EP1381080A2 - Panneau avec des composants enterrés et méthode de fabrication associée - Google Patents

Panneau avec des composants enterrés et méthode de fabrication associée Download PDF

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Publication number
EP1381080A2
EP1381080A2 EP03015264A EP03015264A EP1381080A2 EP 1381080 A2 EP1381080 A2 EP 1381080A2 EP 03015264 A EP03015264 A EP 03015264A EP 03015264 A EP03015264 A EP 03015264A EP 1381080 A2 EP1381080 A2 EP 1381080A2
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EP
European Patent Office
Prior art keywords
electronic component
board
component
design data
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03015264A
Other languages
German (de)
English (en)
Other versions
EP1381080A3 (fr
Inventor
Masatoshi Akagawa
Kazunari Sekigawa
Shinichi Wakabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Publication of EP1381080A2 publication Critical patent/EP1381080A2/fr
Publication of EP1381080A3 publication Critical patent/EP1381080A3/fr
Withdrawn legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5389Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
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    • Y10T29/4913Assembling to base an electrical component, e.g., capacitor, etc.
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • Y10T29/49165Manufacturing circuit on or in base by forming conductive walled aperture in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble
    • Y10T29/53039Means to assemble or disassemble with control means energized in response to activator stimulated by condition sensor
    • Y10T29/53061Responsive to work or work-related machine element
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble
    • Y10T29/53087Means to assemble or disassemble with signal, scale, illuminator, or optical viewer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble
    • Y10T29/5313Means to assemble electrical device
    • Y10T29/53174Means to fasten electrical component to wiring board, base, or substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/53Means to assemble or disassemble
    • Y10T29/5313Means to assemble electrical device
    • Y10T29/532Conductor

Definitions

  • the present invention relates to a component-embedded board fabrication method for fabricating a component-embedded board with electronic components embedded in a wiring board, and an apparatus using the same.
  • component-embedded boards various kinds of electronic components, such as IC chips, semiconductor devices, capacitors, resistors, etc., are embedded, or electronic components such as capacitors, resistors, inductors, etc. are fabricated in integral fashion in the board.
  • the multilayered structure can achieve a wiring board that is resistant to noise and stray capacitance and that can be used in high-frequency applications.
  • a wiring board is fabricated by exposing the board in a desired pattern based on wiring pattern design data, and by developing the desired pattern to print the pattern on it, followed by etching.
  • the electronic component when forming an electronic component in a certain layer, the electronic component must be formed by precisely positioning it with respect to the board; otherwise, the via and wiring formed in the subsequent exposure process would be displaced from the connecting terminal of the electronic component.
  • Figure 19 is a diagram illustrating the patterning and the resulting positional displacement in a prior art example using a photomask.
  • the mask position and the mask pattern are decided based on design data.
  • an angular displacement ⁇ and horizontal displacements ⁇ x and ⁇ y occur between the mask position and the position where the electronic component is formed.
  • Figure 20 is a diagram illustrating the positional relationship between the electronic component and a wiring line projected on the component-embedded board through the photomask.
  • the design position 101 of the connecting terminal of the electronic component that is, the position where the connecting terminal of the electronic component should normally be located, is indicated by a dashed line.
  • the displacement of the position of each electronic component formed on each individual board is detected relative to the design position of the electronic component before it is covered with an insulating layer.
  • design data to be used for processing the board after it is covered with the insulating layer is dynamically corrected using the thus detected displacement.
  • a wiring pattern and a via are formed using maskless exposure or inkjet technology.
  • Figure 1 is a flowchart (part 1) illustrating the component-embedded board fabrication method of the present invention.
  • the component-embedded board fabrication method of the present invention comprises: a first detection step S101 for detecting, before the board is covered with a first insulating layer, the actual position of a first electronic component formed on a surface of the board; a first holding step S102 for calculating a displacement between the design position of the first electronic component and the actual position of the first electronic component on the surface of the board, and for holding the displacement as first displacement data; and a first correction step S103 for correcting, based on the first displacement data, design data to be used for processing the board after the board is covered with the first insulating layer.
  • the first detection step S101 may be replaced by a step for capturing, before the board is covered with the first insulating layer, an image of the surface of the board on which the first electronic component is formed.
  • the first holding step calculates the displacement between the design position of the first electronic component and the actual position of the first electronic component detected from first image data obtained by imaging the surface of the board, and holds the displacement as the first displacement data.
  • Figure 2 is a flowchart (part 2) illustrating the component-embedded board fabrication method of the present invention.
  • the corrected design data obtained from step S103 is used in various processing steps, for example, a via formation step and a maskless exposure step, to be performed on the board after the board is covered with the insulating layer.
  • the component-embedded board fabrication method of the present invention may further comprise a first via formation step S104 for forming, based on the design data corrected in the first correction step S103, a via hole in the board covered with the first insulating layer, and a first maskless exposure step S105 for applying, based on the design data corrected in the first correction step S103, a maskless exposure to the board covered with the first insulating layer.
  • a multilayered component-embedded board can be fabricated by repeating the above process.
  • Figure 3 is a flowchart (part 3) illustrating the component-embedded board fabrication method of the present invention.
  • the corrected design data obtained from step S103 may be used when directly forming a wiring pattern by using inkjet technology.
  • the component-embedded board fabrication method of the present invention may further comprises a first via formation step S104 for forming, based on the design data corrected in the first correction step S103, a via hole in the board covered with the first insulating layer, and a first direct patterning step S106 for forming, based on the design data corrected in the first correction step S103, a wiring pattern by inkjetting onto the board covered with the first insulating layer.
  • a multilayered component-embedded board can be fabricated by repeating the above process.
  • Figure 4 is a system block diagram (part 1) illustrating the component-embedded board fabrication apparatus of the present invention.
  • the component-embedded board fabrication apparatus 1 of the present invention comprises: detecting unit 11 for detecting, before the board 21 is covered with an insulating layer 23, the actual position of an electronic component 22 formed on a surface of the board 21; holding unit 12 for calculating a displacement between the design position of the electronic component 22 and the actual position of the electronic component 22 on the surface of the board 21, and for holding the displacement as displacement data; and correcting unit 13 for correcting, based on the displacement data, design data to be used for processing the board 21 after the board 21 is covered with the insulating layer 23.
  • the detecting unit 11 may be replaced by imaging means for capturing, before the board 23 is covered with the insulating layer 23, an image of the surface of the board 21 on which the electronic component 22 is formed.
  • the holding unit 12 calculates the displacement between the design position of the electronic component 22 and the actual position of the electronic component 22 detected from image data obtained by imaging the surface of the board 21, and holds the displacement as the displacement data.
  • the component-embedded board fabrication apparatus 1 of the present invention further comprises via forming unit 14 for forming, based on the design data corrected by the correcting unit 13, a via hole 25 in the board covered with the insulating layer 23. After the via hole 25 is formed, a photoresist layer 24 for wiring pattern formation is formed.
  • the component-embedded board fabrication apparatus 1 of the present invention further comprises maskless exposure unit 15 for applying, based on the design data corrected by the correcting unit 13, a maskless exposure to the board covered with the insulating layer 23.
  • Figure 5 is a system block diagram (part 2) illustrating the component-embedded board fabrication apparatus of the present invention.
  • the component-embedded board fabrication apparatus 1 of the present invention may include, in place of the maskless exposure unit 15 shown in Figure 4, direct patterning unit 16 for forming, based on the design data corrected by the correcting unit 13, a wiring pattern by inkjetting on the board covered with the insulating layer 23.
  • the design data to be used in the subsequent processing of the board is corrected by taking the displacement into account, and the wiring pattern formation and the via formation using the maskless exposure or inkjet technology are performed based on the corrected design data; as a result, the component-embedded board can be fabricated easily, even if the electronic component is somewhat displaced in position, and the fabrication yield improves drastically compared with the prior art that uses a photomask.
  • the present invention can easily cope with a situation where, during the trial production of the component-embedded board, for example, an urgent change has to be made to the circuit configuration without changing the design drawing itself.
  • Figures 6a to 11b are diagrams for explaining the first embodiment of the component-embedded board fabrication method according to the present invention.
  • an electronic component 22-1 is formed by positioning it in accordance with design data on the surface of a board 21 which is not yet covered with an insulating layer.
  • the board used here is, for example, a glass epoxy board
  • the electronic component is, for example, a semiconductor device, a capacitor, a resistor, or the like.
  • the electronic component 22-1 is mounted and formed as a discrete component on the bare board surface, but a passive component (electronic component) such as an inductor, capacitor, or resistor may be formed by fabricating it in integral fashion using a thin-film process such as sputtering or vapor deposition. An example of this will be described later.
  • the actual position of the electronic component 22-1 on the surface of the board 21 is detected before the surface is covered with an insulating layer. Then, the displacement between the design position of the electronic component 22-1 and the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated and stored as displacement data. Such displacement data is calculated and stored for each individual electronic component on each individual board. The data structure of the displacement data will be described later.
  • an optical reading device such as a CCD camera (not shown) is used to detect the formed position of the electronic component 22-1.
  • an image of the surface of the board 21 on which the electronic component 22-1 is formed is captured by the optical reading device.
  • the connecting terminal position of the electronic component 22-1 relative to the reference point on the board 21 is read from the captured image data.
  • the displacement of the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated relative to the design position of the electronic component 22-1 that can be obtained from the design data.
  • the resulting data is stored as the displacement data in a storage device (not shown) within a component-embedded board fabrication apparatus.
  • the formed position of the electronic component is optically detected, but other methods may be used; for example, the position of the electronic component may be detected using ultrasound, X-rays, or other means.
  • a maximum value may be predetermined for the displacement data with which the dynamic correction described later can be performed, and provisions may be made to render the board defective if the displacement data exceeds the maximum value. This serves to further increase the fabrication yield, because seriously defective parts that cannot be remedied by the dynamic correction can be completely eliminated.
  • the insulating layer 23-1 is formed in such a manner as to cover the electronic component 22-1, thus burying the electronic component 22-1 in the insulating layer 23-1.
  • a resin such as epoxy, polyimide, or polyphenylene ether may be used to form the insulating layer.
  • the insulating layer 23-1 is formed by applying a coating of such resin material or by depositing a film of such resin material. If, in the process hereinafter described, a via hole is to be formed by exposure to light, a photosensitive insulating resin should be used.
  • a via hole 25 for forming a via is formed in the insulating layer 23-1, as shown in Figure 6d.
  • the via hole 25 is formed so as to expose the electrode portion 31 of the electronic component 22-1.
  • the electronic component 22-1 cannot be seen from above as it is already buried in the insulating layer 23-1.
  • the via hole was formed in accordance with the design data, without applying any corrections. Accordingly, in the prior art, when the formed position of the electronic component was displaced for some reason from its design position, if the via hole was formed without applying any corrections to the design data, there were cases where the electrode portion of the electronic component could not be exposed as desired.
  • the displacement data indicating the displacement between the design position of the electronic component 22-1 and the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated and stored in advance.
  • the position at which to form the via hole 25 is adjusted by dynamically correcting the design data necessary for the formation of the via hole 25 by using the displacement data. Accordingly, if the electronic component 22-1 is displaced from the position specified in the design data, the via hole 25 can be formed by taking the displacement into account, and the electrode portion of the electronic component can thus be exposed reliably.
  • a laser method or an exposure method is used to open the via hole 25.
  • the via hole is formed in the insulating layer by using a YAG laser or a CO 2 laser.
  • a photosensitive resin such as a photosensitive polyimide resin is used to form the insulating layer, which is exposed to light and developed to form the via hole.
  • a conductive layer 32 is formed over the surface of the insulating layer 23-1 and the inner wall surface of the via hole 25.
  • This conductive layer 32 acts as a feeder layer when applying electroplating in a subsequent process.
  • the conductive layer 32 is formed, for example, by electroless plating, sputtering, vapor deposition, or the like.
  • the conductive layer is formed using copper.
  • a chromium layer is formed by sputtering, on top which a copper layer is formed by sputtering to complete the formation of the conductive layer.
  • the chromium layer acts as an adhesion layer between the insulating layer and the copper layer.
  • the copper layer when used as a feeder layer, has the function of reducing electrical resistance.
  • a photoresist layer 33 for wiring pattern formation is formed as shown in Figure 7a.
  • the photoresist layer 33 is formed by applying a photoresist resin coating or by depositing a photoresist resin film.
  • a photoresist type layer is shown here, but a thermosetting resin layer may be used in place of the photoresist layer.
  • the photoresist layer 33 is exposed to light, as shown in Figure 7b.
  • maskless exposure direct exposure such as laser or electron beam exposure
  • the exposed pattern is a positive or negative pattern, depending on whether the photoresist layer 33 is of a positive type or a negative type.
  • the electronic component 22-1 is buried in the insulating layer 23-1 and cannot be seen from above.
  • the exposure was performed by forming a photomask in accordance with the design data, without applying any corrections. Accordingly, in the prior art, when the formed position of the electronic component was displaced for some reason from its design position, the connection or via could not be formed properly to match the position of the connecting terminal of the electronic component.
  • the displacement data indicating the displacement between the design position of the electronic component 22-1 and the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated and stored in advance.
  • the exposure position is adjusted by dynamically correcting the design data necessary in the maskless exposure by using the displacement data. Accordingly, if the electronic component 22-1 is formed displaced from the position specified in the design data, the connection and the via can be formed by taking the displacement into account. A specific example of the correction algorithm will be described later.
  • the photoresist layer 33 is developed, and the photoresist layer is removed from the wiring pattern forming portion 34 to expose the underlying conductive layer 32 in that portion.
  • a wiring conductor 35 is formed in the wiring pattern forming portion 34 by electroplating, as shown in Figure 7d. More specifically, electroplating is applied in such a manner as to fill the via hole 25. The electroplating is applied using the conductive layer 32 as the feeder layer. In this example, copper plating is applied by electroplating, but other plating material may be used.
  • the conductive layer is removed by etching everywhere except at the wiring conductor forming portion, to form the wiring pattern.
  • Figures 9a and 9b are diagrams illustrating the formation of a capacitor to be embedded in an insulating layer in accordance with the first embodiment of the component-embedded board fabrication method of the present invention.
  • a lower electrode 36 of the capacitor is formed simultaneously with the formation of a wiring pattern on the underlying insulating layer (or on the board if such an insulating layer is not formed yet).
  • This lower electrode 36 is formed by forming a portion of the wiring pattern as a wide planar portion.
  • a ferroelectric layer 37 of such material as strontium titanate, barium titanate, or tantalum oxide is formed by sputtering, and on top of that, an upper electrode 38 is formed by copper sputtering or plating. More specifically, the ferroelectric layer 37 and the upper electrode 38 are formed by forming a resist layer. This completes the integral fabrication of the capacitor 39.
  • a passive component such as an inductance, a capacitor or a resistance may be embedded in the insulating layer by fabricating it in integral fashion as described above, but the description given hereinafter deals with the case where a discrete electronic component is mounted.
  • a second electronic component 22-2 is formed is formed by positioning it in accordance with the design data on the surface of the insulating layer 23-1 in which the previously described electronic component is already embedded.
  • the actual position of the electronic component 22-2 formed on the surface of the insulating layer 23-1 is detected in the same manner as that described with reference to Figure 6b, before the surface is covered with a second insulating layer. Then, the displacement between the design position of the electronic component 22-2 and the actual position of the electronic component 22-2 formed on the surface of the insulating layer 23-1 is calculated and stored as displacement data.
  • the second insulating layer 23-2 is formed over the insulating layer 23-1 in such a manner as to cover the electronic component 22-2, thus burying the electronic component 22-2 in the insulating layer 23-2.
  • a via hole 25 for forming a via is formed in the insulating layer 23-2, as shown in Figure 10b.
  • the position at which to form the via hole 25 is adjusted by dynamically correcting the design data necessary for the formation of the via hole 25 by using the displacement data.
  • the formation of a conductive layer 32, the formation of a photoresist layer 33, maskless exposure, etching, and other processing steps are performed in the same manner as previously described, to complete the fabrication of a two-layered component-embedded board such as shown in Figure 11a.
  • Figure 11b is a cross-sectional view illustrating a three-layered component-embedded board.
  • a multilayered component-embedded board can be fabricated with high precision as described above.
  • a semi-additive method has been used as the wiring pattern forming method, but other forming methods may be used in the present invention; for example, a subtractive method or a full-additive method may be used.
  • the displacement data indicating the displacement between the design position of the electronic component 22-1 and the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated and stored in advance.
  • the design data necessary when performing the maskless exposure is dynamically corrected using the displacement data.
  • the wiring pattern is directly formed (patterned) by using inkjet technology, not the maskless exposure.
  • Design data necessary for the direct patterning is dynamically corrected using the displacement data in the same manner as previously described. That is, the wiring pattern formation using inkjet technology is performed by taking into account the displacement of the electronic component 22-1 from the design data. A specific example of the correction algorithm will be described later.
  • Inkjet technology is a technology that ejects liquid droplets through nozzles in which microscopic holes are opened.
  • inkjet technology is used for printers, but when applying inkjet technology directly for the formation of wiring patterns as in the present embodiment,the liquid droplets to be ejected from the nozzles should be formed from a liquid containing fine metal particles or from a metal oxide material.
  • inkjet printing There are two main types of inkjet printing: one is the piezoelectric type that utilizes a piezoelectric element which, when a voltage is applied, is caused to deform, causing a sudden increase in the liquid pressure in the ink chamber and thereby forcing a liquid droplet through the nozzle, and the other is the thermal type that forms a bubble in the liquid by a heater mounted on the head and thereby pushes out a liquid droplet. Either type can be used in the present invention.
  • the design data dynamically corrected as described in the first embodiment is converted into input data for use in an inkjet apparatus.
  • fine wiring lines for example, with line width of 10 ⁇ m or less can be formed by ejecting fine metal particles. This contributes to reducing the semiconductor package size.
  • a capacitor since various materials can be sprayed onto the board, devices having such functions as a capacitor, resistor, or inductor can be formed on the board as desired.
  • a liquid containing fine metal particles is used, and when forming a capacitor, a metal oxide material is formed by using inkjet technology; in this way, the material to be ejected should be selected according to the element to be formed.
  • the smaller the size of the material to be ejected is made the more stable can be made the amount of metal particles to be ejected by the inkjet apparatus; this serves to reduce variations in the resistance of the wiring lines formed.
  • Figures 12a to 13b are diagrams for explaining the second embodiment of the component-embedded board fabrication method according to the present invention.
  • an electronic component 22-1 is formed by positioning it in accordance with design data on the surface of a board 21 which is not yet covered with an insulating layer, or on the surface of an underlying insulating layer.
  • the electronic component to be formed here is, for example, a semiconductor device, a capacitor, a resistor, or the like.
  • the electronic component 22-1 is mounted and formed as a discrete component on the board surface but, alternatively, a device having a function as a capacitor, resistor, inductor, or the like may be formed in an integral fashion on the board by inkjetting the desired material onto the board.
  • the insulating layer can be formed by depositing an insulating resin film or by applying an insulating resin coating.
  • an optical reading device such as a CCD camera (not shown) is used to detect the formed position of the electronic component 22-1.
  • an image of the surface of the board 21 on which the electronic component 22-1 is formed is captured by the optical reading device.
  • the connecting terminal position of the electronic component 22-1 relative to the reference point on the board 21 is read from the captured image data.
  • the displacement of the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated relative to the design position of the electronic component 22-1 that can be obtained from the design data.
  • the resulting data is stored as the displacement data in a storage device (not shown) within the component-embedded board fabrication apparatus.
  • a via hole 25 for forming a via is formed in the insulating layer 23-1.
  • the insulating layer is formed in the same manner as in the foregoing first embodiment, after which the via hole is formed by laser machining.
  • an insulating resin may be applied by an inkjet apparatus in such a manner as to avoid the position where the via hole is to be formed. According to this method, the via hole can be formed simultaneously with the formation of the insulating layer.
  • an opening is formed, using, for example, a laser, in such a manner as to expose the electrode portion 31 of the electronic component 22-1, as shown in Figure 12c.
  • the displacement data indicating the displacement between the design position of the electronic component 22-1 and the actual position of the electronic component 22-1 formed on the surface of the board 21 is calculated and stored in advance, the position at which to form the via hole 25 is adjusted by dynamically correcting the design data necessary for the formation of the via hole 25 by using the displacement data. Accordingly, if the electronic component 22-1 is displaced from the position specified in the design data, the via hole 25 can be formed by taking the displacement into account, and the electrode portion of the electronic component can thus be exposed reliably.
  • a wiring pattern 35 including a portion that serves as a lower electrode 36 of the passive component is formed using the inkjet apparatus.
  • ferroelectric particles made of such material as strontium titanate, barium titanate, or tantalum oxide are applied by the inkjet apparatus to form a ferroelectric layer 37.
  • copper is applied by the inkjet apparatus to form an upper electrode 38. This completes the integral fabrication of the capacitor 39.
  • the wiring lines and passive components can be formed directly on the board by using inkjet technology, it becomes easier to fabricate necessary products when necessary in just necessary quantities.
  • the wiring can be formed without using lithography or etching steps, the time required to fabricate the circuit board can be drastically reduced. Further, as the specification of the circuit board can be changed easily, the time and cost required to modify the circuit board to be fabricated can also be reduced drastically. Moreover, the time required to fabricate passive components can be saved because portions of the passive components can be formed simultaneously with the formation of the wiring pattern. It is also easy to build a trial product upon completing the design work. Furthermore, any changes to the specification of the circuit board, for example, can be easily implemented without stopping the production line and without separately preparing passive components.
  • Figure 14 is a diagram for explaining the data base structure of the displacement data.
  • DDB is a data base in which the design data is stored
  • BDB is a data base in which the displacement data, i.e., information indicating the displacement from the design data, is stored.
  • Board identification data is data relating to board identification information that indicates the sequence number of the board.
  • Component identification data is data relating to electronic component identification information that indicates the kind of the electronic component, the position of the electronic component formed on the board, etc.
  • Terminal identification data is data that indicates the applicable terminal of the electronic component.
  • P, Q, ⁇ , ⁇ x, and ⁇ y are data relating to various geometrical information concerning the terminal of the electronic component.
  • P is a graphical object indicating the design position and shape of the terminal of the electronic component.
  • Q is a graphical object indicating the position and shape of the terminal of the actually formed electronic component that are detected by the detecting means.
  • is data relating to the amount of angular displacement of the actually formed electronic component.
  • ⁇ x is data relating to the amount of displacement in x direction of the actually formed electronic component.
  • ⁇ y is data relating to the amount of displacement in y direction of the actually formed electronic component.
  • L denotes a graphical object of a connection line
  • ls denotes an end point of L at the non-terminal side of the electronic component
  • lt denotes an end point of L at the terminal side of the electronic component. That is, L is used as a connection line from the end point ls at the non-terminal side of the electronic component to the end point lt at the terminal side thereof.
  • i and j are integers.
  • Figure 15 is a diagram illustrating the positional relationships between the terminals and wiring lines of electronic components before corrections are applied
  • Figure 16 is a diagram illustrating the positional relationships shown in Figure 15 after corrections are applied.
  • the terminal positions of the electronic components as specified in the design data are indicated by P1, P2, P3, and P4, and the positions where the terminals of the electronic components are actually formed are indicated by Q1, Q2, Q3, and Q4.
  • the connection lines as specified in the design data are indicated by L1, L2, L3, and L4, the end points of the L's at the electronic component terminal side are indicated by lt1, lt2, lt3, and lt4, and the end points of the L's at the non-terminal side are indicated by ls1, ls2, ls3, and ls4.
  • the end point ls1 is connected by L1 to the end point lt1 located in the electronic component terminal position P1
  • the end point ls2 is connected by L2 to the end point lt2 located in the electronic component terminal position P2
  • the end point ls3 is connected by L3 to the end point lt3 located in the electronic component terminal position P3
  • the end point ls4 is connected by L4 to the end point lt4 located in the electronic component terminal position P4, in the exposure area EA, by maskless exposure.
  • the design position and the actual position of each electronic component terminal will have the following positional relationship with respect to the wiring line to be connected.
  • the design data is dynamically corrected by using the electronic component displacement data (that is, the displacement from the design data) calculated and stored in advance before the board is covered with an insulating layer, and the subsequent processing steps such as the wiring pattern formation and via formation using the maskless exposure or inkjet technology, are carried out using the corrected data.
  • the electronic component displacement data that is, the displacement from the design data
  • the correction algorithm is adapted to match the positional displacement condition of the electronic component.
  • the design data is corrected so as to move the end lt of the wiring line L to be connected to the terminal of the electronic component to the actual terminal position of the electronic component so that the wiring line can be connected to the terminal of the electronic component as specified in the design drawing.
  • end points lt1', lt2', and lt3' are created at the positions where the respective electronic components are actually formed.
  • a correction is made by creating a bending point to reroute the wiring line or by increasing or decreasing the line width. For example, as shown in Figure 16, while leaving the position of lt4 unchanged, a bending point lt4' is created and connected using lines L4 and L4'. In this case, the line width may be adjusted so as to keep the electrical length between ls4 and lt4 as close as possible to the design length.
  • the maskless exposure or the via formation process itself may be stopped, and provisions may be made to report the occurrence of the error to the production line manager, etc.
  • the present invention may also be applied to such a case where an urgent change is made to the circuit configuration, for example, during the trial production of the component-embedded board, without changing the design drawing itself.
  • the wiring when the wiring pattern is changed due to a circuit change in the component-embedded board, the wiring may be formed by incorporating the corresponding change.
  • the wiring may be formed by making a correction so as to eliminate the connection to that electronic component from the wiring pattern.
  • the wiring may be formed by making a correction so as to add pads for connection of the new electronic component.
  • Figures 17 and 18 are flowcharts illustrating in detail the flow of the design data correction process.
  • the design data dynamic correction described hereinafter is repeated for each exposure area EA on each individual board (S200 to S250).
  • the exposure area EA is determined in step S201.
  • This step includes mechanically moving the substrate mounting stage and the exposure head prior to the maskless exposure performed on the thus determined exposure area EA.
  • step S202 graphical objects representing the lines contained in the exposure area EA are extracted from the data base DDB in which the design data is stored.
  • the extracted result is designated as ⁇ L ⁇ .
  • step S203 graphical objects representing the terminals of the electronic components contained in the exposure area EA are extracted from the data base BDB in which the information indicating the displacement from the design data is stored.
  • the extracted result is designated as ⁇ P ⁇ .
  • step S204 graphical objects containing the displacements of the terminals of the electronic components contained in the exposure area EA are extracted from the data base BDB in which the information indicating the displacement from the design data is stored.
  • the extracted result is designated as ⁇ Q ⁇ .
  • step S301 for all P ⁇ ⁇ P ⁇ (S300 to S350), a search is made in step S301 for L that intersects with P.
  • the search result is designated as S(P).
  • step S302 a search is made for L that intersects with Q corresponding to P.
  • the search result is designated as U ⁇ Q ⁇ .
  • step S401 it is determined in step S401 whether L is contained in S(P). If L is not contained in S(P), this means that an intersection with a wiring line other than the wiring line to be connected to P has been detected; therefore, in step S402, the second correction algorithm explained with reference to Figures 15 and 16 is performed, after which the process proceeds to step S502 to be described later. Alternatively, the process itself may stop here.
  • step S502 the design data dynamically corrected as described above is converted into input data for the maskless exposure apparatus.
  • the design data is dynamically corrected as described above, and the thus corrected data is used in the maskless exposure.
  • the design data dynamically corrected as described above should be converted into input data for the inkjet apparatus.
  • the design data has been corrected by only considering the difference between the actually formed or mounted position of the electronic component and the forming or mounting position specified in the design data.
  • the design data may be dynamically corrected by taking into account the distortion caused in the board or the electronic component during fabrication. In this case, not only the formed or mounted position of the electronic component but the shape of the formed or mounted electronic component is also measured, and the design data is corrected in accordance with the obtained results.
  • the design data to be used in the subsequent processing of the board is corrected by taking the displacement into account, and the via formation, the maskless exposure, and the wiring pattern formation using inkjet technology are performed based on the corrected design data; as a result, the component-embedded board can be fabricated easily and stably, even if the electronic component is somewhat displaced in position.
  • the design data necessary for the maskless exposure, the via formation, and the wiring pattern formation using inkjet technology can be correctly dynamically for each individual board and for each individual electronic component and each terminal of the electronic component, optimum maskless exposure, optimum via formation, and optimum wiring pattern formation using inkjet technology can always be achieved.
  • the above processes can be performed with high precision. For example, in the case of a multilayered component-embedded board, if it is desired to place a decoupling capacitor in the layer directly above the power supply line from the standpoint of noise reduction, many benefits can be obtained by applying the present invention.
  • the fabrication yield drastically improves compared with the prior art example using a photomask, and the production cost can also be reduced because there is no need to produce a photomask.
  • the fabrication yield can be further increased because seriously defective parts that cannot be remedied by the dynamic correction can be completely eliminated.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Structure Of Printed Boards (AREA)
EP03015264A 2002-07-09 2003-07-07 Panneau avec des composants enterrés et méthode de fabrication associée Withdrawn EP1381080A3 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2002200055 2002-07-09
JP2002200055 2002-07-09
JP2002352440A JP4190269B2 (ja) 2002-07-09 2002-12-04 素子内蔵基板製造方法およびその装置
JP2002352440 2002-12-04

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EP1381080A2 true EP1381080A2 (fr) 2004-01-14
EP1381080A3 EP1381080A3 (fr) 2005-08-03

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EP (1) EP1381080A3 (fr)
JP (1) JP4190269B2 (fr)
KR (1) KR101011684B1 (fr)
TW (1) TWI327449B (fr)

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Also Published As

Publication number Publication date
US7793412B2 (en) 2010-09-14
KR20040005659A (ko) 2004-01-16
JP4190269B2 (ja) 2008-12-03
US7707713B2 (en) 2010-05-04
KR101011684B1 (ko) 2011-01-31
EP1381080A3 (fr) 2005-08-03
JP2004096058A (ja) 2004-03-25
TW200403015A (en) 2004-02-16
US20080110021A1 (en) 2008-05-15
TWI327449B (en) 2010-07-11
US20040049912A1 (en) 2004-03-18

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