FR2407497A1 - Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique - Google Patents

Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique

Info

Publication number
FR2407497A1
FR2407497A1 FR7830278A FR7830278A FR2407497A1 FR 2407497 A1 FR2407497 A1 FR 2407497A1 FR 7830278 A FR7830278 A FR 7830278A FR 7830278 A FR7830278 A FR 7830278A FR 2407497 A1 FR2407497 A1 FR 2407497A1
Authority
FR
France
Prior art keywords
microelectronics
useful
forming
graphic arts
reserve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7830278A
Other languages
English (en)
French (fr)
Other versions
FR2407497B1 (OSRAM
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2407497A1 publication Critical patent/FR2407497A1/fr
Application granted granted Critical
Publication of FR2407497B1 publication Critical patent/FR2407497B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7830278A 1977-10-25 1978-10-25 Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique Granted FR2407497A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/844,951 US4141733A (en) 1977-10-25 1977-10-25 Development of light-sensitive quinone diazide compositions

Publications (2)

Publication Number Publication Date
FR2407497A1 true FR2407497A1 (fr) 1979-05-25
FR2407497B1 FR2407497B1 (OSRAM) 1983-01-21

Family

ID=25294041

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7830278A Granted FR2407497A1 (fr) 1977-10-25 1978-10-25 Procede pour former une reserve photographique, utile en particulier dans les arts graphiques et en microelectronique

Country Status (5)

Country Link
US (1) US4141733A (OSRAM)
JP (1) JPS5474432A (OSRAM)
CA (1) CA1110903A (OSRAM)
FR (1) FR2407497A1 (OSRAM)
GB (1) GB2013913B (OSRAM)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4294911A (en) * 1979-06-18 1981-10-13 Eastman Kodak Company Development of light-sensitive quinone diazide compositions using sulfite stabilizer
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
US4419437A (en) * 1981-02-11 1983-12-06 Eastman Kodak Company Image-forming compositions and elements containing ionic polyester dispersing agents
NL8101200A (nl) * 1981-03-12 1982-10-01 Philips Nv Werkwijze voor het aanbrengen van een resistmateriaal op een drager en resist-materiaal.
JPS57151939A (en) * 1981-03-16 1982-09-20 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
EP0062733B1 (en) * 1981-04-10 1986-01-02 Shipley Company Inc. Metal ion-free photoresist developer composition
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
JPS57192952A (en) * 1981-05-25 1982-11-27 Konishiroku Photo Ind Co Ltd Composition of developing solution
JPS5843451A (ja) * 1981-09-09 1983-03-14 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
US4351895A (en) * 1981-10-19 1982-09-28 American Hoechst Corporation Deletion fluid for positive printing plates
US4423138A (en) * 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
DE3230171A1 (de) * 1982-08-13 1984-02-16 Hoechst Ag, 6230 Frankfurt Waessrig-alkalische loesung und verfahren zum entwickeln von positiv-arbeitenden reproduktionsschichten
JPS59182444A (ja) * 1983-04-01 1984-10-17 Sumitomo Chem Co Ltd ポジ型フオトレジストの改良現像液
JPS59219743A (ja) * 1983-05-28 1984-12-11 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト現像液
US4464461A (en) * 1983-07-22 1984-08-07 Eastman Kodak Company Development of light-sensitive quinone diazide compositions
JPS60254043A (ja) * 1984-05-30 1985-12-14 Yotsukaichi Gosei Kk ポジ型感光材料用現像剤
US4711836A (en) * 1984-09-10 1987-12-08 Olin Hunt Specialty Products, Inc. Development of positive-working photoresist compositions
JPS62102888A (ja) * 1985-10-28 1987-05-13 Toyo Kagaku Kenkyusho:Kk 浄水器等の殺菌洗浄方法
JPH0638159B2 (ja) * 1986-07-18 1994-05-18 東京応化工業株式会社 ポジ型ホトレジスト用現像液
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
US4788127A (en) * 1986-11-17 1988-11-29 Eastman Kodak Company Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
WO1990001726A1 (en) * 1988-08-10 1990-02-22 Macdermid, Incorporated Light-sensitive novolac resins
US4997748A (en) * 1988-08-26 1991-03-05 Tokyo Ohka Kogyo Co., Ltd. Developer solution for positive-working resist composition
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JPH0234858A (ja) * 1988-11-05 1990-02-05 Toshiba Corp フォトレジスト現像液の製造方法
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
DE69203824T2 (de) * 1991-10-29 1996-02-22 Du Pont Entwicklerlösungen für lithographische Druckelemente.
US6472128B2 (en) 1996-04-30 2002-10-29 Shipley Company, L.L.C. Antihalation compositions
US6528235B2 (en) 1991-11-15 2003-03-04 Shipley Company, L.L.C. Antihalation compositions
US6773864B1 (en) 1991-11-15 2004-08-10 Shipley Company, L.L.C. Antihalation compositions
US6165697A (en) * 1991-11-15 2000-12-26 Shipley Company, L.L.C. Antihalation compositions
US6340559B1 (en) * 2001-02-21 2002-01-22 Huntsman Petrochemical Corporation Semiconductor developing agent
JP4080784B2 (ja) * 2002-04-26 2008-04-23 東京応化工業株式会社 レジスト用現像液及びそれを用いたレジストパターン形成方法、並びにレジスト用現像原液
US7716813B2 (en) * 2006-12-05 2010-05-18 Hitachi Global Storage Technologies Netherlands B.V. Method for fabricating magnetic write pole for a magnetic head using an E-beam resist mask

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1328967A (en) * 1969-10-14 1973-09-05 Philadelphia Quartz Co Quaternary alkanol ammonium hydroxides
GB1367830A (en) * 1972-05-23 1974-09-25 Hunt Chem Corp Philip A Processes and materials for making photoresists
JPS5156226A (en) * 1974-11-11 1976-05-17 Sanei Kagaku Kogyo Kk Hojitaipukankoseijushino genzozai

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5264877A (en) * 1975-11-26 1977-05-28 Toshiba Corp Production of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1328967A (en) * 1969-10-14 1973-09-05 Philadelphia Quartz Co Quaternary alkanol ammonium hydroxides
GB1367830A (en) * 1972-05-23 1974-09-25 Hunt Chem Corp Philip A Processes and materials for making photoresists
JPS5156226A (en) * 1974-11-11 1976-05-17 Sanei Kagaku Kogyo Kk Hojitaipukankoseijushino genzozai

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
EXBK/70 *
EXBK/76 *

Also Published As

Publication number Publication date
GB2013913B (en) 1982-03-03
JPS5474432A (en) 1979-06-14
GB2013913A (en) 1979-08-15
FR2407497B1 (OSRAM) 1983-01-21
JPS6161097B2 (OSRAM) 1986-12-24
CA1110903A (en) 1981-10-20
US4141733A (en) 1979-02-27

Similar Documents

Publication Publication Date Title
FR2353881A1 (fr) Procede de durcissement de couches photographiques contenant de la gelatine
ES422644A1 (es) Un procedimiento para formar un registro de imagen en un e-lemento fotografico.
GB1307111A (en) Screen printing plate and method of making same
US2058396A (en) Photoink printing
CA1166059A (en) Method of making families of steady-state heat transfer coefficient curves visible by photochemical means
US3250616A (en) Printing forms of high polymer substances
FR2363132A1 (fr) Procede de formation d'image
GB1403608A (en) Method of imaging light-sensitive materials
US1911955A (en) Phototransfer process
FR2424567A1 (fr) Produit photographique contenant des composes de la classe des sulfonamidophenols ou des sulfonamidonaphtols donnant des images en couleurs et procede pour former une image en couleurs avec ce produit
US2739890A (en) Photographic reproduction process
US3804621A (en) Negative or positive wash-off relief systems
KR880013043A (ko) 알칸올 아민을 함유한 고콘트라스트 양화 감광성 내식막 현상액
ES435450A1 (es) Metodo de fabricar un tubo de rayos catodicos para la pre- sentacion de imagenes en colores.
GB793550A (en) Improvements in or relating to photolithography
ES326326A1 (es) Un procedimiento para la confeccion de una plancha para la impresion en offset.
US2987396A (en) Photographic silver halide diffusion transfer process
GB1451790A (en) Electrophotographic recording
GB933004A (en) Improvements in processes of photographic reproduction
GB1530398A (en) Colour radiographic silver halide processing
FR2368064A1 (fr) Procede de formation d'images en
US1417328A (en) Light film
GB1292359A (en) Photographic dye developer diffusion transfer process
US3595654A (en) Process for preparing color proofs
US2609295A (en) Process for discontinuously physically developing latent photographic images

Legal Events

Date Code Title Description
ST Notification of lapse