DK2907527T3 - Driftsprocedure for ebestrålingsanordning - Google Patents
Driftsprocedure for ebestrålingsanordning Download PDFInfo
- Publication number
- DK2907527T3 DK2907527T3 DK15154264.4T DK15154264T DK2907527T3 DK 2907527 T3 DK2907527 T3 DK 2907527T3 DK 15154264 T DK15154264 T DK 15154264T DK 2907527 T3 DK2907527 T3 DK 2907527T3
- Authority
- DK
- Denmark
- Prior art keywords
- emitter
- temperature
- operating procedure
- irradiation
- heating element
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title claims description 30
- 238000000034 method Methods 0.000 title claims description 25
- 238000010438 heat treatment Methods 0.000 claims description 72
- 239000000758 substrate Substances 0.000 claims description 31
- 238000001816 cooling Methods 0.000 claims description 17
- 238000011017 operating method Methods 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 3
- 239000003570 air Substances 0.000 description 41
- 230000032258 transport Effects 0.000 description 22
- 230000008569 process Effects 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 18
- 238000009423 ventilation Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000002070 germicidal effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000003116 impacting effect Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 229910000497 Amalgam Inorganic materials 0.000 description 1
- 240000008100 Brassica rapa Species 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/10—Irradiation devices with provision for relative movement of beam source and object to be irradiated
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/08—Radiation
- A61L2/10—Ultra-violet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F23/00—Devices for treating the surfaces of sheets, webs, or other articles in connection with printing
- B41F23/04—Devices for treating the surfaces of sheets, webs, or other articles in connection with printing by heat drying, by cooling, by applying powders
- B41F23/0403—Drying webs
- B41F23/0406—Drying webs by radiation
- B41F23/0409—Ultra-violet dryers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F23/00—Devices for treating the surfaces of sheets, webs, or other articles in connection with printing
- B41F23/04—Devices for treating the surfaces of sheets, webs, or other articles in connection with printing by heat drying, by cooling, by applying powders
- B41F23/044—Drying sheets, e.g. between two printing stations
- B41F23/045—Drying sheets, e.g. between two printing stations by radiation
- B41F23/0453—Drying sheets, e.g. between two printing stations by radiation by ultraviolet dryers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B55/00—Preserving, protecting or purifying packages or package contents in association with packaging
- B65B55/02—Sterilising, e.g. of complete packages
- B65B55/12—Sterilising contents prior to, or during, packaging
- B65B55/16—Sterilising contents prior to, or during, packaging by irradiation
Claims (10)
- DRIFTSPROCEDURE FOR EBESTRÅLINGSARORDNING PATERTKRAV1. Driftsprocedure for en bestråiingsanordning ti! bestråling af et substart (2) ved hjælp afen UV-emitier (9a; 205a-205h; 405a-405h, 503), hvilken driftsprocedure består af følgende proceduretrin: (a) Drift af UV-emitteren (9a; 205a-205h; 405a-405h, 503) ved en nominel drifissiråleeffekt, der er en funktion af en nominel drifistemperatur; (b) Kontinuerlig tilførsel af substratet (2) med en tilførselshastighed ind i et bestrålingsområde, der er defineret af UV-emitteren (9a; 205a~205h; 405a-405h, 503); (c) Bestråling af substratet (2) i bestrålingsområdet, kendetegnet ved, at UV-emitteren (9a; 205a-205h; 405a-405h, 503) slukkes, hvis der forekommer en afbrydelse af den kontinuerlige substrattilførsel, hvorved emitter-temperaturen for den slukkede UV-emitter (9a; 205a-205h; 405a-405h,503) måles, og at der tilvejebringes en opvarmning som modforanstaltning for at modvirke, at emitter-temperaturen falder med mere end 10°C under den nominelle driftstemperatur.
- 2. Driftsprocedure ifølge krav 1, kendetegnet ved, at den tiivejebringer opvarmning af UV-emitteren (9a; 205a-205h; 405a-405h) ved hjælp af et varmeelement (10a, 10b, 10c, 404) som modforanstaltning.
- 3. Driftsprocedure ifølge krav 1, kendetegnet ved, at emitter-temperaturen påvirkes ved hjælp af en luftstrøm, der genereres af en iuftkøiing (202, 203), og ved at der tilvejebringes opvarmning af luftstrømmen ved hjælp af et varmeelement (204) som modforanstaltning.
- 4. Driftsprocedure ifølge et af de foregående krav 1, kendetegnet ved, at emitter-temperaturen påvirkes af en luftstrøm, der genereres af en luftkøling (202, 203), og at der som modforanstaltning tilvejebringes en ændring af luftstrømmens massestrømning.
- 5. Driftsprocedure ifølge krav 2 eller 3, kendetegnet ved, at hvis den kontinuerlige substrattilførsel afbrydes (aa) UV-emitteren (9a; 205a-250h; 405a-405h)slukkes, og (bb) varmeelementet (10a, 10b, 10c, 404) tændes, og at ved ophævelse af afbrydelsen af den kontinuerlige substrattilførsel (cc) UV-emitteren (9a; 205a-205h; 405a-405h, 503) tændes, og (dd) varmeelementet (10a, 10b, 10c, 404) slukkes.
- 6. Driftsprocedure ifølge krav 3, kendetegnet ved, at opvarmningen af luftstrømmen sker i en lufttilførselskanal (202) i lufikølingen (202, 203).
- 7. Driftsprocedure ifølge et af de foregående krav 3 eller 6, kendetegnet ved, at bestrålingsanordningen har en reflektor (402) med en side, der vender ind mod UV-emitteren (405a-405h) og en side, der vender bort fra UV-emitteren (405a-405h), og at opvarmningen af luftstrømmen sker via et varmeelement (404), der er anbragt på den bortvendte side af reflektoren (402).
- 8. Driftsprocedure ifølge et af de foregående krav 3, 4, 6 eiler 7, kendetegnet ved, at luftstrømmen strømmer omkring UV-emitteren (9a; 205a-205h) i en retning, der er lodret på emitterens langsgående retning.
- 9. Driftsprocedure ifølge et af de foregående krav, kendetegnet ved, at tilførselshastigheden detekteres fortløbende af en sensor (11).
- 10. Driftsprocedure ifølge et af de foregående krav, kendetegnet ved, attemperaturen af UV-emitteren (9a; 205a-205h; 405a-405h, 503) detekteres fortløbende afen sensor (12).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014101935.0A DE102014101935B4 (de) | 2014-02-17 | 2014-02-17 | Betriebsverfahren für eine Bestrahlungsvorrichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
DK2907527T3 true DK2907527T3 (da) | 2016-11-28 |
Family
ID=52450023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK15154264.4T DK2907527T3 (da) | 2014-02-17 | 2015-02-09 | Driftsprocedure for ebestrålingsanordning |
Country Status (10)
Country | Link |
---|---|
US (1) | US9281093B2 (da) |
EP (1) | EP2907527B1 (da) |
JP (1) | JP5980357B2 (da) |
CN (1) | CN104851472B (da) |
DE (1) | DE102014101935B4 (da) |
DK (1) | DK2907527T3 (da) |
ES (1) | ES2603802T3 (da) |
HU (1) | HUE031085T2 (da) |
LT (1) | LT2907527T (da) |
PL (1) | PL2907527T3 (da) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102014101935B4 (de) * | 2014-02-17 | 2018-05-30 | Heraeus Noblelight Gmbh | Betriebsverfahren für eine Bestrahlungsvorrichtung |
US9674963B1 (en) * | 2015-06-03 | 2017-06-06 | Eric Sari | Multilevel machine to process coatings |
DE102017217881A1 (de) | 2016-11-08 | 2018-05-09 | Heidelberger Druckmaschinen Ag | Verfahren zum Betreiben einer UV-Härtungsvorrichtung einer Druckmaschine |
JP7109930B2 (ja) * | 2018-02-05 | 2022-08-01 | 日機装株式会社 | 流体殺菌装置 |
USD914232S1 (en) | 2019-12-19 | 2021-03-23 | Bridgeport Magnetics Group, Inc. | Ultraviolet radiation surface disinfection device |
US20220189759A1 (en) * | 2020-12-11 | 2022-06-16 | The Boeing Company | Ultraviolet light-emitting module and disinfecting system |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61107795A (ja) * | 1984-10-31 | 1986-05-26 | 日立化成工業株式会社 | フレキシブル配線板の製造法 |
JPS6271533A (ja) * | 1985-09-26 | 1987-04-02 | Toshiba Corp | 紫外線照射装置 |
JPH03238041A (ja) * | 1989-11-30 | 1991-10-23 | Toshiba Lighting & Technol Corp | 紫外線照射装置 |
JPH0794251B2 (ja) | 1992-08-03 | 1995-10-11 | 澁谷工業株式会社 | キャップ殺菌装置 |
EP0722423B1 (en) * | 1993-10-06 | 1998-09-16 | Water Recovery Plc | Photodetector apparatus |
US5832833A (en) * | 1995-07-25 | 1998-11-10 | Burgio; Joseph Thomas | Apparatus and method for drying a substrate printed on a multi-stand offset press |
JPH09282918A (ja) * | 1996-04-16 | 1997-10-31 | Yazaki Corp | 車両計器用バックライト照明装置 |
US6217695B1 (en) * | 1996-05-06 | 2001-04-17 | Wmw Systems, Llc | Method and apparatus for radiation heating substrates and applying extruded material |
US6111700A (en) * | 1996-09-05 | 2000-08-29 | Fujitsu Limited | Optical display device having a reflection-type polarizer |
JP2856322B1 (ja) * | 1997-09-26 | 1999-02-10 | 日本電気株式会社 | ビームはんだ付け装置 |
US7409777B2 (en) * | 2000-05-09 | 2008-08-12 | James Thomas Shiveley | Rapid efficient infrared curing powder/wet coatings and ultraviolet coatings curing laboratory applied production processing |
US6563255B1 (en) * | 2000-10-19 | 2003-05-13 | General Electric Company | Luminaire incorporating arc tube preheater |
JP4187645B2 (ja) * | 2001-07-12 | 2008-11-26 | ダイナフロー株式会社 | 浄水装置 |
US7009630B1 (en) * | 2002-09-09 | 2006-03-07 | General Data Company, Inc. | Method and apparatus for printing ink imprinted indicia |
JP2008034143A (ja) * | 2006-07-26 | 2008-02-14 | Matsushita Electric Works Ltd | 埋込型照明器具 |
JP5047676B2 (ja) * | 2007-04-23 | 2012-10-10 | 東製株式会社 | 袋体の殺菌及び液体充填装置 |
JP2009103981A (ja) * | 2007-10-24 | 2009-05-14 | Fujifilm Corp | 光学補償フィルムの製造方法及び光学補償フィルム |
DE102008044293A1 (de) * | 2008-12-02 | 2010-06-10 | Brita Gmbh | Flüssigkeitsentkeimungsvorrichtung |
US9090114B1 (en) * | 2010-09-08 | 2015-07-28 | Brian A Stumm | Machine including LED-based UV radiation sources to process coatings |
US9018110B2 (en) * | 2011-04-25 | 2015-04-28 | Applied Materials, Inc. | Apparatus and methods for microwave processing of semiconductor substrates |
JP2013033636A (ja) * | 2011-08-02 | 2013-02-14 | Harison Toshiba Lighting Corp | 紫外線照射システム |
DE102014101935B4 (de) * | 2014-02-17 | 2018-05-30 | Heraeus Noblelight Gmbh | Betriebsverfahren für eine Bestrahlungsvorrichtung |
-
2014
- 2014-02-17 DE DE102014101935.0A patent/DE102014101935B4/de not_active Expired - Fee Related
-
2015
- 2015-02-09 HU HUE15154264A patent/HUE031085T2/hu unknown
- 2015-02-09 ES ES15154264.4T patent/ES2603802T3/es active Active
- 2015-02-09 EP EP15154264.4A patent/EP2907527B1/de not_active Not-in-force
- 2015-02-09 LT LTEP15154264.4T patent/LT2907527T/lt unknown
- 2015-02-09 DK DK15154264.4T patent/DK2907527T3/da active
- 2015-02-09 PL PL15154264T patent/PL2907527T3/pl unknown
- 2015-02-13 US US14/621,624 patent/US9281093B2/en not_active Expired - Fee Related
- 2015-02-15 CN CN201510081368.XA patent/CN104851472B/zh not_active Expired - Fee Related
- 2015-02-17 JP JP2015028465A patent/JP5980357B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE102014101935A1 (de) | 2015-08-20 |
US20150235727A1 (en) | 2015-08-20 |
CN104851472B (zh) | 2017-11-10 |
PL2907527T3 (pl) | 2017-02-28 |
ES2603802T3 (es) | 2017-03-01 |
CN104851472A (zh) | 2015-08-19 |
JP5980357B2 (ja) | 2016-08-31 |
LT2907527T (lt) | 2016-11-25 |
DE102014101935B4 (de) | 2018-05-30 |
JP2015150561A (ja) | 2015-08-24 |
US9281093B2 (en) | 2016-03-08 |
EP2907527A1 (de) | 2015-08-19 |
HUE031085T2 (hu) | 2017-06-28 |
EP2907527B1 (de) | 2016-08-24 |
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