JP2001210693A5 - - Google Patents

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Publication number
JP2001210693A5
JP2001210693A5 JP2000017223A JP2000017223A JP2001210693A5 JP 2001210693 A5 JP2001210693 A5 JP 2001210693A5 JP 2000017223 A JP2000017223 A JP 2000017223A JP 2000017223 A JP2000017223 A JP 2000017223A JP 2001210693 A5 JP2001210693 A5 JP 2001210693A5
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JP
Japan
Prior art keywords
substrate
chamber
outside air
processing chamber
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000017223A
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English (en)
Japanese (ja)
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JP3998386B2 (ja
JP2001210693A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000017223A priority Critical patent/JP3998386B2/ja
Priority claimed from JP2000017223A external-priority patent/JP3998386B2/ja
Priority to US09/715,022 priority patent/US6461437B1/en
Priority to CNB001364952A priority patent/CN1196173C/zh
Priority to KR10-2001-0003540A priority patent/KR100381807B1/ko
Publication of JP2001210693A publication Critical patent/JP2001210693A/ja
Publication of JP2001210693A5 publication Critical patent/JP2001210693A5/ja
Application granted granted Critical
Publication of JP3998386B2 publication Critical patent/JP3998386B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000017223A 2000-01-26 2000-01-26 液晶表示装置の製造装置および液晶表示装置の製造方法 Expired - Fee Related JP3998386B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000017223A JP3998386B2 (ja) 2000-01-26 2000-01-26 液晶表示装置の製造装置および液晶表示装置の製造方法
US09/715,022 US6461437B1 (en) 2000-01-26 2000-11-20 Apparatus used for fabricating liquid crystal device and method of fabricating the same
CNB001364952A CN1196173C (zh) 2000-01-26 2000-12-27 液晶显示装置的制造装置和液晶显示装置的制造方法
KR10-2001-0003540A KR100381807B1 (ko) 2000-01-26 2001-01-22 액정 표시 장치의 제조 장치 및 액정 표시 장치의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000017223A JP3998386B2 (ja) 2000-01-26 2000-01-26 液晶表示装置の製造装置および液晶表示装置の製造方法

Publications (3)

Publication Number Publication Date
JP2001210693A JP2001210693A (ja) 2001-08-03
JP2001210693A5 true JP2001210693A5 (enExample) 2005-04-07
JP3998386B2 JP3998386B2 (ja) 2007-10-24

Family

ID=18544249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000017223A Expired - Fee Related JP3998386B2 (ja) 2000-01-26 2000-01-26 液晶表示装置の製造装置および液晶表示装置の製造方法

Country Status (4)

Country Link
US (1) US6461437B1 (enExample)
JP (1) JP3998386B2 (enExample)
KR (1) KR100381807B1 (enExample)
CN (1) CN1196173C (enExample)

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JP5190215B2 (ja) * 2007-03-30 2013-04-24 東京エレクトロン株式会社 ターボ分子ポンプの洗浄方法
KR20130041089A (ko) * 2010-06-21 2013-04-24 가부시키가이샤 알박 기판 반전 장치, 진공 성막 장치 및 기판 반전 방법
WO2012082198A1 (en) * 2010-12-13 2012-06-21 Tp Solar, Inc. Dopant applicator system and method of applying vaporized doping compositions to pv solar wafers
JP5472283B2 (ja) * 2011-12-21 2014-04-16 株式会社安川電機 ロボットのアーム構造およびロボット
US9837271B2 (en) 2014-07-18 2017-12-05 Asm Ip Holding B.V. Process for forming silicon-filled openings with a reduced occurrence of voids
US9443730B2 (en) * 2014-07-18 2016-09-13 Asm Ip Holding B.V. Process for forming silicon-filled openings with a reduced occurrence of voids
US10460932B2 (en) 2017-03-31 2019-10-29 Asm Ip Holding B.V. Semiconductor device with amorphous silicon filled gaps and methods for forming
CN109712906B (zh) * 2017-10-25 2021-05-11 长鑫存储技术有限公司 具有清洗功能的晶圆存储装置及半导体生产设备
TWI842826B (zh) * 2019-02-22 2024-05-21 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 基材處理設備及處理基材之方法
CN118086860A (zh) * 2024-04-29 2024-05-28 成都晨发泰达航空科技股份有限公司 一种转子叶片化学气相沉积铝涂层装置及方法

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