GB1141551A - A method of coating metallic filaments - Google Patents

A method of coating metallic filaments

Info

Publication number
GB1141551A
GB1141551A GB3799866A GB3799866A GB1141551A GB 1141551 A GB1141551 A GB 1141551A GB 3799866 A GB3799866 A GB 3799866A GB 3799866 A GB3799866 A GB 3799866A GB 1141551 A GB1141551 A GB 1141551A
Authority
GB
United Kingdom
Prior art keywords
electrode
filament
deposited
sic
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3799866A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of GB1141551A publication Critical patent/GB1141551A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)

Abstract

1,141,551. Coating filamentary substrates. DOW CORNING CORP. 24 Aug., 1966 [24 Jan., 1966], No. 37998/66. Heading C1A. [Also in Divisions C7 and H5] Filamentary substrates e.g. of quartz, ceramic or metal such as W are coated by passing the substrate through a vapour of a compound of the element to be deposited, establishing a glow discharge in the vapour between an electrode and the substrate to decompose the compound and deposit the required element. The materials deposited may be Si, B, SiC, boron silicides, B 4 C, Mo, Al and Ta. Boron trichloride or diborane is used for depositing B and SiC is deposited from methyltrichlorosilane, ethyltrichlorosilane, propyltrichlorosilane, trimethylmonochlorosilane, dimethyldichlorosilane, methylsilane, mixtures thereof and mixtures of or with silicon tetrachloride, trichlorosilane. As shown in Fig. 1, a filament 11 is passed through electrode 12 or alternatively the electrode may be moved. A D.C. power source has its negative terminal connected to 12 and its positive terminal to filament 11. The feed gas is fed into the electrode 12 and a glow discharge is created between the electrode and the filament. The process is preferably carried out in a vacuum of 1000 to 70 microns.
GB3799866A 1966-01-24 1966-08-24 A method of coating metallic filaments Expired GB1141551A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52254666A 1966-01-24 1966-01-24

Publications (1)

Publication Number Publication Date
GB1141551A true GB1141551A (en) 1969-01-29

Family

ID=24081286

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3799866A Expired GB1141551A (en) 1966-01-24 1966-08-24 A method of coating metallic filaments

Country Status (4)

Country Link
BE (1) BE693026A (en)
FR (1) FR1508794A (en)
GB (1) GB1141551A (en)
NL (1) NL6701010A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2118212A (en) * 1982-03-29 1983-10-26 Energy Conversion Devices Inc Glow-discharge deposition apparatus including a non-horizontally disposed cathode for depositing amorphous layers
FR2659089A1 (en) * 1990-03-05 1991-09-06 Northrop Corp METHOD AND APPARATUS FOR CHEMICAL VAPOR PHASE DEPOSITION, CONTINUOUSLY, OF SUPERIOR LAYER ON SUBSTRATE.
DE4439056A1 (en) * 1994-11-02 1996-05-09 Dresden Vakuumtech Gmbh Appts. for chemical vapour deposition on fibres
DE4335573C2 (en) * 1993-10-19 2002-10-17 Eberhard Kohl Device for carrying out a CVD coating

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2118212A (en) * 1982-03-29 1983-10-26 Energy Conversion Devices Inc Glow-discharge deposition apparatus including a non-horizontally disposed cathode for depositing amorphous layers
FR2659089A1 (en) * 1990-03-05 1991-09-06 Northrop Corp METHOD AND APPARATUS FOR CHEMICAL VAPOR PHASE DEPOSITION, CONTINUOUSLY, OF SUPERIOR LAYER ON SUBSTRATE.
GB2241711A (en) * 1990-03-05 1991-09-11 Northrop Corp Continuous open chemical vapour deposition
GB2241711B (en) * 1990-03-05 1993-09-22 Northrop Corp Method and apparatus for carbon coating and boron-doped carbon coating
DE4335573C2 (en) * 1993-10-19 2002-10-17 Eberhard Kohl Device for carrying out a CVD coating
DE4439056A1 (en) * 1994-11-02 1996-05-09 Dresden Vakuumtech Gmbh Appts. for chemical vapour deposition on fibres

Also Published As

Publication number Publication date
NL6701010A (en) 1967-07-25
BE693026A (en) 1967-07-24
FR1508794A (en) 1968-01-05

Similar Documents

Publication Publication Date Title
GB1202573A (en) Methods of depositing thin films on substrates by means of gas plasmas
KR880003403A (en) Chemical Vapor Growth and Its Apparatus
GB1364898A (en) Method for depositing refractory metal
KR950703073A (en) MOLYBDENUM ENHANCED LOW TEMPERATURE DEPOSITION OF CRYSTALLINE SILICON NITRIDE OF CRYSTALLINE SILICON
GB1142080A (en) Deposition chamber for manufacture of refractory coated filaments
GB1141551A (en) A method of coating metallic filaments
US5573742A (en) Method for the preparation of high purity aluminum nitride
GB1347369A (en) Production of hollow bodies of semiconductor material
GB1263580A (en) Improvements in or relating to the production of a tubular body of a semiconductor material
GB1260233A (en) Improvements in or relating to the epitaxial deposition of crystalline material from the gas phase
US3279946A (en) Hydrogen chloride treatment of semiconductor coating chamber
SE302914B (en)
GB1013094A (en) Process for the deposition of a thin layer of a very pure brittle material in crystalline form
GB1229128A (en)
GB1518564A (en) Method for the low pressure pyrolytic deposition of silicon nitride
GB1440357A (en) Method for making amorphous semiconductor films
GB1324292A (en) Methods and devices for effecting surface deposits
EP0396333B1 (en) Process for depositing a silicon carbide coating on a filament
GB1237952A (en)
JPH06184750A (en) Composite body and its production
ES327660A1 (en) A method of treating graphite articles and products obtained thereby
Fedoseev et al. Effect of hydrogen on diamond growth from a gaseous phase
US3463666A (en) Monocrystalline beta silicon carbide on sapphire
Causley et al. Vacuum ultraviolet absorption spectra of dichlorosilane, dichloromethylsilane and dichlorodimethylsilane
GB1134352A (en) Improvements in or relating to the production of layers of a solid nitride of a semiconductor element on semiconductor crystals