JPS5340692A - Forming method for evaporated film of high purity - Google Patents

Forming method for evaporated film of high purity

Info

Publication number
JPS5340692A
JPS5340692A JP11620576A JP11620576A JPS5340692A JP S5340692 A JPS5340692 A JP S5340692A JP 11620576 A JP11620576 A JP 11620576A JP 11620576 A JP11620576 A JP 11620576A JP S5340692 A JPS5340692 A JP S5340692A
Authority
JP
Japan
Prior art keywords
forming method
high purity
evaporated film
boat
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11620576A
Other languages
Japanese (ja)
Other versions
JPS5852024B2 (en
Inventor
Masahiko Nakajima
Hiroshi Oizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP11620576A priority Critical patent/JPS5852024B2/en
Publication of JPS5340692A publication Critical patent/JPS5340692A/en
Publication of JPS5852024B2 publication Critical patent/JPS5852024B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent the evaporation of metal and the thermal radiation to the clamp and to suppress the vaporization of impurities, by equipping the screening plate made of refractories at the position nearer to the clamp than the most heated part at the evaporation in the boat and further kept apart by more than the prescribed distance from the surface of the boat.
JP11620576A 1976-09-28 1976-09-28 Resistance heating type vacuum evaporation equipment Expired JPS5852024B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11620576A JPS5852024B2 (en) 1976-09-28 1976-09-28 Resistance heating type vacuum evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11620576A JPS5852024B2 (en) 1976-09-28 1976-09-28 Resistance heating type vacuum evaporation equipment

Publications (2)

Publication Number Publication Date
JPS5340692A true JPS5340692A (en) 1978-04-13
JPS5852024B2 JPS5852024B2 (en) 1983-11-19

Family

ID=14681432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11620576A Expired JPS5852024B2 (en) 1976-09-28 1976-09-28 Resistance heating type vacuum evaporation equipment

Country Status (1)

Country Link
JP (1) JPS5852024B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007314877A (en) * 2006-04-28 2007-12-06 Semiconductor Energy Lab Co Ltd Electrode cover and evaporation device
US8608855B2 (en) 2006-04-28 2013-12-17 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007314877A (en) * 2006-04-28 2007-12-06 Semiconductor Energy Lab Co Ltd Electrode cover and evaporation device
US8608855B2 (en) 2006-04-28 2013-12-17 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device
KR101353567B1 (en) * 2006-04-28 2014-01-22 가부시키가이샤 한도오따이 에네루기 켄큐쇼 Electrode cover and evaporation device
US9290842B2 (en) 2006-04-28 2016-03-22 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device

Also Published As

Publication number Publication date
JPS5852024B2 (en) 1983-11-19

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