DE944571C - Verfahren zur Beeinflussung DER elektrischen Eigenschaften von Halbleiterkoerpern bei deren Herstellung aus reinem Halbleitermaterial, welches nur sehr kleine Anteile an Geber- und Nehmerberunreinigung enthaelt - Google Patents
Verfahren zur Beeinflussung DER elektrischen Eigenschaften von Halbleiterkoerpern bei deren Herstellung aus reinem Halbleitermaterial, welches nur sehr kleine Anteile an Geber- und Nehmerberunreinigung enthaeltInfo
- Publication number
- DE944571C DE944571C DEW8848A DEW0008848A DE944571C DE 944571 C DE944571 C DE 944571C DE W8848 A DEW8848 A DE W8848A DE W0008848 A DEW0008848 A DE W0008848A DE 944571 C DE944571 C DE 944571C
- Authority
- DE
- Germany
- Prior art keywords
- germanium
- oxidizing
- donor
- aluminum
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B31/00—Disazo and polyazo dyes of the type A->B->C, A->B->C->D, or the like, prepared by diazotising and coupling
- C09B31/02—Disazo dyes
- C09B31/025—Disazo dyes containing acid groups, e.g. -COOH, -SO3H, -PO3H2, -OSO3H, -OPO2H2; Salts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/906—Special atmosphere other than vacuum or inert
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/909—Controlled atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/919—Compensation doping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/925—Fluid growth doping control, e.g. delta doping
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/934—Sheet resistance, i.e. dopant parameters
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Carbon And Carbon Compounds (AREA)
- Sampling And Sample Adjustment (AREA)
- Electrotherapy Devices (AREA)
- Coloring (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67894A US2602763A (en) | 1948-12-29 | 1948-12-29 | Preparation of semiconductive materials for translating devices |
US236662A US2753281A (en) | 1948-12-29 | 1951-07-13 | Method of preparing germanium for translating devices |
Publications (1)
Publication Number | Publication Date |
---|---|
DE944571C true DE944571C (de) | 1956-06-21 |
Family
ID=26748380
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEW8848A Expired DE944571C (de) | 1948-12-29 | 1952-06-19 | Verfahren zur Beeinflussung DER elektrischen Eigenschaften von Halbleiterkoerpern bei deren Herstellung aus reinem Halbleitermaterial, welches nur sehr kleine Anteile an Geber- und Nehmerberunreinigung enthaelt |
DEC6841A Expired DE944577C (de) | 1948-12-29 | 1952-12-18 | Verfahren zur Herstellung kupfer- oder nickelhaltiger Disazofarbstoffe |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEC6841A Expired DE944577C (de) | 1948-12-29 | 1952-12-18 | Verfahren zur Herstellung kupfer- oder nickelhaltiger Disazofarbstoffe |
Country Status (7)
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1064486B (de) * | 1956-11-05 | 1959-09-03 | Pechiney Prod Chimiques Sa | Verfahren zum Reinigen von Silicium |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686279A (en) * | 1949-09-28 | 1954-08-10 | Rca Corp | Semiconductor device |
US2783197A (en) * | 1952-01-25 | 1957-02-26 | Gen Electric | Method of making broad area semiconductor devices |
BE523775A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1950-09-29 | |||
US2762953A (en) * | 1951-05-15 | 1956-09-11 | Sylvania Electric Prod | Contact rectifiers and methods |
BE516364A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1951-12-20 | |||
NL176299B (nl) * | 1952-03-10 | Hydrotech Int Inc | Inrichting voor het losneembaar afsluiten van pijpleidingen. | |
US2714566A (en) * | 1952-05-28 | 1955-08-02 | Rca Corp | Method of treating a germanium junction rectifier |
NL178757B (nl) * | 1952-06-02 | British Steel Corp | Werkwijze en inrichting voor het continu produceren van een metaalstrook uit metaalpoeder. | |
DE928674C (de) * | 1952-06-21 | 1955-06-06 | Licentia Gmbh | Verfahren zum Herstellen von Einkristallen und deren Verwendung |
US2750262A (en) * | 1952-07-12 | 1956-06-12 | Bell Telephone Labor Inc | Process for separating components of a fusible material |
BE522097A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1952-08-13 | |||
US2726357A (en) * | 1952-10-22 | 1955-12-06 | Columbia Broadcasting Syst Inc | Semiconductor device |
US2719799A (en) * | 1952-11-13 | 1955-10-04 | Rca Corp | Zone melting furnace and method of zone melting |
US2763581A (en) * | 1952-11-25 | 1956-09-18 | Raytheon Mfg Co | Process of making p-n junction crystals |
US3162556A (en) * | 1953-01-07 | 1964-12-22 | Hupp Corp | Introduction of disturbance points in a cadmium sulfide transistor |
US2874448A (en) * | 1953-02-13 | 1959-02-24 | William F Haldeman | Method for stabilizing semi-conductor rectifiers |
US2821490A (en) * | 1953-03-11 | 1958-01-28 | Sylvania Electric Prod | Titanate rectifiers |
US2849341A (en) * | 1953-05-01 | 1958-08-26 | Rca Corp | Method for making semi-conductor devices |
US2837771A (en) * | 1953-07-08 | 1958-06-10 | Standard Oil Co | Casting method |
US2759855A (en) * | 1953-08-24 | 1956-08-21 | Eagle Picher Co | Coated electronic device and method of making same |
GB805291A (en) * | 1953-12-02 | 1958-12-03 | Philco Corp | Improvements in methods of electrolytically etching or plating bodies of semiconductive material |
NL96864C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1954-01-14 | 1900-01-01 | ||
US2740700A (en) * | 1954-05-14 | 1956-04-03 | Bell Telephone Labor Inc | Method for portraying p-n junctions in silicon |
BE538469A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1954-05-27 | |||
US2891201A (en) * | 1954-12-22 | 1959-06-16 | Itt | Crystal contact device |
US2785096A (en) * | 1955-05-25 | 1957-03-12 | Texas Instruments Inc | Manufacture of junction-containing silicon crystals |
US2996918A (en) * | 1955-12-27 | 1961-08-22 | Ibm | Junction transistor thermostat |
NL133498C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1958-06-18 | |||
US3154439A (en) * | 1959-04-09 | 1964-10-27 | Sprague Electric Co | Method for forming a protective skin for transistor |
US3143443A (en) * | 1959-05-01 | 1964-08-04 | Hughes Aircraft Co | Method of fabricating semiconductor devices |
US3192141A (en) * | 1959-12-24 | 1965-06-29 | Western Electric Co | Simultaneous etching and monitoring of semiconductor bodies |
CA734135A (en) * | 1961-12-28 | 1966-05-10 | R. Gunther-Mohr Gerard | Electrical contact formation |
GB1019924A (en) * | 1963-08-26 | 1966-02-09 | Ici Ltd | Stabilisation of chlorinated hydrocarbons |
US7563022B2 (en) * | 2003-11-28 | 2009-07-21 | Ontario Power Generation Inc. | Methods and apparatus for inspecting reactor pressure tubes |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2402582A (en) * | 1941-04-04 | 1946-06-25 | Bell Telephone Labor Inc | Preparation of silicon materials |
GB594783A (en) * | 1944-01-05 | 1947-11-19 | Western Electric Co | Improvements in the preparation of silicon ingots |
GB632942A (en) * | 1945-12-29 | 1949-12-05 | Western Electric Co | Improvements in rectifiers and methods of making them |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE625778C (de) * | 1934-02-16 | 1936-02-15 | I G Farbenindustrie Akt Ges | Verfahren zur Herstellung von Azofarbstoffen |
DE626839C (de) * | 1934-05-19 | 1936-03-05 | I G Farbenindustrie Akt Ges | Verfahren zur Herstellung von Azofarbstoffen |
DE698979C (de) * | 1935-01-05 | 1940-11-20 | I G Farbenindustrie Akt Ges | Verfahren zur Herstellung von Disazofarbstoffen |
US2419561A (en) * | 1941-08-20 | 1947-04-29 | Gen Electric Co Ltd | Crystal contact of which one element is mainly silicon |
FR1012618A (fr) * | 1949-12-29 | 1952-07-15 | Francolor Sa | Nouveaux colorants métallifères et leurs procédés de préparation |
-
0
- NL NLAANVRAGE7013317,A patent/NL171020B/xx unknown
- NL NL717102297A patent/NL149164B/xx unknown
- NL NL77451D patent/NL77451C/xx active
- BE BE490848D patent/BE490848A/xx unknown
- NL NL88607D patent/NL88607C/xx active
-
1948
- 1948-12-29 US US67894A patent/US2602763A/en not_active Expired - Lifetime
-
1949
- 1949-12-29 GB GB33225/49A patent/GB692094A/en not_active Expired
- 1949-12-29 CH CH295809D patent/CH295809A/fr unknown
-
1951
- 1951-07-13 US US236662A patent/US2753281A/en not_active Expired - Lifetime
-
1952
- 1952-03-31 FR FR1058979D patent/FR1058979A/fr not_active Expired
- 1952-06-19 DE DEW8848A patent/DE944571C/de not_active Expired
- 1952-07-11 GB GB17525/52A patent/GB713597A/en not_active Expired
- 1952-12-18 DE DEC6841A patent/DE944577C/de not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2402582A (en) * | 1941-04-04 | 1946-06-25 | Bell Telephone Labor Inc | Preparation of silicon materials |
GB594783A (en) * | 1944-01-05 | 1947-11-19 | Western Electric Co | Improvements in the preparation of silicon ingots |
GB632942A (en) * | 1945-12-29 | 1949-12-05 | Western Electric Co | Improvements in rectifiers and methods of making them |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1064486B (de) * | 1956-11-05 | 1959-09-03 | Pechiney Prod Chimiques Sa | Verfahren zum Reinigen von Silicium |
Also Published As
Publication number | Publication date |
---|---|
US2602763A (en) | 1952-07-08 |
NL171020B (nl) | |
CH295809A (fr) | 1954-01-15 |
GB713597A (en) | 1954-08-11 |
DE944577C (de) | 1956-06-21 |
NL149164B (nl) | |
NL77451C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | |
BE490848A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | |
NL88607C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | |
US2753281A (en) | 1956-07-03 |
GB692094A (en) | 1953-05-27 |
FR1058979A (fr) | 1954-03-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE944571C (de) | Verfahren zur Beeinflussung DER elektrischen Eigenschaften von Halbleiterkoerpern bei deren Herstellung aus reinem Halbleitermaterial, welches nur sehr kleine Anteile an Geber- und Nehmerberunreinigung enthaelt | |
DE69717531T2 (de) | Verfahren zur Herstellung III-V Verbindungshalbleiterkristallen | |
DE1025631B (de) | Verfahren zur Raffination eines laenglichen Metallkoerpers nach dem Zonenschmelzverfahren | |
DE2606581A1 (de) | Verfahren zur herstellung von metallegierungsfaeden | |
DE2152066A1 (de) | Siliciumnitridkeramiken und Verfahren zu ihrer Herstellung | |
DE112006002595T5 (de) | Herstellungsvorrichtung und Herstellungsverfahren für ein Einkristall-Halbleiter | |
DE69414652T2 (de) | Verbessertes Verfahren zur Bildung von Siliconkristallen | |
DE4212580A1 (de) | Vorrichtung zur herstellung von silizium-einkristallen | |
DE102022207643B4 (de) | Halbisolierendes Galliumarsenid-Einkristall und Verfahren zu seiner Herstellung | |
DE1608243A1 (de) | Legierung und Verfahren zu ihrer Herstellung | |
DE69312582T2 (de) | Verfahren zur Herstellung eines Metalloxid-Kristalls | |
DE69428302T2 (de) | Regulierung der Sauerstoffkonzentration in einem Einkristall, der aus einer ein Gruppe V Element enthaltenden Schmelze gezogenen wird. | |
DE3810678C2 (de) | Permanentmagnet mit hoher Koerzitivkraft und hohem maximalen Energieprodukt und Verfahren zu dessen Herstellung | |
DE3021074A1 (de) | Verfahren zur herstellung von oberflaechenschichten aus hg tief 1-x cd tief x te | |
DE1941968B2 (de) | Verfahren und vorrichtung zur herstellung von einkristallen | |
DE1292695B (de) | Verfahren zur Erzeugung von Wuerfeltextur in Eisen-Silicium-Blechen | |
DE1917136A1 (de) | Verfahren zur Herstellung von Kristallen,insbesondere Haarkristalle und Gegenstaende,die solche Haarkristalle enthalten | |
DE69128349T2 (de) | Verfahren zur Herstellung von schmelzgegossenem magnetischem Weichferrit | |
DE2115999B2 (de) | Verwendung eines wolframpulvers fuer sinterhartmetall hoher biegefestigkeit und haerte | |
DE1808618C3 (de) | Verfahren zum tiegelfreien Zonenschmelzen eines Halbleiterkristallstabes | |
DE1667655C3 (de) | Verfahren zur Herstellung von Slliziumkarbidkristalten | |
DE1769275C3 (de) | Verfahren zum epitaktischen Abscheiden von Silicium auf einem Substrat | |
DE10061398C1 (de) | Verfahren zur Herstellung metallischer Bänder | |
AT206477B (de) | Verfahren zur Herstellung von reinem Silizium | |
DE1963853A1 (de) | Verfahren zur Herstellung einer Galliumverbindung und aus dieser bestehender Einkristall |