EP0343559B2 - Utilisation de composés éthane sulfone substitués en position 2 comme agents auxiliaires galvaniques - Google Patents

Utilisation de composés éthane sulfone substitués en position 2 comme agents auxiliaires galvaniques Download PDF

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Publication number
EP0343559B2
EP0343559B2 EP89109164A EP89109164A EP0343559B2 EP 0343559 B2 EP0343559 B2 EP 0343559B2 EP 89109164 A EP89109164 A EP 89109164A EP 89109164 A EP89109164 A EP 89109164A EP 0343559 B2 EP0343559 B2 EP 0343559B2
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EP
European Patent Office
Prior art keywords
compounds
galvanic
auxiliary agents
substituted ethane
pyridinium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP89109164A
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German (de)
English (en)
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EP0343559B1 (fr
EP0343559A1 (fr
Inventor
Wolfgang Clauss
Werner Kurze
Ferdinand Leifeld
Willy Wasserberg
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Raschig AG
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Raschig AG
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Publication date
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Definitions

  • propanesulfone compounds with a pyridinium substituent or a quinoline substituent in the 3-position are known for electroplating purposes as brighteners and levelers in acidic nickel baths (cf. DE-PS 1 004 011).
  • 2-substituted ethanesulfone compounds used according to the invention with an alkyl chain branching at the C2 show good gloss formation and leveling, in particular of nickel and copper coatings, although the steric hindrance leads to poor results. In this way, numerous substance variants allow adaptation and optimization to different galvanic requirements.
  • the pyridine and quinoline derivatives of the 2-substituted ethanesulfone betaines in particular are particularly good brighteners and levelers in acidic nickel baths, while the mercapto derivatives are suitable as brighteners in acidic copper baths.
  • a galvanic nickel bath was set up as follows: 50 g / l Boric acid 70 g / l Nickel chloride .6 H 2 O 330 g / l Nickel sulfate .7 H 2 O 2 g / l Saccharin 0.2 g / l Trial connection 0.02 g / l Leveler (epichlorohydrin-propargyl alcohol adduct) distilled water to 1 liter, pH 4.0 adjusted with sulfuric acid.
  • the sheets After the nickel plating, the sheets showed a uniform surface, good gloss and leveling.
  • the storage stability of the prepared additional solution at 60 ° C was good.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Pyridine Compounds (AREA)

Claims (3)

  1. Utilisation de composés éthanesulfonés substitués en position 2 de formule générale I

            [A-CHR3-CH2-SO3 ]-     (I)

    et de leurs sels alcaline ou d'ammonium, dans laquelle R3 représente un alkyle inférieur en C1 - C4 et A représente
    (1) un reste pyridinium
    Figure imgb0005
     dont les substituants R1 et R2 représentent un hydrogène ou alkyle inférieur en C1 - C3, ou les substituants R1 et R2 représentent ensemble avec la reste pyridinium, un cycle aromatique condensé à 6 chaînons, ou
    (2) un SH-groupe
    comme substance auxiliaire dans les techniques galvaniques.
  2. Utilisation de composés de formule I avec A = (1) comme agent de brillance et agent égalisateur dans les bains galvaniques acides au nickel.
  3. Utilisation de composés de fromule I avec A = (2) comme agent de brillance dans les bains galvaniques acides au cuivre.
EP89109164A 1988-05-25 1989-05-22 Utilisation de composés éthane sulfone substitués en position 2 comme agents auxiliaires galvaniques Expired - Lifetime EP0343559B2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3817722A DE3817722A1 (de) 1988-05-25 1988-05-25 Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe
DE3817722 1988-05-25

Publications (3)

Publication Number Publication Date
EP0343559A1 EP0343559A1 (fr) 1989-11-29
EP0343559B1 EP0343559B1 (fr) 1993-03-31
EP0343559B2 true EP0343559B2 (fr) 1996-07-10

Family

ID=6355072

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89109164A Expired - Lifetime EP0343559B2 (fr) 1988-05-25 1989-05-22 Utilisation de composés éthane sulfone substitués en position 2 comme agents auxiliaires galvaniques

Country Status (5)

Country Link
US (1) US5024736A (fr)
EP (1) EP0343559B2 (fr)
JP (1) JP2505281B2 (fr)
DE (2) DE3817722A1 (fr)
ES (1) ES2053865T5 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2242200B (en) * 1990-02-20 1993-11-17 Omi International Plating compositions and processes
DE4013349A1 (de) * 1990-04-23 1991-10-24 Schering Ag 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung
US5523861A (en) 1991-05-15 1996-06-04 Canon Kabushiki Kaisha Image reader capable of setting density and illumination
US6605204B1 (en) * 1999-10-14 2003-08-12 Atofina Chemicals, Inc. Electroplating of copper from alkanesulfonate electrolytes
US6776893B1 (en) * 2000-11-20 2004-08-17 Enthone Inc. Electroplating chemistry for the CU filling of submicron features of VLSI/ULSI interconnect
EP2801640A1 (fr) * 2013-05-08 2014-11-12 ATOTECH Deutschland GmbH Bain électrolytique de nickel galvanique ou d'alliage de nickel pour déposer un alliage de nickel ou de nickel mi-lustré
DE102014207778B3 (de) * 2014-04-25 2015-05-21 Kiesow Dr. Brinkmann GmbH & Co. KG Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht
MX2021005299A (es) 2018-11-07 2021-09-14 Coventya Inc Ba?o de cobre satinado y metodo de deposito de una capa de cobre satinado.
WO2020212346A1 (fr) * 2019-04-15 2020-10-22 Atotech Deutschland Gmbh Bain d'électrodéposition galvanique de nickel ou d'alliage de nickel pour le dépôt d'un revêtement semi-brillant de nickel ou d'alliage de nickel semi-brillant
DE102020212830B4 (de) 2020-10-12 2022-08-18 Sms Group Gmbh Einstellsystem zum Einstellen des Führungsspiels einer Gleitführung für bewegbare Teile einer Presse sowie Verfahren zum Einstellen der Position wenigstens eines Gleitblocks einer Gleitführung an einer Presse

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1075398B (de) * 1954-03-22 1960-02-11 DEHYDAG Deutsche Hydrierwerke G.m.b.H., Düsseldorf Bad zur galvanischen Herstellung von Metallüberzügen
NL205377A (fr) * 1955-03-16
DE1092744B (de) * 1958-12-17 1960-11-10 Dehydag Gmbh Saures galvanisches Nickelbad
DE1238032B (de) * 1962-07-21 1967-04-06 Dehydag Gmbh Verfahren zur Herstellung von Oxygruppen enthaltenden Sulfobetainen
DE1205973B (de) * 1963-02-02 1965-12-02 Dehydag Gmbh Verfahren zur Herstellung von Oxygruppen enthaltenden Thiosulfobetainen
DE1191652B (de) * 1963-05-15 1965-04-22 Dehydag Gmbh Saures galvanisches Nickelbad
US3328273A (en) * 1966-08-15 1967-06-27 Udylite Corp Electro-deposition of copper from acidic baths
DE2803493A1 (de) * 1978-01-27 1979-08-02 Agfa Gevaert Ag Verfahren zur herstellung von sulfoalkylquartaersalzen
FI70304C (fi) * 1980-02-27 1986-09-15 Kee Klamps Ltd Roeranslutning
US4526968A (en) * 1981-08-24 1985-07-02 M&T Chemicals Inc. Quaternary aminehydroxypropane sulfobetaines
US4555315A (en) * 1984-05-29 1985-11-26 Omi International Corporation High speed copper electroplating process and bath therefor
DE3541098A1 (de) * 1985-11-21 1987-05-27 Agfa Gevaert Ag Sulfoalkylierungsverfahren

Also Published As

Publication number Publication date
JPH0273990A (ja) 1990-03-13
JP2505281B2 (ja) 1996-06-05
DE3817722A1 (de) 1989-12-14
EP0343559B1 (fr) 1993-03-31
DE58903912D1 (de) 1993-05-06
ES2053865T3 (es) 1994-08-01
US5024736A (en) 1991-06-18
EP0343559A1 (fr) 1989-11-29
ES2053865T5 (es) 1996-11-16

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