JPS52126168A - Preparing device for thin films - Google Patents

Preparing device for thin films

Info

Publication number
JPS52126168A
JPS52126168A JP4278676A JP4278676A JPS52126168A JP S52126168 A JPS52126168 A JP S52126168A JP 4278676 A JP4278676 A JP 4278676A JP 4278676 A JP4278676 A JP 4278676A JP S52126168 A JPS52126168 A JP S52126168A
Authority
JP
Japan
Prior art keywords
thin films
preparing device
ions
deposition
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4278676A
Other languages
Japanese (ja)
Other versions
JPS565061B2 (en
Inventor
Sadayuki Okudaira
Keizo Suzuki
Ichiro Shikamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4278676A priority Critical patent/JPS52126168A/en
Publication of JPS52126168A publication Critical patent/JPS52126168A/en
Publication of JPS565061B2 publication Critical patent/JPS565061B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE:To form thin films by collecting impurity ions in an electrode interposed between an evaporation source and a substrate being coated and initiating vapor-deposition after the amount of the ions decreases to less than the given value.
JP4278676A 1976-04-15 1976-04-15 Preparing device for thin films Granted JPS52126168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4278676A JPS52126168A (en) 1976-04-15 1976-04-15 Preparing device for thin films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4278676A JPS52126168A (en) 1976-04-15 1976-04-15 Preparing device for thin films

Publications (2)

Publication Number Publication Date
JPS52126168A true JPS52126168A (en) 1977-10-22
JPS565061B2 JPS565061B2 (en) 1981-02-03

Family

ID=12645635

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4278676A Granted JPS52126168A (en) 1976-04-15 1976-04-15 Preparing device for thin films

Country Status (1)

Country Link
JP (1) JPS52126168A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60119710A (en) * 1983-12-02 1985-06-27 Nippon Telegr & Teleph Corp <Ntt> Unit for producing thin film
JPH0196371A (en) * 1987-10-05 1989-04-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60119710A (en) * 1983-12-02 1985-06-27 Nippon Telegr & Teleph Corp <Ntt> Unit for producing thin film
JPH0239590B2 (en) * 1983-12-02 1990-09-06 Nippon Telegraph & Telephone
JPH0196371A (en) * 1987-10-05 1989-04-14 Ishikawajima Harima Heavy Ind Co Ltd Ion plating method

Also Published As

Publication number Publication date
JPS565061B2 (en) 1981-02-03

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