IL23185A - Sputtering technique - Google Patents
Sputtering techniqueInfo
- Publication number
- IL23185A IL23185A IL2318565A IL2318565A IL23185A IL 23185 A IL23185 A IL 23185A IL 2318565 A IL2318565 A IL 2318565A IL 2318565 A IL2318565 A IL 2318565A IL 23185 A IL23185 A IL 23185A
- Authority
- IL
- Israel
- Prior art keywords
- sputtering technique
- sputtering
- technique
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US37253764A | 1964-06-04 | 1964-06-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
IL23185A true IL23185A (en) | 1968-08-22 |
Family
ID=23468560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL2318565A IL23185A (en) | 1964-06-04 | 1965-03-19 | Sputtering technique |
Country Status (9)
Country | Link |
---|---|
AT (1) | AT255226B (xx) |
BE (1) | BE664061A (xx) |
DE (1) | DE1515322C3 (xx) |
ES (1) | ES313735A1 (xx) |
FR (1) | FR1434758A (xx) |
GB (1) | GB1104487A (xx) |
IL (1) | IL23185A (xx) |
NL (2) | NL6506292A (xx) |
SE (1) | SE314269B (xx) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3617459A (en) * | 1967-09-15 | 1971-11-02 | Ibm | Rf sputtering method and apparatus for producing insulating films of varied physical properties |
MX145314A (es) * | 1975-12-17 | 1982-01-27 | Coulter Systems Corp | Mejoras a un aparato chisporroteador para producir pelicula electrofotografica |
-
0
- NL NL136984D patent/NL136984C/xx active
-
1965
- 1965-03-19 IL IL2318565A patent/IL23185A/xx unknown
- 1965-04-05 AT AT307465A patent/AT255226B/de active
- 1965-05-17 BE BE664061D patent/BE664061A/xx unknown
- 1965-05-18 DE DE1965W0039172 patent/DE1515322C3/de not_active Expired
- 1965-05-18 NL NL6506292A patent/NL6506292A/xx unknown
- 1965-05-21 GB GB2157965A patent/GB1104487A/en not_active Expired
- 1965-05-24 FR FR18205A patent/FR1434758A/fr not_active Expired
- 1965-05-26 ES ES0313735A patent/ES313735A1/es not_active Expired
- 1965-06-03 SE SE728665A patent/SE314269B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
ES313735A1 (es) | 1965-07-16 |
DE1515322B2 (de) | 1973-10-04 |
DE1515322A1 (de) | 1972-03-02 |
AT255226B (de) | 1967-06-26 |
SE314269B (xx) | 1969-09-01 |
GB1104487A (en) | 1968-02-28 |
FR1434758A (fr) | 1966-04-08 |
BE664061A (xx) | 1965-09-16 |
NL6506292A (xx) | 1965-12-06 |
DE1515322C3 (de) | 1974-05-02 |
NL136984C (xx) |
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