.フォトレジスト層又はスクリーン印刷ニス層の全面的な除去; d.接着層及び/又は鑞付け層の形成; e.上記サブストレートと上記流体経路を閉じる閉鎖セグメントとの重ね合わせ と、接着及び/又は鑞付けによるサブストレート と閉鎖セグメントの相互連結 の各方法ステップを備える製造方法。 4.上記方法ステップaで、サブストレートがフォトレジスト層で被覆され、当 該フォトレジスト層が流体経路構造のポジ乃至ネガ画像で露光され、次いで発現 されることを特徴とする請求項1〜3のいずれか一項にしたがう方法。 5.少なくとも鋼、特殊鋼、銅、ニッケル及びアルミニウムからなる群から選択 された金属からなる表面を備えたサブストレートが用いられることを特徴とする 前記請求項のいずれか一項にしたがう方法。 6.上記方法ステップbで、少なくとも錫、鉛、ニッケル、コバルト、ビスマス 、銀、金及びこれら金属の合金からなる群から選択された金属が非電着性及び/ 又は電気化学的に施与されることを特徴とする請求項2にしたがう方法。 7.錫層、鉛層、ビスマス層又は合金層が金属に熱作用下で結合される鑞付け結 合によって上記サブストレートが相互連結されることを特徴とする請求項6にし たがう方法。 8.上記方法ステップbで、サブストレートの一方の側に錫層が施与され、サブ ストレートの他方の側にビスマス層が施与されて、錫層とビスマス層が上下に重 なり合い次いで互いに鑞付けされるように上記サブストレートが積み重ねられる ことを特徴とする請求項6又は7にしたがう方法。 9.通路がサブストレートの内側に形成されることを特徴とする 前記請求項のいずれか一項にしたがう方法。 10.サブストレートを重ね合わせ相互連結した後に流体経路の表面が金属析出 、金属エッチング及び化合物又は他の化学種の吸着からなる群から選択された少 なくとも1つの方法によって部分変更されることを特徴とする前記請求項のいず れか一項にしたがう方法。 11.触媒表面の形成のため又は腐食層としてパラジウム層、プラチナ層、ロジ ウム層、イリジウム層、ルテニウム層及び/又はこれら金属の合金の層及び/又 はニッケル/燐合金層の更なる析出によって流体経路の表面が部分変更されるこ とを特徴とする請求項10にしたがう方法。 12.強磁性金属層の施与によってバルブ及び/又は他のアクターがリアクタに 形成されることを特徴とする前記請求項のいずれか一項にしたがう方法。 13.流れる流体の特性の測定のためのセンサ及び/又は電線がリアクタに形成 されることを特徴とする前記請求項のいずれか一項にしたがう方法。 14.電気的抵抗加熱系及び/又は冷却要素がリアクタに形成されることを特徴 とする前記請求項のいずれか一項にしたがう方法。 15.複数のサブストレートからなるマイクロリアクタの個々の層にて、透光性 窓を形成するために腐食除去によって限定された範囲で金属が完全に除去される ことを特徴とする前記請求項のいずれか一項にしたがう方法。 16.流体経路を少なくとも1つの平板に並びに流体のための導入路と導出路を 備えたケミカルマイクロリアクタにして、上記流体経路が互いに対抗する金属で なる側壁とこれら側壁の間に延在する金属乃至プラスチックでなる他の側壁によ って画定されたマイクロリアクタにおいて、適切な鑞付け層及び/又は接着層を 用いて上記平板が互いに及び/又は開いた流体経路を閉じる閉鎖セグメントと連 結していることを特徴とするマイクロリアクタ。 17.上記側壁が少なくとも鋼、特殊鋼、銅、ニッケル及びアルミニウムの群か ら選択された金属から形成されることを特徴とする請求項16にしたがうマイク ロリアクタ。 18.鑞付け層として、錫、鉛、ビスマス、アンチモン及び銀の群から選択され た金属を含有する金属合金が含まれることを特徴とする請求項16又は17にし たがうマイクロリアクタ。 19.側壁が触媒作用のため及び/又は腐食保護のために機能層で被覆されてい ることを特徴とする請求項16〜18のいずれか一項にしたがうマイクロリアク タ。 20.有毒、不安定又は爆発性の化学製品、特に塩化シアン、ホスゲン、酸化エ チレン、セレン化合物、メルカプタン、塩化メチル、ヨウ化メチル、硫酸ジメチ ル、塩化ビルニ及びホスフィンを製造するために、請求項16〜19のいずれか 一項にしたがうマイクロリアクタの使用。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19708472A DE19708472C2 (de) | 1997-02-20 | 1997-02-20 | Herstellverfahren für chemische Mikroreaktoren |
DE19708472.9 | 1997-02-20 | ||
PCT/DE1998/000519 WO1998037457A1 (de) | 1997-02-20 | 1998-02-17 | Chemische mikroreaktoren und verfahren zu deren herstellung |
Publications (2)
Publication Number | Publication Date |
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JP2001524019A true JP2001524019A (ja) | 2001-11-27 |
JP4020438B2 JP4020438B2 (ja) | 2007-12-12 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP53616298A Expired - Fee Related JP4020438B2 (ja) | 1997-02-20 | 1998-02-17 | ケミカルマイクロリアクタを製造するための方法 |
Country Status (9)
Country | Link |
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US (1) | US6409072B1 (ja) |
EP (1) | EP0961953B1 (ja) |
JP (1) | JP4020438B2 (ja) |
KR (1) | KR100507426B1 (ja) |
CA (1) | CA2282354C (ja) |
DE (2) | DE19708472C2 (ja) |
ES (1) | ES2205468T3 (ja) |
TW (1) | TW438624B (ja) |
WO (1) | WO1998037457A1 (ja) |
Cited By (11)
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JP2005047794A (ja) * | 2003-07-14 | 2005-02-24 | Dainippon Printing Co Ltd | 水素製造用のマイクロリアクターおよびその製造方法 |
JP2006150347A (ja) * | 2004-10-27 | 2006-06-15 | Kyocera Corp | 生成物製造装置並びに微粒子の製造方法 |
JP2006518270A (ja) * | 2002-10-31 | 2006-08-10 | ジョージア テック リサーチ コーポレイション | マイクロ構造及びその製造方法 |
JP2006523522A (ja) * | 2003-04-16 | 2006-10-19 | ウーデ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 触媒を備えたプレート構造のマイクロ型反応器 |
JP2006320772A (ja) * | 2005-05-17 | 2006-11-30 | Hitachi Plant Technologies Ltd | マイクロ流体デバイス |
JP2007269578A (ja) * | 2006-03-31 | 2007-10-18 | Sumitomo Chemical Co Ltd | シアナミド類の製造方法 |
JP2007319815A (ja) * | 2006-06-02 | 2007-12-13 | Toray Eng Co Ltd | 液体混合装置、および液体混合システム |
US7527741B2 (en) | 2003-07-24 | 2009-05-05 | Ryoichi Aogaki | Microreactor including magnetic barrier |
JP2009527350A (ja) * | 2006-02-23 | 2009-07-30 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | マイクロ反応器を製造するためのプロセスとリフォーマとしてのその使用 |
US7763216B2 (en) | 2002-10-25 | 2010-07-27 | Casio Computer Co., Ltd. | Chemical reactor and fuel cell system |
JP2013514878A (ja) * | 2009-12-18 | 2013-05-02 | ヴェロシス インコーポレイテッド | 材料が低減され且つ容積生産性が増長された構造を有するマイクロチャンネルテクノロジー |
Families Citing this family (96)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19801374C1 (de) | 1998-01-16 | 1999-03-11 | Dbb Fuel Cell Engines Gmbh | Verfahren zum Löten von metallischen mikrostrukturierten Blechen |
DE19825102C2 (de) | 1998-06-05 | 2001-09-27 | Xcellsis Gmbh | Verfahren zur Herstellung eines kompakten katalytischen Reaktors |
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JP2006523522A (ja) * | 2003-04-16 | 2006-10-19 | ウーデ ゲゼルシャフト ミット ベシュレンクテル ハフツング | 触媒を備えたプレート構造のマイクロ型反応器 |
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JP2006150347A (ja) * | 2004-10-27 | 2006-06-15 | Kyocera Corp | 生成物製造装置並びに微粒子の製造方法 |
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JP2009527350A (ja) * | 2006-02-23 | 2009-07-30 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | マイクロ反応器を製造するためのプロセスとリフォーマとしてのその使用 |
JP2007269578A (ja) * | 2006-03-31 | 2007-10-18 | Sumitomo Chemical Co Ltd | シアナミド類の製造方法 |
JP2007319815A (ja) * | 2006-06-02 | 2007-12-13 | Toray Eng Co Ltd | 液体混合装置、および液体混合システム |
JP2013514878A (ja) * | 2009-12-18 | 2013-05-02 | ヴェロシス インコーポレイテッド | 材料が低減され且つ容積生産性が増長された構造を有するマイクロチャンネルテクノロジー |
Also Published As
Publication number | Publication date |
---|---|
ES2205468T3 (es) | 2004-05-01 |
DE19708472C2 (de) | 1999-02-18 |
CA2282354C (en) | 2009-11-03 |
EP0961953A1 (de) | 1999-12-08 |
KR20000075460A (ko) | 2000-12-15 |
US6409072B1 (en) | 2002-06-25 |
CA2282354A1 (en) | 1998-08-27 |
DE59809806D1 (de) | 2003-11-06 |
KR100507426B1 (ko) | 2005-08-09 |
TW438624B (en) | 2001-06-07 |
JP4020438B2 (ja) | 2007-12-12 |
DE19708472A1 (de) | 1998-09-24 |
EP0961953B1 (de) | 2003-10-01 |
WO1998037457A1 (de) | 1998-08-27 |
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