HK1078680A1 - Illuminating method, exposing method, and device for therefor - Google Patents

Illuminating method, exposing method, and device for therefor

Info

Publication number
HK1078680A1
HK1078680A1 HK05110399A HK05110399A HK1078680A1 HK 1078680 A1 HK1078680 A1 HK 1078680A1 HK 05110399 A HK05110399 A HK 05110399A HK 05110399 A HK05110399 A HK 05110399A HK 1078680 A1 HK1078680 A1 HK 1078680A1
Authority
HK
Hong Kong
Prior art keywords
therefor
illuminating
exposing
exposing method
illuminating method
Prior art date
Application number
HK05110399A
Other languages
English (en)
Inventor
Yoshitada Oshida
Shigenobu Maruyama
Kazuo Kobayashi
Yoshitatu Naitou
Yoshihisa Osaka
Original Assignee
Hitachi Via Mechanics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics Ltd filed Critical Hitachi Via Mechanics Ltd
Publication of HK1078680A1 publication Critical patent/HK1078680A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
HK05110399A 2002-07-03 2005-11-18 Illuminating method, exposing method, and device for therefor HK1078680A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002195086A JP4546019B2 (ja) 2002-07-03 2002-07-03 露光装置
PCT/JP2003/008399 WO2004006308A1 (ja) 2002-07-03 2003-07-02 照明方法並びに露光方法及びその装置

Publications (1)

Publication Number Publication Date
HK1078680A1 true HK1078680A1 (en) 2006-03-17

Family

ID=30112329

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05110399A HK1078680A1 (en) 2002-07-03 2005-11-18 Illuminating method, exposing method, and device for therefor

Country Status (8)

Country Link
US (1) US20050219493A1 (xx)
EP (1) EP1646073A4 (xx)
JP (1) JP4546019B2 (xx)
KR (1) KR100703110B1 (xx)
CN (2) CN101075099A (xx)
HK (1) HK1078680A1 (xx)
TW (1) TWI247972B (xx)
WO (1) WO2004006308A1 (xx)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004335953A (ja) * 2002-11-25 2004-11-25 Nikon Corp 露光装置及び露光方法
JP4508743B2 (ja) * 2004-03-31 2010-07-21 日立ビアメカニクス株式会社 パターン露光方法およびパターン露光装置
JP2006019412A (ja) * 2004-06-30 2006-01-19 Canon Inc 露光装置及びデバイスの製造方法
US7079225B2 (en) * 2004-09-14 2006-07-18 Asml Netherlands B.V Lithographic apparatus and device manufacturing method
JP4942301B2 (ja) * 2004-11-30 2012-05-30 新光電気工業株式会社 直接露光装置および直接露光方法
JP4587170B2 (ja) 2005-01-20 2010-11-24 キヤノン株式会社 露光装置及びデバイスの製造方法
JP5080009B2 (ja) 2005-03-22 2012-11-21 日立ビアメカニクス株式会社 露光方法
JP4678493B2 (ja) * 2005-05-23 2011-04-27 株式会社ニコン 光源ユニット、照明光学装置、露光装置、および露光方法
JP2007027188A (ja) * 2005-07-12 2007-02-01 Nano System Solutions:Kk 露光用照明光源の形成方法、露光用照明光源装置、露光方法及び露光装置
JP2007033882A (ja) 2005-07-27 2007-02-08 Hitachi Via Mechanics Ltd 露光装置及び露光方法並びに配線基板の製造方法
JP2007080953A (ja) * 2005-09-12 2007-03-29 Hitachi Via Mechanics Ltd 照明装置及び露光装置
KR100784090B1 (ko) * 2005-10-25 2007-12-10 엘지이노텍 주식회사 발광모듈 및 이를 구비하는 백라이트 유닛
DE102005060034A1 (de) * 2005-12-15 2006-11-16 Siemens Ag Linse oder Anordnung von Linsen für ein Lasersystem
EP1990828A4 (en) * 2006-02-16 2010-09-15 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
US7868999B2 (en) * 2006-08-10 2011-01-11 Asml Netherlands B.V. Lithographic apparatus, source, source controller and control method
JP4511502B2 (ja) * 2006-09-30 2010-07-28 日立ビアメカニクス株式会社 基板露光装置
JP5047669B2 (ja) * 2007-04-04 2012-10-10 オリンパス株式会社 走査型共焦点顕微鏡装置
DE102007022895B9 (de) * 2007-05-14 2013-11-21 Erich Thallner Vorrichtung zum Übertragen von in einer Maske vorgesehenen Strukturen auf ein Substrat
JP4543069B2 (ja) 2007-09-26 2010-09-15 日立ビアメカニクス株式会社 マスクレス露光装置
JP2009086015A (ja) * 2007-09-27 2009-04-23 Hitachi Via Mechanics Ltd マスクレス露光装置
JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
KR100983582B1 (ko) * 2007-12-31 2010-10-11 엘지디스플레이 주식회사 노광 장치 및 노광 방법과 그 노광 장치를 이용한 박막패터닝 방법
JP5403933B2 (ja) * 2008-03-31 2014-01-29 日立ビアメカニクス株式会社 露光装置
JP5361239B2 (ja) * 2008-04-09 2013-12-04 キヤノン株式会社 露光装置及びデバイス製造方法
JP2008210814A (ja) * 2008-04-28 2008-09-11 Hitachi Ltd 変調器
NL2003204A1 (nl) * 2008-08-14 2010-02-16 Asml Netherlands Bv Lithographic apparatus and method.
US8345724B2 (en) * 2008-10-27 2013-01-01 Trumpf Photonics Inc. Laser beam interleaving
JP2010157390A (ja) 2008-12-26 2010-07-15 Toshiba Corp 燃料電池
US8330938B2 (en) * 2009-02-27 2012-12-11 Corning Incorporated Solid-state array for lithography illumination
JP5184419B2 (ja) * 2009-03-31 2013-04-17 日立ビアメカニクス株式会社 マスクレス露光装置の光学系補正方法
JP5799306B2 (ja) * 2010-07-22 2015-10-21 株式会社ブイ・テクノロジー 露光装置用光照射装置の制御方法、及び露光方法
WO2012011497A1 (ja) * 2010-07-22 2012-01-26 Ｎｓｋテクノロジー株式会社 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
KR101443431B1 (ko) * 2010-07-22 2014-10-30 엔에스케이 테쿠노로지 가부시키가이샤 노광 장치용 광조사 장치, 광조사 장치의 제어 방법, 노광 장치 및 노광 방법
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置
US20130207544A1 (en) * 2011-09-30 2013-08-15 Pinebrook Imaging Technology, Ltd. Illumination system
TWI617892B (zh) * 2011-09-30 2018-03-11 應用材料股份有限公司 照明系統及控制此照明系統之方法及電腦程式產品
JP6283798B2 (ja) * 2013-07-01 2018-02-28 株式会社ブイ・テクノロジー 露光装置および照明ユニット
JP6383166B2 (ja) * 2014-03-28 2018-08-29 株式会社Ｓｃｒｅｅｎホールディングス 光照射装置および描画装置
JP6345963B2 (ja) * 2014-03-28 2018-06-20 株式会社Ｓｃｒｅｅｎホールディングス 光照射装置および描画装置
TWI526771B (zh) * 2014-07-04 2016-03-21 台達電子工業股份有限公司 光源系統
CN107111153B (zh) * 2014-12-31 2019-12-27 杜比实验室特许公司 用于图像投影仪的分立激光光纤输入
JP6651124B2 (ja) * 2015-03-28 2020-02-19 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
US10133187B2 (en) 2015-05-29 2018-11-20 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
EP3098017B1 (en) * 2015-05-29 2022-07-27 SCREEN Holdings Co., Ltd. Light irradiation apparatus and drawing apparatus
JP6438879B2 (ja) * 2015-12-17 2018-12-19 株式会社テクノポスト 照明装置
CN105929639B (zh) * 2016-06-29 2017-12-29 武汉华星光电技术有限公司 曝光机镜组条纹的改善方法
KR101848072B1 (ko) * 2016-09-27 2018-04-11 (주)블루코어 노광용 광원모듈 유닛 및 그 광원모듈 유닛이 구비된 노광장치
JP7025683B2 (ja) * 2017-06-08 2022-02-25 ウシオ電機株式会社 光源装置
JP6857585B2 (ja) * 2017-09-29 2021-04-14 株式会社アドテックエンジニアリング 露光装置
JP7020859B2 (ja) 2017-10-24 2022-02-16 キヤノン株式会社 照明光学系、露光装置および物品の製造方法
JP7427352B2 (ja) * 2017-12-27 2024-02-05 株式会社アドテックエンジニアリング 露光装置
DE102018200524A1 (de) * 2018-01-15 2019-07-18 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit verbesserter Komponentenjustage und Justageverfahren
JP2019056914A (ja) * 2018-11-19 2019-04-11 株式会社テクノポスト 照明装置および照明方法
JP7267761B2 (ja) * 2019-01-31 2023-05-02 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法
JP7231474B2 (ja) * 2019-05-07 2023-03-01 レーザーテック株式会社 照明装置及び検査装置
JP2020074031A (ja) * 2020-01-21 2020-05-14 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP7340167B2 (ja) * 2020-01-21 2023-09-07 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
CN111736439A (zh) * 2020-07-24 2020-10-02 苏州天准科技股份有限公司 激光直接成像光学系统
KR20240012549A (ko) * 2021-07-05 2024-01-29 가부시키가이샤 니콘 패턴 노광 장치, 디바이스 제조 방법, 및 노광 장치

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5952246A (ja) * 1982-09-20 1984-03-26 Nippon Kogaku Kk <Nikon> 露光制御装置
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
JP2997351B2 (ja) * 1991-08-12 2000-01-11 旭光学工業株式会社 照明光学装置
US5815248A (en) * 1993-04-22 1998-09-29 Nikon Corporation Illumination optical apparatus and method having a wavefront splitter and an optical integrator
JPH0837139A (ja) * 1994-07-21 1996-02-06 Sony Corp 露光照明装置
JPH08330212A (ja) * 1995-05-31 1996-12-13 Nikon Corp 露光装置
US5891806A (en) * 1996-04-22 1999-04-06 Nikon Corporation Proximity-type microlithography apparatus and method
CN1144263C (zh) * 1996-11-28 2004-03-31 株式会社尼康 曝光装置以及曝光方法
US5900981A (en) * 1997-04-15 1999-05-04 Scitex Corporation Ltd. Optical system for illuminating a spatial light modulator
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
US6324203B1 (en) * 1997-06-13 2001-11-27 Nikon Corporation Laser light source, illuminating optical device, and exposure device
US6304316B1 (en) * 1998-10-22 2001-10-16 Anvik Corporation Microlithography system for high-resolution large-area patterning on curved surfaces
EP1014196A3 (en) * 1998-12-17 2002-05-29 Nikon Corporation Method and system of illumination for a projection optical apparatus
JP2000223408A (ja) * 1999-02-03 2000-08-11 Hitachi Ltd 半導体製造装置および半導体装置の製造方法
JP2001085308A (ja) * 1999-09-10 2001-03-30 Nikon Corp 照明光学装置及び露光装置
JP3472249B2 (ja) * 2000-08-25 2003-12-02 キヤノン株式会社 複数の光源を使用する照明装置、照明制御装置及び方法、並びに、露光装置
US20020126479A1 (en) * 2001-03-08 2002-09-12 Ball Semiconductor, Inc. High power incoherent light source with laser array
JP3694255B2 (ja) * 2001-06-19 2005-09-14 株式会社シチズン電子 Ｓｍｄ部品の構造および製造方法
JP2003270585A (ja) * 2002-03-18 2003-09-25 Ricoh Co Ltd レーザ照明光学系及びそれを用いた露光装置、レーザ加工装置、投射装置
US6960035B2 (en) * 2002-04-10 2005-11-01 Fuji Photo Film Co., Ltd. Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method
US6958867B2 (en) * 2002-09-30 2005-10-25 Fuji Photo Film Co., Ltd. Illumination optical system, exposure device using the illumination optical system, and exposure method
US6947459B2 (en) * 2002-11-25 2005-09-20 Eastman Kodak Company Organic vertical cavity laser and imaging system

Also Published As

Publication number Publication date
CN101075099A (zh) 2007-11-21
TW200402608A (en) 2004-02-16
WO2004006308A1 (ja) 2004-01-15
JP2004039871A (ja) 2004-02-05
EP1646073A4 (en) 2007-08-29
US20050219493A1 (en) 2005-10-06
KR100703110B1 (ko) 2007-04-05
JP4546019B2 (ja) 2010-09-15
EP1646073A1 (en) 2006-04-12
CN1639845A (zh) 2005-07-13
CN100355022C (zh) 2007-12-12
KR20040099311A (ko) 2004-11-26
TWI247972B (en) 2006-01-21

Similar Documents

Publication Publication Date Title
HK1078680A1 (en) Illuminating method, exposing method, and device for therefor
SG121762A1 (en) Lithographic apparatus, and device manufacturing method
AU2003279157A8 (en) Methods and apparatus for illuminating environments
AU2003223514A8 (en) Lighting device and method
SG116555A1 (en) Lithographic apparatus and device manufacturing method.
SG116549A1 (en) Lithographic apparatus and device manufacturing method.
IL175044A0 (en) Single mask via method and device
IL162696A0 (en) Apparatus and method for endoscopiccolectomy
SG121819A1 (en) Lithographic apparatus and device manufacturing method
SG121820A1 (en) Lithographic apparatus and device manufacturing method
SG2010050110A (en) Lithographic apparatus and device manufacturing method
SG130007A1 (en) Lithographic apparatus and device manufacturing method
SG121829A1 (en) Lithographic apparatus and device manufacturing method
SG108317A1 (en) Lithographic apparatus and device manufacturing method
AU2003289271A1 (en) Exposure apparatus, exposure method and method for manufacturing device
AU2003302831A1 (en) Exposure method, exposure apparatus and method for manufacturing device
GB0301775D0 (en) Device and method for 3Dimaging
SG106138A1 (en) Lithographic apparatus and device manufacturing method
SG121780A1 (en) Lithographic apparatus and device manufacturing method
SG123556A1 (en) Lithographic apparatus and device manufacturing method
EP1622532A4 (en) DEVICE AND METHOD FOR DACRYOCYSTORHINOSTOMY
TWI319516B (en) Exposure device and exposure method
SG132504A1 (en) Lithographic apparatus and device manufacturing method
SG111129A1 (en) Lithographic apparatus and device manufacturing method
SG120919A1 (en) Lithographic apparatus and device manufacturing method

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20120702