HK1218185A1 - 載台裝置、曝光裝置和設備製造方法 - Google Patents

載台裝置、曝光裝置和設備製造方法

Info

Publication number
HK1218185A1
HK1218185A1 HK16106134.6A HK16106134A HK1218185A1 HK 1218185 A1 HK1218185 A1 HK 1218185A1 HK 16106134 A HK16106134 A HK 16106134A HK 1218185 A1 HK1218185 A1 HK 1218185A1
Authority
HK
Hong Kong
Prior art keywords
fabricating method
device fabricating
exposure apparatus
stage
stage apparatus
Prior art date
Application number
HK16106134.6A
Other languages
English (en)
Inventor
Kazuya Ono
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1218185A1 publication Critical patent/HK1218185A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK16106134.6A 2006-12-27 2016-05-31 載台裝置、曝光裝置和設備製造方法 HK1218185A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006351479 2006-12-27

Publications (1)

Publication Number Publication Date
HK1218185A1 true HK1218185A1 (zh) 2017-02-03

Family

ID=39562477

Family Applications (1)

Application Number Title Priority Date Filing Date
HK16106134.6A HK1218185A1 (zh) 2006-12-27 2016-05-31 載台裝置、曝光裝置和設備製造方法

Country Status (7)

Country Link
US (1) US20100066992A1 (zh)
EP (2) EP2109133A4 (zh)
JP (1) JP5146323B2 (zh)
KR (2) KR20150036734A (zh)
HK (1) HK1218185A1 (zh)
TW (1) TWI457978B (zh)
WO (1) WO2008078688A1 (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101532824B1 (ko) 2003-04-09 2015-07-01 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI612338B (zh) 2003-11-20 2018-01-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI412067B (zh) 2004-02-06 2013-10-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
KR101455551B1 (ko) 2005-05-12 2014-10-27 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
WO2009050977A1 (en) 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
EP2179330A1 (en) 2007-10-16 2010-04-28 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
EP2282188B1 (en) 2008-05-28 2015-03-11 Nikon Corporation Illumination optical system and exposure apparatus
JP5262455B2 (ja) * 2008-09-01 2013-08-14 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US20110042874A1 (en) * 2009-08-20 2011-02-24 Nikon Corporation Object processing apparatus, exposure apparatus and exposure method, and device manufacturing method
JP5861858B2 (ja) * 2010-03-29 2016-02-16 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
US8598538B2 (en) * 2010-09-07 2013-12-03 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
NL2008696A (en) * 2011-05-25 2012-11-27 Asml Netherlands Bv A multi-stage system, a control method therefor, and a lithographic apparatus.
US9169895B2 (en) * 2011-11-29 2015-10-27 Hennessy Industries, Inc. Vehicle wheel balance weights
US8779635B2 (en) * 2012-04-10 2014-07-15 Kla-Tencor Corporation Arrangement of reticle positioning device for actinic inspection of EUV reticles
WO2014054689A1 (ja) 2012-10-02 2014-04-10 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
NL2011457A (en) * 2012-10-15 2014-04-16 Asml Netherlands Bv Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices.
KR20160060067A (ko) 2013-09-04 2016-05-27 씨케이디 가부시키 가이샤 전자 액추에이터용 전기자 코일, 전자 액추에이터, 노광 장치, 및 디바이스 제조 방법
EP3926404A1 (en) 2014-12-24 2021-12-22 Nikon Corporation Measurement device and measurement method, exposure apparatus and exposure method, and device manufacturing method
KR102294481B1 (ko) 2014-12-24 2021-08-27 가부시키가이샤 니콘 이동체의 제어 방법, 노광 방법, 디바이스 제조 방법, 이동체 장치, 및 노광 장치
CN108168442B (zh) * 2018-03-28 2023-09-08 河北省同创交通工程配套产品产业技术研究院 一种止水带凹凸槽动态测量装置的动态测量方法
DE202019000816U1 (de) * 2019-02-20 2020-05-28 isel GmbH & Co. KG Planarläuferpositionsmesssystem

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2369299A (en) 1942-05-16 1945-02-13 Kafowi Jan Apparatus for working metals
JPH01164543A (ja) 1987-12-21 1989-06-28 Okuma Mach Works Ltd ワーク判別方法
JPH01194479A (ja) 1988-01-29 1989-08-04 Murata Mfg Co Ltd 積層熱電素子およびその製造方法
JP3312387B2 (ja) * 1992-05-26 2002-08-05 ソニー株式会社 パターニング装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
US5677758A (en) 1995-02-09 1997-10-14 Mrs Technology, Inc. Lithography System using dual substrate stages
US5825043A (en) 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
US6222614B1 (en) * 1996-12-06 2001-04-24 Nikon Corporation Exposure elements with a cable-relaying support
JPH10293611A (ja) * 1997-04-21 1998-11-04 Canon Inc 位置決め装置
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP4164905B2 (ja) * 1997-09-25 2008-10-15 株式会社ニコン 電磁力モータ、ステージ装置および露光装置
JP4210871B2 (ja) 1997-10-31 2009-01-21 株式会社ニコン 露光装置
US6897963B1 (en) 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4264676B2 (ja) 1998-11-30 2009-05-20 株式会社ニコン 露光装置及び露光方法
TW449672B (en) * 1997-12-25 2001-08-11 Nippon Kogaku Kk Process and apparatus for manufacturing photomask and method of manufacturing the same
JPH11194479A (ja) 1997-12-26 1999-07-21 Nikon Corp フォトマスクの製造方法及び装置
KR20010042133A (ko) 1998-03-26 2001-05-25 오노 시게오 노광방법, 노광장치, 포토마스크, 포토마스크의 제조방법,마이크로디바이스, 및 마이크로디바이스의 제조방법
WO1999049504A1 (fr) 1998-03-26 1999-09-30 Nikon Corporation Procede et systeme d'exposition par projection
WO1999066370A1 (fr) 1998-06-17 1999-12-23 Nikon Corporation Procede relatif a l'elaboration d'un masque
JP2000012453A (ja) 1998-06-18 2000-01-14 Nikon Corp 露光装置及びその使用方法、露光方法、並びにマスクの製造方法
JP2000029202A (ja) 1998-07-15 2000-01-28 Nikon Corp マスクの製造方法
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
KR20020054368A (ko) * 1999-12-16 2002-07-06 시마무라 테루오 노광방법 및 장치
US6437463B1 (en) * 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
JP2002043213A (ja) * 2000-07-25 2002-02-08 Nikon Corp ステージ装置および露光装置
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
EP1364257A1 (en) 2001-02-27 2003-11-26 ASML US, Inc. Simultaneous imaging of two reticles
JP2002305140A (ja) * 2001-04-06 2002-10-18 Nikon Corp 露光装置及び基板処理システム
JP4814438B2 (ja) * 2001-05-02 2011-11-16 日本トムソン株式会社 リニアモータを内蔵したステージ装置
DE60232568D1 (de) * 2001-07-09 2009-07-23 Canon Kk Belichtungsapparat
TW529172B (en) 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
US6879377B2 (en) * 2001-11-30 2005-04-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3809381B2 (ja) 2002-01-28 2006-08-16 キヤノン株式会社 リニアモータ、ステージ装置、露光装置及びデバイス製造方法
US6937911B2 (en) * 2002-03-18 2005-08-30 Nikon Corporation Compensating for cable drag forces in high precision stages
TWI251125B (en) * 2002-06-13 2006-03-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2004260116A (ja) * 2003-02-27 2004-09-16 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP2005046941A (ja) * 2003-07-31 2005-02-24 Canon Inc ケーブル微動ユニット付きステージ装置
JP2005159322A (ja) * 2003-10-31 2005-06-16 Nikon Corp 定盤、ステージ装置及び露光装置並びに露光方法
JP4586367B2 (ja) * 2004-01-14 2010-11-24 株式会社ニコン ステージ装置及び露光装置
JP2005285881A (ja) * 2004-03-29 2005-10-13 Nikon Corp ステージ装置及び露光装置
JP2005317916A (ja) * 2004-03-30 2005-11-10 Canon Inc 露光装置及びデバイス製造方法
JP4677267B2 (ja) * 2005-04-04 2011-04-27 キヤノン株式会社 平面ステージ装置及び露光装置
JP2006351479A (ja) 2005-06-20 2006-12-28 Sumitomo Wiring Syst Ltd コネクタ

Also Published As

Publication number Publication date
EP2109133A4 (en) 2011-12-28
TW200845118A (en) 2008-11-16
JP5146323B2 (ja) 2013-02-20
WO2008078688A1 (ja) 2008-07-03
US20100066992A1 (en) 2010-03-18
EP2998983B1 (en) 2018-03-21
EP2998983A3 (en) 2016-06-08
KR20150036734A (ko) 2015-04-07
KR20090106555A (ko) 2009-10-09
EP2998983A2 (en) 2016-03-23
JPWO2008078688A1 (ja) 2010-04-22
TWI457978B (zh) 2014-10-21
EP2109133A1 (en) 2009-10-14

Similar Documents

Publication Publication Date Title
HK1259005A1 (zh) 曝光設備、曝光方法以及裝置製造方法
HK1249936B (zh) 曝光裝置、曝光方法和器件製造方法
HK1244893A1 (zh) 曝光裝置和方法以及設備製造方法
HK1243498A1 (zh) 曝光裝置、曝光方法及組件製造方法
HK1243499A1 (zh) 曝光裝置、曝光方法、及組件製造方法
HK1218185A1 (zh) 載台裝置、曝光裝置和設備製造方法
HK1218186A1 (zh) 暴光設備、暴光方法以及器件製造方法
HK1218675A1 (zh) 曝光裝置、曝光方法以及元件製造方法
HK1222716A1 (zh) 曝光裝置、曝光方法、及元件製造方法
HK1173232A1 (zh) 曝光方法及裝置、以及組件製造方法
HK1169861A1 (zh) 曝光裝置、曝光方法以及器件製造方法
HK1136878A1 (en) Exposure apparatus, exposure method, and device manufacturing method
EP1986222A4 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
EP1990828A4 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
IL188276A0 (en) Exposure method and exposure apparatus, and device manufacturing method
EP1947683A4 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
HK1137077A1 (en) Exposure apparatus, exposure method and device manufacturing method
EP1986223A4 (en) EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
EP1876635A4 (en) EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
EP1993121A4 (en) EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
EP1895570A4 (en) EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
EP1965414A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
IL186919A0 (en) Exposure method, exposure apparatus, and device manufacturing method
EP2006899A4 (en) STAGE APPARATUS, EXPOSURE APPARATUS, STAGE CONTROL METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
EP1850371A4 (en) EXPOSURE METHOD, EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20221219