IT1160835B - Apparato per deposizione mediante scarica a bagliore,includente un catado non disposto orizzontalmente - Google Patents

Apparato per deposizione mediante scarica a bagliore,includente un catado non disposto orizzontalmente

Info

Publication number
IT1160835B
IT1160835B IT20280/83A IT2028083A IT1160835B IT 1160835 B IT1160835 B IT 1160835B IT 20280/83 A IT20280/83 A IT 20280/83A IT 2028083 A IT2028083 A IT 2028083A IT 1160835 B IT1160835 B IT 1160835B
Authority
IT
Italy
Prior art keywords
catado
bagliore
deposition
discharge
horizontally placed
Prior art date
Application number
IT20280/83A
Other languages
English (en)
Other versions
IT8320280A0 (it
Inventor
Prem Nath
David Attilio Gattuso
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of IT8320280A0 publication Critical patent/IT8320280A0/it
Application granted granted Critical
Publication of IT1160835B publication Critical patent/IT1160835B/it

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
IT20280/83A 1982-03-29 1983-03-24 Apparato per deposizione mediante scarica a bagliore,includente un catado non disposto orizzontalmente IT1160835B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/363,256 US4423701A (en) 1982-03-29 1982-03-29 Glow discharge deposition apparatus including a non-horizontally disposed cathode

Publications (2)

Publication Number Publication Date
IT8320280A0 IT8320280A0 (it) 1983-03-24
IT1160835B true IT1160835B (it) 1987-03-11

Family

ID=23429485

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20280/83A IT1160835B (it) 1982-03-29 1983-03-24 Apparato per deposizione mediante scarica a bagliore,includente un catado non disposto orizzontalmente

Country Status (9)

Country Link
US (1) US4423701A (it)
JP (1) JPS58174570A (it)
AU (1) AU563805B2 (it)
CA (1) CA1191975A (it)
DE (1) DE3310797A1 (it)
FR (1) FR2524199A1 (it)
GB (1) GB2118212B (it)
IT (1) IT1160835B (it)
NL (1) NL8301062A (it)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3244391A1 (de) * 1982-12-01 1984-06-07 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zur beschichtung von substraten durch plasmapolymerisation
JPH0719748B2 (ja) * 1984-02-17 1995-03-06 鐘淵化学工業株式会社 製膜装置
JPS60191269A (ja) * 1984-03-13 1985-09-28 Sharp Corp 電子写真感光体製造装置
FR2589168B1 (fr) * 1985-10-25 1992-07-17 Solems Sa Appareil et son procede d'utilisation pour la formation de films minces assistee par plasma
US5366554A (en) * 1986-01-14 1994-11-22 Canon Kabushiki Kaisha Device for forming a deposited film
US4829189A (en) * 1986-07-18 1989-05-09 Sando Iron Works Co., Ltd. Apparatus for low-temperature plasma treatment of sheet material
US4920917A (en) * 1987-03-18 1990-05-01 Teijin Limited Reactor for depositing a layer on a moving substrate
JPH0193129A (ja) * 1987-10-02 1989-04-12 Mitsubishi Electric Corp 化学気相成長装置
JPH0351971Y2 (it) * 1988-05-12 1991-11-08
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
DE4324320B4 (de) * 1992-07-24 2006-08-31 Fuji Electric Co., Ltd., Kawasaki Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung
DE4301189C2 (de) * 1993-01-19 2000-12-14 Leybold Ag Vorrichtung zum Beschichten von Substraten
DE4313284A1 (de) * 1993-04-23 1994-10-27 Leybold Ag Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer
DE9407482U1 (de) * 1994-05-05 1994-10-06 Balzers und Leybold Deutschland Holding AG, 63450 Hanau Funktionseinrichtung für eine Vakuumanlage für die Behandlung von scheibenförmigen Werkstücken
FR2786208B1 (fr) * 1998-11-25 2001-02-09 Centre Nat Rech Scient Procede de croissance cristalline sur substrat et reacteur pour sa mise en oeuvre
US6610150B1 (en) 1999-04-02 2003-08-26 Asml Us, Inc. Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
TW514557B (en) * 2000-09-15 2002-12-21 Shipley Co Llc Continuous feed coater
US7085616B2 (en) * 2001-07-27 2006-08-01 Applied Materials, Inc. Atomic layer deposition apparatus
US20060278163A1 (en) * 2002-08-27 2006-12-14 Ovshinsky Stanford R High throughput deposition apparatus with magnetic support
US20040040506A1 (en) * 2002-08-27 2004-03-04 Ovshinsky Herbert C. High throughput deposition apparatus
US20060096536A1 (en) * 2004-11-10 2006-05-11 Daystar Technologies, Inc. Pressure control system in a photovoltaic substrate deposition apparatus
EP1810344A2 (en) * 2004-11-10 2007-07-25 Daystar Technologies, Inc. Pallet based system for forming thin-film solar cells
WO2007102433A1 (ja) 2006-03-02 2007-09-13 Incorporated National University Iwate University 二次電池及びその製造方法並びにシステム
US20100252605A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Web support assembly
US8061686B2 (en) * 2009-04-03 2011-11-22 Uniter Solar Ovonic LLC Pinch valve
US20100252602A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Continuous processing system with pinch valve
US20100252606A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Roll-to-roll deposition apparatus with improved web transport system
EP2368860A1 (de) * 2010-03-01 2011-09-28 Saint-Gobain Glass France Vorrichtung und Verfahren zur Substratprozessierung
JP2013527609A (ja) * 2010-04-30 2013-06-27 アプライド マテリアルズ インコーポレイテッド 縦型インラインｃｖｄシステム
US8861167B2 (en) 2011-05-12 2014-10-14 Global Plasma Solutions, Llc Bipolar ionization device

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1419289A1 (de) * 1961-01-26 1968-12-12 Siemens Ag Verfahren zum Herstellen dotierter Halbleiterkoerper
GB1141551A (en) * 1966-01-24 1969-01-29 Dow Corning A method of coating metallic filaments
DE1621358A1 (de) * 1966-11-08 1971-04-29 Texas Instruments Inc Verfahren zur Aufbringung duenner Filme aus dielektrischem Material auf ein Substrat
CH542772A (de) * 1971-09-21 1973-10-15 Balzers Patent Beteilig Ag Einrichtung zum Transportieren von zu beschichtenden Substraten durch eine Vakuumanlage
DE2253769C3 (de) * 1972-11-02 1979-07-12 Siemens Ag, 1000 Berlin Und 8000 Muenchen Kathodenzerstäubungsanlage mit kontinuierlichem Substratdurchlauf
DE2522352A1 (de) * 1975-05-20 1976-12-02 Siemens Ag Kathodenzerstaeubungsanlage
JPS51149882A (en) * 1975-06-18 1976-12-23 Matsushita Electric Ind Co Ltd Chemical condensation apparatus
JPS5824371B2 (ja) * 1975-07-25 1983-05-20 小沢 寿一郎 炭化珪素薄膜の製造方法
JPS53112066A (en) * 1977-03-11 1978-09-30 Fujitsu Ltd Plasma treatment apparatus
JPS6025537B2 (ja) * 1977-08-22 1985-06-19 株式会社平工製作所 横編機用自動制御装置におけるプログラムシ−トの節約装置
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
US4226898A (en) * 1978-03-16 1980-10-07 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process
JPS559427A (en) * 1978-07-07 1980-01-23 Hitachi Ltd Manufacturing device of silicon nitride film
US4223048A (en) * 1978-08-07 1980-09-16 Pacific Western Systems Plasma enhanced chemical vapor processing of semiconductive wafers
JPS5559727A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma deposition device
US4328646A (en) * 1978-11-27 1982-05-11 Rca Corporation Method for preparing an abrasive coating
JPS5578524A (en) * 1978-12-10 1980-06-13 Shunpei Yamazaki Manufacture of semiconductor device
JPS55125681A (en) * 1979-03-22 1980-09-27 Sanyo Electric Co Ltd Manufacture of photovoltaic device
US4274936A (en) * 1979-04-30 1981-06-23 Advanced Coating Technology, Inc. Vacuum deposition system and method
US4260647A (en) * 1979-06-13 1981-04-07 Rca Corporation Method of depositing an abrasive layer
JPS6029295B2 (ja) * 1979-08-16 1985-07-10 舜平 山崎 非単結晶被膜形成法
JPS5675565A (en) * 1979-11-20 1981-06-22 Sumitomo Electric Ind Ltd Manufacturing method of thin film
JPS5934421B2 (ja) * 1979-11-29 1984-08-22 住友電気工業株式会社 薄膜製造法
JPS5680128A (en) * 1979-12-05 1981-07-01 Sumitomo Electric Ind Ltd Manufacture of thin film
DE2950997C2 (de) * 1979-12-18 1986-10-09 Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa Vorrichtung zum Beschichten
JPS56111274A (en) * 1980-02-07 1981-09-02 Sanyo Electric Co Ltd Manufacture of photoelectromotive force element
JPS56114387A (en) * 1980-02-13 1981-09-08 Sanyo Electric Co Ltd Manufacture of photovoltaic force element
US4289598A (en) * 1980-05-03 1981-09-15 Technics, Inc. Plasma reactor and method therefor
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4410558A (en) * 1980-05-19 1983-10-18 Energy Conversion Devices, Inc. Continuous amorphous solar cell production system
JPS5742118A (en) * 1980-08-27 1982-03-09 Mitsubishi Electric Corp Plasma cvd device
US4438188A (en) * 1981-06-15 1984-03-20 Fuji Electric Company, Ltd. Method for producing photosensitive film for electrophotography
JPS5848416A (ja) * 1981-09-16 1983-03-22 Fuji Electric Corp Res & Dev Ltd 量産型薄膜生成装置

Also Published As

Publication number Publication date
GB2118212B (en) 1986-07-09
JPH0468390B2 (it) 1992-11-02
AU563805B2 (en) 1987-07-23
IT8320280A0 (it) 1983-03-24
FR2524199A1 (fr) 1983-09-30
DE3310797A1 (de) 1983-09-29
JPS58174570A (ja) 1983-10-13
GB8308249D0 (en) 1983-05-05
US4423701A (en) 1984-01-03
CA1191975A (en) 1985-08-13
GB2118212A (en) 1983-10-26
AU1264183A (en) 1983-10-06
NL8301062A (nl) 1983-10-17

Similar Documents

Publication Publication Date Title
IT1160835B (it) Apparato per deposizione mediante scarica a bagliore,includente un catado non disposto orizzontalmente
GB2134987B (en) Apparatus for stopping a fuel-injection-type i.c. engine
IT8222061A0 (it) Apparato per il trattamento di un combustibile.
DK161272C (da) Udleveringsmekanisme til salgsautomat
GB8311173D0 (en) Deposition apparatus
IT8223494A0 (it) Apparecchiatura contabile programmabile per macchine divendita automatiche.
DE3162235D1 (en) Moving support, particularly for sanitary apparatus
ES534202A0 (es) Un procedimiento para preparar nuevos compuestos de cefem.
DK161271C (da) Udleveringsmekanisme til salgsautomat
IT8322177A0 (it) Rulli stenditori interni per un apparato di avvolgimento.
EP0111001A4 (en) DISCHARGE MACHINING DEVICE WITH A CUTTING WIRE.
EP0166786A4 (en) POSITIONING APPARATUS FOR AN ELECTRIC DISCHARGE MACHINE.
IT8319511A0 (it) Gruppo di stiramento per un filatoio.
GB8306409D0 (en) Take down mechanism for flat knitting machines
IT1215716B (it) Apparato per lavorazione mediante scarica elettrica.
IT8323361A0 (it) Dispositivo per centrare un telaio girevole.
FI830604A0 (fi) Roerligt stoed foer roerledningar, apparater och liknande
IT1206103B (it) Macchina per fare trefoli.
IT8321562A1 (it) Dispositivo di estrazione per un armadio, preferibilmente un armadio di riserva
IT8121964A0 (it) Apparato per fotocomposizione.
IT8319102A0 (it) Sostegno intermedio per un quadro.
JPS56141498A (en) Apparatus for installing rotary machine
GB8334330D0 (en) Deposition apparatus
ES517622A0 (es) Procedimiento de preparacion de un nuevo espirodecano.
IT8119540A0 (it) Dispositivo per sostenere un corpo fra due parti reciprocamente parallele.

Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19990331