HK1005153A1 - Polymers and use in photoimageable compositions - Google Patents

Polymers and use in photoimageable compositions

Info

Publication number
HK1005153A1
HK1005153A1 HK98104291A HK98104291A HK1005153A1 HK 1005153 A1 HK1005153 A1 HK 1005153A1 HK 98104291 A HK98104291 A HK 98104291A HK 98104291 A HK98104291 A HK 98104291A HK 1005153 A1 HK1005153 A1 HK 1005153A1
Authority
HK
Hong Kong
Prior art keywords
mole percent
polymer
maleic anhydride
photoimageable
residues
Prior art date
Application number
HK98104291A
Other languages
English (en)
Inventor
James J Briguglio
Charles R Keil
Vinai Ming Tara
Edward J Reardon
Randall W Kautz
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/386,974 external-priority patent/US5576145A/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Publication of HK1005153A1 publication Critical patent/HK1005153A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/20—Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
HK98104291A 1995-02-10 1998-05-19 Polymers and use in photoimageable compositions HK1005153A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/386,974 US5576145A (en) 1995-02-10 1995-02-10 Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance
US08/510,836 US5609991A (en) 1995-02-10 1995-08-03 Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging

Publications (1)

Publication Number Publication Date
HK1005153A1 true HK1005153A1 (en) 1998-12-24

Family

ID=27011686

Family Applications (1)

Application Number Title Priority Date Filing Date
HK98104291A HK1005153A1 (en) 1995-02-10 1998-05-19 Polymers and use in photoimageable compositions

Country Status (13)

Country Link
US (2) US5609991A (fr)
EP (1) EP0726499B1 (fr)
JP (1) JP2950770B2 (fr)
KR (1) KR0169207B1 (fr)
CN (1) CN1087080C (fr)
AT (1) ATE171284T1 (fr)
AU (1) AU677537B2 (fr)
BR (1) BR9600360A (fr)
CA (1) CA2166177C (fr)
DE (1) DE69600644T2 (fr)
ES (1) ES2123320T3 (fr)
HK (1) HK1005153A1 (fr)
IL (1) IL116414A (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW353158B (en) * 1994-03-09 1999-02-21 Nat Starch Chem Invest Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof
US5576145A (en) * 1995-02-10 1996-11-19 Morton International, Inc. Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US6066435A (en) * 1997-06-02 2000-05-23 Ciba Specialty Chemicals Corp. Liquid photosensitive composition
US5922522A (en) * 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US6063550A (en) * 1998-04-29 2000-05-16 Morton International, Inc. Aqueous developing solutions for reduced developer residue
JP2000047381A (ja) * 1998-07-02 2000-02-18 Morton Internatl Inc ソルダ―マスクを形成するための１パ―ト型光画像形成性組成物
US6248506B1 (en) 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
US6045973A (en) * 1998-12-11 2000-04-04 Morton International, Inc. Photoimageable compositions having improved chemical resistance and stripping ability
EP1008912A1 (fr) * 1998-12-11 2000-06-14 Shipley Company LLC Compositions photoimageables aux propriétés de décapage et à la résistance chimique améliorées
CN1445248A (zh) * 2002-02-15 2003-10-01 希普雷公司 官能化聚合物
EP2427467B1 (fr) 2009-05-07 2015-08-05 Regents of the University of Minnesota Promédicaments à base de triptolide
US9150600B2 (en) 2009-05-07 2015-10-06 Regents Of The University Of Minnesota Triptolide prodrugs
JP5215473B2 (ja) * 2009-09-25 2013-06-19 旭化成イーマテリアルズ株式会社 レジスト材料用感光性樹脂組成物及び感光性樹脂積層体

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JPS5753587B2 (fr) * 1974-08-05 1982-11-13
US4273857A (en) * 1976-01-30 1981-06-16 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4092443A (en) * 1976-02-19 1978-05-30 Ciba-Geigy Corporation Method for making reinforced composites
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US4444976A (en) * 1982-12-20 1984-04-24 The Goodyear Tire & Rubber Company Sag resistant two component adhesive and sealant
DE3420425A1 (de) * 1984-06-01 1985-12-05 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch, das als photoinitiator ein 1,3,10-triazaanthracen-4-on- enthaelt
US4722947A (en) * 1985-08-05 1988-02-02 Pony Industries, Inc. Production of radiation curable partial esters of anhydride-containing copolymers
JPS62158710A (ja) * 1986-01-08 1987-07-14 Ube Ind Ltd 光硬化性組成物
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US5364736A (en) * 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
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JPH04153657A (ja) * 1990-10-18 1992-05-27 Nippon Kayaku Co Ltd カラーフィルター形成用の光重合性組成物
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US5270146A (en) * 1992-04-07 1993-12-14 Morton International, Inc. Photosensitive laminate having dual intermediate layers
CA2090099C (fr) * 1992-05-15 1997-01-14 James Rath Methode de fabrication de cartes de circuit imprime multicouche et carte de circuit obtenue avec cette methode
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GB2273366B (en) * 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
JP2877659B2 (ja) * 1993-05-10 1999-03-31 日本化薬株式会社 レジストインキ組成物及びその硬化物
JPH075302A (ja) * 1993-06-15 1995-01-10 Tosoh Corp マイクロ集光レンズ形成用感光性組成物
US5609991A (en) * 1995-02-10 1997-03-11 Morton International, Inc. Photoimageable composition having improved alkaline process resistance and tack-free surface for contact imaging
US5576145A (en) * 1995-02-10 1996-11-19 Morton International, Inc. Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance

Also Published As

Publication number Publication date
IL116414A (en) 2000-09-28
AU677537B2 (en) 1997-04-24
DE69600644D1 (de) 1998-10-22
CA2166177C (fr) 1998-12-08
MX9600240A (es) 1998-06-28
JP2950770B2 (ja) 1999-09-20
IL116414A0 (en) 1996-03-31
CN1135611A (zh) 1996-11-13
US5698376A (en) 1997-12-16
CA2166177A1 (fr) 1996-08-11
US5609991A (en) 1997-03-11
EP0726499A1 (fr) 1996-08-14
BR9600360A (pt) 1998-01-27
KR960031490A (ko) 1996-09-17
ATE171284T1 (de) 1998-10-15
KR0169207B1 (ko) 1999-03-20
ES2123320T3 (es) 1999-01-01
AU4229496A (en) 1996-08-22
DE69600644T2 (de) 1999-02-11
JPH08248634A (ja) 1996-09-27
CN1087080C (zh) 2002-07-03
EP0726499B1 (fr) 1998-09-16

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20090208