ES2657710T3 - Macro-fotoiniciadores y composiciones curables de los mismos - Google Patents

Macro-fotoiniciadores y composiciones curables de los mismos Download PDF

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Publication number
ES2657710T3
ES2657710T3 ES11759867.2T ES11759867T ES2657710T3 ES 2657710 T3 ES2657710 T3 ES 2657710T3 ES 11759867 T ES11759867 T ES 11759867T ES 2657710 T3 ES2657710 T3 ES 2657710T3
Authority
ES
Spain
Prior art keywords
photoinitiator
macro
alkyl
compounds
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
ES11759867.2T
Other languages
English (en)
Spanish (es)
Inventor
John G. Woods
Roderick Coffey
Anthony F. Jacobine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel IP and Holding GmbH
Original Assignee
Henkel IP and Holding GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel IP and Holding GmbH filed Critical Henkel IP and Holding GmbH
Application granted granted Critical
Publication of ES2657710T3 publication Critical patent/ES2657710T3/es
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00—Living radical polymerisation
    • C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
ES11759867.2T 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos Active ES2657710T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US316190P 2001-08-30
US31619010P 2010-03-22 2010-03-22
PCT/US2011/025153 WO2011119272A2 (en) 2010-03-22 2011-02-17 Macro-photoinitiators and curable compositions thereof

Publications (1)

Publication Number Publication Date
ES2657710T3 true ES2657710T3 (es) 2018-03-06

Family

ID=44673796

Family Applications (1)

Application Number Title Priority Date Filing Date
ES11759867.2T Active ES2657710T3 (es) 2010-03-22 2011-02-17 Macro-fotoiniciadores y composiciones curables de los mismos

Country Status (8)

Country Link
US (1) US8748503B2 (enExample)
EP (1) EP2550307B1 (enExample)
JP (1) JP5955832B2 (enExample)
KR (1) KR101437751B1 (enExample)
CN (1) CN102770465B (enExample)
CA (1) CA2786630C (enExample)
ES (1) ES2657710T3 (enExample)
WO (1) WO2011119272A2 (enExample)

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* Cited by examiner, † Cited by third party
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US9097979B2 (en) 2013-03-13 2015-08-04 Wisconsin Alumni Research Foundation Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
CN106663676B (zh) * 2014-08-29 2019-05-28 三菱电机株式会社 半导体装置以及多相用半导体装置
US9587062B2 (en) * 2014-12-15 2017-03-07 Henkel IP & Holding GmbH and Henkel AG & Co. KGaA Photocrosslinkable block copolymers for hot-melt adhesives
EP3242899A4 (en) * 2015-01-08 2018-07-04 Henkel IP & Holding GmbH Process for preparing high molecular weight polyacrylates having narrow polydispersity indices
US10492888B2 (en) 2015-07-07 2019-12-03 Align Technology, Inc. Dental materials using thermoset polymers
ES2874129T3 (es) 2016-04-15 2021-11-04 Beckman Coulter Inc Macromoléculas fotoactivas y usos de las mismas
EP3481872B1 (en) * 2016-07-11 2020-04-08 3M Innovative Properties Company Polymeric material and methods of making using controlled radical initiators
CN111095046B (zh) 2017-09-15 2022-07-22 富士胶片株式会社 组合物、膜、层叠体、红外线透射滤波器、固体摄像元件及红外线传感器
CA3098622A1 (en) 2018-05-04 2019-11-07 Align Technology, Inc. Polymerizable monomers and method of polymerizing the same
JP7437320B2 (ja) 2018-05-04 2024-02-22 アライン テクノロジー， インコーポレイテッド 高温リソグラフィーに基づく光重合プロセスへの使用の為の硬化性組成物及び其れから架橋されたポリマーを生産する方法
JP7114724B2 (ja) 2018-09-20 2022-08-08 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
JP7260847B2 (ja) 2019-02-26 2023-04-19 株式会社リコー 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置
WO2020262270A1 (ja) 2019-06-27 2020-12-30 富士フイルム株式会社 組成物、膜および光センサ
CN114269556B (zh) 2019-08-29 2024-12-13 富士胶片株式会社 组合物、膜、近红外线截止滤波器、图案形成方法、层叠体、固体摄像元件、红外线传感器、图像显示装置、相机模块及化合物
JPWO2021039253A1 (enExample) 2019-08-30 2021-03-04
CN114727856A (zh) 2019-10-31 2022-07-08 阿莱恩技术有限公司 可结晶树脂
CN110981995B (zh) * 2019-12-27 2021-12-07 阜阳欣奕华材料科技有限公司 一种低迁移型光引发剂及其制备方法和应用
EP4130147A4 (en) 2020-03-30 2023-08-09 FUJIFILM Corporation COMPOSITION, FILM AND OPTICAL SENSOR
WO2022065006A1 (ja) 2020-09-28 2022-03-31 富士フイルム株式会社 積層体の製造方法、アンテナインパッケージの製造方法、積層体及び組成物
CN112430279A (zh) * 2020-11-23 2021-03-02 濮阳展辰新材料有限公司 一种酰化法制备大分子光引发剂的方法及其应用
EP4266094A4 (en) 2020-12-16 2024-08-28 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
EP4266093A4 (en) 2020-12-17 2024-08-28 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
TW202244147A (zh) 2021-03-19 2022-11-16 日商富士軟片股份有限公司 膜及光感測器
TW202248755A (zh) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件
WO2022210175A1 (ja) 2021-03-29 2022-10-06 富士フイルム株式会社 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット
KR102627683B1 (ko) 2021-08-31 2024-01-23 후지필름 가부시키가이샤 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액
WO2023054142A1 (ja) 2021-09-29 2023-04-06 富士フイルム株式会社 組成物、樹脂、膜および光センサ
KR20240111777A (ko) 2021-12-23 2024-07-17 후지필름 가부시키가이샤 접합체의 제조 방법, 접합체, 적층체의 제조 방법, 적층체, 디바이스의 제조 방법, 및, 디바이스, 및, 폴리이미드 함유 전구체부 형성용 조성물
JPWO2023162687A1 (enExample) 2022-02-24 2023-08-31
JPWO2023190064A1 (enExample) 2022-03-29 2023-10-05
WO2024043110A1 (ja) 2022-08-22 2024-02-29 富士フイルム株式会社 感光性組成物、膜および光センサ
CN120051506A (zh) 2022-09-30 2025-05-27 富士胶片株式会社 树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件
CN119998728A (zh) 2022-09-30 2025-05-13 富士胶片株式会社 膜的制造方法、感光性树脂组合物、固化物的制造方法，固化物及层叠体
TW202424051A (zh) 2022-09-30 2024-06-16 日商富士軟片股份有限公司 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件

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IE45626B1 (en) 1976-07-14 1982-10-20 Loctite Ltd Filled cyanoacrylate adhesive compositions
IE45111B1 (en) 1976-07-14 1982-06-30 Loctite Ltd Cyanoacrylate adhesive paste compositions
EP1086145B1 (en) * 1998-05-29 2004-05-12 Ciba SC Holding AG Photoinitiators and their applications
JP2002544205A (ja) * 1999-05-10 2002-12-24 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 新規な光開始剤及びその応用
CN1324081C (zh) * 2002-07-03 2007-07-04 宝洁公司 辐射固化性低应力弛豫弹性体材料
JP2009209275A (ja) * 2008-03-05 2009-09-17 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法
US9243083B2 (en) * 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications

Also Published As

Publication number Publication date
EP2550307A2 (en) 2013-01-30
US20130018122A1 (en) 2013-01-17
KR20130018702A (ko) 2013-02-25
EP2550307A4 (en) 2014-03-19
WO2011119272A2 (en) 2011-09-29
CN102770465B (zh) 2015-04-22
CN102770465A (zh) 2012-11-07
JP2013522445A (ja) 2013-06-13
WO2011119272A3 (en) 2012-01-05
EP2550307B1 (en) 2017-11-22
CA2786630A1 (en) 2011-09-29
JP5955832B2 (ja) 2016-07-20
CA2786630C (en) 2016-02-02
KR101437751B1 (ko) 2014-09-03
US8748503B2 (en) 2014-06-10

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