EP3463751A1 - Outil, dispositif et procédé de polissage de lentilles - Google Patents
Outil, dispositif et procédé de polissage de lentillesInfo
- Publication number
- EP3463751A1 EP3463751A1 EP17729015.2A EP17729015A EP3463751A1 EP 3463751 A1 EP3463751 A1 EP 3463751A1 EP 17729015 A EP17729015 A EP 17729015A EP 3463751 A1 EP3463751 A1 EP 3463751A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- polishing
- workpiece
- tool
- contact surface
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 207
- 238000000034 method Methods 0.000 title claims abstract description 21
- 230000003287 optical effect Effects 0.000 claims abstract description 11
- 238000007373 indentation Methods 0.000 claims description 12
- 238000007493 shaping process Methods 0.000 claims description 8
- 230000007423 decrease Effects 0.000 claims description 5
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 description 23
- 238000007517 polishing process Methods 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 12
- 239000011148 porous material Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 5
- 230000006978 adaptation Effects 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 238000004026 adhesive bonding Methods 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000013016 damping Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/01—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools
- B24B13/012—Specific tools, e.g. bowl-like; Production, dressing or fastening of these tools conformable in shape to the optical surface, e.g. by fluid pressure acting on an elastic membrane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/02—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor by means of tools with abrading surfaces corresponding in shape with the lenses to be made
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/14—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of optical work, e.g. lenses, prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
- B24B13/06—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor grinding of lenses, the tool or work being controlled by information-carrying means, e.g. patterns, punched tapes, magnetic tapes
Definitions
- the present invention relates to a tool according to the preamble of claim 1, a device according to the preamble of claim 8 and a method according to the preamble of claim 15 and a use of the tool, in particular for only zonal polishing of optical workpieces, in particular lenses ,
- the present invention is particularly concerned with the zonal polishing of optical workpieces.
- the tool (polishing tool) has a polishing surface, which is applied only partially in the region of a contact surface on the workpiece to be polished or can be applied. This contact surface is substantially smaller in comparison to the surface of the workpiece to be polished, in particular with respect to the radial extent of the workpiece.
- "zonal" is to be understood in particular as meaning only polishing with such a "small” contact surface.
- pot tools with their contact surface or their abutment edge extend over the entire radius of a workpiece surface to be polished.
- a curved head of the tool carries a flexible or elastic polishing element to form a curved polishing surface.
- EP 1 798 872 B1 shows such a tool.
- the polishing surface of the tool lies partially in the region of its abutment surface on the workpiece, in which case the tilt angle between the surface normal of the abutment surface and the axis of rotation of the tool is continuously changed so that the abutment surface on the tool moves along a longitude.
- Zonal polishing is used in particular for precision optics or workpieces with aspherical surfaces, for example for mirrors or in particular lenses, and in particular for correcting manufacturing errors. Accordingly, it is important to allow the most accurate or defined processing possible. During polishing, there is always a certain removal of material on the workpiece.
- DE 10 2004 047 563 A1 discloses a method for polishing a rotating workpiece with a tool having a rubber membrane or a plunger with a glued-on polyurethane membrane. On the exact structure of the tool will not be discussed.
- the present invention has for its object to provide a tool, a device and a method and a use for particular zonal polishing of optical workpieces, with a particularly accurate or defined polishing of the respective workpiece, in particular an aspherical surface, preferably simple design is possible.
- the tool has an elastic cap for forming a polishing pad, preferably the cap for preforming the curvature of a curved head of the tool preformed and / or stress-free on the head sits or is.
- the cap for preforming the curvature of a curved head of the tool preformed and / or stress-free on the head sits or is.
- a particularly defined spring behavior of the cap or the Poier surface formed therefrom can be achieved in a simple manner.
- the cap has a multilayer structure and in particular has an intermediate element and a polishing element.
- the polishing element forms a polishing pad or a polishing film or polishing layer.
- the polishing surface or polishing pad formed by the cap or polishing member forms a polishing agent carrier for a polishing agent.
- the proposed polishing refers to the polishing with a polishing agent, which is in particular in the form of a suspension with polishing particles, such as very fine granules, particles o. Dg.., Is present or used.
- the polishing surface also serves to transport the polishing agent into an effective gap between the contact surface of the tool and the surface to be polished and / or to disperse or move therein and / or to rub it with the polishing agent on the surface.
- the polishing reduces the roughness of the surface and / or the cracks in the material which have arisen during previous shaping, for example by grinding, can be removed.
- material is removed.
- the removed material is also conveyed away from the working gap between the polishing surface and the surface to be polished by the tool or the polishing surface by means of the poying agent.
- the present invention relates in particular to the polishing of a workpiece with the aid of a tool and a polishing agent.
- the polishing can alternatively be done without separate or additional polish, but only with the tool.
- the polishing surface is optionally porous or non-porous and / or provided with a favorable surface structure or texture in order to achieve the desired polishing effect, in particular with a specific polishing agent in the respective workpiece material.
- the intermediate element and also the polishing element are preformed or shaped to adapt to the curvature.
- the polishing element is then adapted to the shape of the intermediate element by previous shaping.
- the preforming can be done, for example, by appropriate foaming or other prototyping with the desired shape.
- the molding is preferably carried out by material removal or mechanical processing of the cap or the cap-forming elements, in particular by milling and / or turning, for example, plate or solid material.
- the polishing element is preferably substantially thinner than the intermediate element.
- the cap or the intermediate element and the polishing element are glued. This allows a simple structure.
- a proposed device and a proposed method are characterized in particular by the diameter of the contact surface of the tool on the workpiece and / or the tilt angle of the axis of rotation of the tool to the normal (surface normal) of the contact surface during the polishing of the workpiece, that is, during the respective polishing process, is kept at least substantially constant or become. This is conducive to defined polishing with in particular defined material removal.
- the proposed device and the proposed method are particularly characterized in that the tool is moved from an edge of a surface to be polished of the workpiece over the middle to the opposite side of the edge or is movable.
- This allows a particularly uniform polishing, especially in the area of the optically important and sensitive center of the workpiece.
- the usual stopping or ending of the polishing process in the region of the center usually leads to an uneven and / or undefined material removal.
- the indentation depth of the particular elastically deformable polishing surface on the tool is preferably varied, controlled or regulated by corresponding delivery of the tool relative to the workpiece during the polishing process, particularly preferably as a function of the radial position the contact surface the workpiece, the desired diameter of the contact surface, the (desired) contact pressure of the tool on the workpiece and / or the profile of the workpiece, in particular the curvature of the workpiece in the region of the respective contact surface.
- This contributes to a defined polishing and a defined material removal, whereby an optimization of the time required for the polishing is also made possible.
- the distance of adjacent tracks of the preferably spiral-shaped polishing path of the contact surface on the workpiece or the surface to be polished is optionally kept at least substantially constant. This is conducive to a defined polishing or a defined material removal.
- the rotation speed of the workpiece during one rotation is optionally dependent on the rotational position, a locally desired dwell time (polishing time), the diameter of the contact surface, the contact pressure of the tool on the workpiece and / or the profile of the workpiece, in particular in the region of the respective contact surface, varies or is controlled or regulated.
- a locally desired dwell time polishing time
- the diameter of the contact surface the contact pressure of the tool on the workpiece and / or the profile of the workpiece, in particular in the region of the respective contact surface
- the tool is preferably provided with a polishing surface, which is formed from at least substantially closed pores, in particular wherein the polishing surface to more than 1 or 5% (based on the areal extent or number of pores) by Pores with a size of more than 0.5 mm and / or more than 25 or 50% (based on the areal extent or the number of pores) of pores with a size of less than 0.4 or 0.3 mm, more preferably less than 0.1 mm, and / or in particular wherein the size of the pores on the polishing surface is less than 1 mm, in particular less than 0.9 mm, and / or in particular wherein the polishing surface is not machined or not dressed.
- the size of the pores in particular the average or maximum diameter is considered. It has emerged from experiments that such a polishing surface exhibits particularly good polishing properties, in particular when polishing precision optics or glass. Particularly preferred is the polishing surface or the polishing pad or cap forming this polyurethane or other suitable foam or
- the tool is used for zonal polishing or prepared and prepared for the apparatus for polishing, so is a (further) onsieren or dressing of the polishing tool when new in the polishing machine, as in particular in the precision machining usual, not (more) required.
- the workpiece to be polished is first measured and errors can then be corrected by correcting polishing with the proposed tool, the proposed device or the proposed method.
- the proposed tool, the proposed device and / or the proposed method can be used in particular for Vorpolteren and / or Korrekturpolieren.
- Fig. 1 is a schematic representation of a proposed device for polishing an optical workpiece, wherein different positions of a proposed tool with associated tool spindle are shown;
- Fig. 2 is a schematic section of the proposed tool
- Fig. 3 is a schematic plan view of a surface to be polished of
- FIG. 1 shows, in a schematic representation, a proposed device 1 for, in particular, zonal polishing of an optical workpiece 2, in particular a lens, a mirror or the like, particularly preferably of glass.
- the device 1 is designed for polishing the workpiece 2 by means of a particular proposed tool 3 or other tool.
- the preferred structure of the proposed polishing tool 3 will be explained in more detail in particular with reference to FIG. 2.
- the tool 3 is shown together with an associated tool spindle 13 of the device 1 in three different positions, in particular for illustrating the movability of the tool 3 or a preferred method sequence.
- the proposed tool 3 is shown in a schematic section in Fig. 2. It preferably has a carrier 4 with a curved head 5 and a particular hemispherical or conical cap 6.
- the cap 8 is preferably of multilayer construction and, in the illustrated embodiment, preferably has an intermediate element 7 and a polishing element 8.
- the tool 3, the cap 8 or its intermediate element 7 is attached to the head 5 of the tool 3, in particular adhesively bonded thereto.
- the cap 8 or its polishing element 8 forms a polishing surface 9.
- the polishing surface 9 of the tool 3 or the cap 8 or of the element 8 is preferably curved convexly, in particular geometrically similar to the head 5 or curved to suit and / or preferably spherical or hemispherical and / or conical.
- the polishing element 8 is mounted on the intermediate element 7, in particular glued to this.
- the cap 6 may also be formed in one piece and / or produced in a multilayered manner by bi-injection or the like.
- the cap 6 or the intermediate element 7 and / or the polishing element 8 is or are preferably made of plastic or foam and / or of an elastic and / or flexible material.
- the intermediate element 7 is made of a preferably closed-cell foam, in particular of polyurethane.
- the cap 6 or the intermediate element 7 preferably has a static modulus of elasticity with a static permanent load of more than 0.5 N / mm 2 , preferably more than 1 N / mm 2 , in particular more than 1.5 N / mm 2 , and / or less than 30 N / mm 2 , preferably less than 15 N / mm 2 , in particular less than 7.0 N / mm 2 , and / or a dynamic elastic modulus at a dynamic continuous load of 10 Hz of more than 0.5 N / mm 2 , preferably more than 1 N / mm 2 , in particular more than 1.3 N / mm 2 , and / or less than 20 N / mm 2 , preferably less than 10 N / mm 2 , in particular less than 8.0 N / mm 2 , and / or a compression hardness at 10% deformation of more than 0.05 N / mm 2 , preferably more than 0.1 N / mm 2 , in particular more than 0.2
- the polishing element 8 is preferably made of a harder and / or stiffer material than the intermediate element 7.
- the polishing element 8 is preferably formed thin-walled and / or foil-like.
- the density, preferably in accordance with DIN EN ISO 845: 2009-10, of the polishing element 8 is preferably more than 300 kg / m 3 , in particular more than 500 kg / m 3 , particularly preferably more than 700 kg / m 3 , and / or preferably less than 4000 kg / m 3 , in particular less than 3000 kg / m 3 , particularly preferably less than 2000 kg / m 3 .
- the polishing element 8 or the cap 6 or polishing surface 9 preferably has a Shore A hardness of more than 5, in particular more than 10, more preferably more than 20, and / or preferably less than 90, in particular less than 80, more preferably less than 70, in particular according to DIN ISO EN 868: 2003-10 or DIN ISO 7619-1: 2012-02, on.
- the polishing element 8 preferably has a thickness of more than 0.1 mm, in particular more than 0.3 mm, more preferably more than 0.4 mm, and / or preferably less than 3 mm, in particular less than 2 mm, more preferably less than 1 mm, on.
- the thickness of the intermediate element 7 is preferably more than 2 mm and / or less than 10 mm, in particular about 3 to 7 mm.
- the thickness of the intermediate element 7 is preferably at least 5 times, in particular approximately 10 times, the thickness of the polishing element 8 or more.
- the cap 6, the intermediate element 7 and / or the polishing element 8 preferably has or each have an at least substantially constant thickness.
- the polishing element 8 or the polishing surface 9 is preferably formed or produced from an open-cell or closed-cell plastic or composite material or the like.
- the polishing element 8 is preferably made of a plastic film or of polyurethane.
- the cap 6 or the intermediate element 7 and / or polishing element 8 is or are preformed or shaped to conform to the curvature of the head 5 and / or to achieve a desired curvature or other shape, such as a ball, preferably inside and / or outside, So adjusted before attaching to the tool 3 and head 5 in their shape of the head 5, in particular provided with a complementary curvature to the head 5 and intermediate element 7.
- the tool 3 or the head 5 preferably forms a solid or non-compliant surface made of metal or other suitable material for the support and in particular also attachment of the cap 6 or elements 7, 8 arranged thereon.
- / or polishing element 8 is particularly preferably mechanically, in particular by turning and / or milling.
- Particularly preferred Voilmaterial is machined to the desired shape mechanically.
- the mechanical processing has the advantage that a very uniform material layer, without material compression, deformation or other Materialunre- irregularities with the desired shape, in particular a cap-like or spherical, possibly also other shape can be produced.
- the said shaping can also take place, for example, by appropriate foaming or other prototyping.
- the preformed or machined cap 6 or correspondingly preformed or machined elements 7 and 8 is or are attached to the tool 3 or head 5, in particular by gluing.
- the polishing element 8 is attached to the intermediate element 7 by gluing.
- another connection can be made with it.
- stress-free means, in particular, that in the applied state no local material deformations or stresses in the material of the cap 6 or elements 7, 8 occur due to adaptation to the curvature, which is caused by deformation during adaptation to the arched shape - He would and a uniform and in particular defined spring and damping behavior of the cap 6 or elements 7, 8 adversely affect (can).
- the polishing element 8 should be mounted stress-free in this sense, in particular to avoid any wrinkling.
- the polishing element 8 is adapted to the curvature of the outside of the intermediate element 7 by appropriate preforming, in particular shaping, prior to attachment to or connection to the intermediate element 7,
- the tool 3 or its carrier 4 preferably has a collar
- the tool 3 or the carrier 4 preferably has a connection section
- the tool 3 is clamped or fastened to the tool spindle 13 by means of the tool chuck 14.
- the stop 12 in this case serves in particular a defined axial position of the tool 3 on the tool spindle 13 or on the tool chuck 14.
- other design solutions are also possible.
- tools 3 with different curvature radii of the head 5 or the cap 6 or the polishing surface 9 are used depending on the shape of the surface 2A to be polished.
- the radius of curvature of the polishing surface 9 is preferably more than 2 mm, in particular more than 3 mm or 5 mm, and / or preferably less than 1000 mm, in particular less than 500 mm, particularly preferably less than 100 mm, preferably as a function of the (maximum ) Curvature of the surface to be polished 2A and / or the desired use.
- the distance of the polishing surface 9, in particular at the intersection with the axis of rotation R, to the stop 12 is preferably the same for all tools 3 even with different curvature or curvature.
- the device according to the preamble 1 has the tool spindle 13 for rotating the associated or clamped tool 3 about an axis of rotation R, as indicated in FIG. 1.
- the rotational speed is preferably about 1000 to 5000 revolutions per minute.
- the rotational speed is preferably controlled or regulated.
- the rotational speed is kept constant during the polishing process.
- a change in the rotational speed during a polishing operation or an adaptation of the rotational speed to a respective tool 3 and / or workpiece 2 or for each polishing operation is possible.
- the rotation of the tool 3 is preferably carried out without detection of the angle of rotation. It is therefore not a controlled axis of rotation in the sense of a CNC control.
- the tool spindle 13 and thus the tool 3 are pivotable about a pivot axis B. In particular, it is a controlled or controlled pivot axis or C C-axis, also called rotary axis. In particular, the pivotal position is detected.
- a defined pivoting is enabled, as exemplified by the three different positions shown in FIG.
- the pivot axis B runs in the representation example transverse and in particular perpendicular to the axis of rotation R or drawing plane.
- the pivot axis B is preferably arranged as close as possible to the tool 3 or to the polishing surface 9 and / or to the tool chuck 14.
- the device 1 has a workpiece drive 15, in particular a workpiece spindle, for the workpiece 2, so that the workpiece 2 to be polished is rotatable about the rotation axis C with a defined angular position.
- the workpiece 2 is held by a holder 18, such as a block piece, and / or held by means of a chuck on the workpiece drive 1 5 with a defined angular position or coupled with this.
- the rotation axis C is in particular a controlled or controlled axis or a CNC axis, also called a rotary axis.
- the rotational angle position is detected here.
- an angle-dependent variation of the rotational speed is made possible even within one revolution.
- the rotational speed of the workpiece drive 15 or of the workpiece 2 is generally variable, in particular, for example, from about 10 or 20 revolutions per minute (for polishing at the edge 2C of the side 2A of the workpiece 2 to be polished) up to about 2000 to 3000 revolutions per minute (FIG. for polishing in the area of the center 2B of the workpiece 2).
- the C-axis preferably extends in a plane with the axis of rotation R (independent of the pivotal position of the tool spindle 13) and / or transversely or perpendicular to the pivot axis B.
- the workpiece drive 15 and thus the workpiece 2 are preferably linearly movable in the Z direction or adjustable, as indicated in Fig. 1. The adjustment is carried out in particular by means of a carriage and adjusting drive, not shown, or the like.
- the Z axis preferably runs parallel to the C axis and / or transversely or perpendicular to the pivot axis B.
- the tool spindle 13 and thus the tool 3 is preferably adjustable transversely in the X direction, in particular by means of a carriage, not shown, and one associated drive.
- This carriage then preferably also carries the B axis and the corresponding pivot drive for pivoting the tool spindle 13.
- the X-axis and Z-axis are preferably each formed as a controlled or controlled axis or as a CNC axis or linear axis, so that an accurate positioning in the X and Z directions is made possible.
- the X-axis preferably runs transversely or perpendicular to the C-axis, B-axis and / or Z-axis.
- the X-axis preferably runs in or parallel to the common plane of the C-axis and R-axis.
- the axes can also be stacked or distributed differently.
- the Z-axis of the tool spindle 13 may be assigned instead of the workpiece drive 15.
- the B-axis and / or X-axis are not realized on the tool side, but on the workpiece side.
- the device 1 is, in particular, a polishing machine or CNC machine with X, Z, B and C axes.
- the X-axis and / or the B-axis is horizontal.
- the C-axis and / or the Z-axis is vertical.
- the polishing tools 3 are each with their polishing surfaces 9 in height or in the vicinity of the B axis, so that the contact surface A can be pivoted as possible with a minimum radius.
- the B-axis is preferably less than 100 or 50 mm, in particular less than 30 or 1 5 mm, more preferably less than 10 mm from the polishing surface 9 or contact surface A, in particular from the intersection of the axis of rotation R with the polishing surface 9, spaced , In particular, this distance is preferably at least substantially the same for tools 3 with other radii of curvature of the polishing surface 9.
- the B-axis preferably intersects the axis of rotation R within the cap 6 or polishing surface 9.
- the tool 3 in particular as indicated by arrow W in Fig. 1 and in Fig. 3 schematically on the workpiece 2 and the surface to be polished 2A are moved.
- the tool 3 is particularly preferably moved starting from an edge 2C of the workpiece 2 or the surface 2A toward the center 2B and beyond it to the opposite side of the edge 2C, as illustrated in FIGS. 1 and 3.
- This avoids and thereby enables or ensures a more optimal processing or a defined removal of material.
- the polishing surface 9 of the tool 3 lies only in regions with a contact surface A on the workpiece 2 to be polished or its surface 2A, as shown schematically in particular in FIG. 4, which represents a fragmentary enlargement of the dash-dotted circular region of FIG.
- the contact surface A is preferably at least substantially circular, depending on the three-dimensional shape of the surface 2A.
- the contact surface A with which the polishing surface 9 rests against the workpiece 2 or the surface 2A, is also indicated.
- the plane normal N intersects the axis of rotation R of the tool 3 at a (relative) tilt angle K, as indicated in FIGS. 1 and 4.
- polishing with the tool 3 takes place in such a way that the contact surface A lies off-center with respect to the axis of rotation R on the polishing surface 9.
- tilt angle K of more than 0 °, in particular more than 2 °, particularly preferably more than 5 ° or 10 °, and / or preferably less than 50 °, in particular less than 30 °, more preferably less than 25 °, worked or polished.
- the tilt angle K is kept constant during the polishing process. This is achieved by corresponding pivoting of the tool spindle 13 and the tool 3.
- the swivel angle S (angle of the rotation axis R to the C axis) then varies accordingly along the tool path W, as indicated schematically in FIG. 1, for example, by a small swivel angle. Angle S in the left position over a mean swivel angle S in the middle position to a large swivel angle S in the right position.
- a polishing process in the sense of the present invention designates the complete polishing of the surface 2A of the workpiece 2 to be polished with a tool 3.
- the tool path W is traversed or traversed by the tool 3, while on the one hand the tool 3 and on the other hand, the workpiece 2 rotates.
- the contact surface A or its center AM then passes over the surface 2A to be polished into a particularly spiral polishing path P, as indicated in FIG. 3, however, only schematically. Namely, the spiral polishing path P is passed through once when the tool 3 or the abutment surface A moves from the edge region 2C to the center 2B or to the rotational axis C, respectively.
- the device 1 is particularly preferably designed or controlled such that a uniform spiral or an at least substantially constant distance PA between adjacent polishing tracks PS of the polishing path P is reached or passed through, as indicated in FIG. 3.
- the distance PA is therefore particularly preferably kept at least substantially constant.
- the distance PA may alternatively vary, in particular depending on the workpiece radius at which the center of the contact surface (even) is located.
- the diameter AD of the contact surface A is particularly preferably at least by a factor of 10 or 20 greater than the spiral spacing or spacing PA of adjacent polishing tracks PS.
- the tool 3 rotates opposite to the workpiece 2.
- a rectified rotation is possible.
- the tool 3 rotates (much) faster than the workpiece 2.
- the rotational speed of the workpiece 2 and, consequently, the speed of movement of the workpiece 2 along the tool path W are constant increased from the edge 2C towards the center 2B and then reduced again towards the edge.
- the rotational speed of the workpiece 2 during one revolution in particular depending on the rotational position, the diameter AD of the contact surface A, the contact pressure of the tool 3 on the workpiece 2, the Eindiefeiefe E of the polishing surface 9 and / or the profile of the workpiece. 2 be varied in order to achieve a particularly uniform material removal or a desired polishing result. This allows in particular a highly accurate polishing processing.
- the device 1 is embodied or the proposed method is implemented such that the size or the diameter AD of the abutment surface A is at least substantially kept constant during the polishing process. This is conducive to a uniform or defined material removal.
- the size or the diameter AD of the contact surface A is determined in particular by the in Fig. 4 schematically indicated Eindiefeiefe E of the polishing surface 9 by appropriate delivery of the tool 3 during the polishing process, but also depends on the surface shape of the workpiece 2, in particular the respective Curvature ratios and from the curvature of the polishing surface 9 from.
- the indentation depth E of the polishing surface 9 and thus also the size or diameter AD of the abutment surface A are correspondingly varied.
- the indentation depth E of the polishing surface 9 is varied by appropriate infeed of the tool 3 during a polishing operation such that an at least substantially constant diameter AD is obtained, even with different curvatures of the surface 2A to be polished, particularly preferably with an aspherical surface 2A the contact surface A is enough. This is conducive to uniform or defined material removal over the entire polishing process.
- the diameter AD of the contact surface A decreases from the edge 2C to the center 2B and increases in the reverse direction.
- the speed of the C-axis is preferably derived from calculated residence times of the contact surface A over certain partial surfaces of the surface 2A to be polished.
- the web speed or rotational speed of the workpiece 2 is changed within one revolution. In this way, in particular within one revolution, different polishing or residence times, depending on the required error correction, can be realized.
- the speed of the X-axis is adjusted so that the desired constant spiral spacing or spacing PA of adjacent polishing tracks PS remains constant per revolution. Accordingly, then the feed in the X direction is directly coupled to the speed or number of revolutions of the C axis or vice versa.
- the optimum dwell time of the tool 3 or of the contact surface A is determined in advance by means of local areas on the surface 2A of a simulation to be polished. Subsequently, the corresponding web positions and web speeds are determined from the calculated local residence times.
- the optimum indentation depth E of the polishing surface 9 or delivery of the tool 3 on the workpiece 2 is optimally determined depending on the tool 3 and geometry of the surface 2 to be polished, in particular by means of appropriate calculations, estimates and / or measurements, the indentation depth E during the polishing process in particular is adjusted so that the diameter AD of the contact surface A remains as constant as possible.
- the proposed polishing tool 3 is characterized in particular by a cap 6 or a cap structure with defined spring and damping properties. shadow out.
- the Eindschreibiefe E very accurately the size of the contact surface A can be influenced.
- the indentation depth E is preferably more than 0.1 mm and / or less than 0.8 mm.
- the size or the diameter AD of the contact surface A is preferably more than 1 mm, in particular more than 3 mm, and / or less than 25 mm, in particular less than 15 or 10 mm.
- a zonal polishing of the workpiece 2 is particularly preferred.
- “Zonal” means that the contact surface A is substantially smaller than the surface 2A of the workpiece 2 to be polished, in particular with respect to the radial extent of the workpiece 2 average or largest diameter AD of Aniageflache A much smaller than the mean or largest radius of the workpiece 2.
- the mean or largest radius of the workpiece 2 at least by a factor of 2, 3 or 5 is greater than the mean or largest diameter AD of the contact surface A.
- the device 1 also has a feed, not shown, for polishing agents, as usual in polishing machines, so that the polishing agent can be supplied in the desired manner during polishing.
- the proposed tool 3, the proposed device 1 and / or the proposed method can or can be used in particular for polishing precision optics or aspherical surfaces or other optical workpieces, preferably measuring the surface shape before polishing and thus by polishing a desired Surface shape can be achieved. This is also called correction polishing.
- the polishing can be carried out in particular with an accuracy of 10 to 100 nm.
- Tools 3 with smaller radii of curvature of the polishing surface 9, in particular with radii of curvature of less than 100 mm, more preferably less than 50 mm, are preferably used for correction purposes.
- Tools 3 with larger radii of curvature of the polishing surface 9, in particular of up to 1000 mm, are preferably used for pre-polishing.
- the proposed device 1 and the proposed method can basically be used both for pre-polishing and for corrective polishing. Individual aspects and features of the present invention can be implemented independently of one another, but also in any desired combination.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102016006741.1A DE102016006741A1 (de) | 2016-06-06 | 2016-06-06 | Werkzeug, Vorrichtung und Verfahren zum Polieren von Linsen |
PCT/EP2017/025160 WO2017211467A1 (fr) | 2016-06-06 | 2017-06-02 | Outil, dispositif et procédé de polissage de lentilles |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3463751A1 true EP3463751A1 (fr) | 2019-04-10 |
Family
ID=59034713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17729015.2A Pending EP3463751A1 (fr) | 2016-06-06 | 2017-06-02 | Outil, dispositif et procédé de polissage de lentilles |
Country Status (5)
Country | Link |
---|---|
US (1) | US11890712B2 (fr) |
EP (1) | EP3463751A1 (fr) |
CN (1) | CN109414795A (fr) |
DE (1) | DE102016006741A1 (fr) |
WO (1) | WO2017211467A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110352115A (zh) * | 2017-03-06 | 2019-10-18 | 应用材料公司 | 为cmp位置特定研磨(lsp)设计的螺旋及同心圆移动 |
DE102018202570A1 (de) | 2018-02-20 | 2019-08-22 | Carl Zeiss Smt Gmbh | Verfahren zum Polieren eines Werkstücks bei der Herstellung eines optischen Elements |
DE102019005294A1 (de) | 2019-01-17 | 2020-07-23 | Schneider Gmbh & Co. Kg | Polierwerkzeug und Vorrichtung zum Polieren eines Werkstücks |
GB2582639B (en) * | 2019-03-29 | 2023-10-18 | Zeeko Innovations Ltd | Shaping apparatus, method and tool |
CN115383560A (zh) * | 2022-10-31 | 2022-11-25 | 中国科学院长春光学精密机械与物理研究所 | 抛光磨头、抛光设备、光学镜片非球面模具的抛光方法 |
CN118305690B (zh) * | 2024-06-07 | 2024-09-27 | 中国科学院光电技术研究所 | 一种非球面光学元件分区加工方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3430391A (en) * | 1962-12-31 | 1969-03-04 | Indiana Contact Lens Inc | Apparatus for altering the power of a corneal contact lens |
US4979337A (en) * | 1986-10-03 | 1990-12-25 | Duppstadt Arthur G | Polishing tool for contact lenses and associated method |
US4989316A (en) | 1987-03-09 | 1991-02-05 | Gerber Scientific Products, Inc. | Method and apparatus for making prescription eyeglass lenses |
US5320006A (en) * | 1991-09-27 | 1994-06-14 | Coburn Optical Industries, Inc. | Methods and apparatus for producing ophthalmic lenses |
US5577950A (en) * | 1993-11-29 | 1996-11-26 | Coburn Optical Industries, Inc. | Conformal tool operating apparatus and process for an ophthalmic lens finer/polisher |
JPH0985603A (ja) * | 1995-09-28 | 1997-03-31 | Nikon Corp | 研磨方法及び研磨装置 |
JP2000071154A (ja) * | 1998-08-28 | 2000-03-07 | Canon Inc | 研磨工具の製作方法 |
JP2002535151A (ja) * | 1998-12-01 | 2002-10-22 | ユニヴァーシティ カレッジ ロンドン | 研磨装置および方法 |
DE50114907D1 (de) * | 2000-02-03 | 2009-07-02 | Carl Zeiss Vision Gmbh | Verfahen zum Polieren und Poliermaschine |
EP1203626B1 (fr) * | 2000-02-16 | 2007-04-11 | Seiko Epson Corporation | Procede de fabrication de verres de lunettes, et outil de polissage |
JP2001263101A (ja) | 2000-03-14 | 2001-09-26 | Fuji Heavy Ind Ltd | エンジンのバルブタイミング制御装置 |
DE10031057B4 (de) | 2000-06-26 | 2005-04-07 | Optotech Optikmaschinen Gmbh | Verfahren und Vorrichtung zum korrigierenden Feinstpolieren von vorbearbeiteten optischen Linsen und Spiegeln |
US8062098B2 (en) * | 2000-11-17 | 2011-11-22 | Duescher Wayne O | High speed flat lapping platen |
JP2002154040A (ja) * | 2000-11-20 | 2002-05-28 | Ikegami Kanagata Kogyo Kk | 回転工具 |
FR2823143B1 (fr) | 2001-04-10 | 2003-07-04 | Essilor Int | Outil torique de polissage d'une surface optique d'une lentille, et procede de polissage d'une surface atorique au moyen d'un tel outil |
JP2003340698A (ja) * | 2002-05-30 | 2003-12-02 | Hoya Corp | レンズ加工装置及びレンズ加工方法 |
US20040229553A1 (en) * | 2003-05-16 | 2004-11-18 | Bechtold Michael J. | Method, apparatus, and tools for precision polishing of lenses and lens molds |
DE102004047563A1 (de) | 2004-09-30 | 2006-04-06 | Asphericon Gmbh | Verfahren zum Polieren |
DE602005004229T2 (de) * | 2004-11-09 | 2009-01-02 | Seiko Epson Corp. | Elastisches Polierwerkzeug und Verfahren zum Polieren einer Linse mit einem solchen Werkzeug |
US7312154B2 (en) * | 2005-12-20 | 2007-12-25 | Corning Incorporated | Method of polishing a semiconductor-on-insulator structure |
JP4598749B2 (ja) * | 2006-12-21 | 2010-12-15 | セイコーエプソン株式会社 | 粘着テープ及び粘着テープの貼り付け方法 |
DE102009004787A1 (de) | 2009-01-13 | 2010-07-15 | Schneider Gmbh & Co. Kg | Vorrichtung und Verfahren zum Polieren von Linsen |
DE102010035526A1 (de) * | 2010-08-25 | 2012-03-01 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Feinbearbeitungsmembran und -werkzeug |
JP5864298B2 (ja) * | 2011-02-21 | 2016-02-17 | Hoya株式会社 | 眼鏡レンズの製造方法 |
JP5809816B2 (ja) | 2011-03-08 | 2015-11-11 | オリンパス株式会社 | レンズ研磨皿の作製方法 |
DE102013108766B4 (de) * | 2013-08-13 | 2023-11-16 | Optotech Optikmaschinen Gmbh | Polierverfahren zur Bearbeitung einer optischen Oberfläche einer optischen Linse und hierfür geeignete Polierwerkzeuge |
WO2015190189A1 (fr) * | 2014-06-10 | 2015-12-17 | オリンパス株式会社 | Outil de meulage, procédé de meulage et dispositif de meulage |
DE102014015052A1 (de) * | 2014-10-15 | 2016-04-21 | Satisloh Ag | Polierteller für ein Werkzeug zur Feinbearbeitung von optisch wirksamen Flächen an Brillengläsern |
JP6378626B2 (ja) * | 2014-12-17 | 2018-08-22 | オリンパス株式会社 | 光学素子の加工用工具および光学素子の製造方法 |
US11358250B2 (en) * | 2016-07-08 | 2022-06-14 | Kojima Engineering Co., Ltd. | Spherical lens surface processing method and spherical lens surface processing apparatus with cup-shaped grinding stone |
DE102019005084A1 (de) * | 2019-07-16 | 2021-01-21 | Schneider Gmbh & Co. Kg | Polierwerkzeug sowie Vorrichtung zum Polieren eines Werkstücks |
-
2016
- 2016-06-06 DE DE102016006741.1A patent/DE102016006741A1/de active Pending
-
2017
- 2017-06-02 WO PCT/EP2017/025160 patent/WO2017211467A1/fr unknown
- 2017-06-02 EP EP17729015.2A patent/EP3463751A1/fr active Pending
- 2017-06-02 CN CN201780042480.XA patent/CN109414795A/zh active Pending
- 2017-06-02 US US16/307,174 patent/US11890712B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN109414795A (zh) | 2019-03-01 |
US20190126425A1 (en) | 2019-05-02 |
US11890712B2 (en) | 2024-02-06 |
DE102016006741A1 (de) | 2017-12-07 |
WO2017211467A1 (fr) | 2017-12-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3463751A1 (fr) | Outil, dispositif et procédé de polissage de lentilles | |
EP1608485B1 (fr) | Procede et dispositif pour realiser des verres de lunettes et d'autres corps moules ayant des surface optiquement actives | |
EP0807491B1 (fr) | Support pour lentille optique et procédé pour polir des lentilles | |
EP2338640B1 (fr) | Machine de meulage de pièces optiques, en particuliere de verres à lunettes en plastique | |
EP3206837B1 (fr) | Disque à polir pour un outil destiné au traitement précis de surfaces optiques actives en particulier sur des verres de lunettes | |
EP1711311B2 (fr) | Dispositif et procede pour polir une surface optique et procede pour realiser un outil de polissage | |
EP3463746B1 (fr) | Machine pour le traitement des surfaces à effet optique | |
DE102007034706B3 (de) | Schleifzentrum und Verfahren zum gleichzeitigen Schleifen mehrerer Lager und endseitigen Flächen von Kurbelwellen | |
EP0685298B2 (fr) | Procédé et dispositif pour fabriquer des lentilles asphériques | |
DE102007026562A1 (de) | Schleifzentrum und Verfahren zum gleichzeitigen Schleifen mehrerer Lager von Kurbelwellen | |
DE4320934A1 (de) | Brillenglasrandschleifmaschine | |
DE102006026524A1 (de) | Maschine zur Bearbeitung von optischen Werkstücken, insbesondere von Kunststoff-Brillengläsern | |
DE10310561B4 (de) | Verfahren und Vorrichtung zur Fertigung von Brillengläsern und anderen Formkörpern mit optisch aktiven Oberflächen | |
DE19751750B4 (de) | Verfahren und Vorrichtung zum Herstellen von polierbaren, optischen Linsen aus Linsenrohlingen | |
EP3230008A1 (fr) | Lunette de mesure pour supporter et mesurer des zones de pièce centrées, meuleuse pourvue d'une telle lunette de mesure et procédé de support et de mesure de zones de pièce centrées | |
EP0727280B1 (fr) | Appareil pour polir des lentilles sphériques | |
DE102007050470A1 (de) | Verfahren zum Herstellen von optisch aktiven Oberflächen durch Polieren von vorgeschliffenen Linsen und eine Vorrichtung zur Durchführung des Verfahrens | |
EP0937542A1 (fr) | Procédé pour polir des lentilles et dispositif de polissage avec plusieurs mandrins et outils pour mettre en oeuvre ce procédé | |
DE102007024760A1 (de) | Verfahren zum Feinstschleifen von im Querschnitt gekrümmten Flächen an ringförmigen Werkstücken | |
DE29803158U1 (de) | Mehrspindel-Poliermaschine mit verschiedenen Polierwerkzeugen | |
DE102012216724A1 (de) | Verfahren und Vorrichtung zur Polierbearbeitung von Brillenlinsen und Gießformen für die Brillenlinsenherstellung sowie entsprechendes Verfahren zur Herstellung von Brillenlinsen und Gießformen für die Brillenlinsenherstellung | |
WO2015150201A1 (fr) | Outil de polissage ainsi que dispositif et procédé de polissage de surface de verres de lunettes optimisé en termes de défauts de moulage et coques de moulage pour fabriquer des verres de lunettes | |
DE102004058797A1 (de) | Verfahren und Werkzeug zur Bearbeitung von Funktionselementen mit gekrümmten Oberflächen | |
DE102004028544B4 (de) | Verfahren zur Bearbeitung und Vermessung von rotationssymmetrischen Werkstücken sowie Schleif- und Polierwerkzeug | |
DE202006005710U1 (de) | Maschine zur Bearbeitung von optischen Werkstücken, insbesondere von Kunststoff-Brillengläsern |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: UNKNOWN |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20180914 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |
|
17Q | First examination report despatched |
Effective date: 20201015 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: EXAMINATION IS IN PROGRESS |