GB1104487A - Improvements in and relating to thin films - Google Patents

Improvements in and relating to thin films

Info

Publication number
GB1104487A
GB1104487A GB2157965A GB2157965A GB1104487A GB 1104487 A GB1104487 A GB 1104487A GB 2157965 A GB2157965 A GB 2157965A GB 2157965 A GB2157965 A GB 2157965A GB 1104487 A GB1104487 A GB 1104487A
Authority
GB
United Kingdom
Prior art keywords
base
chamber
holder
cathode
relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2157965A
Other languages
English (en)
Inventor
Newton Schwartz
Frederick Vratny
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1104487A publication Critical patent/GB1104487A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
GB2157965A 1964-06-04 1965-05-21 Improvements in and relating to thin films Expired GB1104487A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US37253764A 1964-06-04 1964-06-04

Publications (1)

Publication Number Publication Date
GB1104487A true GB1104487A (en) 1968-02-28

Family

ID=23468560

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2157965A Expired GB1104487A (en) 1964-06-04 1965-05-21 Improvements in and relating to thin films

Country Status (9)

Country Link
AT (1) AT255226B (enrdf_load_html_response)
BE (1) BE664061A (enrdf_load_html_response)
DE (1) DE1515322C3 (enrdf_load_html_response)
ES (1) ES313735A1 (enrdf_load_html_response)
FR (1) FR1434758A (enrdf_load_html_response)
GB (1) GB1104487A (enrdf_load_html_response)
IL (1) IL23185A (enrdf_load_html_response)
NL (2) NL6506292A (enrdf_load_html_response)
SE (1) SE314269B (enrdf_load_html_response)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3617459A (en) * 1967-09-15 1971-11-02 Ibm Rf sputtering method and apparatus for producing insulating films of varied physical properties
MX145314A (es) * 1975-12-17 1982-01-27 Coulter Systems Corp Mejoras a un aparato chisporroteador para producir pelicula electrofotografica

Also Published As

Publication number Publication date
BE664061A (enrdf_load_html_response) 1965-09-16
AT255226B (de) 1967-06-26
DE1515322C3 (de) 1974-05-02
FR1434758A (fr) 1966-04-08
NL6506292A (enrdf_load_html_response) 1965-12-06
SE314269B (enrdf_load_html_response) 1969-09-01
ES313735A1 (es) 1965-07-16
NL136984C (enrdf_load_html_response)
DE1515322B2 (de) 1973-10-04
DE1515322A1 (de) 1972-03-02
IL23185A (en) 1968-08-22

Similar Documents

Publication Publication Date Title
ES454329A1 (es) Perfeccionamientos en aparatos de tratamiento al vacio.
GB1095704A (en) Thin film resistors
ES391740A1 (es) Un aparato para depositar material en un sustrato.
UA18259A (uk) Спосіб управліhhя плазмовим осаджеhhям тоhких плівок у вакуумі
GB1294025A (en) Rf sputtering
GB1114644A (en) Sputtering apparatus
JPS5419662A (en) Forming method of plasma cvd film
GB1054660A (enrdf_load_html_response)
GB485528A (en) Improvements in and relating to light sensitive devices and methods of manufacturing the same
FR1283796A (fr) Procédé d'élimination des contraintes dans une pellicule mince
GB1104487A (en) Improvements in and relating to thin films
GB1431935A (en) Chemically resistant material
GB1100560A (en) Improvements in apparatus and process for treating diamonds by glow discharge
GB1073069A (en) Process for producing a superconductor
GB1119277A (en) Improvements in or relating to sputtering apparatus
GB1333617A (en) Cathode sputtering apparatus
GB1208714A (en) Improvements in optical resonance cells
GB1067831A (en) Improvements in thin film circuits
GB1241213A (en) Sequential sputtering apparatus
JPS5315273A (en) Forming method for transparent thin film of oxide
JPS5665981A (en) Sputtering device
GB1088629A (en) Improvements in or relating to methods of vapour-depositing a plurality of thin films of material onto a curved surface
JPS5518190A (en) Frequency adjustment method for high-coupled piezoelectric oscillator
GB2017138A (en) Light-Absorption Film for Rear Electrodes of Electroluminescent Display Panel
JPS53141182A (en) Plasma chemical vapor depositing device