EP1408141B1 - Methode et électrolyte pour la deposition galvanique des bronzes - Google Patents
Methode et électrolyte pour la deposition galvanique des bronzes Download PDFInfo
- Publication number
- EP1408141B1 EP1408141B1 EP02022718.7A EP02022718A EP1408141B1 EP 1408141 B1 EP1408141 B1 EP 1408141B1 EP 02022718 A EP02022718 A EP 02022718A EP 1408141 B1 EP1408141 B1 EP 1408141B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- electrolyte
- tin
- copper
- deposition
- wetting agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
Definitions
- the present invention relates to a process for the electrodeposition of bronzes, with which the substrate to be coated in an acidic electrolyte, which comprises at least tin and copper ions, an alkyl sulfonic acid and a wetting agent is metallized, and the representation of such an electrolyte.
- an acidic electrolyte which comprises at least tin and copper ions, an alkyl sulfonic acid and a wetting agent is metallized
- the European patent application EP 1 091 023 discloses a method for depositing tin-copper alloys for electrical engineering applications.
- the electrolytes known from said patent application may contain between 5 and 100 g / l of tin, 0.01 and 10 g / l of copper and an aromatic nonionic surfactant and an alkylsulfonic acid.
- an electrolyte for depositing tin-copper alloys which contains water-soluble tin salts, water-soluble copper salts, inorganic or organic acids or their water-soluble salts, and one or more compounds selected from the group consisting of thioamides and thiols.
- the thus deposited tin-copper alloys can serve as a replacement for lead-containing tin solders.
- an electrolyte for the deposition of specularly lustrous tin-copper alloys, wherein the electrolyte is an aqueous cyanide-free solution comprising organosulfonic acids, bivalent tin and copper salt and a brightener.
- an alkaline cyanide bath for depositing copper-tin alloys containing as organo-constituents either a fatty acid amidoalkyldialkylamine oxide, a fatty acid amidoalkyldialkylamine betaine or an ethoxylated naphthol.
- a solution for the deposition of tin alloys and a corresponding deposition method comprises an organic sulfonic acid, tin salts of organic sulfonic acid and sulfonates of metals of the group consisting of zinc, bismuth, silver, indium and copper.
- an electrolyte for depositing low-melting tin alloys is known, wherein the electrolyte may comprise tin as methanesulfonates or isopropanol sulfonates. As further alloying metals to be deposited.
- the electrolyte may contain copper, silver, indium, zinc or thallium.
- the US patent US 6,176,996 discloses an electrolyte for depositing a tin-based binary alloy, wherein the electrolyte is 20 to 500 g / L of a tin salt, 1 to 100 g / L of a metal salt selected from the group consisting of zinc, cobalt, bismuth and copper, 20 to 200 g / L a methanesulfonic acid, 10 to 300 g / l of a lead compound and 0.5 to 50 g / l of a complexing agent.
- the oxidation to tetravalent tin is associated with a strong sludge formation, which can prevent a stable operation and a long life of the acidic electrolyte.
- the formation of an adherent and non-porous coating is no longer guaranteed by such impurities.
- the invention is therefore based on the object of specifying a method for the deposition of bronzes, which allows a uniform deposition of at least tin and copper next to each other from an acidic electrolyte at much higher deposition rates over the methods known in the art.
- adherent and non-porous bronze coatings with high copper contents and different decorative and mechanical properties should be deposited.
- an acidic electrolyte is to be provided for the deposition of such bronze coatings, which may have a high content of bivalent copper ions, is stable to oxidation-induced sludge formation, is ready for use over a prolonged period and is economical and environmentally friendly.
- the object is achieved by a process for the electrodeposition of bronzes with a copper content of> 10 wt .-%, wherein a substrate to be coated is metallized in an acidic electrolyte at a set current density between 0.1 to 120 A / dm 2 , wherein the electrolyte has at least tin and copper ions, an aromatic nonionic surfactant and methanesulfonic acid dissolved, characterized in that the electrolyte has a tin ion concentration of 2 to 75 g / l, a copper ion concentration of 2 to 70 g / l and a methanesulfonic acid concentration of at least 238 g / l is adjusted and bismuth and / or zinc is added to the electrolyte.
- the present invention provides a process for the electrodeposition of bronzes, wherein, using an electrolyte, an anode of a copper-tin alloy and a cathode connected to the substrate to be coated, the coating is carried out while passing through direct current. Furthermore, the invention provides an electrolyte which can be used in particular for this process and also the coatings obtainable by this process.
- the disadvantages known in the prior art become available with the provision of a novel composition of the electrolyte eliminated and achieved in this way significantly better deposition results.
- the implementation is simplified and made more economical. This too is mainly due to the advantageous composition of the electrolyte.
- the process is carried out at room temperature or between 17 to 25 ° C and to be coated Substrate metallized in a strongly acidic medium at a pH of ⁇ 1. In this temperature range, the electrolyte is particularly stable.
- there are no costs for heating the electrolyte and also the metallized substrates need not be cooled down in a time and cost intensive manner.
- deposition rates of 0.25 ⁇ m / min are achieved at a current density of 1 A / dm 2 , inter alia due to the pH value and the advantageous addition of at least one aromatic, nonionic wetting agent.
- This can be increased by the increase of the metal content up to 7 A / dm 2 in the rack application and for pass-through systems even up to 120 A / dm 2 .
- applicable current densities in a range of 0.1 to 120 A / dm 2 are achieved depending on the type of system.
- the wetting of the surfaces to be metallized, especially of more complex substrates is surprisingly improved considerably.
- This advantageously has the consequence that not only significantly higher deposition rates are achieved by the use of the method according to the invention, but also that the coatings obtained by the process are uniform and of high quality, have a very good adhesion and are completely non-porous.
- Another advantage of the aromatic, nonionic wetting agent used is that due to the advantageous wetting properties during the process, the electrolyte and / or the substrate in the electrolyte has little or no need to be moved in order to achieve the desired deposition results, so that the use of additional devices for moving the electrolyte can be dispensed with.
- the aromatic, nonionic wetting agent when removing the metallized substrates from the electrolyte, the electrolyte residues run better from the substrates, which leads to reduced carry-over losses and thus to lower process costs.
- Particularly advantageous is the addition of 2 to 40 g / l of one or more aromatic, nonionic wetting agents, particular preference being given to using ⁇ -naphthol ethoxylate and / or nonylphenol ethoxylate.
- the proposed method is thus advantageously economical and environmentally friendly with respect to the cyanidic processes.
- anionic and / or aliphatic, nonionic wetting agents are possible, provided that they support the advantageous mode of action of the aromatic, nonionic wetting agent or even reinforce.
- Polyethylene glycols and / or anionic surfactants are preferably added to the electrolyte as anionic and / or aliphatic, nonionic wetting agents in this regard.
- the method according to the invention is characterized in particular by the particular composition of the electrolyte.
- This contains essentially tin and copper ions, an alkyl sulfonic acid and an aromatic nonionic wetting agent.
- stabilizers and / or complexing agents, anionic and / or nonionic, aliphatic wetting agents, antioxidants, brighteners and other metal salts may additionally be present in the electrolyte.
- the metals introduced mainly for the deposition of bronze according to the invention in the electrolyte - tin and copper - may be present primarily as salts of alkylsulfonic acids, preferably as methanesulfonates or as salts of mineral acids, preferably as sulfates.
- the tin salt used is particularly preferably the tin methanesulfonate in the electrolyte, which is advantageously added to the electrolyte in an amount of 5 to 195 g / l of electrolyte, preferably 11 to 175 g / l of electrolyte.
- the copper salt used is particularly preferably the copper methanesulfonate in the electrolyte, which is advantageously added to the electrolyte in an amount of 8 to 280 g / l of electrolyte, preferably 16 to 260 g / l of electrolyte.
- the electrolyte is an acid, preferably a mineral and / or an alkyl sulfonic acid in Quantities of 140 to 382 g / l electrolyte, preferably 175 to 245 g / l electrolyte added.
- methanesulphonic acid turned out to be particularly advantageous, since on the one hand it causes advantageous solubility of the metal salts and, on the other hand, prescribes or facilitates the adjustment of the pH required for the process due to its acidity.
- the methanesulfonic acid has the advantageous property of contributing significantly to the stability of the bath.
- At least one additional metal and / or chloride is added to the electrolyte.
- the metals are in the form of their soluble salts.
- the addition of zinc and / or bismuth influences the properties of the deposited coatings to a particular extent.
- the zinc and / or bismuth metals introduced into the electrolyte may be predominantly present as salts of alkylsulfonic acids, preferably as methanesulfonates or as salts of mineral acids, preferably as sulfates.
- the zinc sulfate is particularly preferably used in the electrolyte, which is advantageously added to the electrolyte in an amount of 0 to 25 g / l electrolyte, preferably 15 to 20 g / l electrolyte.
- the bismuth salt is particularly preferably used in the electrolyte, which is advantageously added in an amount of 0 to 5 g / l electrolyte, preferably 0.05 to 0.2 g / l electrolyte to the electrolyte.
- additives such as stabilizers and / or complexing agents, antioxidants and brighteners, which are commonly used in acidic electrolytes for the deposition of tin alloys, may be added to the electrolyte.
- gluconates are added to the electrolyte as stabilizers and / or complexing agents.
- the concentration of the stabilizers and / or complexing agents is 0 to 50 g / l of electrolyte, preferably 20 to 30 g / l of electrolyte.
- the antioxidant compounds are preferred from the class of Dihydroxybenzenes, for example, mono- or polyhydroxyphenyl such as catechol or phenolsulfonic acid used.
- the concentration of the antioxidants is 0 to 5 g / l of electrolyte.
- the electrolyte contains hydroquinone as an antioxidant.
- the implementation of the method according to the invention enables the deposition of bronzes on different substrates.
- all common materials for the production of electronic components can be used.
- hard and wear-resistant bronze coatings are deposited on materials such as plain bearings etc. by the method according to the invention.
- the inventive method is advantageously used, which is particularly advantageous in these areas, the deposition of multi-metal alloys containing tin, copper, zinc and bismuth, effects.
- a very particular advantage is that with the method according to the invention so-called "real" bronzes can be deposited, which have a copper content> 60%, wherein the copper content can be up to 95 wt .-%, depending on the desired property.
- the ratio of the copper content to the tin content in the electrolyte has a significant influence on the properties such as hardness and color of the bronze coatings.
- silver-colored coatings, so-called white bronzes are deposited, which are relatively soft.
- yellow gold-colored coatings so-called yellow bronzes
- red-gold-colored coatings so-called red bronzes
- the electrolyte contains brighteners from the class of aromatic carbonyl compounds and / or ⁇ , ⁇ -unsaturated carbonyl compounds.
- the concentration of the brightener is 0 to 5 g / l electrolyte.
- Electrolyte composition :
- the base electrolyte of the strongly acidic electrolyte according to the invention essentially comprises (per liter of the electrolyte) 2 - 75 g divalent tin, 2 - 70 g divalent copper, 2 - 40 g an aromatic, nonionic wetting agent and 140 - 382 g a mineral and / or alkylsulfonic acid
- further constituents can be added to the electrolyte: 0-10 g an anionic and / or aliphatic, nonionic wetting agent, 0 - 50 g a stabilizer and / or complexing agent, 0 - 5 g an antioxidant, 0 - 5 g a shine agent 0 - 5 g trivalent bismuth 0 - 25 g divalent zinc
- Example 1 red bronze 4 g / l Sn 2+ 18 g / l Cu 2+ 286 g / l methane 3 g / l aromatic, nonionic wetting agent 0.4 g / l aliphatic, nonionic wetting agent 2 g / l Antioxidant 20 mg / l complexing
- Example 2a (yellow bronze) 4 g / l Sn 2+ 18 g / l Cu 2+ 240 g / l methane 32.2 g / l aromatic, nonionic wetting agent 2 g / l Antioxidant 25 g / l Stabilizer / complexing agent
- Example 2b (yellow bronze) 4 g / l Sn 2+ 18 g
- Example 5 (high ductility) (Example of the invention) 4 g / l Sn 2+ 18 g / l Cu 2+ 238 g / l methane 32.2 g / l aromatic, nonionic wetting agent 3 mg / l brightener 2 g / l Antioxidant 25 g / l Stabilizer / complexing agent 20 g / l ZnSO 4
- Example 6 (Hardness) (Example of the invention) 4 g / l Sn 2+ 18 g / l Cu 2+ 238 g / l methane 32.2 g / l aromatic, nonionic wetting agent 2 g / l Antioxidant 25 g / l Stabilizer / complexing agent 0.1 g / l Bi 3+
- Example 7 (Yellow Bronze) (Example of the invention) 14.5 g / l Sn 2+ 65.5 g / l Cu 2+ 382
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Chemically Coating (AREA)
Claims (15)
- Procédé pour le dépôt galvanique de bronzes présentant une proportion de cuivre > 10% en poids, un substrat à revêtir étant métallisé dans un électrolyte acide à une densité de courant réglée entre 0,1 à 120 A/dm2, l'électrolyte présentant au moins des ions d'étain et des ions de cuivre, un mouillant aromatique non ionique ainsi que de l'acide méthanesulfonique, caractérisé en ce qu'on règle dans l'électrolyte une concentration en ions d'étain de 2 à 75 g/l, une concentration en ions de cuivre de 2 à 70 g/l et une concentration en acide méthanesulfonique d'au moins 238 g/l et on ajoute du bismuth et/ou du zinc à l'électrolyte.
- Procédé selon la revendication 1, caractérisé en ce qu'on ajoute à l'électrolyte, comme mouillant aromatique non ionique, de l'éthoxylate de β-naphtol.
- Procédé selon la revendication 2, l'électrolyte étant additionné de 2 à 40 g/l d'éthoxylate de β-naphtol.
- Procédé selon l'une quelconque des revendications précédentes, caractérisé en ce que le dépôt a lieu à une température de 17°C à 25°C.
- Procédé selon l'une quelconque des revendications précédentes, caractérisé en ce qu'on règle, pour le dépôt, un pH de l'électrolyte < 1.
- Électrolyte acide pour le dépôt galvanique de bronzes présentant une proportion de cuivre > 10% en poids, contenant au moins des ions d'étain et des ions de cuivre, de l'acide méthanesulfonique ainsi qu'un mouillant aromatique non ionique, caractérisé en ce que l'électrolyte présente une concentration en ions d'étain entre 2 et 75 g/l, une concentration en ions de cuivre entre 2 et 70 g/l et une concentration en acide méthanesulfonique d'au moins 238 g/l et contient du bismuth et/ou du zinc.
- Electrolyte selon la revendication 6, caractérisé en ce que l'électrolyte présente, comme mouillant aromatique non ionique, de l'éthoxylate de ß-naphtol.
- Electrolyte selon la revendication 7, caractérisé en ce qu'il présente 2 à 40 g/l d'éthoxylate de β-naphtol.
- Electrolyte selon l'une quelconque des revendications 6 à 8, caractérisé en ce qu'il contient de l'étain et du cuivre sous forme d'un sel soluble d'un acide alkylsulfonique.
- Electrolyte selon l'une quelconque des revendications 6 à 9, caractérisé en ce qu'il contient du polyéthylèneglycol et/ou des tensioactifs anioniques comme autre mouillant.
- Electrolyte selon l'une quelconque des revendications 6 à 10, caractérisé en ce qu'il contient du chlorure.
- Electrolyte selon l'une quelconque des revendications 6 à 11, caractérisé en ce qu'il contient, comme complexant, du gluconate.
- Electrolyte selon l'une quelconque des revendications 6 à 12, caractérisé en ce qu'il contient un antioxydant de la classe des dihydroxybenzènes.
- Electrolyte selon l'une quelconque des revendications 6 à 13, caractérisé en ce qu'il contient un brillanteur de la classe des composés carbonyle aromatiques et/ou des composés carbonyle α,β-insaturés.
- Electrolyte selon l'une quelconque des revendications 6 à 14, caractérisé en ce qu'il présente un pH < 1.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES02022718T ES2531163T3 (es) | 2002-10-11 | 2002-10-11 | Procedimiento y electrolito para la deposición galvánica de bronces |
EP02022718.7A EP1408141B1 (fr) | 2002-10-11 | 2002-10-11 | Methode et électrolyte pour la deposition galvanique des bronzes |
CN2003801012538A CN1703540B (zh) | 2002-10-11 | 2003-10-10 | 电沉积青铜的方法 |
PCT/EP2003/011229 WO2004035875A2 (fr) | 2002-10-11 | 2003-10-10 | Procede de depot galvanique de bronzes |
KR1020057004846A KR100684818B1 (ko) | 2002-10-11 | 2003-10-10 | 청동의 전해석출 방법 |
JP2004544134A JP4675626B2 (ja) | 2002-10-11 | 2003-10-10 | ブロンズ電析法及び電解質 |
US10/531,142 US20060137991A1 (en) | 2002-10-11 | 2003-10-10 | Method for bronze galvanic coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02022718.7A EP1408141B1 (fr) | 2002-10-11 | 2002-10-11 | Methode et électrolyte pour la deposition galvanique des bronzes |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1408141A1 EP1408141A1 (fr) | 2004-04-14 |
EP1408141B1 true EP1408141B1 (fr) | 2014-12-17 |
Family
ID=32010957
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02022718.7A Revoked EP1408141B1 (fr) | 2002-10-11 | 2002-10-11 | Methode et électrolyte pour la deposition galvanique des bronzes |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060137991A1 (fr) |
EP (1) | EP1408141B1 (fr) |
JP (1) | JP4675626B2 (fr) |
KR (1) | KR100684818B1 (fr) |
CN (1) | CN1703540B (fr) |
ES (1) | ES2531163T3 (fr) |
WO (1) | WO2004035875A2 (fr) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004041701A1 (de) * | 2004-08-28 | 2006-03-02 | Enthone Inc., West Haven | Verfahren zur elektrolytischen Abscheidung von Metallen |
US7296370B2 (en) * | 2004-09-24 | 2007-11-20 | Jarden Zinc Products, Inc. | Electroplated metals with silvery-white appearance and method of making |
WO2006036479A1 (fr) * | 2004-09-24 | 2006-04-06 | Jarden Zinc Products, Inc. | Metaux deposes par electrodeposition presentant un aspect blanc argente et procede de production |
US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
CN100368924C (zh) * | 2005-05-31 | 2008-02-13 | 西北工业大学 | 一种非周期性红外波段负磁导率材料 |
EP1803837B2 (fr) | 2005-11-25 | 2024-10-23 | MacDermid Enthone Inc. | Procédé pour le nettoyage de solutions de traitement |
EP2037006B9 (fr) * | 2006-05-24 | 2012-02-15 | ATOTECH Deutschland GmbH | Composition de placage métallique et procédé pour le dépôt de cuivre-zinc-étain adapté à la fabrication de cellule solaire à couche mince |
ATE453740T1 (de) * | 2007-02-14 | 2010-01-15 | Umicore Galvanotechnik Gmbh | Kupfer-zinn-elektrolyt und verfahren zur abscheidung von bronzeschichten |
JP5642928B2 (ja) | 2007-12-12 | 2014-12-17 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 青銅の電気めっき |
ATE486157T1 (de) | 2008-05-08 | 2010-11-15 | Umicore Galvanotechnik Gmbh | Modifizierter kupfer-zinn-elektrolyt und verfahren zur abscheidung von bronzeschichten |
DE102008032398A1 (de) * | 2008-07-10 | 2010-01-14 | Umicore Galvanotechnik Gmbh | Verbesserter Kupfer-Zinn-Elektrolyt und Verfahren zur Abscheidung von Bronzeschichten |
DE102011008836B4 (de) | 2010-08-17 | 2013-01-10 | Umicore Galvanotechnik Gmbh | Elektrolyt und Verfahren zur Abscheidung von Kupfer-Zinn-Legierungsschichten |
US8426241B2 (en) | 2010-09-09 | 2013-04-23 | International Business Machines Corporation | Structure and method of fabricating a CZTS photovoltaic device by electrodeposition |
EP2738290A1 (fr) * | 2011-08-30 | 2014-06-04 | Rohm and Haas Electronic Materials LLC | Promotion de l'adhérence de bronze blanc exempt de cyanure |
CN102605394B (zh) * | 2012-03-07 | 2015-02-18 | 深圳市华傲创表面技术有限公司 | 一种无氰酸性白铜锡电镀液 |
JP6101510B2 (ja) * | 2013-02-18 | 2017-03-22 | 株式会社シミズ | 非シアン銅−錫合金めっき浴 |
CN106661752B (zh) * | 2014-08-08 | 2021-08-10 | 奥野制药工业株式会社 | 铜-锡合金镀敷浴 |
US11597637B2 (en) | 2018-02-22 | 2023-03-07 | Vis, Llc | Under hoist support stand |
EP3540097A1 (fr) | 2018-03-13 | 2019-09-18 | COVENTYA S.p.A. | Produits galvanisés et bain électrolytique approprié pour fournir de tels produits |
US10906789B2 (en) * | 2018-09-05 | 2021-02-02 | Vis, Llc | Power unit for a floor jack |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0813185A (ja) * | 1994-06-28 | 1996-01-16 | Ebara Yuujiraito Kk | 低融点錫合金めっき浴 |
JPH11181589A (ja) * | 1997-12-18 | 1999-07-06 | Japan Energy Corp | 錫合金電気めっき液およびめっき方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2854388A (en) * | 1955-03-14 | 1958-09-30 | City Auto Stamping Co | Electrodeposition of copper-tin alloys |
JPS5672196A (en) * | 1979-11-19 | 1981-06-16 | Shimizu Shoji Kk | Bright plating bath for copper-tin alloy |
DE3339541C2 (de) * | 1983-11-02 | 1986-08-07 | Degussa Ag, 6000 Frankfurt | Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
JPS63206494A (ja) * | 1987-02-20 | 1988-08-25 | Yutaka Fujiwara | シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴 |
JPH02107795A (ja) * | 1988-10-14 | 1990-04-19 | Tohoku Ricoh Co Ltd | 銅一スズ合金メツキ浴 |
DE3934866A1 (de) * | 1989-10-19 | 1991-04-25 | Blasberg Oberflaechentech | Verfahren zur abscheidung von blei- und bleihaltigen schichten, elektrolyte zur durchfuehrung des verfahrens sowie verwendung von tensiden in sauren blei-elektrolyten |
JP2901292B2 (ja) * | 1989-12-05 | 1999-06-07 | 住友ゴム工業 株式会社 | ゴムコーティングタイヤ用ビードワイヤおよびそれを用いたタイヤ |
DE4336664A1 (de) * | 1993-10-27 | 1995-05-04 | Demetron Gmbh | Werkstücke aus nichtkorrosionsbeständigen Metallen mit nach dem PVD-Verfahren aufgebrachten Überzügen |
JPH0711477A (ja) * | 1993-06-28 | 1995-01-13 | Electroplating Eng Of Japan Co | 貴金属めっき品 |
US5385661A (en) * | 1993-09-17 | 1995-01-31 | International Business Machines Corporation | Acid electrolyte solution and process for the electrodeposition of copper-rich alloys exploiting the phenomenon of underpotential deposition |
JPH0827590A (ja) * | 1994-07-13 | 1996-01-30 | Okuno Chem Ind Co Ltd | 光沢銅−錫合金めっき浴 |
US6176996B1 (en) * | 1997-10-30 | 2001-01-23 | Sungsoo Moon | Tin alloy plating compositions |
TW577938B (en) * | 1998-11-05 | 2004-03-01 | Uyemura C & Co Ltd | Tin-copper alloy electroplating bath and plating process therewith |
JP2001060672A (ja) * | 1999-08-20 | 2001-03-06 | Mitsubishi Electric Corp | エッチング方法およびエッチングマスク |
JP3433291B2 (ja) * | 1999-09-27 | 2003-08-04 | 石原薬品株式会社 | スズ−銅含有合金メッキ浴、スズ−銅含有合金メッキ方法及びスズ−銅含有合金メッキ皮膜が形成された物品 |
JP2001107287A (ja) * | 1999-10-07 | 2001-04-17 | Ebara Udylite Kk | Sn−Cu合金めっき浴 |
EP1091023A3 (fr) * | 1999-10-08 | 2003-05-14 | Shipley Company LLC | Composition d'alliage et procédé de plaquage |
JP2001181889A (ja) * | 1999-12-22 | 2001-07-03 | Nippon Macdermid Kk | 光沢錫−銅合金電気めっき浴 |
DE50106133D1 (de) * | 2000-09-20 | 2005-06-09 | Schloetter Fa Dr Ing Max | Elektrolyt und verfahren zur abscheidung von zinn-kupfer-legierungsschichten |
DE10046600C2 (de) * | 2000-09-20 | 2003-02-20 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Kupfer-Legierungsschichten und Verwendung des Elektrolyten |
CN1407141A (zh) * | 2001-03-16 | 2003-04-02 | 希普雷公司 | 镀锡 |
EP1260614B1 (fr) * | 2001-05-24 | 2008-04-23 | Shipley Co. L.L.C. | Placage d'étain |
US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
-
2002
- 2002-10-11 EP EP02022718.7A patent/EP1408141B1/fr not_active Revoked
- 2002-10-11 ES ES02022718T patent/ES2531163T3/es not_active Expired - Lifetime
-
2003
- 2003-10-10 US US10/531,142 patent/US20060137991A1/en not_active Abandoned
- 2003-10-10 WO PCT/EP2003/011229 patent/WO2004035875A2/fr active Application Filing
- 2003-10-10 JP JP2004544134A patent/JP4675626B2/ja not_active Expired - Lifetime
- 2003-10-10 CN CN2003801012538A patent/CN1703540B/zh not_active Expired - Lifetime
- 2003-10-10 KR KR1020057004846A patent/KR100684818B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0813185A (ja) * | 1994-06-28 | 1996-01-16 | Ebara Yuujiraito Kk | 低融点錫合金めっき浴 |
JPH11181589A (ja) * | 1997-12-18 | 1999-07-06 | Japan Energy Corp | 錫合金電気めっき液およびめっき方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1703540A (zh) | 2005-11-30 |
JP2005537394A (ja) | 2005-12-08 |
US20060137991A1 (en) | 2006-06-29 |
KR100684818B1 (ko) | 2007-02-22 |
KR20050059174A (ko) | 2005-06-17 |
JP4675626B2 (ja) | 2011-04-27 |
WO2004035875A3 (fr) | 2005-04-14 |
WO2004035875A2 (fr) | 2004-04-29 |
CN1703540B (zh) | 2010-10-06 |
ES2531163T3 (es) | 2015-03-11 |
EP1408141A1 (fr) | 2004-04-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1408141B1 (fr) | Methode et électrolyte pour la deposition galvanique des bronzes | |
DE69924807T2 (de) | Zinn-Kupfer-Legierung Elektroplattierungsbad und Plattierungsverfahren mit diesem Bad | |
EP1413646B2 (fr) | Procédé de dépot sans courant de métaux | |
EP2116634B1 (fr) | Electrolyte de cuivre-zinc modifié et procédé de déposition de couches de bronze | |
EP1325175B1 (fr) | Electrolyte et procede pour deposer des couches d'alliages etain-cuivre | |
DE19653681A1 (de) | Verfahren zur elektrolytischen Abscheidung von Kupferschichten mit gleichmäßiger Schichtdicke und guten optischen und metallphysikalischen Eigenschaften | |
DE102010053676A1 (de) | Elektrolyt für die galvanische Abscheidung von Gold-Legierungen und Verfahren zu dessen Herstellung | |
DE4023444A1 (de) | Cyanid-freies verfahren zur herstellung eines galvanischen kupferueberzuges | |
DE19545427C2 (de) | Schichtwerkstoff für Gleitelemente sowie Verfahren und Mittel zu seiner Herstellung | |
WO2000079030A1 (fr) | Systeme de bain pour depot de metaux par voie galvanique | |
EP1192297B1 (fr) | Bain acide pour deposer par voie electrolytique des couches d'or ou d'alliage d'or brillantes, et agent de brillantage prevu a cet effet | |
EP1295967A2 (fr) | Méthode pour la déposition électrolytique d'un alliage de zinc-nickel | |
AT514427B1 (de) | Elektrolytbad sowie damit erhältliche Objekte bzw. Artikel | |
EP3067444B1 (fr) | Deposition de revetements decoratifs en alliage palladium-fer sur des substances metalliques | |
DE102018126174B3 (de) | Thermisch stabile Silberlegierungsschichten, Verfahren zur Abscheidung und Verwendung | |
EP1442160A2 (fr) | Bain d'electrolyse pour la precipitation par electrolyse d'alliages argent-etain | |
DE102020133188B4 (de) | Verwendung eines Silber-Bismut-Elektrolyt zur Abscheidung von Hartsilberschichten | |
DE3139815A1 (de) | "verfahren zur erhaltung eines goldueberzuges mit verbesserter korrosionsbestaendigkeit auf einem substrat" | |
DE10306823B4 (de) | Verfahren und Elektrolyt zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen | |
EP0142615B1 (fr) | Bain et procédé pour le dépôt galvanique de couches de dispersion à base de - ou contenant un - métal noble | |
EP4146848B1 (fr) | Électrolyte à base d'argent pour le dépôt de couches de dispersion d'argent | |
WO2000029645A2 (fr) | Solution aqueuse pour depot electrolytique d'alliages d'etain et de zinc | |
DE2333096B2 (de) | Galvanisch aufgebrachter mehrschichtiger Metallüberzug und Verfahren zu seiner Herstellung | |
DE2943399A1 (de) | Zusammensetzung und verfahren fuer die galvanische abscheidung von metallischem palladium bei im wesentlichen konstanter badleistung | |
DE2439656C2 (de) | Wäßriges saures Bad zur galvanischen Abscheidung einer Zinn-Nickel-Legierung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20030930 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
AKX | Designation fees paid |
Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
17Q | First examination report despatched |
Effective date: 20061027 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
INTG | Intention to grant announced |
Effective date: 20140808 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: GERMAN |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: REF Ref document number: 702015 Country of ref document: AT Kind code of ref document: T Effective date: 20150115 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R096 Ref document number: 50216003 Country of ref document: DE Effective date: 20150129 |
|
REG | Reference to a national code |
Ref country code: ES Ref legal event code: FG2A Ref document number: 2531163 Country of ref document: ES Kind code of ref document: T3 Effective date: 20150311 |
|
REG | Reference to a national code |
Ref country code: NL Ref legal event code: T3 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20150318 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 Ref country code: CZ Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 Ref country code: EE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20150417 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R026 Ref document number: 50216003 Country of ref document: DE |
|
PLBI | Opposition filed |
Free format text: ORIGINAL CODE: 0009260 |
|
26 | Opposition filed |
Opponent name: ATOTECH DEUTSCHLAND GMBH Effective date: 20150917 |
|
PLAX | Notice of opposition and request to file observation + time limit sent |
Free format text: ORIGINAL CODE: EPIDOSNOBS2 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 14 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 |
|
PLAF | Information modified related to communication of a notice of opposition and request to file observations + time limit |
Free format text: ORIGINAL CODE: EPIDOSCOBS2 |
|
PLBB | Reply of patent proprietor to notice(s) of opposition received |
Free format text: ORIGINAL CODE: EPIDOSNOBS3 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 |
|
PLAB | Opposition data, opponent's data or that of the opponent's representative modified |
Free format text: ORIGINAL CODE: 0009299OPPO |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: MM4A |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20151031 Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20151031 |
|
R26 | Opposition filed (corrected) |
Opponent name: ATOTECH DEUTSCHLAND GMBH Effective date: 20150917 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 15 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20151011 |
|
RDAF | Communication despatched that patent is revoked |
Free format text: ORIGINAL CODE: EPIDOSNREV1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE PATENT HAS BEEN GRANTED |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BG Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 |
|
APBM | Appeal reference recorded |
Free format text: ORIGINAL CODE: EPIDOSNREFNO |
|
APBP | Date of receipt of notice of appeal recorded |
Free format text: ORIGINAL CODE: EPIDOSNNOA2O |
|
APAH | Appeal reference modified |
Free format text: ORIGINAL CODE: EPIDOSCREFNO |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20141217 |
|
REG | Reference to a national code |
Ref country code: LU Ref legal event code: HC Owner name: MACDERMID ENTHONE INC.; US Free format text: FORMER OWNER: ENTHONE INC. Effective date: 20170629 |
|
APBQ | Date of receipt of statement of grounds of appeal recorded |
Free format text: ORIGINAL CODE: EPIDOSNNOA3O |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 16 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: PLFP Year of fee payment: 17 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: TR Payment date: 20190923 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: LU Payment date: 20191028 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20191026 Year of fee payment: 18 Ref country code: DE Payment date: 20191029 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20191025 Year of fee payment: 18 Ref country code: ES Payment date: 20191104 Year of fee payment: 18 Ref country code: IT Payment date: 20191023 Year of fee payment: 18 Ref country code: BE Payment date: 20191028 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20190919 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20191028 Year of fee payment: 18 |
|
APBU | Appeal procedure closed |
Free format text: ORIGINAL CODE: EPIDOSNNOA9O |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R064 Ref document number: 50216003 Country of ref document: DE Ref country code: DE Ref legal event code: R103 Ref document number: 50216003 Country of ref document: DE |
|
RDAG | Patent revoked |
Free format text: ORIGINAL CODE: 0009271 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: PATENT REVOKED |
|
REG | Reference to a national code |
Ref country code: FI Ref legal event code: MGE |
|
27W | Patent revoked |
Effective date: 20200618 |
|
GBPR | Gb: patent revoked under art. 102 of the ep convention designating the uk as contracting state |
Effective date: 20200618 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MA03 Ref document number: 702015 Country of ref document: AT Kind code of ref document: T Effective date: 20200618 |