EP2014412B1 - Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication - Google Patents

Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication Download PDF

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Publication number
EP2014412B1
EP2014412B1 EP08010088A EP08010088A EP2014412B1 EP 2014412 B1 EP2014412 B1 EP 2014412B1 EP 08010088 A EP08010088 A EP 08010088A EP 08010088 A EP08010088 A EP 08010088A EP 2014412 B1 EP2014412 B1 EP 2014412B1
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EP
European Patent Office
Prior art keywords
intermediate layer
polishing
main body
tool
agent carrier
Prior art date
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Active
Application number
EP08010088A
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German (de)
English (en)
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EP2014412A1 (fr
Inventor
Peter Philipps
Lothar Urban
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Satisloh AG
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Satisloh AG
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Publication of EP2014412A1 publication Critical patent/EP2014412A1/fr
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B24B13/02—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor by means of tools with abrading surfaces corresponding in shape with the lenses to be made
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/14—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face
    • B24D13/147—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by the front face comprising assemblies of felted or spongy material; comprising pads surrounded by a flexible material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062—Prior to assembly
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1062—Prior to assembly
    • Y10T156/1064—Partial cutting [e.g., grooving or incising]

Definitions

  • the present invention relates to a polishing plate for a tool for fine machining of optically active surfaces, according to the preamble of claim 1.
  • Such polishing plates are used in particular in the production of prescription eyeglass lenses in bulk.
  • the invention relates to a method for producing such a polishing plate, according to the patent claim 9.
  • the machining of the optically effective surfaces of spectacle lenses can be roughly subdivided into two processing phases, namely first the pre-processing of the optically effective surface to produce the recipe macrogeometry and then the fine processing of the optically effective surface to eliminate Vorbearbeitungsspuren and obtain the desired microgeometry. While the preprocessing of the optically effective surfaces of spectacle lenses takes place, inter alia, as a function of the material of the spectacle lenses by grinding, milling and / or turning, the optically effective surfaces of spectacle lenses become during fine machining usually subjected to a fine grinding, lapping and / or polishing process.
  • the polishing film can be adapted within certain limits to the geometry of the surface to be machined, both from “spectacle” to spectacle glass, which is to be processed, as well as in “dynamic” terms, ie during the processing of a specific spectacle lens, in which a relative movement between the polishing plate and the spectacle lens takes place.
  • the elasticity of the foam layer significantly influences the removal behavior of the polishing plate during the polishing process.
  • EP-B-1 711 311 a polishing plate with three-layer or -lagigem structure in which the middle, elastic layer in the radial direction from the inside to the outside is increasingly softened to polish lenses with irregularly curved freeform surfaces in a surface quality that should make post-processing unnecessary.
  • This outwardly increasingly softer formation is achieved in particular by the fact that the middle layer in the radial direction, ie from the inside to the outside has an increasing axial thickness, wherein the carrier body, the middle layer and the polishing foil ends together on a cylindrical outer peripheral surface of the polishing plate.
  • unwanted "marks" of the polishing plate on the machined surface produced by the edge of the polishing film are not addressed in this prior art.
  • a polishing plate according to the preamble of claim 1 is finally from the US-A-6,371,837 known.
  • the invention has for its object to provide a polishing pad as simple as possible for a tool for fine machining of optically active surfaces on particular eyeglass lenses, the edges of which does not reflect on the machined surface in the form of microstructures.
  • the invention also includes the provision of a method for the simple production of such a polishing plate.
  • a polishing plate for a tool for fine machining of optically effective surfaces in particular spectacle lenses having a central body having a central axis, to which a softer intermediate layer is attached in relation to the main body, which rests on a polish carrier
  • the intermediate layer based on the central axis has a radially inner region of substantially constant axial thickness and an adjoining, radially outer region whose radial outer dimensions increase starting from the main body to the polish carrier, so that the elastic support of the polish carrier by means of the intermediate layer in the radially outer region Outer edge of the polishing medium carrier decreases
  • the polishing medium carrier is provided in a central region with at least one opening and at the at least one opening in the polish carrier in the direction of Grundk örpers connects a recess in the intermediate layer; the diameter of the recess in the intermediate layer, starting from the opening in the polish carrier to the base towards.
  • a second aspect of the invention comprises in a polishing plate for a tool for fine machining of optically active surfaces on in particular spectacle lenses having a central axis having base body to which a softer relative to the base body intermediate layer is fixed, which rests a polishing agent, the intermediate layer with respect to the central axis, a radially inner region of substantially constant axial thickness and an adjoining radially outer region, wherein the outer edge of the polishing medium carrier is held spaced apart from the latter by means of the radially outer region of the intermediate layer during the finishing of the optically effective surface.
  • the intermediate layer is divided functionally into a radially inner region of substantially constant axial thickness and an adjoining, radially outer region, which has the task to prevent the edge of the polishing plate on the machined surface in Form of microstructures depicts.
  • the polishing removal is proportional to the product of polishing pressure and relative speed between the tool and workpiece - so that the workpiece with high topographical fidelity, that can be polished shape preserving.
  • the polishing removal decreases as a result of decreasing elastic support of the polishing medium carrier and thus also the possibility that the edge of the polishing plate on the machined surface "push" or can image.
  • the edge region of the polishing plate in which the radially outer region of the intermediate layer is also ensures that the over radially inner region of the intermediate layer radially outwardly projecting outer edge of the polishing medium carrier is attenuated in its movements, in the fine machining of the optically active surface therefore not swing freely or flutter and thus can not hit the machined surface so that it is reflected there.
  • the polishing agent carrier is provided in a middle region with at least one opening.
  • This opening in the polish carrier provides fluid communication between an interior region of the foam usually comprised of a sponge-like liquid pad soaked with liquid polish and the outer surface of the polish carrier in machining engagement with the workpiece surface to be machined.
  • the liquid polishing agent can circulate better and also pass from the interior of the polishing pad to the engagement areas between the polishing medium carrier and the surface of the workpiece to be machined, whereby at these engagement areas due to increased wetting of the polishing medium carrier or a more uniform polishing agent film on this better rinsing and Cooling is ensured. Accordingly, it may not come to partial, the surface quality produced detrimental solidification of the polish carrier.
  • a recess in the intermediate layer adjoins the at least one opening in the polishing agent carrier in the direction of the base body.
  • the recess advantageously serves as a reservoir for the liquid polishing agent.
  • the diameter of the recess in the intermediate layer, starting from the opening in the polishing agent carrier, increases toward the main body (preferably continuously), for example, by delimiting the recess by a conical inner peripheral surface of the intermediate layer.
  • This causes - similar to the starting from the body to the polish carrier toward increasing radial outer dimensions of the radially outer region of the intermediate layer - a close to the opening in the polish carrier in the direction of the opening decreasing elastic support of the polish carrier through the radially inner region of the intermediate layer, even at higher polishing pressures Danger to meet that the opening edge of the polish carrier is reflected on the machined surface.
  • the circumferential contour formed by the radially outer region of the intermediate layer may in principle have any desired geometry, as long as the radial outer dimensions of the radially outer region of the intermediate layer from the base body in the direction of the polishing medium carrier increase (preferably continuously), for example, the radially outer region of Intermediate layer have a toroidal outer peripheral surface.
  • the radially outer region of the intermediate layer has a substantially frusto-conical outer peripheral surface.
  • the main body it is possible for the main body to have an end face facing the intermediate layer, which is preformed toroidally in accordance with the macrogeometry of the surface to be machined, such as in FIG DE-A-10 2005 010 583 described. Investigations by the applicant have shown, however, that it is sufficient for the majority of processing cases when the base body has an intermediate layer facing, substantially spherical end face to which the intermediate layer is glued. On the one hand, this simplifies the polishing plate production and, on the other hand, reduces the number of polishing plates to be provided in the production of prescriptions for the fine processing of the spectacle lenses.
  • the recess in the intermediate layer can extend as far as the main body.
  • Such a continuous recess is not only particularly easy to produce, but also advantageously maximizes the uptake volume of the reservoir formed by the recess for the liquid polishing agent.
  • An even further enlargement of the polishing agent reservoir is possible by also adjoining the recess in the intermediate layer, a recess in the body.
  • the maximum radial width of the radially outer region of the intermediate layer in the undeformed state of the polishing plate should be between 3 and 10% of the maximum total width of the intermediate layer in order to support the polishing agent carrier substantially constantly elastically on a surface as large as possible without that there is a risk of pictures of the polishing plate edge on the machined surface.
  • the polishing plate according to the invention can advantageously be used on a tool for fine machining of optically effective surfaces on, in particular, spectacle lenses, comprising a base body which can be attached to a tool spindle of a processing machine, a joint part which has a tilting and longitudinally movably guided receiving piece with respect to the base body, to which a bellows connects in the direction of the main body, by means of which the joint part is fixed to the main body and a limited by the main body and the joint part pressure medium chamber which is optionally acted upon with a (liquid or gaseous) pressure medium, wherein the polishing plate interchangeable the receiving piece of the joint part is held.
  • polishing plate is held by means of a snap connection on the receiving piece of the joint part.
  • the cutting of the polish carrier can be done by means of the punch and the counter punch for punching the intermediate layer, so that this no separate tool must be used and the cutting can be done quickly.
  • the punching of the intermediate layer and the cutting of the polish carrier can also take place in a joint step, even if these are separate raw materials. This too is conducive to a fast, dimensionally stable production of the polishing plate.
  • Fig. 1 . 5 . 6 and 9 has a polishing plate 10 for a tool 12 for fine machining of optically active surfaces F to particular lenses L a central axis M having base body 14 to which a softer relative to the base body 14 intermediate layer 16 is fixed, which rests a polishing agent carrier 18. It is essential, inter alia, that the intermediate layer 16 with respect to the central axis M has a radially inner region 20 of substantially constant axial thickness D and an adjoining, radially outer region 22, which, as will be described in more detail below, to special A manner is formed to prevent the edge of the polishing pad 10 on the machined surface F of the lens L in the form of very fine, scratch-like microstructures.
  • dashed lines indicate the boundary between the radially inner region 20 and the radially outer region 22 of the intermediate layer 16.
  • the tool 12 has a base body 24, which at an in Fig. 1 indicated by dashed lines tool spindle 26 of a processing machine (not shown) is attachable. Further, the tool 12 has a generally numbered with 28 joint part having a respect to the base body 24 by means of a ball joint 30 and a guide member 32 tilt and longitudinally movably guided receiving piece 34 on which the polishing plate 10 is held interchangeable in a manner to be described. At the receiving piece 34 is followed in the direction of the base body 24 to a bellows 36, by means of which the hinge part 28 is rotatably mounted on the base body 24.
  • the main body 24 and the joint part 28 delimit a pressure medium chamber 38, which can be acted upon via a channel 40 in the guide member 32 selectively with a suitable liquid or gaseous pressure medium (eg oil or compressed air) to during the processing of the optically active surface F on the lens L.
  • a suitable liquid or gaseous pressure medium eg oil or compressed air
  • Further details on the structure of the tool 12 are the publications DE-A-10 2005 010 583 A1 and EP-A-1 473 116 the applicant, to which reference is expressly made in this regard to avoid repetition at this point.
  • the receiving piece 34 of the joint part 28 is supported by means of the guide member 32 in the transverse direction relative to the base body 24 of the tool 12.
  • the guide member 32 follow the receiving piece 34 in the axial direction and vice versa, when the pressure medium chamber 38 is acted upon via the channel 40 with the pressure medium or the receiving piece 34 by external action (from above in Fig. 1 ) is pressed in the direction of the base body 24.
  • the receiving piece 34 of the joint part 28 can tilt due to the ball joint 30 to the guide member 32 on the guide member 32, wherein the bellows 36 of the joint part 28 is deformed accordingly.
  • a substantially mushroom-shaped retaining projection 48 is provided on the end face 42 of the receiving piece 34, which forms an undercut 50.
  • the receiving piece 34 is provided at its end face 42 with a total of four substantially cylindrical Orientiervorsprüngen 52 which are arranged in pairs on opposite sides of the rotary driving projection 46 and 90 ° with respect to the retaining projections 48 angularly offset about the central axis M.
  • injection molded base body 14 of the polishing plate 10 is formed honeycomb-like on its underside 44 with a centrally disposed counter-profile 54 for the rotary driving projection 46 on the tool 12, of which star-shaped reinforcing ribs 56 extend to the outer edge of the base body 14, and arranged on opposite sides of the counter profile 54 between the reinforcing ribs 56, substantially hollow cylindrical holding portions 58 which cooperate with the retaining projections 48 on the tool 12 to the polishing plate 10 in the manner of a snap connection on Holding piece 34 of the joint part 28.
  • a plastic such as an ABS (A crylnitril- B utadien- S styrene-polymer), about Terluran® GP 35 from BASF
  • the holding portions 58 are seen in a plan view ( Fig. 4 ) is slotted cross-shaped for the formation of four spring arms 60, each spring arm 60 carries at its free end with respect to an axis of symmetry of the respective holding portion 58 radially inwardly directed detent 62 (in Fig. 3 indicated), which is dimensioned and arranged so that it is able to lock with the undercut 50 on each associated retaining projection 48 of the tool 12.
  • a reinforcing web 56 extends between a pair of orientation projections 52, namely those reinforcing webs 56 that are in relation to the holding sections 58 of FIG Base body 14 are arranged angularly offset by 90 ° about the central axis M.
  • annular collar 66 serves as a handle for a gripper (not shown) of an automatic polishing plate changing device (also not shown).
  • end face 68 of the base body 14 is preformed substantially spherical in the illustrated embodiments and bulges virtually the intermediate layer 16 against.
  • the end face 68 may also be shaped differently, eg toroidally, in accordance with the macrogeometry of the surface F to be machined.
  • the annular collar 66 according to the 3 and 4 Outside circumference with two seen in a plan view semicircular recesses 70 is provided. These serve to mark the polishing plate 10, in such a way that the in Fig. 4 with 72 numbered angular distance of the recesses 70 encoded about the central axis M represents a measure of the curvature (in diopters) of the end face 68.
  • the intermediate layer 16 is firmly fixed, for example by means of a suitable adhesive.
  • the material of the intermediate layer 16 may be, for example, an open-celled PU (polyurethane) foam, as it is available, for example, under the trade name Sylomer® R from Getzner Maschinentechnik GmbH, Berlin, Germany.
  • the polisher carrier 18 facing top of the intermediate layer 16 may, but need not be provided with a final, manufacturing technology-related "casting" (release layer to the mold, not shown), the intermediate layer 16 an additional Stiffness gives; if necessary, such a "casting skin” can even form the polish carrier itself.
  • the thickness D of the intermediate layer 16 in its radially inner region 20 may correspond to the respective processing requirements, for example between 2 and 10 mm. As already mentioned, this thickness D in the radially inner region 20 of the intermediate layer 16 is substantially constant, so that the elastic support of the polishing medium carrier 18 by means of the intermediate layer 16 in this region 20 is also substantially constant.
  • the radial outer dimensions r of the radially outer region 22 of the intermediate layer 16, starting from the base 14 towards the polish carrier 18 towards continuously increase - namely, such that the radially outer portion 22 of the intermediate layer 16 has a substantially frusto-conical outer peripheral surface 74, the inclination with respect the central axis M is greater than the inclination of any surface normal on the end face 68 of the base body 14 with respect to the central axis M - so that the elastic support of the polishing medium carrier 18 by means of the intermediate layer 16 in the radially outer region 22 to the outer edge 76 of the polishing medium carrier 18 decreases continuously ,
  • This causes - as already mentioned - causes the polishing pressure and thus the polishing removal in the edge region of the polishing pad 10 decreases and at the same time the outer edge 76 of the polish carrier 18 - compared to a free, unsupported outer edge of the polish carrier, as he from DE-A-10 2005 010 583 is known - is attenuated in its
  • the transition between the outer peripheral surface 64 of the base body 14 and the outer peripheral surface 74 of the intermediate layer 16 does not necessarily have to be infinitely variable.
  • the base body over the intermediate layer can protrude radially outward, such as in the DE-A-10 2005 010 583 disclosed.
  • polish carrier 18 also called “polishing film” or “polishing pad”, according to Fig. 1 forming the active machining tool component is a commercially available, flexible and abrasion-resistant fine grinding or polishing agent carrier, such as a polyurethane (P oly ur ethane) film having a thickness of 0.5 to 1.4 mm and a Hardness between 12 and 45 after Shore D.
  • polishing agent carrier 18 is rather thicker if, by means of the polishing plate 10, a pre-polishing is to take place, but rather thinner in the case of a fine polishing.
  • the radial dimensions of the polishing medium carrier 18 are selected so that in a plan view from above in the Fig. 1 and 5 seen in this embodiment, circular polish carrier 18 ends with its outer edge 76 on the outer peripheral surface 74 of the underlying intermediate layer 16.
  • the polishing agent carrier 18 is secured in the illustrated embodiment by means of a suitable adhesive to the intermediate layer 16.
  • the polish carrier 18 may be otherwise more or less permanently bonded to the intermediate layer 16, e.g. by vulcanization or Aufkletten.
  • the connection between the polish carrier 18 and the intermediate layer 16 must be so strong that a movement entrainment, in particular rotational drive of the polish carrier 18 is ensured with the intermediate layer 16 at any time during processing.
  • Fig. 9 is to be described below to avoid repetition only insofar as they differ from those described above Fig. 1 to 8 different.
  • the polishing medium carrier 18 is additionally provided in a central region with (at least) one through opening 92, which in the case shown has a circular shape and can be formed, for example, by cutting or punching.
  • the opening 92 in the polishing medium carrier 18 occupies a surface area of 0.25 to 2% of the total area of the polishing medium carrier 18 facing the surface F of the lens L to be processed.
  • the opening 92 provides pressure equalization during processing and provides liquid polishing agent from within the intermediate layer 16, thereby providing better rinsing and cooling of otherwise deprived areas of the polishing platen 10.
  • Such a "central" supply of polishing agent is particularly advantageous when the polishing plate 10 rotates at a relatively high speed and thus the acting centrifugal forces are anxious to "drive" the polishing agent radially outward.
  • Fig. 9 illustrated embodiment joins the opening 92 in the polishing medium carrier 18 in the direction of the base body 14 a recess 94 in the intermediate layer 16, which extends to the base body 14 back. Also in the base body 14 is followed by the recess 94 in the intermediate layer 16 steplessly a recess 96 at.
  • the recesses 94 and 96 in the intermediate layer 16 and in the main body 14 serve during processing as (extended) reservoir for the liquid polishing agent.
  • the recess 96 in the base body 14 is cylindrical, the diameter d of the recess 94 in the intermediate layer 16, starting from the opening 92 in the polish carrier 18 to the main body 14 toward continuously increases.
  • Such a shape of the recess 94 can be made analogous to the substantially frusto-conical outer peripheral surface 74 of the intermediate layer 16 by punching, wherein a suitable Naturally, a punching device would have a smaller-diameter annular cutting edge on the punching tool and expediently a greater curvature on the counter-punching surface than in FIG Fig. 7 shown.
  • the recess 94 in the intermediate layer 16 outwardly bounding inner peripheral surface of the intermediate layer 16 has basically the same effect as the substantially frusto-conical outer peripheral surface of the intermediate layer 16, namely, it causes the elastic support of the polishing medium carrier 18 through the radially inner region 20 of the intermediate layer 16 near the opening 92 in the polishing medium carrier 18 decreases in the direction of the opening 92 to ensure that even at higher polishing pressures that the edge of the opening 92 in the polishing medium carrier 18 does not image on the machined surface F.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Claims (12)

  1. Disque de polissage (10) destiné à un outil (12) pour l'usinage de précision de surfaces (F) actives sur le plan optique, notamment sur des verres de lunettes (L), comprenant un corps de base (14) qui présente un axe central (M) et sur lequel est fixée une couche intermédiaire (16) plus molle par rapport au corps de base (14) et sur laquelle repose un support d'agent de polissage (18), la couche intermédiaire (16) présentant, en se référant à l'axe central (M), une zone radialement intérieure (20) d'une épaisseur axiale (D) sensiblement constante, et, s'y raccordant, une zone radialement extérieure (22) dont les dimensions extérieures radiales (r) augmentent à partir du corps de base (14) en direction du support d'agent de polissage (18), de sorte que le soutien élastique du support d'agent de polissage (18) moyennant la couche intermédiaire (16), diminue, dans sa zone radialement extérieure (22), en direction du bord extérieur (76) du support d'agent de polissage (18), et le support d'agent de polissage (18) étant pourvu, dans une zone centrale, d'au moins une ouverture (92), et un évidement (94) dans la couche intermédiaire (16) se raccordant à ladite au moins une ouverture (92) dans le support d'agent de polissage (18), en direction du corps de base (14),
    caractérisé en ce que le diamètre (d) de l'évidement (94) dans la couche intermédiaire (16) augmente à partir de l'ouverture (92) dans le support d'agent de polissage (18) en direction du corps de base (14).
  2. Disque de polissage (10) selon la revendication 1, caractérisé en ce que la zone radialement extérieure (22) de la couche intermédiaire (16) présente une surface périphérique extérieure (74) sensiblement de forme tronconique.
  3. Disque de polissage (10) selon la revendication 1 ou la revendication 2, caractérisé en ce que le corps de base (14) présente une surface frontale (68) sensiblement sphérique, dirigée vers la couche intermédiaire (16), et sur laquelle est collée de manière fixe la couche intermédiaire (16).
  4. Disque de polissage (10) selon l'une des revendications précédentes, caractérisé en ce que l'évidement (94) dans la couche intermédiaire (16) s'étend jusqu'au corps de base (14).
  5. Disque de polissage (10) selon la revendication 4, caractérisé en ce qu'à l'évidement (94) dans la couche intermédiaire (16) se raccorde un évidement (96) dans le corps de base (14).
  6. Disque de polissage (10) selon l'une des revendications précédentes, caractérisé en ce que la largeur radiale (b) maximale de la zone radialement extérieure (22) de la couche intermédiaire (16), présente, dans l'état non déformé du disque de polissage (10), une valeur comprise entre 3 et 10% de la largeur totale maximale (B) de la couche intermédiaire (16).
  7. Outil (12) pour l'usinage de précision de surfaces (F) actives sur le plan optique, notamment sur des verres de lunettes (L), comprenant
    un corps de base (24) qui peut être rapporté sur une broche porte-outil (26) d'une machine d'usinage,
    une partie articulée (28) qui présente une pièce de réception (34) guidée de manière mobile en pivotement et longitudinalement par rapport au corps de base (24), et à laquelle se raccorde, en direction du corps de base (24), un soufflet (36) au moyen duquel la partie articulée (28) est fixée au corps de base (24) en étant susceptible d'être entraînée en rotation,
    une chambre d'agent de pression (38) qui est délimitée par le corps de base (24) et la partie articulée (28), et peut être alimentée sélectivement par un agent de pression, et
    un disque de polissage (10) selon l'une des revendications précédentes, qui est maintenu de manière interchangeable sur la pièce de réception (34) de la partie articulée (28).
  8. Outil (12) selon la revendication 7, caractérisé en ce que le disque de polissage (10) est maintenu sur la pièce de réception (34) de la partie articulée (28), au moyen d'une liaison par encliquetage (48, 58).
  9. Procédé de fabrication d'un disque de polissage (10) selon la revendication 1, comprenant les étapes suivantes :
    réaliser le corps de base (14),
    mettre à disposition un matériau brut en forme de nappe pour la couche intermédiaire (16), qui présente une épaisseur (D) sensiblement constante,
    tendre ledit matériau brut pour la couche intermédiaire (16) par-dessus une surface (78) de courbure convexe d'un poinçon conjugué (80), et découper par matriçage la couche intermédiaire (16) au moyen d'un outil de découpage par matriçage (86) présentant un tranchant de coupe annulaire (84),
    le cas échéant, découper le support d'agent de polissage (18) conformément à la surface frontale (90) la plus grande de la couche intermédiaire (16) non déformée, et
    coller ensemble le corps de base (14), la couche intermédiaire (16) et, le cas échéant, le support d'agent de polissage (18), pour en former un élément composite du type en sandwich.
  10. Procédé selon la revendication 9, caractérisé en ce que le corps de base (14) est moulé par injection, en une matière plastique.
  11. Procédé selon la revendication 9 ou la revendication 10, caractérisé en ce que la découpe du support d'agent de polissage (18) s'effectue au moyen de l'outil de découpage par matriçage (86) et du poinçon conjugué (80) pour le découpage par matriçage de la couche intermédiaire (16).
  12. Procédé selon la revendication 11, caractérisé en ce que le découpage par matriçage de la couche intermédiaire (16) et la découpe du support d'agent de polissage (18) s'effectuent au cours d'une même étape de travail.
EP08010088A 2007-06-06 2008-06-03 Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication Active EP2014412B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007026841A DE102007026841A1 (de) 2007-06-06 2007-06-06 Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern und Verfahren für dessen Herstellung

Publications (2)

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EP2014412A1 EP2014412A1 (fr) 2009-01-14
EP2014412B1 true EP2014412B1 (fr) 2010-11-10

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EP08010088A Active EP2014412B1 (fr) 2007-06-06 2008-06-03 Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes et son procédé de fabrication

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US (1) US8246424B2 (fr)
EP (1) EP2014412B1 (fr)
CN (1) CN101318304B (fr)
AT (1) ATE487563T1 (fr)
BR (1) BRPI0801761B1 (fr)
DE (2) DE102007026841A1 (fr)
ES (1) ES2355170T3 (fr)

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DE202009000790U1 (de) * 2009-01-20 2009-03-26 Schneider Gmbh & Co. Kg Polierkopf und Werkzeugwechselarm für einen Polierkopf
DE102009036981A1 (de) 2009-08-12 2011-02-17 Satisloh Ag Flexibles Polierwerkzeug zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
DE102009041442A1 (de) * 2009-09-16 2011-03-24 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
DE102009048757A1 (de) 2009-10-08 2011-04-14 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an Werkstücken, insbesondere Brillengläsern
DE102011014230A1 (de) 2011-03-17 2012-09-20 Satisloh Ag Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an insbesondere Brillengläsern
DE102012103743A1 (de) * 2012-04-27 2013-10-31 Schneider Gmbh & Co. Kg Polierfolie für Kunststoff-Brillengläser
TWI584914B (zh) * 2013-07-22 2017-06-01 佳能股份有限公司 元件製造方法及拋光裝置
DE102013220973A1 (de) * 2013-10-16 2015-04-16 Carl Zeiss Vision International Gmbh Werkzeug zur Polierbearbeitung von optischen Flächen
CN105764649B (zh) * 2013-11-27 2018-04-03 依视路国际公司 用于以气动方式封阻光学镜片的固持器
DE102014206424A1 (de) 2014-04-03 2015-10-08 Carl Zeiss Vision International Gmbh Polierwerkzeug sowie Vorrichtung und Verfahren zur formfehleroptimierten Polierbearbeitung von Brillenlinsenoberflächen und Gießformschalen zur Brillenlinsenherstellung
DE102014015052A1 (de) 2014-10-15 2016-04-21 Satisloh Ag Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an Brillengläsern
JP6378626B2 (ja) * 2014-12-17 2018-08-22 オリンパス株式会社 光学素子の加工用工具および光学素子の製造方法
EP3106262B8 (fr) 2015-06-15 2018-04-04 OptoTech Optikmaschinen GmbH Dispositif de polissage destine a polir des surfaces concaves de lentilles optiques et son procede de fonctionnement
DE102015115078A1 (de) 2015-06-15 2016-12-15 Opto Tech Optikmaschinen Gmbh Poliervorrichtung zum Polieren konkaver Linsenflächen von optischen Linsen und Verfahren zu deren Betrieb
USD836348S1 (en) * 2015-12-15 2018-12-25 Knetik, Lda Ophthalmic lens polishing base
DE102016004328A1 (de) 2016-04-13 2017-10-19 Satisloh Ag Werkzeugspindel für eine Vorrichtung zur Feinbearbeitung von optisch wirksamen Flächen an Werkstücken
CN107363726B (zh) * 2017-09-01 2019-04-19 天津津航技术物理研究所 一种对大口径光学零件进行弹性装卡的方法
DE102017120333A1 (de) * 2017-09-05 2019-03-07 Schaeffler Technologies AG & Co. KG Werkstückspindel für eine Schleifmaschine
JP2019123053A (ja) * 2018-01-18 2019-07-25 三菱重工コンプレッサ株式会社 狭隘部の研磨用治具、研磨用治具の製造方法、研磨方法、およびインペラの製造方法
CN109571183B (zh) * 2018-11-30 2024-02-20 温州市华晖汽摩配件厂(普通合伙) 一种镜片磨边机用自出水多弧度镜片玻璃倒边磨头
DE102019005084A1 (de) * 2019-07-16 2021-01-21 Schneider Gmbh & Co. Kg Polierwerkzeug sowie Vorrichtung zum Polieren eines Werkstücks
JP7386452B2 (ja) 2019-11-20 2023-11-27 株式会社ロジストラボ 光学素子の製造方法、及び光学素子製造装置
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CN115026704A (zh) * 2022-05-26 2022-09-09 吴雪花 一种功能陶瓷制备设备

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Also Published As

Publication number Publication date
DE102007026841A1 (de) 2008-12-11
EP2014412A1 (fr) 2009-01-14
CN101318304A (zh) 2008-12-10
DE502008001743D1 (de) 2010-12-23
ES2355170T3 (es) 2011-03-23
BRPI0801761B1 (pt) 2020-11-10
US20080305723A1 (en) 2008-12-11
BRPI0801761A2 (pt) 2009-06-02
ATE487563T1 (de) 2010-11-15
CN101318304B (zh) 2011-12-21
US8246424B2 (en) 2012-08-21

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