EP1576653B1 - Substrat a semi-conducteur presentant un materiau composite en cuivre-diamant et son procede de production - Google Patents
Substrat a semi-conducteur presentant un materiau composite en cuivre-diamant et son procede de production Download PDFInfo
- Publication number
- EP1576653B1 EP1576653B1 EP03768542.7A EP03768542A EP1576653B1 EP 1576653 B1 EP1576653 B1 EP 1576653B1 EP 03768542 A EP03768542 A EP 03768542A EP 1576653 B1 EP1576653 B1 EP 1576653B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- copper
- composite
- semiconductor package
- die
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/06—Containers; Seals characterised by the material of the container or its electrical properties
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3732—Diamonds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8538—Bonding interfaces outside the semiconductor or solid-state body
- H01L2224/85399—Material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01066—Dysprosium [Dy]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
Claims (7)
- Boîtier de semi-conducteur (10) comprenant un substrat métallique (12 ; 30), le substrat métallique (12 ; 30) comprenant un corps (20 ; 32) et des couches de cuivre pur (22, 24 ; 34, 36), dans lequel les couches de cuivre (22, 24 ; 34, 36) sont montées sur les surfaces latérales (26, 28 ; 38, 40) opposées du corps (20 ; 32), caractérisé en ce que le corps (20 ; 32) est au moins partiellement composé d'un composite de particules de diamant dans une matrice de cuivre.
- Boîtier de semi-conducteur (10) selon la revendication 1, dans lequel le corps (20) est entièrement composé du composite de particules de diamant dans une matrice de cuivre.
- Boîtier de semi-conducteur (10) selon la revendication 1, dans lequel le corps (32) est composé d'un composite cuivre/tungstène comportant un insert composite (42) de particules de diamant dans une matrice de cuivre dans celui-ci.
- Boîtier de semi-conducteur (10) selon la revendication 1, comprenant en outre une puce (14) montée sur l'une de la paire de couches de cuivre (22, 24), une pluralité d'isolateurs (16) montés sur l'une de la paire de couches de cuivre (22, 44) adjacents à la puce (14), une pluralité de conducteurs montés sur les isolateurs (16) et une pluralité de fils de liaison (19) couplant les conducteurs à la puce (14).
- Boîtier de semi-conducteur (10) selon la revendication 1, dans lequel le corps (20) a une configuration généralement plane ayant une épaisseur généralement uniforme entre les surfaces latérales (26, 28) opposées, et la paire de couches de cuivre (22, 24) a une configuration généralement plane relativement mince d'une épaisseur entre 30 nm et 2 µm.
- Boîtier de semi-conducteur (10) selon la revendication 1, dans lequel les particules de diamant sont revêtues de l'un ou de plusieurs du Cr, W, Mo, Co, Cu, Ti, Si, SiC, TiN, TiC, Ta et Zr.
- Boîtier de semi-conducteur (10) selon la revendication 1, dans lequel les particules de diamant sont revêtues d'une couche de Cr, d'une couche de W, d'une couche de Co et d'une couche de Cu.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12189387.9A EP2587536B8 (fr) | 2002-11-07 | 2003-10-24 | Substrat semi-conducteur comportant un matériau composite en cuivre/diamant et son procédé de fabrication |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US291126 | 2002-11-07 | ||
US10/291,126 US6727117B1 (en) | 2002-11-07 | 2002-11-07 | Semiconductor substrate having copper/diamond composite material and method of making same |
PCT/US2003/033945 WO2004044950A2 (fr) | 2002-11-07 | 2003-10-24 | Substrat a semi-conducteur presentant un materiau composite en cuivre/diamant et son procede de production |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12189387.9A Division EP2587536B8 (fr) | 2002-11-07 | 2003-10-24 | Substrat semi-conducteur comportant un matériau composite en cuivre/diamant et son procédé de fabrication |
EP12189387.9 Division-Into | 2012-10-22 |
Publications (4)
Publication Number | Publication Date |
---|---|
EP1576653A3 EP1576653A3 (fr) | 2005-08-18 |
EP1576653A2 EP1576653A2 (fr) | 2005-09-21 |
EP1576653A4 EP1576653A4 (fr) | 2008-11-12 |
EP1576653B1 true EP1576653B1 (fr) | 2013-06-12 |
Family
ID=32107653
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12189387.9A Expired - Lifetime EP2587536B8 (fr) | 2002-11-07 | 2003-10-24 | Substrat semi-conducteur comportant un matériau composite en cuivre/diamant et son procédé de fabrication |
EP03768542.7A Expired - Lifetime EP1576653B1 (fr) | 2002-11-07 | 2003-10-24 | Substrat a semi-conducteur presentant un materiau composite en cuivre-diamant et son procede de production |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12189387.9A Expired - Lifetime EP2587536B8 (fr) | 2002-11-07 | 2003-10-24 | Substrat semi-conducteur comportant un matériau composite en cuivre/diamant et son procédé de fabrication |
Country Status (10)
Country | Link |
---|---|
US (1) | US6727117B1 (fr) |
EP (2) | EP2587536B8 (fr) |
JP (1) | JP2006505951A (fr) |
KR (1) | KR100745872B1 (fr) |
CN (2) | CN1768420A (fr) |
AU (1) | AU2003291654A1 (fr) |
CA (2) | CA2505593C (fr) |
HK (1) | HK1080994A1 (fr) |
IL (1) | IL168429A (fr) |
WO (1) | WO2004044950A2 (fr) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT6666U1 (de) * | 2002-09-23 | 2004-01-26 | Plansee Ag | Wärmesenke aus diamant-haltigem verbundwerkstoff mit mehrlagigem überzug |
JP2004146413A (ja) * | 2002-10-22 | 2004-05-20 | Sumitomo Electric Ind Ltd | 半導体素子収納用パッケージおよび半導体装置 |
JP2004200346A (ja) * | 2002-12-18 | 2004-07-15 | Sumitomo Electric Ind Ltd | 半導体素子収納用パッケージ、その製造方法及び半導体装置 |
US7298046B2 (en) * | 2003-01-10 | 2007-11-20 | Kyocera America, Inc. | Semiconductor package having non-ceramic based window frame |
US7861768B1 (en) * | 2003-06-11 | 2011-01-04 | Apple Inc. | Heat sink |
US7279023B2 (en) * | 2003-10-02 | 2007-10-09 | Materials And Electrochemical Research (Mer) Corporation | High thermal conductivity metal matrix composites |
KR100786488B1 (ko) * | 2004-01-10 | 2007-12-18 | 에이치브이브이아이 세미콘덕터즈, 인크. | 전력 반도체 장치 |
US8530963B2 (en) | 2005-01-06 | 2013-09-10 | Estivation Properties Llc | Power semiconductor device and method therefor |
US7335534B2 (en) * | 2005-01-10 | 2008-02-26 | Hvvi, Semiconductors, Inc. | Semiconductor component and method of manufacture |
US7605451B2 (en) * | 2006-06-27 | 2009-10-20 | Hvvi Semiconductors, Inc | RF power transistor having an encapsulated chip package |
US20080017998A1 (en) * | 2006-07-19 | 2008-01-24 | Pavio Jeanne S | Semiconductor component and method of manufacture |
CN100400689C (zh) * | 2007-04-10 | 2008-07-09 | 天津大学 | 化学共沉积制备纳米金刚石增强铜基复合材料的方法 |
CN101139515B (zh) * | 2007-05-18 | 2010-08-18 | 中南大学 | 一种高导热金刚石-铜复合封装材料及其制备方法 |
CN101070461B (zh) * | 2007-05-18 | 2011-04-20 | 中南大学 | 一种超高导热金刚石-铜复合封装材料及其生产方法 |
US8067834B2 (en) * | 2007-08-21 | 2011-11-29 | Hvvi Semiconductors, Inc. | Semiconductor component |
US20090108437A1 (en) * | 2007-10-29 | 2009-04-30 | M/A-Com, Inc. | Wafer scale integrated thermal heat spreader |
US7660335B2 (en) * | 2008-04-17 | 2010-02-09 | Lasertel, Inc. | Liquid cooled laser bar arrays incorporating diamond/copper expansion matched materials |
US8828804B2 (en) * | 2008-04-30 | 2014-09-09 | Infineon Technologies Ag | Semiconductor device and method |
US7754533B2 (en) * | 2008-08-28 | 2010-07-13 | Infineon Technologies Ag | Method of manufacturing a semiconductor device |
TWI387417B (zh) | 2008-08-29 | 2013-02-21 | Ind Tech Res Inst | 電路板結構及其製作方法 |
WO2010027504A1 (fr) * | 2008-09-08 | 2010-03-11 | Materials And Electrochemical Research (Mer) Corporation | Structure de matériaux composites à matrice métallique à base de métal/diamant usinable et son procédé de fabrication |
US20100208431A1 (en) * | 2008-10-09 | 2010-08-19 | Dugas Matthew P | Patterned Composite Structures and Methods of Making the Same |
AT11107U1 (de) * | 2008-11-20 | 2010-04-15 | Plansee Se | Wärmesenke sowie verfahren zu deren herstellung |
US20100139885A1 (en) * | 2008-12-09 | 2010-06-10 | Renewable Thermodynamics, Llc | Sintered diamond heat exchanger apparatus |
US20100319895A1 (en) * | 2009-06-19 | 2010-12-23 | Wei-En Chen | Heat spreader structure and method of manufacturing the same |
AU2010270992A1 (en) * | 2009-06-24 | 2012-02-09 | Third Millennium Metals, Llc | Copper-carbon composition |
US8637379B2 (en) * | 2009-10-08 | 2014-01-28 | Infineon Technologies Ag | Device including a semiconductor chip and a carrier and fabrication method |
WO2011049479A1 (fr) * | 2009-10-21 | 2011-04-28 | Andrey Mikhailovich Abyzov | Matériau composite ayant une conductivité thermique élevée et son procédé de fabrication |
CN101706226B (zh) * | 2009-11-23 | 2012-01-25 | 陈盈同 | 一种散热结构及其制造方法 |
JP5450313B2 (ja) | 2010-08-06 | 2014-03-26 | 株式会社東芝 | 高周波半導体用パッケージおよびその作製方法 |
MX2013010080A (es) | 2011-03-04 | 2014-04-16 | Third Millennium Metals Llc | Composiciones de aluminio-carbono. |
JP5896400B2 (ja) * | 2011-11-25 | 2016-03-30 | トーメイダイヤ株式会社 | ダイヤモンド含有ヒートシンク材及びその製法 |
US9035448B2 (en) | 2012-06-29 | 2015-05-19 | Materion Corporation | Semiconductor packages having metal composite base plates |
CN104733399A (zh) * | 2013-12-24 | 2015-06-24 | 北京有色金属研究总院 | 一种层状高导热绝缘基板及其制备方法 |
CN104046833A (zh) * | 2014-06-18 | 2014-09-17 | 南昌航空大学 | 一种高导热性能的金刚石/铜复合材料及其制备方法 |
JP5807935B1 (ja) | 2014-10-09 | 2015-11-10 | 株式会社半導体熱研究所 | 放熱基板と、それを使用した半導体用モジュール |
CN104651658B (zh) * | 2015-03-17 | 2017-01-11 | 北京科技大学 | 一种新型高导热铜基复合材料制备方法 |
US10246335B2 (en) * | 2016-05-27 | 2019-04-02 | Baker Hughes, A Ge Company, Llc | Methods of modifying surfaces of diamond particles, and related diamond particles and earth-boring tools |
US11025031B2 (en) | 2016-11-29 | 2021-06-01 | Leonardo Electronics Us Inc. | Dual junction fiber-coupled laser diode and related methods |
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US10847336B2 (en) | 2017-08-17 | 2020-11-24 | Bruker AXS, GmbH | Analytical X-ray tube with high thermal performance |
EP3451376A1 (fr) * | 2017-09-04 | 2019-03-06 | The Provost, Fellows, Foundation Scholars, and The Other Members of Board, of The College of The Holy and Undivided Trinity of Queen Elizabeth | Structures thermiques destinées à dissiper la chaleur et leurs procédés de fabrication |
WO2020036998A1 (fr) | 2018-08-13 | 2020-02-20 | Lasertel, Inc. | Utilisation d'une carte de circuit imprimé à noyau métallique (pcb) pour la génération d'une commande à impulsion à courant élevé ultra-étroite |
DE102019121924A1 (de) | 2018-08-14 | 2020-02-20 | Lasertel, Inc. | Laserbaugruppe und zugehörige verfahren |
US11296481B2 (en) | 2019-01-09 | 2022-04-05 | Leonardo Electronics Us Inc. | Divergence reshaping array |
US11752571B1 (en) | 2019-06-07 | 2023-09-12 | Leonardo Electronics Us Inc. | Coherent beam coupler |
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WO2021056133A1 (fr) * | 2019-09-23 | 2021-04-01 | 广东工业大学 | Nouvelle feuille composite en diamant à base de céramique et son procédé de préparation |
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CN114192750B (zh) * | 2021-12-15 | 2023-09-22 | 西华大学 | 一种金刚石/铜复合热导材料及其制备方法 |
US20230352360A1 (en) * | 2022-04-29 | 2023-11-02 | Macom Technology Solutions Holdings, Inc. | Diamond-metal composite high power device packages |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2034550A (en) | 1934-10-25 | 1936-03-17 | Gen Electric | Arcing tip and method for making the same |
US2401221A (en) | 1943-06-24 | 1946-05-28 | Gen Motors Corp | Method of impregnating porous metal parts |
US3303026A (en) | 1966-03-11 | 1967-02-07 | Mallory & Co Inc P R | Vacuum infiltrating of tungsten powder bodies with copper-titanium alloys |
US4333986A (en) | 1979-06-11 | 1982-06-08 | Sumitomo Electric Industries, Ltd. | Diamond sintered compact wherein crystal particles are uniformly orientated in a particular direction and a method for producing the same |
JPS5921032A (ja) | 1982-07-26 | 1984-02-02 | Sumitomo Electric Ind Ltd | 半導体装置用基板 |
WO1988009826A1 (fr) * | 1987-06-11 | 1988-12-15 | Norton Company | Elements de pcd (produit diamantaire polycristallin) enrobes ameliores, produits et procedes |
US5011514A (en) * | 1988-07-29 | 1991-04-30 | Norton Company | Cemented and cemented/sintered superabrasive polycrystalline bodies and methods of manufacture thereof |
US5008737A (en) | 1988-10-11 | 1991-04-16 | Amoco Corporation | Diamond composite heat sink for use with semiconductor devices |
US5130771A (en) | 1988-10-11 | 1992-07-14 | Amoco Corporation | Diamond composite heat sink for use with semiconductor devices |
US5024680A (en) | 1988-11-07 | 1991-06-18 | Norton Company | Multiple metal coated superabrasive grit and methods for their manufacture |
JP2746279B2 (ja) | 1990-06-18 | 1998-05-06 | 日本タングステン 株式会社 | 半導体装置用基板材料及びその製造方法 |
US5045972A (en) | 1990-08-27 | 1991-09-03 | The Standard Oil Company | High thermal conductivity metal matrix composite |
US5120495A (en) | 1990-08-27 | 1992-06-09 | The Standard Oil Company | High thermal conductivity metal matrix composite |
US5481136A (en) | 1992-10-28 | 1996-01-02 | Sumitomo Electric Industries, Ltd. | Semiconductor element-mounting composite heat-sink base |
JP3086558B2 (ja) * | 1993-02-19 | 2000-09-11 | 中部電力株式会社 | タービン高圧給水加熱器のトーラスリング自動切断装置 |
JPH06284556A (ja) * | 1993-03-30 | 1994-10-07 | Meidensha Corp | 三相4線式回路の地絡電流検出方式 |
US5886407A (en) | 1993-04-14 | 1999-03-23 | Frank J. Polese | Heat-dissipating package for microcircuit devices |
US6238454B1 (en) | 1993-04-14 | 2001-05-29 | Frank J. Polese | Isotropic carbon/copper composites |
US5455738A (en) | 1993-07-28 | 1995-10-03 | E-Systems, Inc. | High thermal conductivity, matched CTE. low density mounting plate for a semiconductor circuit |
US6264882B1 (en) | 1994-05-20 | 2001-07-24 | The Regents Of The University Of California | Process for fabricating composite material having high thermal conductivity |
US5686676A (en) | 1996-05-07 | 1997-11-11 | Brush Wellman Inc. | Process for making improved copper/tungsten composites |
GB9626221D0 (en) * | 1996-12-18 | 1997-02-05 | Smiths Industries Plc | Diamond surfaces |
JP3617232B2 (ja) | 1997-02-06 | 2005-02-02 | 住友電気工業株式会社 | 半導体用ヒートシンクおよびその製造方法ならびにそれを用いた半導体パッケージ |
KR100217032B1 (ko) | 1997-06-14 | 1999-09-01 | 박호군 | 구리 용침용 텅스텐 골격 구조 제조 방법 및 이를 이용한 텅스텐-구리 복합재료 제조 방법 |
JP3893681B2 (ja) | 1997-08-19 | 2007-03-14 | 住友電気工業株式会社 | 半導体用ヒートシンクおよびその製造方法 |
US6211463B1 (en) * | 1998-01-26 | 2001-04-03 | Saint-Gobain Industrial Ceramics, Inc. | Electronic circuit package with diamond film heat conductor |
US6106957A (en) | 1998-03-19 | 2000-08-22 | Smith International, Inc. | Metal-matrix diamond or cubic boron nitride composites |
JPH11289037A (ja) * | 1998-04-01 | 1999-10-19 | Sumitomo Metal Electronics Devices Inc | 放熱用金属板およびそれを用いた電子部品用パッケージ |
US6114048A (en) | 1998-09-04 | 2000-09-05 | Brush Wellman, Inc. | Functionally graded metal substrates and process for making same |
-
2002
- 2002-11-07 US US10/291,126 patent/US6727117B1/en not_active Expired - Lifetime
-
2003
- 2003-10-24 CN CNA2003801065126A patent/CN1768420A/zh active Pending
- 2003-10-24 EP EP12189387.9A patent/EP2587536B8/fr not_active Expired - Lifetime
- 2003-10-24 CA CA2505593A patent/CA2505593C/fr not_active Expired - Lifetime
- 2003-10-24 KR KR1020057008074A patent/KR100745872B1/ko active IP Right Grant
- 2003-10-24 CA CA2800957A patent/CA2800957C/fr not_active Expired - Lifetime
- 2003-10-24 AU AU2003291654A patent/AU2003291654A1/en not_active Abandoned
- 2003-10-24 JP JP2004551578A patent/JP2006505951A/ja active Pending
- 2003-10-24 CN CN2011100405466A patent/CN102214620B/zh not_active Expired - Fee Related
- 2003-10-24 WO PCT/US2003/033945 patent/WO2004044950A2/fr active Application Filing
- 2003-10-24 EP EP03768542.7A patent/EP1576653B1/fr not_active Expired - Lifetime
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2005
- 2005-05-05 IL IL168429A patent/IL168429A/en active IP Right Grant
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2006
- 2006-03-20 HK HK06103494.9A patent/HK1080994A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CA2800957C (fr) | 2015-03-17 |
EP2587536B1 (fr) | 2016-12-07 |
EP1576653A4 (fr) | 2008-11-12 |
WO2004044950A3 (fr) | 2005-08-18 |
WO2004044950A2 (fr) | 2004-05-27 |
CN102214620B (zh) | 2013-09-11 |
CN1768420A (zh) | 2006-05-03 |
IL168429A (en) | 2011-12-29 |
JP2006505951A (ja) | 2006-02-16 |
EP1576653A2 (fr) | 2005-09-21 |
CN102214620A (zh) | 2011-10-12 |
CA2505593A1 (fr) | 2004-05-27 |
AU2003291654A1 (en) | 2004-06-03 |
KR20050084963A (ko) | 2005-08-29 |
CA2800957A1 (fr) | 2004-05-27 |
CA2505593C (fr) | 2013-03-19 |
US6727117B1 (en) | 2004-04-27 |
EP2587536A1 (fr) | 2013-05-01 |
AU2003291654A8 (en) | 2004-06-03 |
HK1080994A1 (en) | 2006-05-04 |
EP2587536B8 (fr) | 2017-03-29 |
KR100745872B1 (ko) | 2007-08-02 |
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