IL148872A - Module containing controlled minienvironment for atmospheric wafer transport - Google Patents

Module containing controlled minienvironment for atmospheric wafer transport

Info

Publication number
IL148872A
IL148872A IL14887200A IL14887200A IL148872A IL 148872 A IL148872 A IL 148872A IL 14887200 A IL14887200 A IL 14887200A IL 14887200 A IL14887200 A IL 14887200A IL 148872 A IL148872 A IL 148872A
Authority
IL
Israel
Prior art keywords
minienvironment
module containing
wafer transport
containing controlled
atmospheric wafer
Prior art date
Application number
IL14887200A
Other languages
English (en)
Other versions
IL148872A0 (en
Inventor
Faro F Kaveh
David E Jacob
Dean Jay Larson
Martin R Maraschin
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23623640&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IL148872(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL148872A0 publication Critical patent/IL148872A0/xx
Publication of IL148872A publication Critical patent/IL148872A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ventilation (AREA)
IL14887200A 1999-09-30 2000-09-28 Module containing controlled minienvironment for atmospheric wafer transport IL148872A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/410,190 US6364762B1 (en) 1999-09-30 1999-09-30 Wafer atmospheric transport module having a controlled mini-environment
PCT/US2000/027015 WO2001024233A1 (fr) 1999-09-30 2000-09-28 Module de transport atmospherique de plaquettes a mini-environnement regule

Publications (2)

Publication Number Publication Date
IL148872A0 IL148872A0 (en) 2002-09-12
IL148872A true IL148872A (en) 2005-08-31

Family

ID=23623640

Family Applications (1)

Application Number Title Priority Date Filing Date
IL14887200A IL148872A (en) 1999-09-30 2000-09-28 Module containing controlled minienvironment for atmospheric wafer transport

Country Status (9)

Country Link
US (1) US6364762B1 (fr)
EP (1) EP1218926B1 (fr)
JP (1) JP4632612B2 (fr)
KR (1) KR100660361B1 (fr)
CN (1) CN1189917C (fr)
DE (1) DE60013869T2 (fr)
IL (1) IL148872A (fr)
TW (1) TW462076B (fr)
WO (1) WO2001024233A1 (fr)

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DE102004026883B4 (de) * 2004-05-27 2014-12-24 Inova Pharma Systems Gmbh Anordnung zum sterilen Abfüllen
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US20070134821A1 (en) * 2004-11-22 2007-06-14 Randhir Thakur Cluster tool for advanced front-end processing
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KR20080034492A (ko) * 2005-08-03 2008-04-21 엔테그리스, 아이엔씨. 이송 용기
JP5030410B2 (ja) * 2005-09-28 2012-09-19 株式会社日立ハイテクノロジーズ 真空処理装置
KR101224454B1 (ko) * 2005-11-01 2013-01-22 엘지디스플레이 주식회사 액정 표시 장치용 리프터 장비
US8794896B2 (en) * 2005-12-14 2014-08-05 Tokyo Electron Limited Vacuum processing apparatus and zonal airflow generating unit
US20070144118A1 (en) * 2005-12-22 2007-06-28 Alvarez Daniel Jr Purging of a wafer conveyance container
JP5124096B2 (ja) * 2006-03-03 2013-01-23 川崎重工業株式会社 清潔空間用ロボットシステム
JP4606388B2 (ja) * 2006-06-12 2011-01-05 川崎重工業株式会社 基板移載装置の搬送系ユニット
US8757026B2 (en) 2008-04-15 2014-06-24 Dynamic Micro Systems, Semiconductor Equipment Gmbh Clean transfer robot
FR2933813B1 (fr) * 2008-07-11 2010-12-24 Alcatel Lucent Dispositif de purge et procede.
KR101541538B1 (ko) * 2008-12-19 2015-08-04 세메스 주식회사 웨이퍼 이송 유닛 및 이를 포함하는 프로브 스테이션
JP5796972B2 (ja) * 2010-06-14 2015-10-21 株式会社日立国際電気 基板処理装置
CN102162531A (zh) * 2010-12-27 2011-08-24 北京七星华创电子股份有限公司 风门装置
TWI514089B (zh) 2011-04-28 2015-12-21 Mapper Lithography Ip Bv 在微影系統中用於轉移基板的設備
CN102768977B (zh) * 2011-05-06 2015-09-02 北京北方微电子基地设备工艺研究中心有限责任公司 机械手、大气传输单元和晶片传输方法
CN103917466B (zh) 2011-09-14 2019-01-04 布鲁克斯自动化公司 装载工位
US9272315B2 (en) * 2013-10-11 2016-03-01 Taiwan Semiconductor Manufacturing Co., Ltd Mechanisms for controlling gas flow in enclosure
TWI678751B (zh) * 2013-12-13 2019-12-01 日商昕芙旎雅股份有限公司 設備前端模組（ｅｆｅｍ）
KR102343640B1 (ko) * 2014-12-15 2021-12-30 세메스 주식회사 기판 처리 장치
US9550219B2 (en) * 2014-12-29 2017-01-24 Daifuku Co., Ltd. Apparatus of inhalation type for stocking wafer at ceiling and inhaling type wafer stocking system having the same
SG11201800143RA (en) * 2015-08-04 2018-02-27 Hitachi Int Electric Inc Substrate processing device, semiconductor device manufacturing method, and recording medium
KR102618491B1 (ko) * 2016-10-31 2023-12-28 삼성전자주식회사 기판 이송 장치
CN110549316B (zh) * 2018-06-04 2021-06-22 沈阳新松机器人自动化股份有限公司 一种防水型洁净机器人
CN110549315B (zh) * 2018-06-04 2021-06-22 沈阳新松机器人自动化股份有限公司 一种迷宫式防水型洁净机器人

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Also Published As

Publication number Publication date
IL148872A0 (en) 2002-09-12
EP1218926B1 (fr) 2004-09-15
TW462076B (en) 2001-11-01
DE60013869T2 (de) 2005-09-22
JP2003510837A (ja) 2003-03-18
DE60013869D1 (de) 2004-10-21
EP1218926A1 (fr) 2002-07-03
JP4632612B2 (ja) 2011-02-16
KR20020047196A (ko) 2002-06-21
WO2001024233A1 (fr) 2001-04-05
CN1377510A (zh) 2002-10-30
US6364762B1 (en) 2002-04-02
CN1189917C (zh) 2005-02-16
KR100660361B1 (ko) 2006-12-21

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