SG123556A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG123556A1
SG123556A1 SG200302277A SG200302277A SG123556A1 SG 123556 A1 SG123556 A1 SG 123556A1 SG 200302277 A SG200302277 A SG 200302277A SG 200302277 A SG200302277 A SG 200302277A SG 123556 A1 SG123556 A1 SG 123556A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200302277A
Inventor
Fransiscus Martines Roes
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG123556A1 publication Critical patent/SG123556A1/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
    • A01K61/00—Culture of aquatic animals
    • A01K61/50—Culture of aquatic animals of shellfish
    • A01K61/51—Culture of aquatic animals of shellfish of gastropods, e.g. abalones or turban snails
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Environmental Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Marine Sciences & Fisheries (AREA)
  • Biodiversity & Conservation Biology (AREA)
  • Animal Husbandry (AREA)
  • Zoology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200302277A 2002-04-23 2003-04-22 Lithographic apparatus and device manufacturing method SG123556A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02252853A EP1357429A1 (en) 2002-04-23 2002-04-23 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG123556A1 true SG123556A1 (en) 2006-07-26

Family

ID=28686004

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200302277A SG123556A1 (en) 2002-04-23 2003-04-22 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US6836315B2 (en)
EP (1) EP1357429A1 (en)
JP (1) JP3927924B2 (en)
KR (1) KR100547438B1 (en)
CN (1) CN100340920C (en)
SG (1) SG123556A1 (en)
TW (1) TWI228271B (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6480399B2 (en) 2000-03-02 2002-11-12 Power Integrations, Inc. Switched mode power supply responsive to current derived from voltage across energy transfer element input
US7295283B2 (en) * 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005303196A (en) * 2004-04-15 2005-10-27 Canon Inc Positioning device, aligner, and manufacturing method of semiconductor device
US7500218B2 (en) * 2004-08-17 2009-03-03 Asml Netherlands B.V. Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same
NL1029246C2 (en) * 2005-06-14 2006-12-18 Univ Eindhoven Tech Flat actuator production method, e.g. for planar motors, involves modelling magnetic forces and pairings generated by actuator coils
JP2008004647A (en) * 2006-06-20 2008-01-10 Canon Inc Positioning apparatus, exposure apparatus, and device manufacturing method
US9752615B2 (en) * 2007-06-27 2017-09-05 Brooks Automation, Inc. Reduced-complexity self-bearing brushless DC motor
NL1035987A1 (en) * 2007-10-02 2009-04-03 Asml Netherlands Bv Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus.
US9465305B2 (en) 2010-05-18 2016-10-11 Nikon Corporation Method for determining a commutation offset and for determining a compensation map for a stage
NL2006714A (en) * 2010-06-07 2011-12-08 Asml Netherlands Bv Displacement device, lithographic apparatus and positioning method.
NL2008379A (en) * 2011-03-30 2012-10-02 Asml Netherlands Bv Planar motor and lithographic apparatus comprising such planar motor.
KR20140084238A (en) 2011-10-27 2014-07-04 더 유니버시티 오브 브리티쉬 콜롬비아 Displacement devices and methods for fabrication, use and control of same
WO2014080957A1 (en) * 2012-11-20 2014-05-30 株式会社ニコン Exposure device, mobile device, and device manufacturing method
CN105452812B (en) 2013-08-06 2019-04-30 不列颠哥伦比亚大学 Shift unit and method and apparatus for detecting and estimating movement associated there
WO2015179962A1 (en) 2014-05-30 2015-12-03 The University Of British Columbia Displacement devices and methods for fabrication, use and control of same
WO2015184553A1 (en) 2014-06-07 2015-12-10 The University Of British Columbia Methods and systems for controllably moving multiple moveable stages in a displacement device
EP3155712A4 (en) 2014-06-14 2018-02-21 The University Of British Columbia Displacement devices, moveable stages for displacement devices and methods for fabrication, use and control of same
NL2015092B1 (en) 2015-07-06 2017-01-30 Ding Chenyang Displacement device.
CA2988803C (en) 2015-07-06 2024-01-30 The University Of British Columbia Methods and systems for controllably moving one or more moveable stages in a displacement device
CN111835177A (en) * 2019-04-17 2020-10-27 上海微电子装备（集团）股份有限公司 Magnetic suspension motor and control method thereof
DE102020127012A1 (en) 2020-10-14 2022-04-14 Beckhoff Automation Gmbh Method of controlling a planar propulsion system and planar propulsion system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
EP0502578B1 (en) * 1991-03-07 1997-09-03 Koninklijke Philips Electronics N.V. Optical lithographic device having a machine frame with force compensation
US6028376A (en) * 1997-04-22 2000-02-22 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
EP1001512A2 (en) * 1998-11-10 2000-05-17 Asm Lithography B.V. Actuator and transducer
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
US20020000904A1 (en) * 2000-05-23 2002-01-03 Koninklijke Philips Electronics N.V. Displacement device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3123759A1 (en) * 1980-10-27 1982-07-15 Jenoptik Jena Gmbh, Ddr 6900 Jena Two-coordinate stepping motor
US6208045B1 (en) * 1998-11-16 2001-03-27 Nikon Corporation Electric motors and positioning devices having moving magnet arrays and six degrees of freedom
US6147421A (en) * 1998-11-16 2000-11-14 Nikon Corporation Platform positionable in at least three degrees of freedom by interaction with coils

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502578B1 (en) * 1991-03-07 1997-09-03 Koninklijke Philips Electronics N.V. Optical lithographic device having a machine frame with force compensation
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
US6028376A (en) * 1997-04-22 2000-02-22 Canon Kabushiki Kaisha Positioning apparatus and exposure apparatus using the same
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
EP1001512A2 (en) * 1998-11-10 2000-05-17 Asm Lithography B.V. Actuator and transducer
US20020000904A1 (en) * 2000-05-23 2002-01-03 Koninklijke Philips Electronics N.V. Displacement device

Also Published As

Publication number Publication date
KR20030084676A (en) 2003-11-01
CN100340920C (en) 2007-10-03
TWI228271B (en) 2005-02-21
JP2004047981A (en) 2004-02-12
US6836315B2 (en) 2004-12-28
US20040016891A1 (en) 2004-01-29
CN1456936A (en) 2003-11-19
KR100547438B1 (en) 2006-01-31
EP1357429A1 (en) 2003-10-29
JP3927924B2 (en) 2007-06-13
TW200403715A (en) 2004-03-01

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