JP2000514468A - 高度に誘発性の複屈折を示す光アドレス指定可能基質および光アドレス指定可能側基ポリマー類 - Google Patents
高度に誘発性の複屈折を示す光アドレス指定可能基質および光アドレス指定可能側基ポリマー類Info
- Publication number
- JP2000514468A JP2000514468A JP09541496A JP54149697A JP2000514468A JP 2000514468 A JP2000514468 A JP 2000514468A JP 09541496 A JP09541496 A JP 09541496A JP 54149697 A JP54149697 A JP 54149697A JP 2000514468 A JP2000514468 A JP 2000514468A
- Authority
- JP
- Japan
- Prior art keywords
- polymers
- polymer
- group
- light
- addressable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 title claims abstract description 78
- 230000001747 exhibiting effect Effects 0.000 title claims description 7
- 239000000758 substrate Substances 0.000 title abstract description 17
- 230000003287 optical effect Effects 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims description 35
- 239000000178 monomer Substances 0.000 claims description 26
- 238000010521 absorption reaction Methods 0.000 claims description 25
- 230000008859 change Effects 0.000 claims description 17
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 230000005670 electromagnetic radiation Effects 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- YXPCGOWTNYGQJV-UHFFFAOYSA-N 2-cyano-3-nitrobenzamide Chemical compound C(#N)C1=C(C(=O)N)C=CC=C1[N+](=O)[O-] YXPCGOWTNYGQJV-UHFFFAOYSA-N 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 2
- 239000011232 storage material Substances 0.000 claims description 2
- ZESWUEBPRPGMTP-UHFFFAOYSA-N 4-nitrobenzamide Chemical compound NC(=O)C1=CC=C([N+]([O-])=O)C=C1 ZESWUEBPRPGMTP-UHFFFAOYSA-N 0.000 claims 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 claims 1
- 238000002203 pretreatment Methods 0.000 claims 1
- 238000003860 storage Methods 0.000 abstract description 11
- 230000001678 irradiating effect Effects 0.000 abstract description 4
- 239000005266 side chain polymer Substances 0.000 abstract description 2
- -1 silver halide Chemical class 0.000 description 35
- 239000000243 solution Substances 0.000 description 16
- 125000003118 aryl group Chemical group 0.000 description 15
- 238000005259 measurement Methods 0.000 description 15
- 230000010287 polarization Effects 0.000 description 15
- 238000002834 transmittance Methods 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 239000010408 film Substances 0.000 description 12
- 125000000623 heterocyclic group Chemical group 0.000 description 11
- 230000005540 biological transmission Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000460 chlorine Substances 0.000 description 7
- 229910052801 chlorine Inorganic materials 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 7
- 150000002367 halogens Chemical class 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 125000004739 (C1-C6) alkylsulfonyl group Chemical group 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 125000004750 (C1-C6) alkylaminosulfonyl group Chemical group 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 5
- 229910052794 bromium Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 125000005842 heteroatom Chemical group 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 5
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 230000001939 inductive effect Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000006413 ring segment Chemical group 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 4
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical group NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 3
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 230000006399 behavior Effects 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- 229960000583 acetic acid Drugs 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 229920006125 amorphous polymer Polymers 0.000 description 2
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical group C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 2
- 239000012362 glacial acetic acid Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000009878 intermolecular interaction Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 2
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 2
- 239000012074 organic phase Substances 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 238000001226 reprecipitation Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 238000010345 tape casting Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229930192474 thiophene Natural products 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 239000013598 vector Substances 0.000 description 2
- 125000000391 vinyl group Chemical class [H]C([*])=C([H])[H] 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- FSQQTNAZHBEJLS-OWOJBTEDSA-N (e)-4-amino-4-oxobut-2-enoic acid Chemical group NC(=O)\C=C\C(O)=O FSQQTNAZHBEJLS-OWOJBTEDSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- MBOCINIPIHLPHH-UHFFFAOYSA-N 2-(n-methylanilino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCN(C)C1=CC=CC=C1 MBOCINIPIHLPHH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KLGQWSOYKYFBTR-UHFFFAOYSA-N 2-nitrobenzamide Chemical compound NC(=O)C1=CC=CC=C1[N+]([O-])=O KLGQWSOYKYFBTR-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DXIJHCSGLOHNES-UHFFFAOYSA-N 3,3-dimethylbut-1-enylbenzene Chemical compound CC(C)(C)C=CC1=CC=CC=C1 DXIJHCSGLOHNES-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- IPMNLGOBXWTQRV-UHFFFAOYSA-N 4-aminobenzene-1,3-dicarbonitrile Chemical compound NC1=CC=C(C#N)C=C1C#N IPMNLGOBXWTQRV-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- MYVCBCXHYYLJRW-UHFFFAOYSA-N C(#N)C1(CC=C(C(=O)N)C=C1)[N+](=O)[O-] Chemical compound C(#N)C1(CC=C(C(=O)N)C=C1)[N+](=O)[O-] MYVCBCXHYYLJRW-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-M Carbamate Chemical compound NC([O-])=O KXDHJXZQYSOELW-UHFFFAOYSA-M 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical group OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 241000239366 Euphausiacea Species 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Chemical group C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000004457 alkyl amino carbonyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229940051881 anilide analgesics and antipyretics Drugs 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 239000000987 azo dye Chemical group 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- ZPOLOEWJWXZUSP-AATRIKPKSA-N bis(prop-2-enyl) (e)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C\C(=O)OCC=C ZPOLOEWJWXZUSP-AATRIKPKSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000002837 carbocyclic group Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 150000001470 diamides Chemical class 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- VQTGUFBGYOIUFS-UHFFFAOYSA-N nitrosylsulfuric acid Chemical compound OS(=O)(=O)ON=O VQTGUFBGYOIUFS-UHFFFAOYSA-N 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- 229930015698 phenylpropene Natural products 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000000967 suction filtration Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/106—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an azo dye
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
- G03H2240/52—Exposure parameters, e.g. time, intensity
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 光アドレス指定可能ポリマーから生じさせた0.001から0.95の 光学的異方性Δnを示す平らな材料を該光学的異方性を部分的に選択的に変える ことを通して光学的に利用できる情報を記憶させる目的で用いる使用。 2. ホログラフィー記憶材料としての請求の範囲第1項記載の使用。 3. 請求の範囲第1項に従って使用すべき平らな材料にパターンを記憶させ る方法であって、103から107mJ/m2のエネルギー密度を有する光を用い た照射を該材料に10-3から10-15秒の期間受けさせる方法。 4. 光学的異方性を予備処理で生じさせることができて該異方性を10-3か ら10-15秒の期間に渡る露光で変化させることができるポリマー。 5. 請求の範囲第4項記載のポリマーであって、バックボーンとして働く主 鎖上に多様な種類の側鎖を持っていて、上記種類の鎖の両方が電磁放射線を吸収 する(少なくとも1つの種類が好適には可視光の波長を吸収する)能力を有して いるが、但しその異なる側鎖が示す吸収最大値が離れている距離が少なくとも2 00cm-1で多くとも10000cm-1であるポリマー類。 6. 請求の範囲第5項記載のポリマーであって、式 -S1‐T1‐Q1‐A (I) および ‐S2‐T2‐Q2‐P (II) [式中、 S1、S2は、互いに独立して、酸素、硫黄またはNR1を表し、 R1は、水素またはC1−C4アルキルを表し、 T1、T2は、互いに独立して、場合により−O−、−NR1−または−OSiR1 2 O−が割り込んでいてもよくそして/またはメチルまたはエチルで置換されて いてもよい(CH2)n基を表し、 nは、整数2、3または4を表し、 Q1、Q2は、互いに独立して、二価の基を表し、 A、Pは、互いに独立して、電磁放射線を吸収し得る単位を表す] で表される側基を有するポリマー類。 7. AおよびPが式 および [式中、 R2は、水素またはシアノであり、 R2’は、水素またはメチルであり、 Wは、酸素またはNR1であり、そして R4は、ニトロ、シアノ、ベンズアミド、p−クロロ、p−シアノ、p−ニトロ ベンズアミドまたはジメチルアミドである] に相当する請求の範囲第4から6項記載のポリマー類。 8. 基−S1−T1−Q1−および−S2−T2−Q2−が式−OCH2 CH2O−、−OCH2CH2OCH2CH2O−および−OCH2CH2−NR1−に 相当する請求の範囲第4から7項記載のポリマー類。 9. 該主鎖がポリ(メタ)アクリロイルである請求の範囲第4から8項記載 のポリマー類。 10. 0.15より大きい複屈折率変化Δnを偏光で刻み込むことができる 請求の範囲第4から9項記載のポリマー類。 11. 請求の範囲第4から10項記載のポリマー類を製造する方法であって 、式で表されるモノマー類に加えて場合によりさらなるモノマー類を互いに共重合さ せることに従う方法。 12. 請求の範囲第4から10項記載のポリマーから作られたフィルム。 13. 請求の範囲第12項記載のフィルムで覆われた支持体。 14. 光学構造要素を製造するための請求の範囲第4から10項記載ポリマ ーの使用。
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1996120588 DE19620588A1 (de) | 1996-05-22 | 1996-05-22 | Schnell fotoadressierbare Substrate, ein Verfahren zum Beschreiben dieser Substrate und ihre Verwendung |
DE1997103132 DE19703132A1 (de) | 1997-01-29 | 1997-01-29 | Photoadressierbare Seitengruppenpolymere mit hoher induzierbarer Doppelbrechung |
DE19703132.3 | 1997-02-19 | ||
DE19620588.3 | 1997-02-19 | ||
DE1997106379 DE19706379A1 (de) | 1997-02-19 | 1997-02-19 | Photoadressierbare Seitengruppenpolymere mit hoher induzierbarer Doppelbrechung |
DE19706379.9 | 1997-02-19 | ||
PCT/EP1997/002489 WO1997044365A1 (de) | 1996-05-22 | 1997-05-15 | Schnell fotoadressierbare substrate sowie fotoadressierbare seitengruppenpolymere mit hoher induzierbarer doppelbrechung |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000514468A true JP2000514468A (ja) | 2000-10-31 |
JP2000514468A5 JP2000514468A5 (ja) | 2004-11-25 |
JP4272260B2 JP4272260B2 (ja) | 2009-06-03 |
Family
ID=27216259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54149697A Expired - Fee Related JP4272260B2 (ja) | 1996-05-22 | 1997-05-15 | 高度に誘発性の複屈折を示す光アドレス指定可能基質および光アドレス指定可能側基ポリマー類 |
Country Status (10)
Country | Link |
---|---|
US (1) | US6423799B1 (ja) |
EP (1) | EP0900239B1 (ja) |
JP (1) | JP4272260B2 (ja) |
CN (1) | CN1178959C (ja) |
AU (1) | AU2898497A (ja) |
CA (1) | CA2255935C (ja) |
DE (1) | DE59706772D1 (ja) |
DK (1) | DK0900239T3 (ja) |
ES (1) | ES2176739T3 (ja) |
WO (1) | WO1997044365A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003535192A (ja) * | 2000-05-31 | 2003-11-25 | バイエル アクチェンゲゼルシャフト | 光学式データ記憶用混合ポリマー |
US7501210B2 (en) | 2002-06-07 | 2009-03-10 | Fuji Xerox Co., Ltd. | Photo-responsive high-molecular compound, photo-responsive high-molecular composition, dicarboxylic acid monomer, polyester, optical recording medium and optical record reproducing device |
US7884167B2 (en) | 2006-07-11 | 2011-02-08 | Nitto Denko Corporation | Method for production of polyfunctional compound |
JP2011246696A (ja) * | 2010-04-27 | 2011-12-08 | Sumitomo Chemical Co Ltd | 組成物及び偏光子 |
US8168764B2 (en) | 2006-07-11 | 2012-05-01 | Nitto Denko Corporation | Polyfunctional compound, optical recording material, optical recording medium, optical recording/reproducing apparatus, optical waveguide material, and photo-alignment film material |
JP2017504050A (ja) * | 2013-12-27 | 2017-02-02 | エルジー・ケム・リミテッド | 染料型偏光体形成用組成物および染料型偏光体 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19947579A1 (de) * | 1999-10-01 | 2001-04-12 | Bayer Ag | Verfahren zur digitalen optischen Datenspeicherung |
DE10007410A1 (de) * | 2000-02-18 | 2001-08-23 | Bayer Ag | Neues optisches Speicherverfahren für wiederbeschreibbare digitale Datenträger |
IL135309A0 (en) * | 2000-03-28 | 2001-05-20 | Ortal Apert | Three-dimensional optical memory |
DE10027153A1 (de) | 2000-05-31 | 2001-12-06 | Bayer Ag | Blockcopolymere zur optischen Datenspeicherung |
DE10115227A1 (de) * | 2001-03-28 | 2002-12-19 | Bayer Ag | Optischer Datenträger enthaltend in der Informationsschicht eine lichtabsorbierende Verbindung mit mehreren chromophoren Zentren |
CA2461570C (en) * | 2001-09-27 | 2010-09-14 | Bayer Aktiengesellschaft | Rewriteable optical recording material having good solubility |
JP2004002288A (ja) * | 2001-12-13 | 2004-01-08 | Merck Patent Gmbh | オキサジアゾール誘導体並びに電荷移動および発光材料としてのこの使用 |
EP1490330A2 (en) * | 2002-02-21 | 2004-12-29 | Mempile Inc. | Polymer bound donor-acceptor-donor compounds and their use in a 3-dimensional optical memory |
KR20050012287A (ko) * | 2002-06-19 | 2005-01-31 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 광학 데이터 저장장치 |
JP4772288B2 (ja) * | 2003-06-05 | 2011-09-14 | 東京応化工業株式会社 | ホトレジスト組成物用樹脂、ホトレジスト組成物、およびレジストパターン形成方法 |
EP1510862A3 (en) | 2003-08-25 | 2006-08-09 | Fuji Photo Film Co., Ltd. | Hologram recording method and hologram recording material |
JP4188265B2 (ja) | 2003-10-23 | 2008-11-26 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
JP2005274628A (ja) * | 2004-03-22 | 2005-10-06 | Fuji Xerox Co Ltd | 光記録材料、光記録媒体、及び光記録再生装置 |
JP2005309359A (ja) | 2004-03-25 | 2005-11-04 | Fuji Photo Film Co Ltd | ホログラム記録材料、ホログラム記録方法、光記録媒体、3次元ディスプレイホログラムおよびホログラフィック光学素子。 |
US7897296B2 (en) * | 2004-09-30 | 2011-03-01 | General Electric Company | Method for holographic storage |
JP4649158B2 (ja) | 2004-09-30 | 2011-03-09 | 富士フイルム株式会社 | ホログラム記録方法 |
US20060078802A1 (en) * | 2004-10-13 | 2006-04-13 | Chan Kwok P | Holographic storage medium |
JPWO2006043632A1 (ja) * | 2004-10-20 | 2008-05-22 | 松下電器産業株式会社 | 記録装置、再生装置、記録再生装置 |
DE102005028145A1 (de) * | 2005-06-17 | 2006-12-28 | Bayer Materialscience Ag | Optischer Datenspeicher, dessen Herstellung und Verwendung |
DE102006005860A1 (de) * | 2006-02-09 | 2007-08-30 | Bayer Innovation Gmbh | Verfahren und Vorrichtung zur Herstellung von Polarisationshologrammen |
US8501371B2 (en) * | 2006-12-14 | 2013-08-06 | General Electric Company | Holographic data storage method and system |
DE102006062457A1 (de) * | 2006-12-28 | 2008-07-03 | Bayer Innovation Gmbh | Optische Speichermedien und Verfahren zu deren Herstellung |
JP6586276B2 (ja) | 2015-02-20 | 2019-10-02 | 住友化学株式会社 | 化合物およびこれを含む組成物 |
WO2018070507A1 (ja) * | 2016-10-14 | 2018-04-19 | 日産化学工業株式会社 | 液晶配向剤、液晶配向膜及び液晶表示素子 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3190876A (en) * | 1962-04-19 | 1965-06-22 | Nat Starch Chem Corp | Ethylenically unsaturated azobenzene derivatives |
DE3211400A1 (de) | 1982-03-27 | 1983-09-29 | Basf Ag, 6700 Ludwigshafen | Polymere mit mesogenen gruppen und farbstoffresten in den seitenketten |
US5190689A (en) * | 1985-09-28 | 1993-03-02 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymer materials having liquid-crystalline phases |
DE3631841A1 (de) * | 1986-09-19 | 1988-03-24 | Basf Ag | Fluessigkristallines copolymer |
US4925589A (en) | 1987-12-29 | 1990-05-15 | Hoffmann-La Roche Inc. | Amide side-chain polymers |
DE3808430A1 (de) | 1988-03-14 | 1989-09-28 | Consortium Elektrochem Ind | Fluessigkristalline polymere mit chromophoren seitengruppen |
DE3810722A1 (de) | 1988-03-30 | 1989-10-12 | Roehm Gmbh | Vorrichtung zur reversiblen optischen datenspeicherung |
DE3920420A1 (de) | 1989-06-22 | 1991-01-03 | Roehm Gmbh | Verfahren zur herstellung optischer komponenten (i) |
US5262081A (en) * | 1990-03-01 | 1993-11-16 | Akzo N.V. | Liquid crystalline polyesters for optical data storage |
US5173381A (en) | 1991-08-05 | 1992-12-22 | Queen's University | Azo polymers for reversible optical storage |
DE4132685A1 (de) * | 1991-10-01 | 1993-04-08 | Basf Ag | Azofarbstoffe enthaltende polymerisate |
DE4135080A1 (de) | 1991-10-24 | 1993-04-29 | Roehm Gmbh | Verbesserte fluessigkristalline farbstoffcopolymere |
DE4208328C2 (de) | 1992-03-16 | 2002-11-14 | Bayer Ag | Verfahren und Vorrichtung zur löschbaren Speicherung von Information |
US5359008A (en) * | 1992-05-18 | 1994-10-25 | Nippon Telegraph And Telephone Corporation | Second-order nonlinear optical polymer and method for producing the same |
DE4244197A1 (de) * | 1992-12-24 | 1994-06-30 | Basf Ag | Verfahren zur Herstellung vernetzter Polymerschichten mit nichtlinear optischen Eigenschaften und deren Verwendung |
EP0622789B1 (de) * | 1993-03-30 | 2002-08-07 | Bayer Ag | Flächenhafte Gebilde aus Seitengruppenpolymeren |
US5332522A (en) * | 1993-04-29 | 1994-07-26 | The University Of Rochester | Thermotropic chiral nematic liquid crystalline copolymers |
US5496670A (en) * | 1993-08-30 | 1996-03-05 | Riso National Laboratory | Optical storage medium |
DE4434966A1 (de) * | 1994-09-30 | 1996-04-04 | Bayer Ag | Neue Seitengruppenpolymere und ihre Verwendung für optische Bauelemente |
US5641346A (en) * | 1995-12-13 | 1997-06-24 | Xerox Corporation | Ink jet ink compositions and recording processes |
-
1997
- 1997-05-15 CN CNB971966648A patent/CN1178959C/zh not_active Expired - Lifetime
- 1997-05-15 US US09/180,851 patent/US6423799B1/en not_active Expired - Lifetime
- 1997-05-15 AU AU28984/97A patent/AU2898497A/en not_active Abandoned
- 1997-05-15 ES ES97923082T patent/ES2176739T3/es not_active Expired - Lifetime
- 1997-05-15 DE DE59706772T patent/DE59706772D1/de not_active Expired - Lifetime
- 1997-05-15 EP EP97923082A patent/EP0900239B1/de not_active Expired - Lifetime
- 1997-05-15 DK DK97923082T patent/DK0900239T3/da active
- 1997-05-15 JP JP54149697A patent/JP4272260B2/ja not_active Expired - Fee Related
- 1997-05-15 CA CA002255935A patent/CA2255935C/en not_active Expired - Fee Related
- 1997-05-15 WO PCT/EP1997/002489 patent/WO1997044365A1/de active IP Right Grant
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003535192A (ja) * | 2000-05-31 | 2003-11-25 | バイエル アクチェンゲゼルシャフト | 光学式データ記憶用混合ポリマー |
US7501210B2 (en) | 2002-06-07 | 2009-03-10 | Fuji Xerox Co., Ltd. | Photo-responsive high-molecular compound, photo-responsive high-molecular composition, dicarboxylic acid monomer, polyester, optical recording medium and optical record reproducing device |
US7884167B2 (en) | 2006-07-11 | 2011-02-08 | Nitto Denko Corporation | Method for production of polyfunctional compound |
US8158736B2 (en) | 2006-07-11 | 2012-04-17 | Nitto Denko Corporation | Method for production of polyfunctional compound |
US8158737B2 (en) | 2006-07-11 | 2012-04-17 | Nitto Denko Corporation | Method for production of polyfunctional compound |
US8168764B2 (en) | 2006-07-11 | 2012-05-01 | Nitto Denko Corporation | Polyfunctional compound, optical recording material, optical recording medium, optical recording/reproducing apparatus, optical waveguide material, and photo-alignment film material |
JP2011246696A (ja) * | 2010-04-27 | 2011-12-08 | Sumitomo Chemical Co Ltd | 組成物及び偏光子 |
JP2017504050A (ja) * | 2013-12-27 | 2017-02-02 | エルジー・ケム・リミテッド | 染料型偏光体形成用組成物および染料型偏光体 |
US10527758B2 (en) | 2013-12-27 | 2020-01-07 | Lg Chem, Ltd. | Composition for forming dye type polarizer and dye type polarizer |
Also Published As
Publication number | Publication date |
---|---|
DK0900239T3 (da) | 2002-06-10 |
CN1178959C (zh) | 2004-12-08 |
US6423799B1 (en) | 2002-07-23 |
CA2255935A1 (en) | 1997-11-27 |
DE59706772D1 (de) | 2002-05-02 |
EP0900239B1 (de) | 2002-03-27 |
AU2898497A (en) | 1997-12-09 |
EP0900239A1 (de) | 1999-03-10 |
JP4272260B2 (ja) | 2009-06-03 |
CN1226258A (zh) | 1999-08-18 |
WO1997044365A1 (de) | 1997-11-27 |
CA2255935C (en) | 2004-04-20 |
ES2176739T3 (es) | 2002-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4272260B2 (ja) | 高度に誘発性の複屈折を示す光アドレス指定可能基質および光アドレス指定可能側基ポリマー類 | |
KR100355164B1 (ko) | 신규한측쇄기중합체및이의광학부품용용도 | |
JP3626224B2 (ja) | 側鎖基重合体から製造した平板材料 | |
US6620920B1 (en) | Monomers for photoadressable side group polymers of high sensitivity | |
JP4526191B2 (ja) | 書き込みできるブルー・レーザー用の光記録材料 | |
JPH10505447A (ja) | 光による情報の入出力が可能な側鎖重合体における情報を増強する方法 | |
KR20010012559A (ko) | 고도로 광유도성 복굴절되는 단독 중합체 | |
KR100774779B1 (ko) | 광학 데이타 저장용 코폴리머 | |
TWI261153B (en) | Recording material for a holographic volume storage medium, holographic volume storage medium, the dyes used therein and process for the preparation thereof | |
JPWO2003021350A1 (ja) | 光記録材料 | |
US20030096065A1 (en) | Efficient nonlinear optical polymers having high poling stability | |
US7214451B2 (en) | Rewriteable optical recording material having good solubility | |
JPH10212324A (ja) | 高度の誘導可能な複屈折性のフオトアドレス可能な側鎖ポリマー | |
US6743567B2 (en) | Polymer for data storage, data storage media coated by the same, data storage device and method using data storage media | |
JP2001265199A (ja) | ホログラム記録媒体 | |
JP2002539475A (ja) | ホログラフィック記録材料 | |
KR100472886B1 (ko) | 유도복굴절성이높은광어드레스성기재및광어드레스성측쇄중합체 | |
KR100252948B1 (ko) | 정보저장매체로사용하기위한열방성액정고분자및이것을이용한기록박막의제조방법 | |
KR100940612B1 (ko) | 우수한 용해도를 나타내는 재기록가능 광학기록재료 | |
JP2007045949A (ja) | アゾベンゼンモノマー、その重合体及びこれを用いたホログラム光記録媒体 | |
JP2004252327A (ja) | ホログラム記録媒体 | |
JP2007002137A (ja) | アゾベンゼンモノマー、その重合体及びこれを用いた屈折率変調材料 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040206 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040206 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20051115 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20050823 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20060214 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20060403 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060515 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070417 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20070717 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20070827 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071017 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20080327 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080708 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20081008 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20081117 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081225 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090224 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090227 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120306 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120306 Year of fee payment: 3 |
|
R154 | Certificate of patent or utility model (reissue) |
Free format text: JAPANESE INTERMEDIATE CODE: R154 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120306 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130306 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130306 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140306 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |