JPS52153411A - Production of electric substrate - Google Patents

Production of electric substrate

Info

Publication number
JPS52153411A
JPS52153411A JP7055276A JP7055276A JPS52153411A JP S52153411 A JPS52153411 A JP S52153411A JP 7055276 A JP7055276 A JP 7055276A JP 7055276 A JP7055276 A JP 7055276A JP S52153411 A JPS52153411 A JP S52153411A
Authority
JP
Japan
Prior art keywords
production
electric substrate
substrate
evaporation
fitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7055276A
Other languages
Japanese (ja)
Other versions
JPS5921091B2 (en
Inventor
Koichi Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7055276A priority Critical patent/JPS5921091B2/en
Publication of JPS52153411A publication Critical patent/JPS52153411A/en
Publication of JPS5921091B2 publication Critical patent/JPS5921091B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Abstract

PURPOSE:To perform the inclined evaporation of a film made of magnetic material such as magnetic tape at high speed by fitting a reflection plate at high temperature in space between an evaporation source and a substrate.
JP7055276A 1976-06-15 1976-06-15 Method for manufacturing magnetic recording media Expired JPS5921091B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7055276A JPS5921091B2 (en) 1976-06-15 1976-06-15 Method for manufacturing magnetic recording media

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7055276A JPS5921091B2 (en) 1976-06-15 1976-06-15 Method for manufacturing magnetic recording media

Publications (2)

Publication Number Publication Date
JPS52153411A true JPS52153411A (en) 1977-12-20
JPS5921091B2 JPS5921091B2 (en) 1984-05-17

Family

ID=13434791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7055276A Expired JPS5921091B2 (en) 1976-06-15 1976-06-15 Method for manufacturing magnetic recording media

Country Status (1)

Country Link
JP (1) JPS5921091B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102421116B1 (en) 2017-06-22 2022-07-15 삼성디스플레이 주식회사 Etchant composition and method for forming wiring using etchant composition
KR20210084018A (en) 2019-12-27 2021-07-07 삼성전자주식회사 Etchant composition and method of manufacturing integrated circuit device using the same

Also Published As

Publication number Publication date
JPS5921091B2 (en) 1984-05-17

Similar Documents

Publication Publication Date Title
JPS52112797A (en) Ironnsilicon magnetic thin film
JPS5240348A (en) Reflecting mirror formed of metallic film
JPS52153411A (en) Production of electric substrate
JPS5242381A (en) Semiconductor storage device
JPS5437694A (en) Thermo cell and its manufacture
JPS5210343A (en) Polymer film
JPS51111348A (en) Liquid crystal cell
JPS524753A (en) Mic circulator
JPS5290902A (en) Production of reproducing stylus
JPS52153412A (en) Production of electric substrate
JPS5233511A (en) Film magnetic head
JPS5368211A (en) Magnetic recording tape
JPS51123593A (en) Deenergizer for film insulation material
JPS533975A (en) Production of magnetic recording material by evaporation of inclinated incidence angle
JPS5335389A (en) Thin film cryotron
JPS52143500A (en) Manufacturing method of magnetic thin film
JPS5274325A (en) Multiple element magnetic head
JPS5339983A (en) Manufacture of thin film
JPS52108803A (en) Information recording element
JPS51126105A (en) Manufacturing process of magnetic recording material
JPS5274600A (en) Production of linb1-xtaxo3monocrystalline thin film
JPS525294A (en) Laser with variable wave length
JPS5355142A (en) Electrode forming method in full surface mirror typeliquid crystaldisplay device
JPS538376A (en) Preparation of magnetic recording material by evaporation process with oblique incidence
JPS5323607A (en) Production of magnetic recording med ia