KR101437751B1 - 거대-광개시제 및 그의 경화성 조성물 - Google Patents
거대-광개시제 및 그의 경화성 조성물 Download PDFInfo
- Publication number
- KR101437751B1 KR101437751B1 KR1020127024701A KR20127024701A KR101437751B1 KR 101437751 B1 KR101437751 B1 KR 101437751B1 KR 1020127024701 A KR1020127024701 A KR 1020127024701A KR 20127024701 A KR20127024701 A KR 20127024701A KR 101437751 B1 KR101437751 B1 KR 101437751B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoinitiator
- alkyl
- group
- independently
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- KWOLFJPFCHCOCG-UHFFFAOYSA-N CC(c1ccccc1)=O Chemical compound CC(c1ccccc1)=O KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31619010P | 2010-03-22 | 2010-03-22 | |
| US61/316,190 | 2010-03-22 | ||
| PCT/US2011/025153 WO2011119272A2 (en) | 2010-03-22 | 2011-02-17 | Macro-photoinitiators and curable compositions thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130018702A KR20130018702A (ko) | 2013-02-25 |
| KR101437751B1 true KR101437751B1 (ko) | 2014-09-03 |
Family
ID=44673796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127024701A Expired - Fee Related KR101437751B1 (ko) | 2010-03-22 | 2011-02-17 | 거대-광개시제 및 그의 경화성 조성물 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8748503B2 (enExample) |
| EP (1) | EP2550307B1 (enExample) |
| JP (1) | JP5955832B2 (enExample) |
| KR (1) | KR101437751B1 (enExample) |
| CN (1) | CN102770465B (enExample) |
| CA (1) | CA2786630C (enExample) |
| ES (1) | ES2657710T3 (enExample) |
| WO (1) | WO2011119272A2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9097979B2 (en) | 2013-03-13 | 2015-08-04 | Wisconsin Alumni Research Foundation | Block copolymer-based mask structures for the growth of nanopatterned polymer brushes |
| US10340816B2 (en) * | 2014-08-29 | 2019-07-02 | Mitsubishi Electric Corporation | Semiconductor device and multiphase semiconductor device |
| US9587062B2 (en) * | 2014-12-15 | 2017-03-07 | Henkel IP & Holding GmbH and Henkel AG & Co. KGaA | Photocrosslinkable block copolymers for hot-melt adhesives |
| EP3242899A4 (en) * | 2015-01-08 | 2018-07-04 | Henkel IP & Holding GmbH | Process for preparing high molecular weight polyacrylates having narrow polydispersity indices |
| US10492888B2 (en) | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| EP4183853B1 (en) * | 2016-04-15 | 2024-10-02 | Beckman Coulter, Inc. | Photoactive macromolecules and uses thereof |
| CN109476774B (zh) * | 2016-07-11 | 2021-01-12 | 3M创新有限公司 | 使用可控自由基引发剂的聚合物材料及制备方法 |
| KR102483100B1 (ko) | 2017-09-15 | 2022-12-30 | 후지필름 가부시키가이샤 | 조성물, 막, 적층체, 적외선 투과 필터, 고체 촬상 소자 및 적외선 센서 |
| CN116640061A (zh) * | 2018-05-04 | 2023-08-25 | 阿莱恩技术有限公司 | 可聚合单体及其聚合方法 |
| JP7437320B2 (ja) | 2018-05-04 | 2024-02-22 | アライン テクノロジー, インコーポレイテッド | 高温リソグラフィーに基づく光重合プロセスへの使用の為の硬化性組成物及び其れから架橋されたポリマーを生産する方法 |
| JP7114724B2 (ja) | 2018-09-20 | 2022-08-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法 |
| JP7260847B2 (ja) | 2019-02-26 | 2023-04-19 | 株式会社リコー | 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置 |
| JP7667735B2 (ja) | 2019-06-27 | 2025-04-23 | 富士フイルム株式会社 | 組成物、膜および光センサ |
| JP7237166B2 (ja) | 2019-08-29 | 2023-03-10 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物 |
| EP4024096A4 (en) | 2019-08-30 | 2022-12-14 | FUJIFILM Corporation | COMPOSITION, FILM, OPTICAL FILTER AND METHOD OF MANUFACTURE THEREOF, SOLID STATE IMAGING ELEMENT, INFRARED SENSOR AND SENSOR MODULE |
| WO2021087061A2 (en) | 2019-10-31 | 2021-05-06 | Align Technology, Inc. | Crystallizable resins |
| CN110981995B (zh) * | 2019-12-27 | 2021-12-07 | 阜阳欣奕华材料科技有限公司 | 一种低迁移型光引发剂及其制备方法和应用 |
| WO2021199748A1 (ja) | 2020-03-30 | 2021-10-07 | 富士フイルム株式会社 | 組成物、膜及び光センサ |
| JP7477628B2 (ja) | 2020-09-28 | 2024-05-01 | 富士フイルム株式会社 | 積層体の製造方法、アンテナインパッケージの製造方法、及び積層体 |
| CN112430279A (zh) * | 2020-11-23 | 2021-03-02 | 濮阳展辰新材料有限公司 | 一种酰化法制备大分子光引发剂的方法及其应用 |
| WO2022131191A1 (ja) | 2020-12-16 | 2022-06-23 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
| EP4266093A4 (en) | 2020-12-17 | 2024-08-28 | FUJIFILM Corporation | Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor |
| WO2022196599A1 (ja) | 2021-03-19 | 2022-09-22 | 富士フイルム株式会社 | 膜および光センサ |
| TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
| WO2022210175A1 (ja) | 2021-03-29 | 2022-10-06 | 富士フイルム株式会社 | 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット |
| WO2023032545A1 (ja) | 2021-08-31 | 2023-03-09 | 富士フイルム株式会社 | 硬化物の製造方法、積層体の製造方法、及び、半導体デバイスの製造方法、並びに、処理液 |
| JPWO2023054142A1 (enExample) | 2021-09-29 | 2023-04-06 | ||
| EP4456133A4 (en) | 2021-12-23 | 2025-07-30 | Fujifilm Corp | Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part |
| KR20240129216A (ko) | 2022-02-24 | 2024-08-27 | 후지필름 가부시키가이샤 | 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스 |
| JPWO2023190064A1 (enExample) | 2022-03-29 | 2023-10-05 | ||
| WO2024043110A1 (ja) | 2022-08-22 | 2024-02-29 | 富士フイルム株式会社 | 感光性組成物、膜および光センサ |
| WO2024070963A1 (ja) | 2022-09-30 | 2024-04-04 | 富士フイルム株式会社 | 膜の製造方法、感光性樹脂組成物、硬化物の製造方法、硬化物、及び積層体 |
| TW202424051A (zh) | 2022-09-30 | 2024-06-16 | 日商富士軟片股份有限公司 | 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件 |
| TW202424049A (zh) | 2022-09-30 | 2024-06-16 | 日商富士軟片股份有限公司 | 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IE45626B1 (en) | 1976-07-14 | 1982-10-20 | Loctite Ltd | Filled cyanoacrylate adhesive compositions |
| IE45111B1 (en) | 1976-07-14 | 1982-06-30 | Loctite Ltd | Cyanoacrylate adhesive paste compositions |
| EP1517958B1 (en) * | 2002-07-03 | 2009-03-25 | The Procter & Gamble Company | Radiation curable low stress relaxation elastomeric materials |
| JP2009209275A (ja) * | 2008-03-05 | 2009-09-17 | Fujifilm Corp | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
| US9243083B2 (en) * | 2008-04-03 | 2016-01-26 | Henkel IP & Holding GmbH | Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications |
-
2011
- 2011-02-17 JP JP2013501267A patent/JP5955832B2/ja not_active Expired - Fee Related
- 2011-02-17 CN CN201180010476.8A patent/CN102770465B/zh not_active Expired - Fee Related
- 2011-02-17 EP EP11759867.2A patent/EP2550307B1/en not_active Not-in-force
- 2011-02-17 ES ES11759867.2T patent/ES2657710T3/es active Active
- 2011-02-17 CA CA2786630A patent/CA2786630C/en not_active Expired - Fee Related
- 2011-02-17 KR KR1020127024701A patent/KR101437751B1/ko not_active Expired - Fee Related
- 2011-02-17 WO PCT/US2011/025153 patent/WO2011119272A2/en not_active Ceased
-
2012
- 2012-09-21 US US13/623,982 patent/US8748503B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
| KR100698799B1 (ko) | 1999-05-10 | 2007-03-26 | 시바 스페셜티 케미칼스 홀딩 인크. | 신규한 광개시제 및 블록 공중합체 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5955832B2 (ja) | 2016-07-20 |
| ES2657710T3 (es) | 2018-03-06 |
| EP2550307A2 (en) | 2013-01-30 |
| CA2786630A1 (en) | 2011-09-29 |
| EP2550307A4 (en) | 2014-03-19 |
| WO2011119272A3 (en) | 2012-01-05 |
| CN102770465B (zh) | 2015-04-22 |
| US8748503B2 (en) | 2014-06-10 |
| CN102770465A (zh) | 2012-11-07 |
| KR20130018702A (ko) | 2013-02-25 |
| CA2786630C (en) | 2016-02-02 |
| US20130018122A1 (en) | 2013-01-17 |
| JP2013522445A (ja) | 2013-06-13 |
| WO2011119272A2 (en) | 2011-09-29 |
| EP2550307B1 (en) | 2017-11-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101437751B1 (ko) | 거대-광개시제 및 그의 경화성 조성물 | |
| JP5240798B2 (ja) | 屈折率向上剤、並びにそれを含む樹脂組成物、重合若しくは硬化性組成物及び光学材料 | |
| Temel et al. | Polymeric side chain thioxanthone photoinitiator for free radical polymerization | |
| JP7676807B2 (ja) | 重合性組成物及びそれを重合硬化してなる樹脂 | |
| Iskin et al. | Synthesis of ABC type miktoarm star copolymers by triple click chemistry | |
| EP2065408B1 (en) | Hyperbranched polymer and process for production thereof | |
| JP2013014533A (ja) | 縮合多環芳香族骨格を有するウレタン(メタ)アクリレート化合物及び連鎖移動剤並びにこれを用いたポリマー | |
| JP7545023B2 (ja) | 重合性組成物並びにそれから得られる光学材料及び色調変化材料 | |
| KR101512390B1 (ko) | 사슬 말단 부근에 수분-경화성 관능기 클러스터를 갖는 경화성 조성물 | |
| JP7521524B2 (ja) | 光学材料用重合性組成物 | |
| JP5571787B2 (ja) | 架橋フルオロポリマー網目構造 | |
| JP2021524528A (ja) | エポキシ変性アクリル樹脂、その製造方法、エネルギー硬化性のエポキシ変性アクリル樹脂含有組成物および使用 | |
| JP7234677B2 (ja) | 多官能プロパルギル化合物及びそれを含む光学用組成物 | |
| Tao et al. | Synthesis and characterization of well-defined thermo-and light-responsive diblock copolymers by atom transfer radical polymerization and click chemistry | |
| Denizkusu et al. | Structure-reactivity relationships of novel α-hydroxyketone-functionalized cyclopolymerizable and cyclopolymeric photoinitiators | |
| CN106221474A (zh) | 涂料及其制备方法 | |
| Vishwakarma et al. | L‐menthol‐based initiators for atom transfer radical polymerization of styrene | |
| JP2021038354A (ja) | 光学材料用樹脂組成物 | |
| Kati et al. | Phenacyl bromide as Norrish type I photoinitiator for the facile synthesis of chain-end functional PMMA and polystyrene | |
| JP6069645B2 (ja) | チオカーボナートとスルフィド骨格をもつメタクリル酸エステルの櫛型共重合体およびその製造方法並びにそのuv硬化物 | |
| JP5897786B2 (ja) | ポリオレフィンからの、コントロールされたフリーラジカルグラフティング | |
| JPH05505842A (ja) | ジオキソラン及び無水マレイン酸コポリマー | |
| JP6204624B2 (ja) | 過酸化物を用いた熱ラジカル重合開始剤及び熱硬化性樹脂組成物 | |
| JPH04134090A (ja) | ホスファゼン誘導体及びその重合体 | |
| US7157537B2 (en) | α-Halogenated acid esters with polyvalent alcohols as atom transfer radical polymerization initiators |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| A302 | Request for accelerated examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PA0302 | Request for accelerated examination |
St.27 status event code: A-1-2-D10-D17-exm-PA0302 St.27 status event code: A-1-2-D10-D16-exm-PA0302 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
St.27 status event code: A-3-3-R10-R13-asn-PN2301 St.27 status event code: A-3-3-R10-R11-asn-PN2301 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R11-asn-PN2301 |
|
| PN2301 | Change of applicant |
St.27 status event code: A-5-5-R10-R14-asn-PN2301 |
|
| FPAY | Annual fee payment |
Payment date: 20170818 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20200829 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20200829 |