FR2779273B1 - Dispositif de memoire a semiconducteur presentant une structure soi (silicium sur isolant) et procede pour sa fabrication - Google Patents

Dispositif de memoire a semiconducteur presentant une structure soi (silicium sur isolant) et procede pour sa fabrication

Info

Publication number
FR2779273B1
FR2779273B1 FR9906620A FR9906620A FR2779273B1 FR 2779273 B1 FR2779273 B1 FR 2779273B1 FR 9906620 A FR9906620 A FR 9906620A FR 9906620 A FR9906620 A FR 9906620A FR 2779273 B1 FR2779273 B1 FR 2779273B1
Authority
FR
France
Prior art keywords
insulation
silicon
manufacturing
memory device
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9906620A
Other languages
English (en)
Other versions
FR2779273A1 (fr
Inventor
Yun Gi Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of FR2779273A1 publication Critical patent/FR2779273A1/fr
Application granted granted Critical
Publication of FR2779273B1 publication Critical patent/FR2779273B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/31—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/33—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor extending under the transistor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203—Particular design considerations for integrated circuits
    • H01L27/0214—Particular design considerations for integrated circuits for internal polarisation, e.g. I2L
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78645—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
    • H01L29/78648—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B12/00—Dynamic random access memory [DRAM] devices
    • H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/48—Data lines or contacts therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/928—Front and rear surface processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Dram (AREA)
FR9906620A 1998-05-27 1999-05-26 Dispositif de memoire a semiconducteur presentant une structure soi (silicium sur isolant) et procede pour sa fabrication Expired - Fee Related FR2779273B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019980019164A KR100267013B1 (ko) 1998-05-27 1998-05-27 반도체 장치 및 그의 제조 방법

Publications (2)

Publication Number Publication Date
FR2779273A1 FR2779273A1 (fr) 1999-12-03
FR2779273B1 true FR2779273B1 (fr) 2005-04-29

Family

ID=19537782

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9906620A Expired - Fee Related FR2779273B1 (fr) 1998-05-27 1999-05-26 Dispositif de memoire a semiconducteur presentant une structure soi (silicium sur isolant) et procede pour sa fabrication

Country Status (7)

Country Link
US (2) US6294806B1 (fr)
JP (2) JPH11354756A (fr)
KR (1) KR100267013B1 (fr)
DE (1) DE19923388B4 (fr)
FR (1) FR2779273B1 (fr)
GB (1) GB2337851B (fr)
TW (1) TW413943B (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100537552B1 (ko) * 2000-07-31 2005-12-16 매그나칩 반도체 유한회사 반도체 소자 및 그의 제조 방법
US6465331B1 (en) * 2000-08-31 2002-10-15 Micron Technology, Inc. DRAM fabricated on a silicon-on-insulator (SOI) substrate having bi-level digit lines
DE10065669A1 (de) * 2000-12-29 2002-07-11 Infineon Technologies Ag Verfahren zur Herstellung einer integrierten Halbleiterspeicheranordnung
US6972448B2 (en) * 2000-12-31 2005-12-06 Texas Instruments Incorporated Sub-lithographics opening for back contact or back gate
FR2830124B1 (fr) 2001-09-26 2005-03-04 St Microelectronics Sa Memoire vive
US7608927B2 (en) 2002-08-29 2009-10-27 Micron Technology, Inc. Localized biasing for silicon on insulator structures
JP2004111826A (ja) * 2002-09-20 2004-04-08 Renesas Technology Corp 半導体装置およびその製造方法
US7710771B2 (en) * 2002-11-20 2010-05-04 The Regents Of The University Of California Method and apparatus for capacitorless double-gate storage
GB0229191D0 (en) 2002-12-14 2003-01-22 Plastic Logic Ltd Embossing of polymer devices
JP4319078B2 (ja) * 2004-03-26 2009-08-26 シャープ株式会社 半導体装置の製造方法
KR100674952B1 (ko) * 2005-02-05 2007-01-26 삼성전자주식회사 3차원 플래쉬 메모리 소자 및 그 제조방법
US7709313B2 (en) * 2005-07-19 2010-05-04 International Business Machines Corporation High performance capacitors in planar back gates CMOS
WO2011145468A1 (fr) * 2010-05-21 2011-11-24 Semiconductor Energy Laboratory Co., Ltd. Dispositif de mémoire et dispositif à semi-conducteur
TWI708329B (zh) * 2017-03-20 2020-10-21 聯華電子股份有限公司 記憶體元件及其製作方法
US11205616B2 (en) * 2017-06-20 2021-12-21 Intel Corporation Internal node jumper for memory bit cells

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63308386A (ja) * 1987-01-30 1988-12-15 Sony Corp 半導体装置とその製造方法
JPS63219154A (ja) * 1987-03-06 1988-09-12 Nec Corp 半導体装置
US5316962A (en) * 1989-08-15 1994-05-31 Matsushita Electric Industrial Co., Ltd. Method of producing a semiconductor device having trench capacitors and vertical switching transistors
US5306942A (en) * 1989-10-11 1994-04-26 Nippondenso Co., Ltd. Semiconductor device having a shield which is maintained at a reference potential
US5420048A (en) * 1991-01-09 1995-05-30 Canon Kabushiki Kaisha Manufacturing method for SOI-type thin film transistor
JPH06104410A (ja) * 1991-10-31 1994-04-15 Sony Corp Ｓｏｉ構造の形成方法
EP0537677B1 (fr) * 1991-10-16 1998-08-19 Sony Corporation Procédé de fabrication d'une structure du type SOI avec DRAM
EP0543361B1 (fr) * 1991-11-20 2002-02-27 Canon Kabushiki Kaisha Procédé pour la fabrication d'un dispositif semi-conducteur
JPH05243521A (ja) * 1992-03-02 1993-09-21 Fujitsu Ltd 半導体メモリ装置
JPH0834261B2 (ja) * 1992-06-17 1996-03-29 インターナショナル・ビジネス・マシーンズ・コーポレイション Ｂｉｃｍｏｓ集積回路用のｓｏｉ構造体およびその製造方法
JPH0621386A (ja) * 1992-07-06 1994-01-28 Mitsubishi Electric Corp 半導体記憶装置
JPH06252400A (ja) * 1992-12-28 1994-09-09 Sony Corp 横型絶縁ゲート型電界効果トランジスタの製法
US6004865A (en) * 1993-09-06 1999-12-21 Hitachi, Ltd. Method of fabricating multi-layered structure having single crystalline semiconductor film formed on insulator
JP3488730B2 (ja) * 1993-11-05 2004-01-19 株式会社ルネサステクノロジ 半導体集積回路装置
US5446299A (en) * 1994-04-29 1995-08-29 International Business Machines Corporation Semiconductor random access memory cell on silicon-on-insulator with dual control gates
JPH07321332A (ja) * 1994-05-21 1995-12-08 Sony Corp Ｍｉｓ型半導体装置及びその製造方法
US5559368A (en) * 1994-08-30 1996-09-24 The Regents Of The University Of California Dynamic threshold voltage mosfet having gate to body connection for ultra-low voltage operation
JPH08181316A (ja) * 1994-12-22 1996-07-12 Mitsubishi Electric Corp 半導体装置及びその製造方法
US5753947A (en) * 1995-01-20 1998-05-19 Micron Technology, Inc. Very high-density DRAM cell structure and method for fabricating it
JP3973715B2 (ja) * 1995-06-05 2007-09-12 富士通株式会社 半導体記憶装置及びその製造方法
US5776789A (en) * 1995-06-05 1998-07-07 Fujitsu Limited Method for fabricating a semiconductor memory device
GB2321336B (en) * 1997-01-15 2001-07-25 Univ Warwick Gas-sensing semiconductor devices
US6043535A (en) * 1997-08-29 2000-03-28 Texas Instruments Incorporated Self-aligned implant under transistor gate
KR100281109B1 (ko) * 1997-12-15 2001-03-02 김영환 에스오아이(soi)소자및그의제조방법
JP3699823B2 (ja) * 1998-05-19 2005-09-28 株式会社東芝 半導体装置
US6100567A (en) * 1998-06-11 2000-08-08 Sun Microsystems, Inc. Tunable threshold SOI device using back gate and intrinsic channel region

Also Published As

Publication number Publication date
JPH11354756A (ja) 1999-12-24
GB2337851B (en) 2000-08-23
GB9909584D0 (en) 1999-06-23
TW413943B (en) 2000-12-01
KR100267013B1 (ko) 2000-09-15
FR2779273A1 (fr) 1999-12-03
US6294806B1 (en) 2001-09-25
DE19923388B4 (de) 2005-11-10
GB2337851A (en) 1999-12-01
KR19990086261A (ko) 1999-12-15
JP2007335887A (ja) 2007-12-27
US20020001913A1 (en) 2002-01-03
DE19923388A1 (de) 1999-12-02
US6458638B2 (en) 2002-10-01

Similar Documents

Publication Publication Date Title
FR2748157B1 (fr) Dispositif a semiconducteurs comportant une structure silicium sur isolant et procede de fabrication de ce dispositif
FR2798223B1 (fr) Dispositif a semiconducteur et procede de fabrication de celui-ci
FR2779273B1 (fr) Dispositif de memoire a semiconducteur presentant une structure soi (silicium sur isolant) et procede pour sa fabrication
FR2788883B1 (fr) Dispositif a semiconducteur ayant une structure silicium sur isolant
FR2767606B1 (fr) Dispositif a semiconducteurs comportant une structure d'isolation par tranchees et procede de fabrication
FR2744837B1 (fr) Dispositif a semi-conducteur en carbure de silicium et son procede de fabrication
DE69635397D1 (de) Halbleitervorrichtung mit Chipabmessungen und Herstellungsverfahren
FR2679069B1 (fr) Dispositif a semiconducteur comportant une couche d'interconnexion et procede de fabrication de celui-ci.
FR2805394B1 (fr) Dispositif a semiconducteur et procede de fabrication
FR2834125B1 (fr) Dispositif a semi-conducteurs comportant un isolant en tranchee et procede pour la fabrication de ce dispositif
FR2790842B1 (fr) Procede de fabrication d'un circuit de test sur une plaquette de silicium
SG85141A1 (en) Semiconductor device, semiconductor wafer, semiconductor module, and a method of manufacturing semiconductor device
KR960015801A (ko) 집적화된 표면 상호접속부 및 소자들을 갖는 반도체 칩 및 전자적 모듈과 이를 제조하는 방법
KR970004015A (ko) 반도체장치 및 그의 제조방법
GB9924488D0 (en) Semiconductor device having a plurality of mosfets on substrate and method of manufacturing the same
SG68095A1 (en) Fabrication method of wiring substrate for mounting semiconductor element and semiconductor device
FR2750799B1 (fr) Dispositif a semiconducteurs empechant le deverrouillage et procede de fabrication de ce dispositif
KR970004011A (ko) 반도체기억장치 및 그 제조방법
FR2797999B1 (fr) Procede de fabrication d'une capacite integree sur un substrat de silicium
FR2826180B1 (fr) Dispositif semiconducteur integre de memoire de type dram et procede de fabrication correspondant
KR960015805A (ko) 반도체 장치의 제조 방법
JP2000031018A5 (ja) 半導体装置の製造方法
KR970004171A (ko) 반도체장치 및 그 제조방법
DE69637095D1 (de) Selbstjustiertes Ätzverfahren zur verwirklichung der Wortleitungen integrierter Halbleiterspeicherbauelemente
KR960009211A (ko) 반도체장치의 제조방법

Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20100129