ES2158704T3 - Dispositivo para el recubrimiento a vacio de cojinetes de friccion. - Google Patents
Dispositivo para el recubrimiento a vacio de cojinetes de friccion.Info
- Publication number
- ES2158704T3 ES2158704T3 ES98963374T ES98963374T ES2158704T3 ES 2158704 T3 ES2158704 T3 ES 2158704T3 ES 98963374 T ES98963374 T ES 98963374T ES 98963374 T ES98963374 T ES 98963374T ES 2158704 T3 ES2158704 T3 ES 2158704T3
- Authority
- ES
- Spain
- Prior art keywords
- coating
- several
- conveyance
- chambers
- slide bearings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
- F16C33/06—Sliding surface mainly made of metal
- F16C33/14—Special methods of manufacture; Running-in
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Sliding-Contact Bearings (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Compressor (AREA)
- Spray Control Apparatus (AREA)
Abstract
Dispositivo para el recubrimiento a vacío de cojinetes de fricción con al menos una capa intermedia y al menos una capa de fricción, que consta de una serie de cámaras de vacío, que están yuxtapuestas y que están separadas por válvulas de vacío o etapas de presión, donde al menos una cámara de vacío sirve como cámara de esclusas para la introducción de los cojinetes de fricción no recubiertos y/o para la descarga de los cojinetes de fricción recubiertos al y desde el vacío, respectivamente, donde al menos otra cámara de vacío sirve para el tratamiento previo de los cojinetes de fricción no recubiertos a través de un proceso de plasma y al menos una cámara de vacío, respectivamente, para la aplicación de la capa intermedia y de la capa de fricción, de bombas de vacío que están conectadas con las cámaras de vacío, de dispositivos de alimentación de corriente y dispositivos de control para la realización de los procesos de recubrimiento, así como de medios para el transporte de varios cojinetes de fricción sobre una cinta transportadora que se extiende a través del dispositivo, caracterizado porque los cojinetes de fricción (3) están retenidos en unión positiva en cuerpos de soporte (2), estos cuerpos de soporte (2) son atemperables, los cojinetes de fricción (3) se pueden presionar con una fuerza ajustable en los cuerpos de soporte, en la dirección de transporte están dispuestos de forma sucesiva al menos la cámara de esclusas (5), una cámara de tratamiento previo (7), una primera cámara de recubrimiento (9), una segunda cámara de recubrimiento (11) y una cámara de esclusas (19), el dispositivo de control está configurado de tal forma que los cuerpos de soporte (2) se pueden mover a una velocidad de transporte adaptable al proceso parcial que se desarrolla en cada cámara de vacío, enlacámara de tratamiento previo (7) está dispuesto un dispositivo de decapado químico (8) para el decapado estacionario con plasma, asistido por campo magnético, de los cojinetes de fricción (3), enla primera cámara de recubrimiento (9), una fuente de atomización de magnetrones (10), en la que se atomiza al menos un objetivo, está dispuesta debajo de los cojinetes de fricción a una distancia adaptada a la geometría de los cojinetes de fricción (3), en la segunda cámara de recubrimiento (11) está dispuesto un evaporador de haz de electrones con un crisol de evaporador (16) a una distancia adaptada a la geometría de los cojinetes de fricción (3), delante y detrás de la zona, en la que los cojinetes de fricción (3) son recubiertos por medio de evaporación por haz de electrones, están dispuestas zonas intermedias (12; 18).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19753656A DE19753656C1 (de) | 1997-12-03 | 1997-12-03 | Einrichtung zur Vakuumbeschichtung von Gleitlagern |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2158704T3 true ES2158704T3 (es) | 2001-09-01 |
Family
ID=7850630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES98963374T Expired - Lifetime ES2158704T3 (es) | 1997-12-03 | 1998-11-19 | Dispositivo para el recubrimiento a vacio de cojinetes de friccion. |
Country Status (16)
Country | Link |
---|---|
US (1) | US6444086B1 (es) |
EP (1) | EP1036212B1 (es) |
JP (1) | JP2001525490A (es) |
KR (1) | KR100532031B1 (es) |
CN (1) | CN1177950C (es) |
AT (2) | ATE202160T1 (es) |
BR (1) | BR9814771A (es) |
CZ (1) | CZ293929B6 (es) |
DE (2) | DE19753656C1 (es) |
ES (1) | ES2158704T3 (es) |
PL (1) | PL187394B1 (es) |
PT (1) | PT1036212E (es) |
RU (1) | RU2221080C2 (es) |
SK (1) | SK285253B6 (es) |
TR (1) | TR200001348T2 (es) |
WO (1) | WO1999028523A1 (es) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10065709B4 (de) * | 2000-12-29 | 2005-10-27 | Sturm Jun., Wilhelm | Beschichtungsanlage |
DE10205168A1 (de) * | 2002-02-07 | 2003-08-21 | Ardenne Anlagentech Gmbh | Verfahren zur Zwischenbehandlung von Substraten in einer In-Line-Vakuumbeschichtungsanlage |
DE10324570A1 (de) * | 2003-05-30 | 2004-12-23 | Daimlerchrysler Ag | Vorrichtung und Verfahren zur Oberflächenbehandlung einer metallischen Laufbahn einer Maschine mittels Plasmatechnologie |
CN1304628C (zh) * | 2004-08-31 | 2007-03-14 | 成建波 | 真空线源蒸发镀膜方法及其装置 |
WO2006100968A1 (ja) | 2005-03-18 | 2006-09-28 | Ulvac, Inc. | 成膜方法及び成膜装置並びに永久磁石及び永久磁石の製造方法 |
AT501722B1 (de) | 2005-07-12 | 2006-11-15 | Miba Gleitlager Gmbh | Beschichtungsverfahren |
CN100595320C (zh) * | 2005-11-16 | 2010-03-24 | 比亚迪股份有限公司 | 一种真空镀膜方法和系统 |
CN1970828B (zh) * | 2005-11-26 | 2010-05-26 | 鸿富锦精密工业(深圳)有限公司 | 在模具上形成多层镀膜的方法 |
CN101144149B (zh) * | 2006-09-11 | 2010-12-22 | 柏腾科技股份有限公司 | 无时间延迟的连续式真空制程设备及真空加工方法 |
JP5069956B2 (ja) * | 2007-06-25 | 2012-11-07 | 株式会社神戸製鋼所 | 成膜装置 |
DE102007049669A1 (de) * | 2007-10-17 | 2009-04-23 | Sms Demag Ag | Schleusenvorrichtung und Verfahren zum Öffnen der Schleusenvorrichtung |
CN101608301B (zh) * | 2009-06-24 | 2011-12-07 | 江苏常松机械集团有限公司 | 连续真空等离子蒸发金属复合材料生产线 |
JP5244723B2 (ja) * | 2009-07-10 | 2013-07-24 | 株式会社日立ハイテクノロジーズ | 成膜装置 |
CN102703867A (zh) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | 电子轰击镀膜机 |
CN103866255B (zh) * | 2014-03-10 | 2016-04-27 | 江西沃格光电股份有限公司 | 磁控溅射镀膜系统 |
US10371244B2 (en) | 2015-04-09 | 2019-08-06 | United Technologies Corporation | Additive manufactured gear for a geared architecture gas turbine engine |
TWM557347U (zh) * | 2017-07-21 | 2018-03-21 | Guay Guay Trading Co Ltd | 彈匣氣體加熱結構 |
CN117966103B (zh) * | 2024-02-04 | 2024-06-18 | 浙江晟霖益嘉科技有限公司 | 一种蒸发真空设备生产线 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4072985A (en) * | 1977-05-04 | 1978-02-07 | Rca Corporation | Video disc with a dielectric layer formed from styrene and nitrogen |
JPH06105742B2 (ja) * | 1983-11-28 | 1994-12-21 | 株式会社日立製作所 | 真空処理方法及び装置 |
JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
JPS61105853A (ja) * | 1984-10-30 | 1986-05-23 | Anelva Corp | オ−トロ−ダ− |
JPS61106768A (ja) * | 1984-10-31 | 1986-05-24 | Anelva Corp | 基体処理装置 |
DE3606529A1 (de) | 1986-02-28 | 1987-09-03 | Glyco Metall Werke | Verfahren zur herstellung von schichtwerkstoff oder schichtwerkstuecken durch aufdampfen mindestens eines metallischen werkstoffes auf ein metallisches substrat |
DE3717712A1 (de) * | 1987-05-26 | 1988-12-15 | Leybold Ag | Vorrichtung zur halterung von werkstuecken |
US4904362A (en) | 1987-07-24 | 1990-02-27 | Miba Gleitlager Aktiengesellschaft | Bar-shaped magnetron or sputter cathode arrangement |
AT392291B (de) * | 1987-09-01 | 1991-02-25 | Miba Gleitlager Ag | Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens |
US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
JPH07110991B2 (ja) * | 1989-10-02 | 1995-11-29 | 株式会社日立製作所 | プラズマ処理装置およびプラズマ処理方法 |
SU1751506A1 (ru) * | 1990-04-04 | 1992-07-30 | Харьковский авиационный институт им.Н.Е.Жуковского | Узел трени скольжени |
US5236509A (en) * | 1992-02-06 | 1993-08-17 | Spire Corporation | Modular ibad apparatus for continuous coating |
JP3654597B2 (ja) * | 1993-07-15 | 2005-06-02 | 株式会社ルネサステクノロジ | 製造システムおよび製造方法 |
US5377816A (en) * | 1993-07-15 | 1995-01-03 | Materials Research Corp. | Spiral magnetic linear translating mechanism |
JP3732250B2 (ja) * | 1995-03-30 | 2006-01-05 | キヤノンアネルバ株式会社 | インライン式成膜装置 |
DE19514836C2 (de) * | 1995-04-21 | 2000-06-08 | Fraunhofer Ges Forschung | Lagerschale |
US5958134A (en) * | 1995-06-07 | 1999-09-28 | Tokyo Electron Limited | Process equipment with simultaneous or sequential deposition and etching capabilities |
DE19537092C1 (de) * | 1995-10-05 | 1996-07-11 | Ardenne Anlagentech Gmbh | Elektronenstrahl-Bedampfungsanlage im Durchlaufbetrieb für thermisch hoch belastete Substrate |
-
1997
- 1997-12-03 DE DE19753656A patent/DE19753656C1/de not_active Expired - Fee Related
-
1998
- 1998-11-19 DE DE59800874T patent/DE59800874D1/de not_active Expired - Lifetime
- 1998-11-19 ES ES98963374T patent/ES2158704T3/es not_active Expired - Lifetime
- 1998-11-19 CZ CZ20001932A patent/CZ293929B6/cs not_active IP Right Cessation
- 1998-11-19 BR BR9814771-4A patent/BR9814771A/pt not_active IP Right Cessation
- 1998-11-19 CN CNB988113120A patent/CN1177950C/zh not_active Expired - Fee Related
- 1998-11-19 US US09/555,905 patent/US6444086B1/en not_active Expired - Fee Related
- 1998-11-19 TR TR2000/01348T patent/TR200001348T2/xx unknown
- 1998-11-19 AT AT98963374T patent/ATE202160T1/de not_active IP Right Cessation
- 1998-11-19 PL PL98340722A patent/PL187394B1/pl not_active IP Right Cessation
- 1998-11-19 JP JP2000523393A patent/JP2001525490A/ja active Pending
- 1998-11-19 SK SK830-2000A patent/SK285253B6/sk unknown
- 1998-11-19 RU RU2000117466/02A patent/RU2221080C2/ru not_active IP Right Cessation
- 1998-11-19 PT PT81101988T patent/PT1036212E/pt unknown
- 1998-11-19 WO PCT/DE1998/003455 patent/WO1999028523A1/de active IP Right Grant
- 1998-11-19 EP EP98963374A patent/EP1036212B1/de not_active Expired - Lifetime
- 1998-11-19 AT AT0912298A patent/AT407995B/de not_active IP Right Cessation
- 1998-11-19 KR KR10-2000-7005948A patent/KR100532031B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1177950C (zh) | 2004-12-01 |
JP2001525490A (ja) | 2001-12-11 |
RU2221080C2 (ru) | 2004-01-10 |
CZ293929B6 (cs) | 2004-08-18 |
DE59800874D1 (de) | 2001-07-19 |
ATA912298A (de) | 2000-12-15 |
SK8302000A3 (en) | 2001-01-18 |
AT407995B (de) | 2001-07-25 |
EP1036212A1 (de) | 2000-09-20 |
KR20010032666A (ko) | 2001-04-25 |
PT1036212E (pt) | 2001-11-30 |
KR100532031B1 (ko) | 2005-11-29 |
SK285253B6 (sk) | 2006-09-07 |
DE19753656C1 (de) | 1998-12-03 |
TR200001348T2 (tr) | 2000-11-21 |
ATE202160T1 (de) | 2001-06-15 |
WO1999028523A1 (de) | 1999-06-10 |
US6444086B1 (en) | 2002-09-03 |
BR9814771A (pt) | 2000-10-03 |
PL340722A1 (en) | 2001-02-26 |
CN1279728A (zh) | 2001-01-10 |
CZ20001932A3 (cs) | 2000-09-13 |
EP1036212B1 (de) | 2001-06-13 |
PL187394B1 (pl) | 2004-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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