JP2000508378A - バルブ金属材中の酸素含有率を下げる方法 - Google Patents
バルブ金属材中の酸素含有率を下げる方法Info
- Publication number
- JP2000508378A JP2000508378A JP9536266A JP53626697A JP2000508378A JP 2000508378 A JP2000508378 A JP 2000508378A JP 9536266 A JP9536266 A JP 9536266A JP 53626697 A JP53626697 A JP 53626697A JP 2000508378 A JP2000508378 A JP 2000508378A
- Authority
- JP
- Japan
- Prior art keywords
- valve metal
- powder
- acid
- temperature
- tantalum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/14—Treatment of metallic powder
- B22F1/145—Chemical treatment, e.g. passivation or decarburisation
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/052—Sintered electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.脱酸素後のバルブ金属材を、酸浸出溶液中で、室温より低い温度で浸出す ることを含む、バルブ金属材中の酸素含有率をコントロールする方法。 2.その浸出溶液を、その脱酸素後のバルブ金属材を浸出する前に、室温より 低い温度まで冷却する請求項1に記載の方法。 3.バルブ金属が、タンタル、ニオブ、及びそれらの合金からなる群より選択 された請求項1に記載の方法。 4.そのバルブ金属がタンタルである請求項3に記載の方法。 5.そのバルブ金属がニオブである請求項3に記載の方法。 6.そのバルブ金属材が、団塊状粉末、フレーク状粉末、インゴットから取り 出した粉末、及び焼結体からなる群より選択された請求項1に記載の方法。 7.その酸浸出溶液の温度が約20℃より低い請求項1に記載の方法。 8.その酸浸出溶液の温度が約0℃より低い請求項7に記載の方法。 9.その酸浸出溶液が鉱酸を含む請求項1に記載の方法。 10.その酸浸出溶液がフッ化水素酸を10%未満で含む請求項9に記載の方 法。 11.バルブ金属粉末を製造し、 そのバルブ金属粉末を凝集させ、 その凝集したバルブ金属粉末を、そのバルブ金属粉末よりも酸素に対し て高い親和性を有するゲッター物質の存在下で脱酸素し、 その脱酸素したバルブ金属粉末を、室温より低い温度の酸 浸出溶液中で浸出し、ゲッター物質不純物を除去する、 各工程を含む、コントロールされた酸素含有率を有するバルブ金属材の 製造方法。 12.その酸浸出溶液を、その脱酸素後のバルブ金属粉末を浸出する前に、室 温より低い温度まで冷却する請求項11に記載の方法。 13.そのバルブ金属が、タンタル、ニオブ、及びそれらの合金からなる群よ り選択された請求項11に記載の方法。 14.そのバルブ金属がタンタルである請求項13に記載の方法。 15.そのバルブ金属がニオブである請求項13に記載の方法。 16.バルブ金属粉末が、真空下の加熱によって凝集される請求項11に記載 の方法。 17.そのバルブ金属粉末が、マグネシウムを含むゲッター物質の存在下で、 約1000℃以下の温度で脱酸素される請求項11に記載の方法。 18.その酸浸出溶液が鉱酸を含む請求項11に記載の方法。 19.その酸浸出溶液がフッ化水素酸を10%未満で含む請求項18に記載の 方法。 20.その酸浸出したバルブ金属粉末を洗浄・乾燥し、 その粉末を圧縮してペレットにし、 そのペレットを焼結して多孔質体にし、 その多質体を電解質中で陽極酸化し、その多孔質体の上に連続した誘電 性酸化物膜を形成する、 各工程をさらに含む請求項11に記載の方法。 21.そのバルブ金属よりも酸素に対して高い親和性を有するゲ ッター物質の存在下でその焼結多孔質体を脱酸素し、 その焼結多孔質体を、その焼結多孔質体の陽極酸化の前に、室温より低 い温度の酸浸出溶液中で浸出し、ゲッター物質不純物を除去する、 各工程をさらに含む請求項20に記載の方法。 22.その酸浸出溶液の温度が約20℃より低い請求項11に記載の方法。 23.その酸浸出溶液の温度が約0℃より低い請求項22に記載の方法。 24.バルブ金属粉末を圧縮してペレットにし、 そのペレットを焼結して多孔質体にし、 その焼結多孔質体を、そのバルブ金属よりも酸素に対して高い親和性を 有するゲッター物質の存在下で脱酸素し、 その焼結多孔質体を、その焼結多孔質体の陽極酸化の前に、室温より低 い温度の酸浸出溶液中で浸出し、ゲッター物質不純物を除去し、 その多質体を電解質中で陽極酸化し、その多孔質体の上に連続した誘電 性酸化物膜を形成する、 各工程を含む、コントロールされた酸素含有率を有するバルブアノード の製造方法。 25.その酸浸出溶液の温度が約20℃より低い請求項24に記載の方法。 26.その酸浸出溶液の温度が約0℃より低い請求項24に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/628,878 US5993513A (en) | 1996-04-05 | 1996-04-05 | Method for controlling the oxygen content in valve metal materials |
US08/628,878 | 1996-04-05 | ||
PCT/US1997/005265 WO1997038143A1 (en) | 1996-04-05 | 1997-03-31 | Method for lowering the oxygen content in valve metal materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000508378A true JP2000508378A (ja) | 2000-07-04 |
JP3655317B2 JP3655317B2 (ja) | 2005-06-02 |
Family
ID=24520688
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53626697A Expired - Fee Related JP3655317B2 (ja) | 1996-04-05 | 1997-03-31 | バルブ金属材中の酸素含有率を下げる方法 |
Country Status (12)
Country | Link |
---|---|
US (2) | US5993513A (ja) |
JP (1) | JP3655317B2 (ja) |
CN (1) | CN1077143C (ja) |
AU (1) | AU2428997A (ja) |
BR (1) | BR9710425A (ja) |
CZ (1) | CZ320298A3 (ja) |
DE (2) | DE19781680B4 (ja) |
GB (1) | GB2326646B (ja) |
IL (1) | IL126449A (ja) |
RU (1) | RU2192491C2 (ja) |
TW (1) | TW502067B (ja) |
WO (1) | WO1997038143A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002093666A (ja) * | 2000-09-20 | 2002-03-29 | Showa Denko Kk | ニオブ粉、それを用いた焼結体及びそれを用いたコンデンサ |
JP2002231583A (ja) * | 2000-12-01 | 2002-08-16 | Showa Denko Kk | コンデンサ用ニオブ粉と該ニオブ粉を用いた焼結体および該焼結体を用いたコンデンサ |
JP2003514378A (ja) * | 1999-11-09 | 2003-04-15 | エイチ・シー・スタルク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | コンデンサー粉末 |
Families Citing this family (61)
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US5993513A (en) * | 1996-04-05 | 1999-11-30 | Cabot Corporation | Method for controlling the oxygen content in valve metal materials |
CN105033283A (zh) * | 1998-05-06 | 2015-11-11 | H.C.施塔克公司 | 用气态镁还原有关氧化物制备的金属粉末 |
US6576038B1 (en) * | 1998-05-22 | 2003-06-10 | Cabot Corporation | Method to agglomerate metal particles and metal particles having improved properties |
US6416730B1 (en) | 1998-09-16 | 2002-07-09 | Cabot Corporation | Methods to partially reduce a niobium metal oxide oxygen reduced niobium oxides |
US6391275B1 (en) | 1998-09-16 | 2002-05-21 | Cabot Corporation | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
US6462934B2 (en) | 1998-09-16 | 2002-10-08 | Cabot Corporation | Methods to partially reduce a niobium metal oxide and oxygen reduced niobium oxides |
US6515846B1 (en) * | 1999-02-08 | 2003-02-04 | H.C. Starck, Inc. | Capacitor substrates made of refractory metal nitrides |
BR0009107A (pt) * | 1999-03-19 | 2002-12-31 | Cabot Corp | Método para produzir pó de nióbio e outros pós metálicos através de moagem |
JP3585791B2 (ja) * | 1999-11-04 | 2004-11-04 | Necトーキン株式会社 | 固体電解コンデンサ用陽極体の製造方法及びその製造方法に用いられる連続焼結装置 |
US6576099B2 (en) | 2000-03-23 | 2003-06-10 | Cabot Corporation | Oxygen reduced niobium oxides |
AU2001266727A1 (en) * | 2000-06-29 | 2002-01-14 | Johnson & Johnson Consumer Companies, Inc | Electrostatic impregnation of powders on substrates |
JP2002060803A (ja) * | 2000-08-10 | 2002-02-28 | Showa Kyabotto Super Metal Kk | 電解コンデンサ用タンタル焼結体の製造方法 |
MXPA03003968A (es) * | 2000-11-06 | 2004-05-24 | Cabot Corp | Oxidos de metal para valvulas, reducidos en oxigeno, modificados. |
US6537396B1 (en) | 2001-02-20 | 2003-03-25 | Ace Manufacturing & Parts Company | Cryogenic processing of springs and high cycle rate items |
US7149074B2 (en) * | 2001-04-19 | 2006-12-12 | Cabot Corporation | Methods of making a niobium metal oxide |
WO2003022741A2 (en) * | 2001-09-12 | 2003-03-20 | F.W. Gartner Thermal Spraying Company | Nanostructured titania coated titanium |
US20040055420A1 (en) * | 2002-05-30 | 2004-03-25 | Arkady Garbar | Method for enhancing surface area of bulk metals |
US20040078308A1 (en) * | 2002-10-21 | 2004-04-22 | Michaluk Christopher A. | Method of supplying metal material for manufacture of sputtering targets and other articles |
US20040186810A1 (en) * | 2003-02-14 | 2004-09-23 | Michaluk Christopher A. | Method of supplying sputtering targets to fabricators and other users |
US7655214B2 (en) | 2003-02-26 | 2010-02-02 | Cabot Corporation | Phase formation of oxygen reduced valve metal oxides and granulation methods |
US7157073B2 (en) * | 2003-05-02 | 2007-01-02 | Reading Alloys, Inc. | Production of high-purity niobium monoxide and capacitor production therefrom |
US7445679B2 (en) * | 2003-05-16 | 2008-11-04 | Cabot Corporation | Controlled oxygen addition for metal material |
WO2004103906A2 (en) * | 2003-05-19 | 2004-12-02 | Cabot Corporation | Methods of making a niobium metal oxide and oxygen reduced niobium oxides |
US7228722B2 (en) * | 2003-06-09 | 2007-06-12 | Cabot Corporation | Method of forming sputtering articles by multidirectional deformation |
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EE05493B1 (et) * | 2006-03-07 | 2011-12-15 | Cabot Corporation | Meetod l?pliku paksusega metallesemete valmistamiseks, saadud metallplaat ja selle valmistamiseks kasutatav BCC- metall |
US7511943B2 (en) | 2006-03-09 | 2009-03-31 | Avx Corporation | Wet electrolytic capacitor containing a cathode coating |
US7480130B2 (en) | 2006-03-09 | 2009-01-20 | Avx Corporation | Wet electrolytic capacitor |
US20080078268A1 (en) | 2006-10-03 | 2008-04-03 | H.C. Starck Inc. | Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof |
US20080145688A1 (en) | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
CN101808770A (zh) * | 2007-10-15 | 2010-08-18 | 高温特殊金属公司 | 利用回收的废料作为源材料制备钽粉末的方法 |
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US7768773B2 (en) * | 2008-01-22 | 2010-08-03 | Avx Corporation | Sintered anode pellet etched with an organic acid for use in an electrolytic capacitor |
US20090279233A1 (en) * | 2008-05-12 | 2009-11-12 | Yuri Freeman | High volumetric efficiency anodes for electrolytic capacitors |
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CN106834671B (zh) * | 2017-03-30 | 2018-08-28 | 贵州大学 | 一种强力搅拌充气式浸出槽 |
US11077497B2 (en) | 2017-06-07 | 2021-08-03 | Global Titanium Inc. | Deoxidation of metal powders |
WO2019173087A1 (en) | 2018-03-05 | 2019-09-12 | Global Advanced Metals Usa, Inc. | Anodes containing spherical powder and capacitors |
US20190271068A1 (en) | 2018-03-05 | 2019-09-05 | Global Advanced Metals Usa, Inc. | Powder Metallurgy Sputtering Targets And Methods Of Producing Same |
CA3091448C (en) | 2018-03-05 | 2024-03-19 | Craig Sungail | Spherical tantalum powder, products containing the same, and methods of making the same |
JP7250374B2 (ja) | 2018-12-12 | 2023-04-03 | グローバル アドバンスト メタルズ ユー.エス.エー.,インコーポレイティド | 球状ニオブ合金粉末、それを含有する製品、及びその作製方法 |
RU2708899C1 (ru) * | 2019-05-10 | 2019-12-12 | федеральное государственное автономное образовательное учреждение высшего образования "Южный федеральный университет" | Способ определения ёмкости хранения кислорода в оксидных материалах |
TW202106893A (zh) | 2019-07-19 | 2021-02-16 | 美商環球高級金屬美國公司 | 球形鉭-鈦合金粉末,包含彼之產品及製備彼之方法 |
CN114068190A (zh) * | 2021-11-16 | 2022-02-18 | 中国振华(集团)新云电子元器件有限责任公司(国营第四三二六厂) | 一种提高钽电容器绝缘强度的方法 |
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-
1996
- 1996-04-05 US US08/628,878 patent/US5993513A/en not_active Expired - Lifetime
-
1997
- 1997-03-31 BR BR9710425A patent/BR9710425A/pt not_active IP Right Cessation
- 1997-03-31 RU RU98119958/02A patent/RU2192491C2/ru not_active IP Right Cessation
- 1997-03-31 IL IL12644997A patent/IL126449A/en not_active IP Right Cessation
- 1997-03-31 AU AU24289/97A patent/AU2428997A/en not_active Abandoned
- 1997-03-31 DE DE19781680A patent/DE19781680B4/de not_active Expired - Lifetime
- 1997-03-31 JP JP53626697A patent/JP3655317B2/ja not_active Expired - Fee Related
- 1997-03-31 DE DE19781680T patent/DE19781680T1/de not_active Withdrawn
- 1997-03-31 CZ CZ983202A patent/CZ320298A3/cs unknown
- 1997-03-31 CN CN97195237A patent/CN1077143C/zh not_active Expired - Fee Related
- 1997-03-31 WO PCT/US1997/005265 patent/WO1997038143A1/en not_active Application Discontinuation
- 1997-03-31 GB GB9821831A patent/GB2326646B/en not_active Expired - Fee Related
- 1997-04-01 TW TW086104154A patent/TW502067B/zh not_active IP Right Cessation
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1999
- 1999-07-02 US US09/347,160 patent/US6312642B1/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003514378A (ja) * | 1999-11-09 | 2003-04-15 | エイチ・シー・スタルク・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | コンデンサー粉末 |
JP4999135B2 (ja) * | 1999-11-09 | 2012-08-15 | エイチ・シー・スタルク・ゲゼルシヤフト・ミツト・ベシュレンクテル・ハフツング | コンデンサー粉末 |
JP2002093666A (ja) * | 2000-09-20 | 2002-03-29 | Showa Denko Kk | ニオブ粉、それを用いた焼結体及びそれを用いたコンデンサ |
JP2002231583A (ja) * | 2000-12-01 | 2002-08-16 | Showa Denko Kk | コンデンサ用ニオブ粉と該ニオブ粉を用いた焼結体および該焼結体を用いたコンデンサ |
JP4521849B2 (ja) * | 2000-12-01 | 2010-08-11 | 昭和電工株式会社 | コンデンサ用ニオブ粉と該ニオブ粉を用いた焼結体および該焼結体を用いたコンデンサ |
Also Published As
Publication number | Publication date |
---|---|
US6312642B1 (en) | 2001-11-06 |
DE19781680B4 (de) | 2008-02-21 |
WO1997038143A1 (en) | 1997-10-16 |
BR9710425A (pt) | 1999-08-17 |
IL126449A (en) | 2001-07-24 |
DE19781680T1 (de) | 1999-04-15 |
GB9821831D0 (en) | 1998-12-02 |
GB2326646A (en) | 1998-12-30 |
CN1221458A (zh) | 1999-06-30 |
RU2192491C2 (ru) | 2002-11-10 |
GB2326646B (en) | 2000-07-19 |
CZ320298A3 (cs) | 1999-12-15 |
JP3655317B2 (ja) | 2005-06-02 |
IL126449A0 (en) | 1999-08-17 |
US5993513A (en) | 1999-11-30 |
CN1077143C (zh) | 2002-01-02 |
TW502067B (en) | 2002-09-11 |
AU2428997A (en) | 1997-10-29 |
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