EP2014412A1 - Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication - Google Patents

Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication Download PDF

Info

Publication number
EP2014412A1
EP2014412A1 EP08010088A EP08010088A EP2014412A1 EP 2014412 A1 EP2014412 A1 EP 2014412A1 EP 08010088 A EP08010088 A EP 08010088A EP 08010088 A EP08010088 A EP 08010088A EP 2014412 A1 EP2014412 A1 EP 2014412A1
Authority
EP
European Patent Office
Prior art keywords
intermediate layer
polishing
base body
carrier
polishing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP08010088A
Other languages
German (de)
English (en)
Other versions
EP2014412B1 (fr
Inventor
Peter Philipps
Lothar Urban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Satisloh AG
Original Assignee
Satisloh AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Satisloh AG filed Critical Satisloh AG
Publication of EP2014412A1 publication Critical patent/EP2014412A1/fr
Application granted granted Critical
Publication of EP2014412B1 publication Critical patent/EP2014412B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/02Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor by means of tools with abrading surfaces corresponding in shape with the lenses to be made
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B24D13/147Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062Prior to assembly
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062Prior to assembly
    • Y10T156/1064Partial cutting [e.g., grooving or incising]

Definitions

  • the present invention relates to a polishing plate for a tool for fine machining of optically active surfaces, according to the preamble of claims 1 and 3.
  • Such polishing plates are used in particular in the production of prescription eyeglass lenses in bulk.
  • the invention relates to a method for producing such a polishing plate.
  • the machining of the optically effective surfaces of spectacle lenses can be roughly subdivided into two processing phases, namely first the pre-processing of the optically effective surface to produce the recipe macrogeometry and then the fine processing of the optically effective surface to eliminate Vorbearbeitungsspuren and obtain the desired microgeometry. While the preprocessing of the optically effective surfaces of spectacle lenses takes place, inter alia, as a function of the material of the spectacle lenses by grinding, milling and / or turning, the optically effective surfaces of spectacle lenses become during fine machining usually subjected to a fine grinding, lapping and / or polishing process.
  • the polishing film can be adapted within certain limits to the geometry of the surface to be machined, both from “spectacle” to spectacle glass, which is to be processed, as well as in “dynamic” terms, ie during the processing of a specific spectacle lens, in which a relative movement between the polishing plate and the spectacle lens takes place.
  • the elasticity of the foam layer significantly influences the removal behavior of the polishing plate during the polishing process.
  • EP-B-1 711 311 a polishing plate with three-layer or -lagigem structure in which the middle, elastic layer in the radial direction from the inside to the outside is increasingly softened to polish lenses with irregularly curved freeform surfaces in a surface quality that should make post-processing unnecessary.
  • This outwardly increasingly softer formation is achieved in particular by the fact that the middle layer in the radial direction, ie from the inside to the outside has an increasing axial thickness, wherein the carrier body, the middle layer and the polishing foil ends together on a cylindrical outer peripheral surface of the polishing plate.
  • unwanted "marks" of the polishing plate on the machined surface produced by the edge of the polishing film are not addressed in this prior art.
  • the invention is based on the object, starting from the prior art, as he by the DE-A-10 2005 010 583 is represented to create a simple as possible polishing plate for a tool for fine machining of optically effective surfaces of particular eyeglass lenses, the edge of which does not reflect on the machined surface in the form of microstructures.
  • the invention also includes the provision of a method for the simple production of such a polishing plate.
  • a polishing plate for a tool for fine machining of optically active surfaces on particular eyeglass lenses which has a central axis base body to which a softer relative to the base body intermediate layer is fixed, which rests a polishing agent, the intermediate layer relative to the central axis, a radially inner region of substantially constant axial thickness and an adjoining radially outer region whose radial outer dimensions increase starting from the main body to the polish carrier, so that the elastic support of the polish carrier by means of the intermediate layer in its radially outer region decreases towards the outer edge of the polish carrier.
  • a second aspect of the invention comprises in a polishing plate for a tool for fine machining of optically active surfaces on in particular spectacle lenses having a central axis having base body to which a softer relative to the base body intermediate layer is fixed, which rests a polishing agent, the intermediate layer with respect to the central axis, a radially inner region of substantially constant axial thickness and an adjoining radially outer region, wherein the outer edge of the polishing medium carrier is held spaced apart from the latter by means of the radially outer region of the intermediate layer during the finishing of the optically effective surface.
  • the intermediate layer is thus functionally divided in the radially inner region of substantially constant axial thickness and an adjoining, radially outer region, which has the task to prevent the edge of the polishing plate on the machined surface in the form of microstructures.
  • the inner region has a substantially constant axial thickness, the elasticity or resilience of the polishing plate does not change seen here over the radius, in contrast to the prior art according to FIG EP-B-1 711 311 , This results in a suitable relative movement between the tool and the workpiece advantageously a uniform polishing removal achieved - Preston's hypothesis: the polishing removal is proportional to the product of polishing pressure and relative speed between the tool and workpiece - so that the workpiece with high topographical fidelity, that can be polished shape preserving.
  • the polishing removal decreases due to decreasing elastic support of the polishing medium carrier (claim 1) or a "keep away” of the same from the machined surface (claim 3) and thus the Possibility that the edge of the polishing plate on the machined surface "imprint" or can depict.
  • the edge region of the polishing plate in which the radially outer region of the intermediate layer, the latter provides in the first inventive variant of the polishing plate (claim 1) also ensures that over the radially inner region of the intermediate layer radially outwardly projecting outer edge of the polish carrier at his Movements is damped in the fine machining of the optically active surface therefore not swing freely or flutter and thus can not hit the machined surface so that it is reflected there.
  • the radially outer region of the intermediate layer even "pulls" the outer edge of the polishing agent carrier projecting radially outward beyond the radially inner region of the intermediate layer away from the machined surface in order to avoid said "impressions".
  • the circumferential contour formed by the radially outer region of the intermediate layer may in principle have any desired geometry as long as the radial outer dimensions of the radially outer region of the intermediate layer increase from the main body towards the polishing medium carrier (preferably continuously), e.g.
  • the radially outer portion of the intermediate layer may have a toroidal outer peripheral surface.
  • the intermediate layer may have a circumferential chamfer or edge rounding in the radially outer region on the side facing the polish carrier, wherein the polish carrier is also fixed, preferably glued, in the region of the chamfer or edge rounding to the intermediate layer.
  • a circumferential chamfer or edge rounding can be formed, to which the intermediate layer is fastened, preferably glued, to its radially outer region.
  • Such chamfers or edge rounding on the intermediate layer and / or the base body can be formed in a simple manner, for example by water jet cutting in the case of an existing intermediate layer of a foam or by suitable design of the injection mold in the case of an injection molded from a plastic body.
  • the main body it is possible for the main body to have an end face facing the intermediate layer, which is preformed toroidally in accordance with the macrogeometry of the surface to be machined, such as in FIG DE-A-10 2005 010 583 described. Investigations by the applicant have shown, however, that it is sufficient for the majority of processing cases when the base body has an intermediate layer facing, substantially spherical end face to which the intermediate layer is glued. On the one hand, this simplifies the polishing plate production and, on the other hand, reduces the number of polishing plates to be provided in the production of prescriptions for the fine processing of the spectacle lenses.
  • the polishing agent carrier can be provided in a middle region with at least one opening.
  • This opening in the polish carrier provides fluid communication between an interior region of the foam usually comprised of a sponge-like liquid pad soaked with liquid polish and the outer surface of the polish carrier in machining engagement with the workpiece surface to be machined.
  • the liquid polishing agent can circulate better and also pass from the interior of the polishing pad to the engagement areas between the polishing medium carrier and the surface of the workpiece to be machined, whereby at these engagement areas due to increased wetting of the polishing medium carrier or a more uniform polishing agent film on this better rinsing and Cooling is ensured.
  • the opening in the Polierstoff may not come to partial, the surface quality produced detrimental solidification of the polish carrier.
  • the opening in the Polierstoff may advantageous for a relief of the resulting by deformation of the intermediate layer in this hydraulic pressure, which could otherwise lead to about a partial destruction of the intermediate layer, as well as for an "internal cooling" of the polishing plate.
  • a recess in the intermediate layer adjoins the at least one opening in the polishing agent carrier in the direction of the base body.
  • a recess can advantageously serve as a reservoir for the liquid polishing agent.
  • a recess is provided in the intermediate layer, it may extend as far as the main body.
  • Such a continuous recess is not only particularly easy to produce, but also advantageously maximizes the uptake volume of the reservoir formed by the recess for the liquid polishing agent.
  • An even further enlargement of the polishing agent reservoir is possible by also adjoining the recess in the intermediate layer, a recess in the body.
  • the diameter of the recess in the intermediate layer increases (preferably continuously) starting from the opening in the polishing agent carrier toward the main body, for example by delimiting the recess by a conical inner circumferential surface of the intermediate layer. This causes - similar to the starting from the body to the polish carrier toward increasing radial outer dimensions of the radially outer region of the intermediate layer - a close to the opening in the polish carrier in the direction of the opening decreasing elastic support of the polish carrier through the radially inner region of the intermediate layer, even at higher polishing pressures Danger to meet that the opening edge of the polish carrier is reflected on the machined surface.
  • the maximum radial width of the radially outer region of the intermediate layer in the undeformed state of the polishing plate should be between 3 and 10% of the maximum total width of the intermediate layer in order to support the polishing agent carrier substantially constantly elastically on a surface as large as possible without that there is a risk of pictures of the polishing plate edge on the machined surface.
  • the polishing plates according to the invention can advantageously be used on a tool for fine machining of optically effective surfaces on, in particular, spectacle lenses, comprising a base body which can be attached to a tool spindle of a processing machine, a joint part which has a tilting and longitudinally movably guided receiving piece with respect to the base body, to which a bellows connects in the direction of the main body, by means of which the joint part is fastened to the main body so as to be capable of rotation, and a pressure medium chamber bounded by the main body and the joint part, which can be acted upon optionally with a (liquid or gaseous) pressure medium, whereby the polishing plate interchangeably the receiving piece of the joint part is held.
  • polishing plate is held by means of a snap connection on the receiving piece of the joint part.
  • the cutting of the polish carrier can be done by means of the punch and the counter punch for punching the intermediate layer, so that this no separate tool must be used and the cutting can be done quickly.
  • the punching of the intermediate layer and the cutting of the polish carrier can also take place in a joint step, even if these are separate raw materials. This too is conducive to a fast, dimensionally stable production of the polishing plate.
  • Fig. 1 . 5 . 6 and 9 to 12 has a polishing plate 10 for a tool 12 for fine machining of optically active surfaces F to particular lenses L a central axis M having base body 14 to which a softer relative to the base body 14 intermediate layer 16 is fixed, which rests a polishing agent carrier 18. It is essential that the intermediate layer 16 with respect to the central axis M has a radially inner region 20 of substantially constant axial thickness D and an adjoining, radially outer region 22, which, as will be described in more detail below, in a special way and manner, to prevent the edge of the polishing pad 10 on the machined surface F of the lens L in the form of very fine, scratch-like microstructures.
  • dashed lines indicate the boundary between the radially inner region 20 and the radially outer region 22 of the intermediate layer 16.
  • the tool 12 has a base body 24, which at an in Fig. 1 indicated by dashed lines tool spindle 26 of a processing machine (not shown) is attachable. Further, the tool 12 has a generally numbered with 28 joint part having a respect to the base body 24 by means of a ball joint 30 and a guide member 32 tilt and longitudinally movably guided receiving piece 34 on which the polishing plate 10 is held interchangeable in a manner to be described. At the receiving piece 34 is followed in the direction of the base body 24 to a bellows 36, by means of which the hinge part 28 is rotatably mounted on the base body 24.
  • the main body 24 and the joint part 28 delimit a pressure medium chamber 38, which can be acted upon via a channel 40 in the guide member 32 selectively with a suitable liquid or gaseous pressure medium (eg oil or compressed air) to during the processing of the optically active surface F on the lens L.
  • a suitable liquid or gaseous pressure medium eg oil or compressed air
  • Further details on the structure of the tool 12 are the publications DE-A-10 2005 010 583 A1 and EP-A-1 473 116 the applicant, to which reference is expressly made in this regard to avoid repetition at this point.
  • the receiving piece 34 of the joint part 28 is supported by means of the guide member 32 in the transverse direction relative to the base body 24 of the tool 12.
  • the guide member 32 follow the receiving piece 34 in the axial direction and vice versa, when the pressure medium chamber 38 is acted upon via the channel 40 with the pressure medium or the receiving piece 34 by external action (from above in Fig. 1 ) is pressed in the direction of the base body 24.
  • the receiving piece 34 of the joint part 28 can tilt due to the ball joint 30 to the guide member 32 on the guide member 32, wherein the bellows 36 of the joint part 28 is deformed accordingly.
  • a substantially mushroom-shaped retaining projection 48 is provided on the end face 42 of the receiving piece 34, which forms an undercut 50.
  • the receiving piece 34 is provided at its end face 42 with a total of four substantially cylindrical Orientiervorsprüngen 52 which are arranged in pairs on opposite sides of the rotary driving projection 46 and 90 ° with respect to the retaining projections 48 angularly offset about the central axis M.
  • injection molded base body 14 of the polishing plate 10 is formed honeycomb-like on its underside 44 with a centrally disposed counter-profile 54 for the rotary driving projection 46 on the tool 12, of which star-shaped reinforcing ribs 56 extend to the outer edge of the base body 14, and arranged on opposite sides of the counter profile 54 between the reinforcing ribs 56, substantially hollow cylindrical holding portions 58 which cooperate with the retaining projections 48 on the tool 12 to the polishing plate 10 in the manner of a snap connection on Holding piece 34 of the joint part 28.
  • a plastic such as an ABS (A crylnitril- B utadien- S styrene-polymer), about Terluran® GP 35 from BASF
  • the holding portions 58 are seen in a plan view ( Fig. 4 ) is slotted cross-shaped for the formation of four spring arms 60, each spring arm 60 carries at its free end with respect to an axis of symmetry of the respective holding portion 58 radially inwardly directed detent 62 (in Fig. 3 indicated), which is dimensioned and arranged so that it is able to lock with the undercut 50 on each associated retaining projection 48 of the tool 12.
  • a reinforcing web 56 extends between a pair of orientation projections 52, namely those reinforcing webs 56 that are in relation to the holding sections 58 of FIG Base body 14 are arranged angularly offset by 90 ° about the central axis M.
  • annular collar 66 serves as a handle for a gripper (not shown) of an automatic polishing plate changing device (also not shown).
  • end face 68 of the base body 14 is preformed substantially spherical in the illustrated embodiments and bulges virtually the intermediate layer 16 against.
  • the end face 68 may also be shaped differently, eg toroidally, in accordance with the macrogeometry of the surface F to be machined.
  • the annular collar 66 according to the 3 and 4 Outside circumference with two seen in a plan view semicircular recesses 70 is provided. These serve to mark the polishing plate 10, in such a way that the in Fig. 4 with 72 numbered angular distance of the recesses 70 encoded about the central axis M represents a measure of the curvature (in diopters) of the end face 68.
  • the intermediate layer 16 is firmly fixed, for example by means of a suitable adhesive.
  • the material of the intermediate layer 16 may be, for example, an open-celled PU (polyurethane) foam, as it is available, for example, under the trade name Sylomer® R from Getzner Maschinentechnik GmbH, Berlin, Germany.
  • the polisher carrier 18 facing top of the intermediate layer 16 may, but need not be provided with a final, manufacturing technology-related "casting" (release layer to the mold, not shown), the intermediate layer 16 an additional Stiffness gives; if necessary, such a "casting skin” can even form the polish carrier itself.
  • the thickness D of the intermediate layer 16 in its radially inner region 20 may correspond to the respective processing requirements, for example between 2 and 10 mm. As already mentioned, this thickness D in the radially inner region 20 of the intermediate layer 16 is substantially constant, so that the elastic support of the polishing medium carrier 18 by means of the intermediate layer 16 in this region 20 is also substantially constant.
  • the radial outer dimensions r of the radially outer region 22 of the intermediate layer 16 increase continuously from the main body 14 towards the polish carrier 18 - namely such that the radially outer region 22 of the intermediate layer 16 has a substantially frusto-conical outer circumferential surface 74 whose inclination with respect to the central axis M is greater than the inclination of any surface normal on the end face 68 of the base body 14 with respect to the central axis M - so that the elastic support of the polishing medium carrier 18 by means of the intermediate layer 16 in the radially outer region 22 to the outer edge 76 of the polishing medium carrier 18 decreases continuously ,
  • This causes - as already mentioned - causes the polishing pressure and thus the polishing removal in the edge region of the polishing pad 10 decreases and at the same time the outer edge 76 of the polish carrier 18 - compared to a free, unsupported outer edge of the polish carrier, as he from DE-A-10 2005 010 583 is known - is attenuated
  • the transition between the outer peripheral surface 64 of the base body 14 and the outer peripheral surface 74 of the intermediate layer 16 does not necessarily have to be infinitely variable.
  • the base body over the intermediate layer can protrude radially outward, such as in the DE-A-10 2005 010 583 disclosed.
  • polish carrier 18 also called “polishing film” or “polishing pad”, according to Fig. 1 forming the active machining tool component is a commercially available, flexible and abrasion-resistant fine grinding or polishing agent carrier, such as a polyurethane (P oly ur ethane) film having a thickness of 0.5 to 1.4 mm and a Hardness between 12 and 45 after Shore D.
  • polishing agent carrier 18 is rather thicker if, by means of the polishing plate 10, a pre-polishing is to take place, but rather thinner in the case of a fine polishing.
  • the radial dimensions of the polishing medium carrier 18 are selected so that in a plan view from above in the Fig. 1 and 5 seen in this embodiment, circular polish carrier 18 ends with its outer edge 76 on the outer peripheral surface 74 of the underlying intermediate layer 16.
  • the polishing agent carrier 18 is secured in the illustrated embodiment by means of a suitable adhesive to the intermediate layer 16.
  • the polish carrier 18 may be otherwise more or less permanently bonded to the intermediate layer 16, e.g. by vulcanization or Aufkletten.
  • the connection between the polish carrier 18 and the intermediate layer 16 must be so strong that a movement entrainment, in particular rotational drive of the polish carrier 18 is ensured with the intermediate layer 16 at any time during processing.
  • the polishing medium carrier 18 is additionally provided in a central region with (at least) one through opening 92, which in the case shown has a circular shape and can be formed, for example, by cutting or punching.
  • the opening 92 in the polishing medium carrier 18 occupies a surface area of 0.25 to 2% of the total area of the polishing medium carrier 18 facing the surface F of the lens L to be processed.
  • the opening 92 provides pressure equalization during processing and provides liquid polishing agent from within the intermediate layer 16, thereby providing better rinsing and cooling of otherwise deprived areas of the polishing platen 10.
  • Such a "central" supply of polishing agent is particularly advantageous when the polishing plate 10 rotates at a relatively high speed and thus the acting centrifugal forces are anxious to "drive" the polishing agent radially outward.
  • Fig. 9 illustrated embodiment joins the opening 92 in the polishing medium carrier 18 in the direction of the base body 14 a recess 94 in the intermediate layer 16, which extends to the base body 14 back. Also in the base body 14 is followed by the recess 94 in the intermediate layer 16 steplessly a recess 96 at.
  • the recesses 94 and 96 in the intermediate layer 16 and in the main body 14 serve during processing as (extended) reservoir for the liquid polishing agent.
  • the recess 96 in the base body 14 is cylindrical, the diameter d of the recess 94 in the intermediate layer 16, starting from the opening 92 in the polish carrier 18 to the main body 14 toward continuously increases.
  • Such a shape of the recess 94 can be made analogous to the substantially frusto-conical outer peripheral surface 74 of the intermediate layer 16 by punching, wherein a suitable Naturally, a punching device would have a smaller-diameter annular cutting edge on the punching tool and expediently a greater curvature on the counter-punching surface than in FIG Fig. 7 shown.
  • the recess 94 in the intermediate layer 16 outwardly bounding inner peripheral surface of the intermediate layer 16 has basically the same effect as the substantially frusto-conical outer peripheral surface of the intermediate layer 16, namely, it causes the elastic support of the polishing medium carrier 18 through the radially inner region 20 of the intermediate layer 16 near the opening 92 in the polishing medium carrier 18 decreases in the direction of the opening 92 to ensure that even at higher polishing pressures that the edge of the opening 92 in the polishing medium carrier 18 does not image on the machined surface F.
  • Such central openings 92 and recesses 94, 96 can also in the other embodiments according to the 10 to 12 be used.
  • the Fig. 12 further illustrates how a - the third embodiment according to Fig. 10 basically similar, but ultimately a "smoother" transition between the radially inner portion 20 and the radially outer portion 22 of the intermediate layer 16 creating - circumferential edge rounding 102 on the polishing medium carrier 18 facing side of the intermediate layer 16 on the finished polishing plate 10 ( Fig. 12 below) by a circumferential chamfer 104 on the side facing away from the polish carrier 18 side of not yet secured to the base 14 intermediate layer 16 (FIG. Fig. 12 above) is formed.
  • edge rounding 102 on the intermediate layer 16 followed by the polish carrier 18 on the finished polishing pad 10 in the mold will not be formed until the chamfer 104 is planarized at the intermediate layer 16, deforming it Main body 14 is glued.
  • Corresponding measures can also be made in the region of the recess 94 in the intermediate layer 16 (second embodiment according to FIG Fig.
  • the recess 94 delimiting inner peripheral surface of the intermediate layer 16 may also have a different basic shape, for example, be cylindrical.
  • the intermediate layer has, relative to the central axis, a radially inner region of substantially constant axial thickness and an adjoining, radially outer region.
  • the latter is formed in a special way or attached to the main body, to prevent the edge of the polishing plate on the machined surface of the workpiece in the form of very fine, scratch-like microstructures is formed.
  • a simple method is proposed, by means of which such a polishing plate can be produced.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
EP08010088A 2007-06-06 2008-06-03 Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication Active EP2014412B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007026841A DE102007026841A1 (de) 2007-06-06 2007-06-06 Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern und Verfahren für dessen Herstellung

Publications (2)

Publication Number Publication Date
EP2014412A1 true EP2014412A1 (fr) 2009-01-14
EP2014412B1 EP2014412B1 (fr) 2010-11-10

Family

ID=39639105

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08010088A Active EP2014412B1 (fr) 2007-06-06 2008-06-03 Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication

Country Status (7)

Country Link
US (1) US8246424B2 (fr)
EP (1) EP2014412B1 (fr)
CN (1) CN101318304B (fr)
AT (1) ATE487563T1 (fr)
BR (1) BRPI0801761B1 (fr)
DE (2) DE102007026841A1 (fr)
ES (1) ES2355170T3 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011018212A1 (fr) 2009-08-12 2011-02-17 Satisloh Ag Polissoir pour la finition de surfaces optiquement actives en particulier de verres de lunettes
EP2298498A2 (fr) 2009-09-16 2011-03-23 Satisloh AG Dispositif de traitement précis de surfaces à effet optique, notamment sur des verres de lunettes
EP2308644A2 (fr) 2009-10-08 2011-04-13 Satisloh AG Dispositif de traitement précis de surfaces optiquement actif sur des pièces usinées, en particulier sur des lentilles ophtalmiques
DE102011014230A1 (de) 2011-03-17 2012-09-20 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
DE102014015052A1 (de) 2014-10-15 2016-04-21 Satisloh Ag Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an Brillengläsern
WO2017178110A1 (fr) 2016-04-13 2017-10-19 Satisloh Ag Broche d'outil pour un dispositif de finition de surfaces optiquement actives sur des pièces
DE102017120333A1 (de) * 2017-09-05 2019-03-07 Schaeffler Technologies AG & Co. KG Werkstückspindel für eine Schleifmaschine

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202008016454U1 (de) 2008-06-17 2009-03-05 Satisloh Gmbh Werkzeug zum Polieren und Feinschleifen von optisch wirksamen Flächen in der Feinoptik
DE102008062097A1 (de) * 2008-12-16 2010-06-17 Schneider Gmbh & Co. Kg Polierkopf zum zonalen Bearbeiten von optischen Brillenflächen
DE202009000790U1 (de) * 2009-01-20 2009-03-26 Schneider Gmbh & Co. Kg Polierkopf und Werkzeugwechselarm für einen Polierkopf
DE102012103743A1 (de) 2012-04-27 2013-10-31 Schneider Gmbh & Co. Kg Polierfolie für Kunststoff-Brillengläser
TWI584914B (zh) * 2013-07-22 2017-06-01 佳能股份有限公司 元件製造方法及拋光裝置
DE102013220973A1 (de) * 2013-10-16 2015-04-16 Carl Zeiss Vision International Gmbh Werkzeug zur Polierbearbeitung von optischen Flächen
WO2015079134A1 (fr) * 2013-11-27 2015-06-04 Essilor International (Compagnie Generale D'optique) Support de blocage pneumatique d'une lentille optique
DE102014206424A1 (de) 2014-04-03 2015-10-08 Carl Zeiss Vision International Gmbh Polierwerkzeug sowie Vorrichtung und Verfahren zur formfehleroptimierten Polierbearbeitung von Brillenlinsenoberflächen und Gießformschalen zur Brillenlinsenherstellung
JP6378626B2 (ja) * 2014-12-17 2018-08-22 オリンパス株式会社 光学素子の加工用工具および光学素子の製造方法
DE102015115078A1 (de) 2015-06-15 2016-12-15 Opto Tech Optikmaschinen Gmbh Poliervorrichtung zum Polieren konkaver Linsenflächen von optischen Linsen und Verfahren zu deren Betrieb
EP3106262B8 (fr) 2015-06-15 2018-04-04 OptoTech Optikmaschinen GmbH Dispositif de polissage destine a polir des surfaces concaves de lentilles optiques et son procede de fonctionnement
USD836348S1 (en) * 2015-12-15 2018-12-25 Knetik, Lda Ophthalmic lens polishing base
CN107363726B (zh) * 2017-09-01 2019-04-19 天津津航技术物理研究所 一种对大口径光学零件进行弹性装卡的方法
JP2019123053A (ja) * 2018-01-18 2019-07-25 三菱重工コンプレッサ株式会社 狭隘部の研磨用治具、研磨用治具の製造方法、研磨方法、およびインペラの製造方法
CN109571183B (zh) * 2018-11-30 2024-02-20 温州市华晖汽摩配件厂(普通合伙) 一种镜片磨边机用自出水多弧度镜片玻璃倒边磨头
DE102019005084A1 (de) * 2019-07-16 2021-01-21 Schneider Gmbh & Co. Kg Polierwerkzeug sowie Vorrichtung zum Polieren eines Werkstücks
JP7386452B2 (ja) 2019-11-20 2023-11-27 株式会社ロジストラボ 光学素子の製造方法、及び光学素子製造装置
DE102020007766A1 (de) * 2020-08-07 2022-02-10 Schneider Gmbh & Co. Kg Werkzeugaufnahme, Bearbeitungswerkzeug, Werkzeugspindel sowie Verfahren zur Bearbeitung optischer Werkstücke
CN115026704A (zh) * 2022-05-26 2022-09-09 吴雪花 一种功能陶瓷制备设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3043065A (en) * 1961-01-10 1962-07-10 Stephan H Terrel Apparatus for mechanically treating metal and plastic surfaces
US6371837B1 (en) * 1997-11-10 2002-04-16 3M Innovative Properties Company Method of refining a surface
EP1473116A1 (fr) 2003-05-02 2004-11-03 Loh Optikmaschinen AG Outil de finissage de surfaces optiques
DE102005010583A1 (de) 2005-03-04 2006-09-07 Satisloh Gmbh Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
EP1711311A1 (fr) * 2004-01-15 2006-10-18 Carl Zeiss Vision GmbH Dispositif et procede pour polir une surface optique, composant optique, et procede pour realiser un outil de polissage

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3526065A (en) * 1967-09-26 1970-09-01 James H Lee Rotary finishing tool
JPH0822498B2 (ja) * 1988-08-09 1996-03-06 旭硝子株式会社 湾曲したガラス体表面の研磨装置
DE4442181C1 (de) * 1994-11-26 1995-10-26 Loh Optikmaschinen Ag Werkzeug zur Feinbearbeitung optischer Flächen
US6875090B2 (en) * 1999-12-01 2005-04-05 Gerber Coburn Optical, Inc. Apparatus for finishing optical surfaces, including a pad compensation device
WO2002073451A2 (fr) * 2001-03-13 2002-09-19 Intelligate Ltd. Comprehension dynamique du langage naturel
ATE433826T1 (de) * 2002-01-09 2009-07-15 Hoya Corp Schleifwerkzeug
FR2857610B1 (fr) 2003-07-16 2006-03-17 Essilor Int Outil pour le surfacade d'une surface optique

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3043065A (en) * 1961-01-10 1962-07-10 Stephan H Terrel Apparatus for mechanically treating metal and plastic surfaces
US6371837B1 (en) * 1997-11-10 2002-04-16 3M Innovative Properties Company Method of refining a surface
EP1473116A1 (fr) 2003-05-02 2004-11-03 Loh Optikmaschinen AG Outil de finissage de surfaces optiques
EP1711311A1 (fr) * 2004-01-15 2006-10-18 Carl Zeiss Vision GmbH Dispositif et procede pour polir une surface optique, composant optique, et procede pour realiser un outil de polissage
EP1711311B1 (fr) 2004-01-15 2007-05-02 Carl Zeiss Vision GmbH Dispositif et procede pour polir une surface optique et procede pour realiser un outil de polissage
DE102005010583A1 (de) 2005-03-04 2006-09-07 Satisloh Gmbh Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202009018907U1 (de) 2009-08-12 2014-05-15 Satisloh Ag Flexibles Polierwerkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
DE102009036981A1 (de) 2009-08-12 2011-02-17 Satisloh Ag Flexibles Polierwerkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
WO2011018212A1 (fr) 2009-08-12 2011-02-17 Satisloh Ag Polissoir pour la finition de surfaces optiquement actives en particulier de verres de lunettes
EP2298498A2 (fr) 2009-09-16 2011-03-23 Satisloh AG Dispositif de traitement précis de surfaces à effet optique, notamment sur des verres de lunettes
DE102009041442A1 (de) 2009-09-16 2011-03-24 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
EP2308644A2 (fr) 2009-10-08 2011-04-13 Satisloh AG Dispositif de traitement précis de surfaces optiquement actif sur des pièces usinées, en particulier sur des lentilles ophtalmiques
DE102009048757A1 (de) 2009-10-08 2011-04-14 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an Werkstücken, insbesondere Brillengläsern
DE102011014230A1 (de) 2011-03-17 2012-09-20 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
WO2012123120A1 (fr) 2011-03-17 2012-09-20 Satisloh Ag Dispositif d'usinage de précision de surfaces à effet optique, notamment sur des verres de lunettes
DE102014015052A1 (de) 2014-10-15 2016-04-21 Satisloh Ag Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an Brillengläsern
WO2016058661A1 (fr) * 2014-10-15 2016-04-21 Satisloh Ag Plateau de polissage pour outil d'usinage de finition de surfaces optiquement actives sur des verres de lunettes
DE202015009504U1 (de) 2014-10-15 2018-01-16 Satisloh Ag Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an Brillengläsern
WO2017178110A1 (fr) 2016-04-13 2017-10-19 Satisloh Ag Broche d'outil pour un dispositif de finition de surfaces optiquement actives sur des pièces
DE102016004328A1 (de) 2016-04-13 2017-10-19 Satisloh Ag Werkzeugspindel für eine Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an Werkstücken
DE102017120333A1 (de) * 2017-09-05 2019-03-07 Schaeffler Technologies AG & Co. KG Werkstückspindel für eine Schleifmaschine

Also Published As

Publication number Publication date
EP2014412B1 (fr) 2010-11-10
BRPI0801761A2 (pt) 2009-06-02
BRPI0801761B1 (pt) 2020-11-10
ATE487563T1 (de) 2010-11-15
DE102007026841A1 (de) 2008-12-11
US20080305723A1 (en) 2008-12-11
CN101318304A (zh) 2008-12-10
ES2355170T3 (es) 2011-03-23
DE502008001743D1 (de) 2010-12-23
US8246424B2 (en) 2012-08-21
CN101318304B (zh) 2011-12-21

Similar Documents

Publication Publication Date Title
EP2014412B1 (fr) Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication
EP1698432B1 (fr) Disque de polissage pour outil de finition de surfaces optiques en particulier de verres de lunettes
EP3206837B1 (fr) Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes
EP1473116B1 (fr) Outil de finissage de surfaces optiques
EP1711311B2 (fr) Dispositif et procede pour polir une surface optique et procede pour realiser un outil de polissage
EP1877220B2 (fr) Piece de blocage preformee comprenant trois points d'appui
DE10242422B4 (de) Läppscheibe, die eine Schicht aufweist, die Krümmungen optischer Flächen auf Linsen anpaßbar ist und Verfahren für die Feinbearbeitung optischer Flächen
EP1796872B1 (fr) Procede pour polir, en particulier, des surfaces de faces optiquement actives, telles que des lentilles
EP2117774B1 (fr) Procédé pour produire un verre de lunettes
AT500571A2 (de) Polierkissen und system
DE102010019491B4 (de) Polierwerkzeug zur Bearbeitung von optischen Flächen, insbesondere Freiformflächen
EP3463751A1 (fr) Outil, dispositif et procédé de polissage de lentilles
EP2202030A2 (fr) Tête de polissage pour usinage zonal de surfaces optiques de lunettes
DE602004008920T2 (de) Werkzeug zur feinbearbeitung einer optischen fläche
DE102019005084A1 (de) Polierwerkzeug sowie Vorrichtung zum Polieren eines Werkstücks
DE602004013124T2 (de) Schleifverfahren
DE19920651B4 (de) Rotierendes Maschinen-Schleifwerkzeug
DE69200165T2 (de) Von einem Einzelmotor angetriebene Vorrichtung für einen Diamanthalter mit Winkel- und Longitudinalbewegung.
EP3126091B1 (fr) Outil de polissage ainsi que dispositif et procédé de polissage de surface de verres de lunettes optimisé en termes de défauts de moulage et coques de moulage pour fabriquer des verres de lunettes
DE4124178C2 (de) Bearbeitungs-Maschine zur Feinbearbeitung, wie zum Superfinishen
DE102012103743A1 (de) Polierfolie für Kunststoff-Brillengläser
EP0900631B1 (fr) Outil abrasif
DE29708235U1 (de) Schleifkörper
CH699299B1 (de) Polierkörper für eine Poliermaschine.
DE6603270U (de) Linsen-oberflaechenbearbeitungsmaschine.

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA MK RS

17P Request for examination filed

Effective date: 20090708

17Q First examination report despatched

Effective date: 20090807

AKX Designation fees paid

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

RTI1 Title (correction)

Free format text: POLISHING DISC FOR A TOOL FOR FINE PROCESSING OF OPTICALLY ACTIVE SURFACES OF IN PARTICULAR SPECTACLE LENSES AND METHOD FOR ITS PRODUCTION

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

Ref country code: CH

Ref legal event code: NV

Representative=s name: KEMENY AG PATENTANWALTBUERO

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

REF Corresponds to:

Ref document number: 502008001743

Country of ref document: DE

Date of ref document: 20101223

Kind code of ref document: P

REG Reference to a national code

Ref country code: NL

Ref legal event code: VDEP

Effective date: 20101110

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2355170

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20110323

LTIE Lt: invalidation of european patent or patent extension

Effective date: 20101110

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20110210

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20110310

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20110310

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20110210

REG Reference to a national code

Ref country code: IE

Ref legal event code: FD4D

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20110211

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20110811

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 502008001743

Country of ref document: DE

Effective date: 20110811

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

BERE Be: lapsed

Owner name: SATISLOH A.G.

Effective date: 20110630

REG Reference to a national code

Ref country code: CH

Ref legal event code: PFA

Owner name: SATISLOH AG

Free format text: SATISLOH AG#NEUHOFSTRASSE 12#6340 BAAR (CH) -TRANSFER TO- SATISLOH AG#NEUHOFSTRASSE 12#6340 BAAR (CH)

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20101110

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 487563

Country of ref document: AT

Kind code of ref document: T

Effective date: 20130603

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20130603

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 9

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 10

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 11

REG Reference to a national code

Ref country code: CH

Ref legal event code: PFUS

Owner name: SATISLOH AG, CH

Free format text: FORMER OWNER: SATISLOH AG, CH

P01 Opt-out of the competence of the unified patent court (upc) registered

Effective date: 20230525

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20230626

Year of fee payment: 16

Ref country code: DE

Payment date: 20230626

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20230620

Year of fee payment: 16

Ref country code: GB

Payment date: 20230627

Year of fee payment: 16

Ref country code: ES

Payment date: 20230703

Year of fee payment: 16

Ref country code: CH

Payment date: 20230702

Year of fee payment: 16