HK1078680A1 - Illuminating method, exposing method, and device for therefor - Google Patents

Illuminating method, exposing method, and device for therefor

Info

Publication number
HK1078680A1
HK1078680A1 HK05110399A HK05110399A HK1078680A1 HK 1078680 A1 HK1078680 A1 HK 1078680A1 HK 05110399 A HK05110399 A HK 05110399A HK 05110399 A HK05110399 A HK 05110399A HK 1078680 A1 HK1078680 A1 HK 1078680A1
Authority
HK
Hong Kong
Prior art keywords
therefor
illuminating
exposing
exposing method
illuminating method
Prior art date
Application number
HK05110399A
Other languages
English (en)
Inventor
Yoshitada Oshida
Shigenobu Maruyama
Kazuo Kobayashi
Yoshitatu Naitou
Yoshihisa Osaka
Original Assignee
Hitachi Via Mechanics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Via Mechanics Ltd filed Critical Hitachi Via Mechanics Ltd
Publication of HK1078680A1 publication Critical patent/HK1078680A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
HK05110399A 2002-07-03 2005-11-18 Illuminating method, exposing method, and device for therefor HK1078680A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002195086A JP4546019B2 (ja) 2002-07-03 2002-07-03 露光装置
PCT/JP2003/008399 WO2004006308A1 (ja) 2002-07-03 2003-07-02 照明方法並びに露光方法及びその装置

Publications (1)

Publication Number Publication Date
HK1078680A1 true HK1078680A1 (en) 2006-03-17

Family

ID=30112329

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05110399A HK1078680A1 (en) 2002-07-03 2005-11-18 Illuminating method, exposing method, and device for therefor

Country Status (8)

Country Link
US (1) US20050219493A1 (ja)
EP (1) EP1646073A4 (ja)
JP (1) JP4546019B2 (ja)
KR (1) KR100703110B1 (ja)
CN (2) CN100355022C (ja)
HK (1) HK1078680A1 (ja)
TW (1) TWI247972B (ja)
WO (1) WO2004006308A1 (ja)

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JP5080009B2 (ja) 2005-03-22 2012-11-21 日立ビアメカニクス株式会社 露光方法
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KR100784090B1 (ko) * 2005-10-25 2007-12-10 엘지이노텍 주식회사 발광모듈 및 이를 구비하는 백라이트 유닛
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JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
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JP5361239B2 (ja) 2008-04-09 2013-12-04 キヤノン株式会社 露光装置及びデバイス製造方法
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JP7267761B2 (ja) * 2019-01-31 2023-05-02 キヤノン株式会社 光源装置、照明装置、露光装置及び物品の製造方法
JP7231474B2 (ja) * 2019-05-07 2023-03-01 レーザーテック株式会社 照明装置及び検査装置
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Also Published As

Publication number Publication date
CN101075099A (zh) 2007-11-21
WO2004006308A1 (ja) 2004-01-15
CN1639845A (zh) 2005-07-13
KR20040099311A (ko) 2004-11-26
CN100355022C (zh) 2007-12-12
TW200402608A (en) 2004-02-16
EP1646073A4 (en) 2007-08-29
US20050219493A1 (en) 2005-10-06
EP1646073A1 (en) 2006-04-12
TWI247972B (en) 2006-01-21
JP4546019B2 (ja) 2010-09-15
JP2004039871A (ja) 2004-02-05
KR100703110B1 (ko) 2007-04-05

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Effective date: 20120702