JPS5358488A - Forming method for evaporated film - Google Patents

Forming method for evaporated film

Info

Publication number
JPS5358488A
JPS5358488A JP13317476A JP13317476A JPS5358488A JP S5358488 A JPS5358488 A JP S5358488A JP 13317476 A JP13317476 A JP 13317476A JP 13317476 A JP13317476 A JP 13317476A JP S5358488 A JPS5358488 A JP S5358488A
Authority
JP
Japan
Prior art keywords
forming method
evaporated film
evaporated
crucible
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13317476A
Other languages
Japanese (ja)
Inventor
Akio Kotabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13317476A priority Critical patent/JPS5358488A/en
Publication of JPS5358488A publication Critical patent/JPS5358488A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To enable to prevent the generation of defects such as flaws, etc. on the evaporated film, by equipping the perforated cover to the crucible, when the evaporation material of high melting point is evaporated on the substrate by using the heat-resisting crucible for evaporation source.
JP13317476A 1976-11-08 1976-11-08 Forming method for evaporated film Pending JPS5358488A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13317476A JPS5358488A (en) 1976-11-08 1976-11-08 Forming method for evaporated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13317476A JPS5358488A (en) 1976-11-08 1976-11-08 Forming method for evaporated film

Publications (1)

Publication Number Publication Date
JPS5358488A true JPS5358488A (en) 1978-05-26

Family

ID=15098395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13317476A Pending JPS5358488A (en) 1976-11-08 1976-11-08 Forming method for evaporated film

Country Status (1)

Country Link
JP (1) JPS5358488A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100467805B1 (en) * 2002-01-22 2005-01-24 학교법인연세대학교 Linear or planar type evaporator for the controllable film thickness profile

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100467805B1 (en) * 2002-01-22 2005-01-24 학교법인연세대학교 Linear or planar type evaporator for the controllable film thickness profile

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