KR101437751B1 - 거대-광개시제 및 그의 경화성 조성물 - Google Patents
거대-광개시제 및 그의 경화성 조성물 Download PDFInfo
- Publication number
- KR101437751B1 KR101437751B1 KR1020127024701A KR20127024701A KR101437751B1 KR 101437751 B1 KR101437751 B1 KR 101437751B1 KR 1020127024701 A KR1020127024701 A KR 1020127024701A KR 20127024701 A KR20127024701 A KR 20127024701A KR 101437751 B1 KR101437751 B1 KR 101437751B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoinitiator
- alkyl
- group
- independently
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- KWOLFJPFCHCOCG-UHFFFAOYSA-N CC(c1ccccc1)=O Chemical compound CC(c1ccccc1)=O KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/56—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31619010P | 2010-03-22 | 2010-03-22 | |
| US61/316,190 | 2010-03-22 | ||
| PCT/US2011/025153 WO2011119272A2 (en) | 2010-03-22 | 2011-02-17 | Macro-photoinitiators and curable compositions thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130018702A KR20130018702A (ko) | 2013-02-25 |
| KR101437751B1 true KR101437751B1 (ko) | 2014-09-03 |
Family
ID=44673796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020127024701A Expired - Fee Related KR101437751B1 (ko) | 2010-03-22 | 2011-02-17 | 거대-광개시제 및 그의 경화성 조성물 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8748503B2 (enExample) |
| EP (1) | EP2550307B1 (enExample) |
| JP (1) | JP5955832B2 (enExample) |
| KR (1) | KR101437751B1 (enExample) |
| CN (1) | CN102770465B (enExample) |
| CA (1) | CA2786630C (enExample) |
| ES (1) | ES2657710T3 (enExample) |
| WO (1) | WO2011119272A2 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9097979B2 (en) | 2013-03-13 | 2015-08-04 | Wisconsin Alumni Research Foundation | Block copolymer-based mask structures for the growth of nanopatterned polymer brushes |
| CN106663676B (zh) * | 2014-08-29 | 2019-05-28 | 三菱电机株式会社 | 半导体装置以及多相用半导体装置 |
| US9587062B2 (en) * | 2014-12-15 | 2017-03-07 | Henkel IP & Holding GmbH and Henkel AG & Co. KGaA | Photocrosslinkable block copolymers for hot-melt adhesives |
| EP3242899A4 (en) * | 2015-01-08 | 2018-07-04 | Henkel IP & Holding GmbH | Process for preparing high molecular weight polyacrylates having narrow polydispersity indices |
| US10492888B2 (en) | 2015-07-07 | 2019-12-03 | Align Technology, Inc. | Dental materials using thermoset polymers |
| ES2874129T3 (es) | 2016-04-15 | 2021-11-04 | Beckman Coulter Inc | Macromoléculas fotoactivas y usos de las mismas |
| EP3481872B1 (en) * | 2016-07-11 | 2020-04-08 | 3M Innovative Properties Company | Polymeric material and methods of making using controlled radical initiators |
| CN111095046B (zh) | 2017-09-15 | 2022-07-22 | 富士胶片株式会社 | 组合物、膜、层叠体、红外线透射滤波器、固体摄像元件及红外线传感器 |
| CA3098622A1 (en) | 2018-05-04 | 2019-11-07 | Align Technology, Inc. | Polymerizable monomers and method of polymerizing the same |
| JP7437320B2 (ja) | 2018-05-04 | 2024-02-22 | アライン テクノロジー, インコーポレイテッド | 高温リソグラフィーに基づく光重合プロセスへの使用の為の硬化性組成物及び其れから架橋されたポリマーを生産する方法 |
| JP7114724B2 (ja) | 2018-09-20 | 2022-08-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法 |
| JP7260847B2 (ja) | 2019-02-26 | 2023-04-19 | 株式会社リコー | 活性エネルギー線重合性開始剤、活性エネルギー線重合性組成物、活性エネルギー線重合性インク、インク収容容器、画像形成方法および画像形成装置 |
| WO2020262270A1 (ja) | 2019-06-27 | 2020-12-30 | 富士フイルム株式会社 | 組成物、膜および光センサ |
| CN114269556B (zh) | 2019-08-29 | 2024-12-13 | 富士胶片株式会社 | 组合物、膜、近红外线截止滤波器、图案形成方法、层叠体、固体摄像元件、红外线传感器、图像显示装置、相机模块及化合物 |
| JPWO2021039253A1 (enExample) | 2019-08-30 | 2021-03-04 | ||
| CN114727856A (zh) | 2019-10-31 | 2022-07-08 | 阿莱恩技术有限公司 | 可结晶树脂 |
| CN110981995B (zh) * | 2019-12-27 | 2021-12-07 | 阜阳欣奕华材料科技有限公司 | 一种低迁移型光引发剂及其制备方法和应用 |
| EP4130147A4 (en) | 2020-03-30 | 2023-08-09 | FUJIFILM Corporation | COMPOSITION, FILM AND OPTICAL SENSOR |
| WO2022065006A1 (ja) | 2020-09-28 | 2022-03-31 | 富士フイルム株式会社 | 積層体の製造方法、アンテナインパッケージの製造方法、積層体及び組成物 |
| CN112430279A (zh) * | 2020-11-23 | 2021-03-02 | 濮阳展辰新材料有限公司 | 一种酰化法制备大分子光引发剂的方法及其应用 |
| EP4266094A4 (en) | 2020-12-16 | 2024-08-28 | FUJIFILM Corporation | Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor |
| EP4266093A4 (en) | 2020-12-17 | 2024-08-28 | FUJIFILM Corporation | Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor |
| TW202244147A (zh) | 2021-03-19 | 2022-11-16 | 日商富士軟片股份有限公司 | 膜及光感測器 |
| TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
| WO2022210175A1 (ja) | 2021-03-29 | 2022-10-06 | 富士フイルム株式会社 | 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット |
| KR102627683B1 (ko) | 2021-08-31 | 2024-01-23 | 후지필름 가부시키가이샤 | 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액 |
| WO2023054142A1 (ja) | 2021-09-29 | 2023-04-06 | 富士フイルム株式会社 | 組成物、樹脂、膜および光センサ |
| KR20240111777A (ko) | 2021-12-23 | 2024-07-17 | 후지필름 가부시키가이샤 | 접합체의 제조 방법, 접합체, 적층체의 제조 방법, 적층체, 디바이스의 제조 방법, 및, 디바이스, 및, 폴리이미드 함유 전구체부 형성용 조성물 |
| JPWO2023162687A1 (enExample) | 2022-02-24 | 2023-08-31 | ||
| JPWO2023190064A1 (enExample) | 2022-03-29 | 2023-10-05 | ||
| WO2024043110A1 (ja) | 2022-08-22 | 2024-02-29 | 富士フイルム株式会社 | 感光性組成物、膜および光センサ |
| CN120051506A (zh) | 2022-09-30 | 2025-05-27 | 富士胶片株式会社 | 树脂组合物、固化物、层叠体、固化物的制造方法、层叠体的制造方法、半导体器件的制造方法及半导体器件 |
| CN119998728A (zh) | 2022-09-30 | 2025-05-13 | 富士胶片株式会社 | 膜的制造方法、感光性树脂组合物、固化物的制造方法,固化物及层叠体 |
| TW202424051A (zh) | 2022-09-30 | 2024-06-16 | 日商富士軟片股份有限公司 | 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IE45626B1 (en) | 1976-07-14 | 1982-10-20 | Loctite Ltd | Filled cyanoacrylate adhesive compositions |
| IE45111B1 (en) | 1976-07-14 | 1982-06-30 | Loctite Ltd | Cyanoacrylate adhesive paste compositions |
| CN1324081C (zh) * | 2002-07-03 | 2007-07-04 | 宝洁公司 | 辐射固化性低应力弛豫弹性体材料 |
| JP2009209275A (ja) * | 2008-03-05 | 2009-09-17 | Fujifilm Corp | 光硬化性コーティング組成物、オーバープリント及びその製造方法 |
| US9243083B2 (en) * | 2008-04-03 | 2016-01-26 | Henkel IP & Holding GmbH | Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications |
-
2011
- 2011-02-17 CN CN201180010476.8A patent/CN102770465B/zh not_active Expired - Fee Related
- 2011-02-17 JP JP2013501267A patent/JP5955832B2/ja not_active Expired - Fee Related
- 2011-02-17 EP EP11759867.2A patent/EP2550307B1/en not_active Not-in-force
- 2011-02-17 ES ES11759867.2T patent/ES2657710T3/es active Active
- 2011-02-17 CA CA2786630A patent/CA2786630C/en not_active Expired - Fee Related
- 2011-02-17 WO PCT/US2011/025153 patent/WO2011119272A2/en not_active Ceased
- 2011-02-17 KR KR1020127024701A patent/KR101437751B1/ko not_active Expired - Fee Related
-
2012
- 2012-09-21 US US13/623,982 patent/US8748503B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
| US6673850B1 (en) | 1999-05-10 | 2004-01-06 | Ciba Specialty Chemicals Corporation | Photoinitiators and their applications |
| KR100698799B1 (ko) | 1999-05-10 | 2007-03-26 | 시바 스페셜티 케미칼스 홀딩 인크. | 신규한 광개시제 및 블록 공중합체 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2550307A2 (en) | 2013-01-30 |
| ES2657710T3 (es) | 2018-03-06 |
| US20130018122A1 (en) | 2013-01-17 |
| KR20130018702A (ko) | 2013-02-25 |
| EP2550307A4 (en) | 2014-03-19 |
| WO2011119272A2 (en) | 2011-09-29 |
| CN102770465B (zh) | 2015-04-22 |
| CN102770465A (zh) | 2012-11-07 |
| JP2013522445A (ja) | 2013-06-13 |
| WO2011119272A3 (en) | 2012-01-05 |
| EP2550307B1 (en) | 2017-11-22 |
| CA2786630A1 (en) | 2011-09-29 |
| JP5955832B2 (ja) | 2016-07-20 |
| CA2786630C (en) | 2016-02-02 |
| US8748503B2 (en) | 2014-06-10 |
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Legal Events
| Date | Code | Title | Description |
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| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
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