GB1324292A - Methods and devices for effecting surface deposits - Google Patents

Methods and devices for effecting surface deposits

Info

Publication number
GB1324292A
GB1324292A GB1399971A GB1399971A GB1324292A GB 1324292 A GB1324292 A GB 1324292A GB 1399971 A GB1399971 A GB 1399971A GB 1399971 A GB1399971 A GB 1399971A GB 1324292 A GB1324292 A GB 1324292A
Authority
GB
United Kingdom
Prior art keywords
deposits
port
hexachloride
acetylene
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1399971A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agence National de Valorisation de la Recherche ANVAR filed Critical Agence National de Valorisation de la Recherche ANVAR
Publication of GB1324292A publication Critical patent/GB1324292A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/12—Deposition of aluminium only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Plasma Technology (AREA)

Abstract

1324292 Coating with metals &c. by plasmas AGENCE NATIONALE DE VALORISATION DE LA RECHERCHE 10 May 1971 [15 May 1970] 13999/71 Heading C7F [Also in Division H5] A surface deposit or a port 13 is provided by introducing at zone 11 into a rarefied plasma stream from a plasma generator 1 a substance containing the material to be deposited or containing elements entering into the composition of the material to be deposited, the pressure being less than 5 mm. of the Hg. The preferred pressure is 0À05 to 1 mm of Hg and the preferred speed of the plasma stream is 0À8 Mach. The introduction means 10 includes a heater 10a, for converting the substance to gaseous form, and an arc 10b for dissociating it. Supporting member 12 of port 13 is adjustable to expose different parts of the port 13 for deposition. Applications include the production of conductive deposits on insulating materials, refractory deposits or non-refractory materials, local deposits on masked parts and anti-corrosion deposits on gas-turbine blades or hydraulic turbines or screws, and deposits on wires. Specified deposits are carbon from acetylene, tungsten from the hexachloride, tungsten carbide from the hexachloride and acetylene, and boron, titanium, antimony or silicon from the respective trichloride or tetachloride.
GB1399971A 1970-05-15 1971-05-10 Methods and devices for effecting surface deposits Expired GB1324292A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7017833A FR2088088A1 (en) 1970-05-15 1970-05-15

Publications (1)

Publication Number Publication Date
GB1324292A true GB1324292A (en) 1973-07-25

Family

ID=9055603

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1399971A Expired GB1324292A (en) 1970-05-15 1971-05-10 Methods and devices for effecting surface deposits

Country Status (4)

Country Link
BE (1) BE767225A (en)
DE (1) DE2123335A1 (en)
FR (1) FR2088088A1 (en)
GB (1) GB1324292A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19632393A1 (en) * 1996-07-30 1998-02-05 Univ Berlin Tech High rate plasma-assisted nano-structure layer deposition
DE19958474A1 (en) * 1999-12-04 2001-06-21 Bosch Gmbh Robert Process for producing functional layers with a plasma beam source
DE102004029911B4 (en) * 2003-06-20 2006-11-23 Innovent E.V. Technologieentwicklung Method and device for producing inorganic layers
CN113265641A (en) * 2021-03-25 2021-08-17 安徽工业大学 Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4466876A (en) * 1981-03-17 1984-08-21 Clarion Co., Ltd. Thin layer depositing apparatus
FR2524620A1 (en) * 1982-04-02 1983-10-07 Vironneau Pierre Selectively coating substrate with carbon layer - by carbon mon:oxide decomposition, esp. for solar collector mfr.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19632393A1 (en) * 1996-07-30 1998-02-05 Univ Berlin Tech High rate plasma-assisted nano-structure layer deposition
DE19958474A1 (en) * 1999-12-04 2001-06-21 Bosch Gmbh Robert Process for producing functional layers with a plasma beam source
DE102004029911B4 (en) * 2003-06-20 2006-11-23 Innovent E.V. Technologieentwicklung Method and device for producing inorganic layers
CN113265641A (en) * 2021-03-25 2021-08-17 安徽工业大学 Hydrophobic antifriction self-lubricating carbon film based on low-temperature glow plasma and preparation method thereof

Also Published As

Publication number Publication date
BE767225A (en) 1971-11-16
DE2123335A1 (en) 1971-12-02
FR2088088A1 (en) 1972-01-07

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee