IL136874A - Focus rings and method therefor - Google Patents

Focus rings and method therefor

Info

Publication number
IL136874A
IL136874A IL13687498A IL13687498A IL136874A IL 136874 A IL136874 A IL 136874A IL 13687498 A IL13687498 A IL 13687498A IL 13687498 A IL13687498 A IL 13687498A IL 136874 A IL136874 A IL 136874A
Authority
IL
Israel
Prior art keywords
focus ring
chuck
plasma
method therefor
substrate
Prior art date
Application number
IL13687498A
Other languages
English (en)
Other versions
IL136874A0 (en
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL136874A0 publication Critical patent/IL136874A0/xx
Publication of IL136874A publication Critical patent/IL136874A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • H01J37/32642Focus rings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/915Differential etching apparatus including focus ring surrounding a wafer for plasma apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Glass Compositions (AREA)
  • Chemical Vapour Deposition (AREA)
  • Adornments (AREA)
  • Special Wing (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
IL13687498A 1997-12-19 1998-12-11 Focus rings and method therefor IL136874A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/993,791 US6039836A (en) 1997-12-19 1997-12-19 Focus rings
PCT/US1998/026412 WO1999033087A1 (en) 1997-12-19 1998-12-11 Focus rings and methods therefor

Publications (2)

Publication Number Publication Date
IL136874A0 IL136874A0 (en) 2001-06-14
IL136874A true IL136874A (en) 2003-07-31

Family

ID=25539940

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13687498A IL136874A (en) 1997-12-19 1998-12-11 Focus rings and method therefor

Country Status (8)

Country Link
US (1) US6039836A (ja)
EP (1) EP1042783B1 (ja)
JP (1) JP4548560B2 (ja)
KR (1) KR100635693B1 (ja)
AT (1) ATE273562T1 (ja)
DE (1) DE69825630T2 (ja)
IL (1) IL136874A (ja)
WO (1) WO1999033087A1 (ja)

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JP6969182B2 (ja) * 2017-07-06 2021-11-24 東京エレクトロン株式会社 プラズマ処理装置
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Also Published As

Publication number Publication date
DE69825630D1 (de) 2004-09-16
US6039836A (en) 2000-03-21
IL136874A0 (en) 2001-06-14
WO1999033087A1 (en) 1999-07-01
ATE273562T1 (de) 2004-08-15
KR20010033185A (ko) 2001-04-25
EP1042783B1 (en) 2004-08-11
DE69825630T2 (de) 2005-09-15
JP2001527285A (ja) 2001-12-25
KR100635693B1 (ko) 2006-10-17
JP4548560B2 (ja) 2010-09-22
EP1042783A1 (en) 2000-10-11

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