JPS5315273A - Forming method for transparent thin film of oxide - Google Patents

Forming method for transparent thin film of oxide

Info

Publication number
JPS5315273A
JPS5315273A JP8966576A JP8966576A JPS5315273A JP S5315273 A JPS5315273 A JP S5315273A JP 8966576 A JP8966576 A JP 8966576A JP 8966576 A JP8966576 A JP 8966576A JP S5315273 A JPS5315273 A JP S5315273A
Authority
JP
Japan
Prior art keywords
oxide
thin film
forming method
transparent thin
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8966576A
Other languages
Japanese (ja)
Inventor
Tomiya Sonoda
Hiroshi Washida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8966576A priority Critical patent/JPS5315273A/en
Publication of JPS5315273A publication Critical patent/JPS5315273A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form the film of thickness above 500Angstrom without exposing the object to be evaporated to a high temperature and also without receiving the impact of electrons and ions, by holding the pressure of O2 in the vacuum tank within the specified range and evaporating Al, Mg, In or rare earth metals on the object to be evaporated while controlling the vaporization rate.
JP8966576A 1976-07-29 1976-07-29 Forming method for transparent thin film of oxide Pending JPS5315273A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8966576A JPS5315273A (en) 1976-07-29 1976-07-29 Forming method for transparent thin film of oxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8966576A JPS5315273A (en) 1976-07-29 1976-07-29 Forming method for transparent thin film of oxide

Publications (1)

Publication Number Publication Date
JPS5315273A true JPS5315273A (en) 1978-02-10

Family

ID=13977030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8966576A Pending JPS5315273A (en) 1976-07-29 1976-07-29 Forming method for transparent thin film of oxide

Country Status (1)

Country Link
JP (1) JPS5315273A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408563A (en) * 1978-08-09 1983-10-11 Leybold-Heraeus Gmbh Apparatus for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition
US4438701A (en) * 1981-02-20 1984-03-27 Tsubakimoto Chain Company Truck conveyor
US4440090A (en) * 1981-02-20 1984-04-03 Tsubakimoto Chain Company Storage arrangement for truck conveyor trolleys
JPS62103359A (en) * 1985-10-29 1987-05-13 Toyo Metaraijingu Kk Manufacture of transparent film of interrupting gas
US5264394A (en) * 1991-05-22 1993-11-23 Associated Universities, Inc. Method for producing high quality oxide films on substrates
JPH0645933U (en) * 1992-11-25 1994-06-24 三菱重工業株式会社 Transport line

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408563A (en) * 1978-08-09 1983-10-11 Leybold-Heraeus Gmbh Apparatus for regulating the evaporation rate of oxidizable substances in reactive vacuum deposition
US4438701A (en) * 1981-02-20 1984-03-27 Tsubakimoto Chain Company Truck conveyor
US4440090A (en) * 1981-02-20 1984-04-03 Tsubakimoto Chain Company Storage arrangement for truck conveyor trolleys
JPS62103359A (en) * 1985-10-29 1987-05-13 Toyo Metaraijingu Kk Manufacture of transparent film of interrupting gas
US5264394A (en) * 1991-05-22 1993-11-23 Associated Universities, Inc. Method for producing high quality oxide films on substrates
US5282903A (en) * 1991-05-22 1994-02-01 Associated Universities, Inc. High quality oxide films on substrates
JPH0645933U (en) * 1992-11-25 1994-06-24 三菱重工業株式会社 Transport line

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