ATE100218T1 - Lichtempfindliche waesserig entwickelbare, keramische beschichtungszusammensetzung. - Google Patents

Lichtempfindliche waesserig entwickelbare, keramische beschichtungszusammensetzung.

Info

Publication number
ATE100218T1
ATE100218T1 AT89109703T AT89109703T ATE100218T1 AT E100218 T1 ATE100218 T1 AT E100218T1 AT 89109703 T AT89109703 T AT 89109703T AT 89109703 T AT89109703 T AT 89109703T AT E100218 T1 ATE100218 T1 AT E100218T1
Authority
AT
Austria
Prior art keywords
binder
particles
weight ratio
weight
coating composition
Prior art date
Application number
AT89109703T
Other languages
English (en)
Inventor
William John Nebe
James Terry Osborne
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE100218T1 publication Critical patent/ATE100218T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • C08L33/12—Homopolymers or copolymers of methyl methacrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4664—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders
    • H05K3/4667—Adding a circuit layer by thick film methods, e.g. printing techniques or by other techniques for making conductive patterns by using pastes, inks or powders characterized by using an inorganic intermediate insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT89109703T 1988-05-31 1989-05-30 Lichtempfindliche waesserig entwickelbare, keramische beschichtungszusammensetzung. ATE100218T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/200,401 US4912019A (en) 1988-05-31 1988-05-31 Photosensitive aqueous developable ceramic coating composition
EP89109703A EP0347616B1 (de) 1988-05-31 1989-05-30 Lichtempfindliche wässerig entwickelbare, keramische Beschichtungszusammensetzung

Publications (1)

Publication Number Publication Date
ATE100218T1 true ATE100218T1 (de) 1994-01-15

Family

ID=22741575

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89109703T ATE100218T1 (de) 1988-05-31 1989-05-30 Lichtempfindliche waesserig entwickelbare, keramische beschichtungszusammensetzung.

Country Status (7)

Country Link
US (1) US4912019A (de)
EP (1) EP0347616B1 (de)
JP (1) JP2723975B2 (de)
KR (1) KR890017303A (de)
CN (1) CN1037212C (de)
AT (1) ATE100218T1 (de)
DE (1) DE68912212T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5032490A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable copper conductor composition
US5032478A (en) * 1989-08-21 1991-07-16 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable gold conductor composition
US5049480A (en) * 1990-02-20 1991-09-17 E. I. Du Pont De Nemours And Company Photosensitive aqueous developable silver conductor composition
EP0569762A1 (de) * 1992-05-07 1993-11-18 E.I. Du Pont De Nemours And Company Verfahren zur Herstellung von Mustern in dielektrischen photohärtbaren Schichten
DE69324640T2 (de) * 1992-09-23 1999-10-14 Du Pont Photoempfindliches dielektrisches Schichtmaterial und untereinander verbundene Mehrschichtschaltungen
US5563019A (en) 1994-06-30 1996-10-08 E. I. Du Pont De Nemours And Company Donor element for laser-induced thermal transfer
TW367504B (en) * 1996-05-21 1999-08-21 Du Pont Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer
KR100609364B1 (ko) * 1997-03-25 2006-08-08 이 아이 듀폰 디 네모아 앤드 캄파니 디스플레이 패널용 필드 이미터 캐소드 배면판 구조물, 그제조 방법, 및 그를 포함하는 디스플레이 패널
EP1008909B1 (de) 1998-12-11 2003-08-13 E.I. Dupont De Nemours And Company Zusammensetzung für ein Silber enthaltendes, lichtempfindliches, leitendes Band und das damit behandelte Band
JP2000275826A (ja) * 1999-03-25 2000-10-06 Murata Mfg Co Ltd ペースト組成物及びそれを用いた回路基板
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US7052824B2 (en) * 2000-06-30 2006-05-30 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning
US6762009B2 (en) * 2001-10-12 2004-07-13 E. I. Du Pont De Nemours And Company Aqueous developable photoimageable thick film compositions with photospeed enhancer
US6994948B2 (en) * 2001-10-12 2006-02-07 E.I. Du Pont De Nemours And Company, Inc. Aqueous developable photoimageable thick film compositions
US20030124461A1 (en) * 2001-10-12 2003-07-03 Suess Terry R. Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes
EP1507667A1 (de) * 2002-05-17 2005-02-23 E.I. Du Pont De Nemours And Company Planarisierendes element für thermisches drucken eines farbfilters
JP4372493B2 (ja) * 2003-08-28 2009-11-25 Ｔｄｋ株式会社 セラミックグリーンシートの製造方法および当該セラミックグリーンシートを用いた電子部品の製造方法
US7618704B2 (en) * 2003-09-29 2009-11-17 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
JP4507873B2 (ja) * 2003-12-18 2010-07-21 東レ株式会社 感光性セラミックス組成物
US7435763B2 (en) * 2004-04-02 2008-10-14 Hewlett-Packard Development Company, L.P. Solid freeform compositions, methods of application thereof, and systems for use thereof
KR100611446B1 (ko) * 2004-05-18 2006-08-10 제일모직주식회사 수성 현상가능한 감광성 코팅액 조성물의 제조방법
US20060027307A1 (en) * 2004-08-03 2006-02-09 Bidwell Larry A Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein
US7135267B2 (en) * 2004-08-06 2006-11-14 E. I. Du Pont De Nemours And Company Aqueous developable photoimageable compositions for use in photo-patterning methods
US8143326B2 (en) * 2004-09-28 2012-03-27 E.I. Du Pont De Nemours And Company Spin-printing of electronic and display components
JP5108239B2 (ja) * 2005-03-09 2012-12-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 黒色導電性組成物、黒色電極、およびその形成方法
US7569165B2 (en) 2005-03-09 2009-08-04 E. I. Du Pont De Nemours And Company Black conductive compositions, black electrodes, and methods of forming thereof
US8252385B2 (en) * 2005-03-25 2012-08-28 E I Du Pont De Nemours And Company Spin-printing of electronic and display components
US7214466B1 (en) 2005-12-14 2007-05-08 E. I. Du Pont De Nemours And Company Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof
US7645564B2 (en) * 2006-03-03 2010-01-12 Haixin Yang Polymer solutions, aqueous developable thick film compositions, processes of making and electrodes formed thereof
JP5200591B2 (ja) * 2007-03-14 2013-06-05 東レ株式会社 感光性ペースト
EP2980693A4 (de) 2013-03-29 2016-12-21 Seiko Epson Corp Drucksteuerungsvorrichtung, druckvorrichtung, datenverarbeitungsverfahren und einstellverfahren für drucksteuerungsvorrichtung
JP6409855B2 (ja) * 2016-12-15 2018-10-24 セイコーエプソン株式会社 印刷装置、印刷装置の制御方法、及び、プログラム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4273857A (en) * 1976-01-30 1981-06-16 E. I. Du Pont De Nemours And Company Polymeric binders for aqueous processable photopolymer compositions
US4229517A (en) * 1976-11-13 1980-10-21 E. I. Du Pont De Nemours And Company Dot-etchable photopolymerizable elements
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
JPS5749105A (en) * 1980-09-05 1982-03-20 Nippon Electric Co Insulating paste composition
JPS5749106A (en) * 1980-09-05 1982-03-20 Nippon Electric Co Insulating paste composition
JPS58190867A (ja) * 1982-04-26 1983-11-07 鳴海製陶株式会社 セラミツクテ−プの製造方法
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4536535A (en) * 1983-06-07 1985-08-20 E. I. Du Pont De Nemours And Company Castable ceramic compositions
US4613560A (en) * 1984-12-28 1986-09-23 E. I. Du Pont De Nemours And Company Photosensitive ceramic coating composition
US4724021A (en) * 1986-07-23 1988-02-09 E. I. Du Pont De Nemours And Company Method for making porous bottom-layer dielectric composite structure

Also Published As

Publication number Publication date
US4912019A (en) 1990-03-27
CN1037212C (zh) 1998-01-28
EP0347616B1 (de) 1994-01-12
JPH0225848A (ja) 1990-01-29
JP2723975B2 (ja) 1998-03-09
CN1039488A (zh) 1990-02-07
KR890017303A (ko) 1989-12-15
DE68912212T2 (de) 1994-04-28
DE68912212D1 (de) 1994-02-24
EP0347616A1 (de) 1989-12-27

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