JP2000113412A - 薄膜磁気ヘッドおよびその製造方法 - Google Patents
薄膜磁気ヘッドおよびその製造方法Info
- Publication number
- JP2000113412A JP2000113412A JP10285770A JP28577098A JP2000113412A JP 2000113412 A JP2000113412 A JP 2000113412A JP 10285770 A JP10285770 A JP 10285770A JP 28577098 A JP28577098 A JP 28577098A JP 2000113412 A JP2000113412 A JP 2000113412A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin
- magnetic pole
- pole portion
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 105
- 238000004519 manufacturing process Methods 0.000 title claims description 36
- 239000010408 film Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 21
- 230000001939 inductive effect Effects 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 2
- 230000004907 flux Effects 0.000 abstract description 14
- 229920002120 photoresistant polymer Polymers 0.000 description 37
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 13
- 238000007747 plating Methods 0.000 description 9
- 239000000696 magnetic material Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 238000005498 polishing Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910018979 CoPt Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910001337 iron nitride Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10285770A JP2000113412A (ja) | 1998-10-07 | 1998-10-07 | 薄膜磁気ヘッドおよびその製造方法 |
| US09/409,430 US6483664B2 (en) | 1998-10-07 | 1999-09-30 | Thin film magnetic head and method of manufacturing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10285770A JP2000113412A (ja) | 1998-10-07 | 1998-10-07 | 薄膜磁気ヘッドおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000113412A true JP2000113412A (ja) | 2000-04-21 |
| JP2000113412A5 JP2000113412A5 (https=) | 2005-07-21 |
Family
ID=17695842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10285770A Pending JP2000113412A (ja) | 1998-10-07 | 1998-10-07 | 薄膜磁気ヘッドおよびその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6483664B2 (https=) |
| JP (1) | JP2000113412A (https=) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6455174B1 (en) * | 1998-11-05 | 2002-09-24 | Hitachi Maxell, Ltd. | Magnetic recording medium, recording and reproducing head, and magnetic recording and reproducing method |
| JP3529678B2 (ja) * | 1999-10-06 | 2004-05-24 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
| US7023658B1 (en) * | 2000-02-08 | 2006-04-04 | Western Digital (Fremont), Inc. | Submicron track-width pole-tips for electromagnetic transducers |
| JP2001256610A (ja) * | 2000-03-09 | 2001-09-21 | Alps Electric Co Ltd | 薄膜磁気ヘッド及びその製造方法 |
| US7190553B2 (en) * | 2000-04-04 | 2007-03-13 | Alps Electric Co., Ltd. | Thin-film magnetic head having lower magnetic pole layer and insulator layer behind the lower magnetic pole layer in the direction of height of the pole layer, and method for manufacturing the thin-film magnetic head |
| JP3602038B2 (ja) * | 2000-07-24 | 2004-12-15 | 株式会社日立グローバルストレージテクノロジーズ | 磁気ヘッドおよび磁気記録再生装置 |
| JP3847068B2 (ja) * | 2000-09-11 | 2006-11-15 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
| JP2002208111A (ja) * | 2000-11-10 | 2002-07-26 | Tdk Corp | 薄膜磁気ヘッドおよびその製造方法 |
| JP3999469B2 (ja) * | 2001-03-21 | 2007-10-31 | Ｔｄｋ株式会社 | 薄膜磁気ヘッドおよびその製造方法 |
| US6678117B2 (en) * | 2001-06-18 | 2004-01-13 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic transducer with bilayer pole piece structure with improved milling endpoint detection |
| US6737281B1 (en) | 2002-01-08 | 2004-05-18 | Western Digital (Fremont), Inc. | Method of making transducer with inorganic nonferromagnetic apex region |
| US6751055B1 (en) * | 2002-01-08 | 2004-06-15 | Western Digital (Fremont), Inc. | Inductive transducer with reduced pole tip protrusion |
| JP3799322B2 (ja) * | 2002-11-15 | 2006-07-19 | 株式会社日立グローバルストレージテクノロジーズ | 磁気ディスク装置 |
| US6989964B2 (en) * | 2003-06-16 | 2006-01-24 | Hitachi Global Storage Technologies Netherlands B.V. | Magnetic head having a pole piece with a double pedestal structure |
| US7116518B2 (en) * | 2003-08-01 | 2006-10-03 | Headway Technologies, Inc. | Short yoke length planar writer with low DC coil resistance |
| US20050035370A1 (en) * | 2003-08-12 | 2005-02-17 | Hrl Laboratories, Llc | Semiconductor structure for a heterojunction bipolar transistor and a method of making same |
| US7133255B2 (en) * | 2003-08-27 | 2006-11-07 | Hitachi Global Storage Technologies Netherlands, B.V. | Magnetic head having magnetic pole with lengthened neck pole tip and coplanar yoke, and method of fabrication thereof |
| US20050067374A1 (en) * | 2003-09-30 | 2005-03-31 | Ananda Baer | Method of forming a read sensor using photoresist structures without undercuts which are removed using chemical-mechanical polishing (CMP) lift-off processes |
| JP2005182897A (ja) * | 2003-12-18 | 2005-07-07 | Fujitsu Ltd | 薄膜磁気ヘッドおよびその製造方法 |
| US7369358B2 (en) * | 2004-02-05 | 2008-05-06 | Seagate Technology Llc | Grounded writer core |
| JP2005285306A (ja) * | 2004-03-05 | 2005-10-13 | Tdk Corp | 薄膜磁気ヘッド |
| US7408740B2 (en) * | 2005-04-21 | 2008-08-05 | Headway Technologies, Inc. | Thin film magnetic head for perpendicular magnetic recording having a main pole with plural grooves in a lower surface thereof and manufacturing method therefore |
| CN104582978B (zh) | 2012-04-25 | 2017-03-08 | 光学物理有限责任公司 | 用于投射一批合成图像的安全装置 |
| US9530443B1 (en) * | 2015-06-25 | 2016-12-27 | Western Digital (Fremont), Llc | Method for fabricating a magnetic recording device having a high aspect ratio structure |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5872693A (en) * | 1993-08-10 | 1999-02-16 | Kabushiki Kaisha Toshiba | Thin-film magnetic head having a portion of the upper magnetic core coplanar with a portion of the lower magnetic core |
| US5438747A (en) | 1994-03-09 | 1995-08-08 | International Business Machines Corporation | Method of making a thin film merged MR head with aligned pole tips |
| JPH08339508A (ja) * | 1995-06-14 | 1996-12-24 | Nec Corp | 薄膜磁気ヘッドおよびその製造方法ならびに磁気記憶装 置 |
| US5805391A (en) * | 1996-10-28 | 1998-09-08 | International Business Machines Corporation | Write head with recessed stitched yoke on a planar portion of an insulation layer defining zero throat height |
| US6163436A (en) * | 1997-11-19 | 2000-12-19 | Tdk Corporation | Thin film magnet head with improved performance |
| US6130805A (en) * | 1997-11-19 | 2000-10-10 | Tdk Corporation | Thin film magnetic head having upper pole chip formed over insulating layer |
| JPH11283215A (ja) * | 1998-03-30 | 1999-10-15 | Tdk Corp | 薄膜磁気ヘッドおよびその製造方法 |
| US6172848B1 (en) * | 1998-04-10 | 2001-01-09 | International Business Machines Corporation | Write head with self aligned pedestal shaped pole tips that are separated by a zero throat height defining layer |
| US6204997B1 (en) * | 1998-05-19 | 2001-03-20 | Tdk Corporation | Thin film magnetic head with a plurality of engaged thin-film coils and method of manufacturing the same |
| JP3517208B2 (ja) * | 2000-12-26 | 2004-04-12 | アルプス電気株式会社 | 薄膜磁気ヘッド及びその製造方法 |
-
1998
- 1998-10-07 JP JP10285770A patent/JP2000113412A/ja active Pending
-
1999
- 1999-09-30 US US09/409,430 patent/US6483664B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20020060878A1 (en) | 2002-05-23 |
| US6483664B2 (en) | 2002-11-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041206 |
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| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041206 |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
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| A521 | Written amendment |
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| A131 | Notification of reasons for refusal |
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| A02 | Decision of refusal |
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