DE69737862D1 - Automatische justierung eines energiefiltrierenden transmissionselektronenmikroskops - Google Patents
Automatische justierung eines energiefiltrierenden transmissionselektronenmikroskopsInfo
- Publication number
- DE69737862D1 DE69737862D1 DE69737862T DE69737862T DE69737862D1 DE 69737862 D1 DE69737862 D1 DE 69737862D1 DE 69737862 T DE69737862 T DE 69737862T DE 69737862 T DE69737862 T DE 69737862T DE 69737862 D1 DE69737862 D1 DE 69737862D1
- Authority
- DE
- Germany
- Prior art keywords
- energy
- automatic adjustment
- electronic microscope
- feeding transmission
- transmission electronic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005540 biological transmission Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24485—Energy spectrometers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2826—Calibration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US684973 | 1996-08-07 | ||
| US08/684,973 US5798524A (en) | 1996-08-07 | 1996-08-07 | Automated adjustment of an energy filtering transmission electron microscope |
| PCT/US1997/011896 WO1998006125A1 (en) | 1996-08-07 | 1997-07-10 | Automated adjustment of an energy filtering transmissiion electron microscope |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69737862D1 true DE69737862D1 (de) | 2007-08-09 |
| DE69737862T2 DE69737862T2 (de) | 2008-03-06 |
Family
ID=24750270
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69737862T Expired - Lifetime DE69737862T2 (de) | 1996-08-07 | 1997-07-10 | Automatische justierung eines energiefiltrierenden transmissionselektronenmikroskops |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5798524A (de) |
| EP (1) | EP0917725B1 (de) |
| JP (1) | JP2000515675A (de) |
| DE (1) | DE69737862T2 (de) |
| WO (1) | WO1998006125A1 (de) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6184524B1 (en) * | 1996-08-07 | 2001-02-06 | Gatan, Inc. | Automated set up of an energy filtering transmission electron microscope |
| DE19811395A1 (de) * | 1998-03-16 | 1999-09-23 | Deutsches Krebsforsch | Verfahren zur Kontrastverstärkung für ein Transmissionselektronenmikroskop |
| EP0937532B1 (de) * | 1998-02-19 | 2002-11-06 | M J Technologies Limited | Laserbohren mit optischer Rückkopplung |
| JP3571528B2 (ja) * | 1998-04-10 | 2004-09-29 | 日本電子株式会社 | エネルギーフィルタを備える電子顕微鏡 |
| NL1009959C2 (nl) * | 1998-08-28 | 2000-02-29 | Univ Delft Tech | Elektronenmicroscoop. |
| JP4449573B2 (ja) * | 1999-01-04 | 2010-04-14 | 株式会社日立製作所 | 元素マッピング装置,走査透過型電子顕微鏡および元素マッピング方法 |
| JP3687541B2 (ja) * | 1999-01-04 | 2005-08-24 | 株式会社日立製作所 | 元素マッピング装置、走査透過型電子顕微鏡および元素マッピング方法 |
| JP3721287B2 (ja) * | 1999-09-01 | 2005-11-30 | 日本電子株式会社 | エネルギ選択スリット幅設定装置 |
| US6495826B2 (en) * | 2000-04-10 | 2002-12-17 | Jeol, Ltd. | Monochrometer for electron beam |
| US6552340B1 (en) | 2000-10-12 | 2003-04-22 | Nion Co. | Autoadjusting charged-particle probe-forming apparatus |
| EP1209720A3 (de) | 2000-11-21 | 2006-11-15 | Hitachi High-Technologies Corporation | Energieverteilungsmessung |
| US6864493B2 (en) | 2001-05-30 | 2005-03-08 | Hitachi, Ltd. | Charged particle beam alignment method and charged particle beam apparatus |
| US6770887B2 (en) * | 2002-07-08 | 2004-08-03 | Ondrej L. Krivanek | Aberration-corrected charged-particle optical apparatus |
| JP4048925B2 (ja) * | 2002-11-18 | 2008-02-20 | 株式会社日立製作所 | 電子顕微鏡 |
| JP3979945B2 (ja) * | 2003-01-23 | 2007-09-19 | 日本電子株式会社 | 電子分光系を有した電子線装置 |
| JP2004288519A (ja) * | 2003-03-24 | 2004-10-14 | Hitachi High-Technologies Corp | 電子顕微鏡 |
| JP2006040777A (ja) * | 2004-07-29 | 2006-02-09 | Jeol Ltd | 電子顕微鏡 |
| JP5289665B2 (ja) * | 2004-12-08 | 2013-09-11 | 株式会社日立製作所 | 薄膜評価方法及びその装置 |
| JP4512514B2 (ja) * | 2005-04-22 | 2010-07-28 | 株式会社日立ハイテクノロジーズ | 電子線分光器を備えた透過型電子顕微鏡 |
| US7238938B2 (en) * | 2005-06-16 | 2007-07-03 | Gatan, Inc. | Energy selecting slit and energy selective sample analysis systems utilizing the same |
| EP1783811A3 (de) * | 2005-11-02 | 2008-02-27 | FEI Company | Korrektor zur Korrektion von chromatischen Aberrationen in einem korpuskularoptiachen Apparat |
| US7488938B1 (en) * | 2006-08-23 | 2009-02-10 | Kla-Tencor Technologies Corporation | Charge-control method and apparatus for electron beam imaging |
| JP4399471B2 (ja) | 2007-02-28 | 2010-01-13 | 株式会社日立ハイテクノロジーズ | 電子分光器を備えた透過型電子顕微鏡 |
| JP2007266016A (ja) * | 2007-07-23 | 2007-10-11 | Hitachi Ltd | 電子顕微鏡 |
| EP2091062A1 (de) | 2008-02-13 | 2009-08-19 | FEI Company | TEM mit Aberrationskorrektor und Phasenplatte |
| JP5188846B2 (ja) * | 2008-03-10 | 2013-04-24 | 日本電子株式会社 | 走査型透過電子顕微鏡の収差補正装置及び収差補正方法 |
| EP2128885A1 (de) * | 2008-05-26 | 2009-12-02 | FEI Company | Quelle für geladene Teilchen mit integriertem Energiefilter |
| EP2131385A1 (de) * | 2008-06-05 | 2009-12-09 | FEI Company | Hybridphasenplatte |
| EP2166557A1 (de) * | 2008-09-22 | 2010-03-24 | FEI Company | Verfahren zur Berichtigung von Verzerrungen in einer teilchenoptischen Vorrichtung |
| JP5315033B2 (ja) * | 2008-12-09 | 2013-10-16 | 株式会社日立ハイテクノロジーズ | 電子分光器を備えた透過型電子顕微鏡 |
| EP2325862A1 (de) * | 2009-11-18 | 2011-05-25 | Fei Company | Korrektor für axiale Aberrationen einer teilchenoptischen Linse |
| EP2388796A1 (de) * | 2010-05-21 | 2011-11-23 | FEI Company | Simultane Elektronendetektion |
| EP2453461A1 (de) | 2010-11-10 | 2012-05-16 | FEI Company | Quelle für geladene Teilchen mit integriertem elektrostatischen Energiefilter |
| EP2511936B1 (de) | 2011-04-13 | 2013-10-02 | Fei Company | Verzerrungsfreie Stigmation eines TEM |
| US8933425B1 (en) | 2011-11-02 | 2015-01-13 | Kla-Tencor Corporation | Apparatus and methods for aberration correction in electron beam based system |
| US9111715B2 (en) | 2011-11-08 | 2015-08-18 | Fei Company | Charged particle energy filter |
| US9214127B2 (en) * | 2013-07-09 | 2015-12-15 | Apple Inc. | Liquid crystal display using depletion-mode transistors |
| CN106804114B (zh) * | 2014-06-27 | 2019-05-28 | 加坦公司 | 电子能量损失光谱仪 |
| JP6266467B2 (ja) * | 2014-08-11 | 2018-01-24 | 日本電子株式会社 | 電子顕微鏡、およびモノクロメーターの調整方法 |
| US9767984B2 (en) | 2014-09-30 | 2017-09-19 | Fei Company | Chicane blanker assemblies for charged particle beam systems and methods of using the same |
| EP3065160B1 (de) | 2015-11-02 | 2017-12-20 | FEI Company | Nachsäulenfilter mit verbessertem energiebereich |
| WO2017189212A1 (en) * | 2016-04-29 | 2017-11-02 | Battelle Memorial Institute | Compressive scanning spectroscopy |
| US10295677B2 (en) | 2017-05-08 | 2019-05-21 | Battelle Memorial Institute | Systems and methods for data storage and retrieval |
| US10283315B2 (en) | 2017-05-16 | 2019-05-07 | International Business Machines Corporation | Measuring spherical and chromatic aberrations in cathode lens electrode microscopes |
| CN108036739B (zh) * | 2017-11-17 | 2020-01-21 | 宁波大学 | 一种基于移动光阑的显微三维测量系统及方法 |
| EP3496129B1 (de) * | 2017-12-07 | 2023-11-01 | FEI Company | Transmissionsaufgeladeneteilchenmikroskop mit verbessertem eels/eftem-modul |
| US12283455B2 (en) | 2019-09-03 | 2025-04-22 | Cornell University | Monochromator device and methods of use thereof |
| EP4002420A1 (de) * | 2020-11-12 | 2022-05-25 | FEI Company | Verfahren zur bestimmung der energiebreite eines geladenen teilchenstrahls |
Family Cites Families (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL6716628A (de) * | 1967-12-07 | 1969-06-10 | ||
| NL7012388A (de) * | 1970-08-21 | 1972-02-23 | ||
| US4017403A (en) * | 1974-07-31 | 1977-04-12 | United Kingdom Atomic Energy Authority | Ion beam separators |
| SU516316A1 (ru) * | 1975-03-03 | 1976-11-25 | Ордена Ленина Физико-Технический Институт Им. А.Ф.Иоффе | Электроннооптическое устройство со скорректированной сферической аберрацией |
| US4379250A (en) * | 1979-10-19 | 1983-04-05 | Hitachi, Ltd. | Field emission cathode and method of fabricating the same |
| JPS5848011B2 (ja) * | 1979-11-26 | 1983-10-26 | 日本鋼管株式会社 | 加熱炉燃焼制御方法 |
| SU920892A1 (ru) * | 1980-07-23 | 1982-04-15 | Ордена Ленина физико-технический институт им.А.Ф.Иоффе | Электроннооптическое устройство со скорректированной сферической аберрацией |
| NL8100142A (nl) * | 1981-01-14 | 1982-08-02 | Philips Nv | Inrichting voor het weergeven van beelden met behulp van een kathodestraalbuis. |
| NL8101888A (nl) * | 1981-04-16 | 1982-11-16 | Philips Nv | Beeldweergeefinrichting. |
| GB2109538A (en) * | 1981-11-02 | 1983-06-02 | Philips Electronic Associated | Electron beam alignment |
| GB2109539A (en) * | 1981-11-02 | 1983-06-02 | Philips Electronic Associated | Electron beam alignment |
| US4414474A (en) * | 1982-02-17 | 1983-11-08 | University Patents, Inc. | Corrector for axial aberrations in electron optic instruments |
| SU1048532A1 (ru) * | 1982-05-14 | 1983-10-15 | Предприятие П/Я М-5273 | Электроннооптическое устройство с коррекцией аберраций |
| GB8322017D0 (en) * | 1983-08-16 | 1983-09-21 | Vg Instr Ltd | Charged particle energy spectrometer |
| DE3423149A1 (de) * | 1984-06-22 | 1986-01-02 | Fa. Carl Zeiss, 7920 Heidenheim | Verfahren und anordnung zur elektronenenergiegefilterten abbildung eines objektes oder eines objektbeugungsdiagrammes mit einem transmissions-elektronenmikroskop |
| JPS61277141A (ja) * | 1985-05-31 | 1986-12-08 | Jeol Ltd | 磁界型エネルギ−フイルタ− |
| DE3532699A1 (de) * | 1985-09-13 | 1987-03-26 | Zeiss Carl Fa | Elektronenenergiefilter vom omega-typ |
| DE3532698A1 (de) * | 1985-09-13 | 1987-03-26 | Zeiss Carl Fa | Elektronenenergiefilter vom alpha-typ |
| JPS6298724A (ja) * | 1985-10-25 | 1987-05-08 | Hitachi Ltd | 電子線描画装置 |
| NL8600685A (nl) * | 1986-03-18 | 1987-10-16 | Philips Nv | Apparaat voor energie selectieve afbeelding. |
| JPS62240442A (ja) * | 1986-04-09 | 1987-10-21 | Hitachi Ltd | 燃料制御装置 |
| NL8602177A (nl) * | 1986-08-27 | 1988-03-16 | Philips Nv | Electronen detectie met energie discriminatie. |
| US4743756A (en) * | 1987-08-10 | 1988-05-10 | Gatan Inc. | Parallel-detection electron energy-loss spectrometer |
| US4851670A (en) * | 1987-08-28 | 1989-07-25 | Gatan Inc. | Energy-selected electron imaging filter |
| NL8702400A (nl) * | 1987-10-09 | 1989-05-01 | Philips Nv | Kleurenbeeldbuis met asymmetrische deflektie-elektroden. |
| JPH01107532A (ja) * | 1987-10-21 | 1989-04-25 | Hitachi Ltd | 電子線描画装置 |
| NL8702700A (nl) * | 1987-11-12 | 1989-06-01 | Philips Nv | Werkwijze en inrichting voor automatische fasecorrectie van complexe nmr spectra. |
| NL8801050A (nl) * | 1988-04-22 | 1989-11-16 | Philips Nv | Beeldversterkerbuis. |
| JP2686492B2 (ja) * | 1988-12-12 | 1997-12-08 | 株式会社日立製作所 | 透過形電子顕微鏡の照射位置決め方法 |
| JP2842879B2 (ja) * | 1989-01-06 | 1999-01-06 | 株式会社日立製作所 | 表面分析方法および装置 |
| NL8900067A (nl) * | 1989-01-12 | 1990-08-01 | Philips Nv | Beeldweergeefinrichting. |
| US5343112A (en) * | 1989-01-18 | 1994-08-30 | Balzers Aktiengesellschaft | Cathode arrangement |
| FR2642243B1 (fr) * | 1989-01-24 | 1991-04-19 | Labo Electronique Physique | Circuit de predistorsion adaptative |
| GB2233124B (en) * | 1989-06-06 | 1994-02-09 | Mitsubishi Electric Corp | Ion implantation apparatus |
| JP2791103B2 (ja) * | 1989-06-09 | 1998-08-27 | 株式会社日立製作所 | 表面計測方法および装置 |
| US5004919A (en) * | 1989-07-05 | 1991-04-02 | Jeol, Ltd. | Transmission electron microscope |
| US5225999A (en) * | 1990-07-06 | 1993-07-06 | The Trustees Of The University Of Pennsylvania | Magnetic environment stabilization for effective operation of magnetically sensitive instruments |
| DE69030996T2 (de) * | 1990-08-09 | 1998-01-02 | Philips Electronics Nv | Elektronenstrahlvorrichtung mit monopolförmigem, magnetischem Feld |
| US5097126A (en) * | 1990-09-25 | 1992-03-17 | Gatan, Inc. | High resolution electron energy loss spectrometer |
| NL9100380A (nl) * | 1991-03-01 | 1992-10-01 | Philips Nv | Kathodestraalbuis met elektronenkanon met planparallelle optiek. |
| US5177631A (en) * | 1991-06-28 | 1993-01-05 | Eastman Kodak Company | Magnetic position sensor |
| EP0538938B1 (de) * | 1991-10-24 | 1996-08-28 | Koninklijke Philips Electronics N.V. | Elektronenstrahlvorrichtung |
| DE69322890T2 (de) * | 1992-02-12 | 1999-07-29 | Koninklijke Philips Electronics N.V., Eindhoven | Verfahren zur Verringerung einer räumlichen energiedispersiven Streuung eines Elektronenstrahlenbündels und eine für den Einsatz eines solchen Verfahrens geeignete Elektronenstrahlvorrichtung |
| DE69316960T2 (de) * | 1992-11-12 | 1998-07-30 | Koninkl Philips Electronics Nv | Elektronenröhre mit Halbleiterkathode |
| US5432347A (en) * | 1992-11-12 | 1995-07-11 | U.S. Philips Corporation | Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method |
| JP3397347B2 (ja) * | 1992-11-26 | 2003-04-14 | 日本電子株式会社 | オメガフィルタ |
| US5393976A (en) * | 1992-11-26 | 1995-02-28 | Kabushiki Kaisha Topcon | Apparatus for displaying a sample image |
| DE4310559A1 (de) * | 1993-03-26 | 1994-09-29 | Zeiss Carl Fa | Abbildendes Elektronenenergiefilter |
| DE69402283T2 (de) * | 1993-05-21 | 1997-09-18 | Philips Electronics Nv | Energiefilter mit Korrektur von chromatischen Aberrationen zweiter ordnung |
| US5414261A (en) * | 1993-07-01 | 1995-05-09 | The Regents Of The University Of California | Enhanced imaging mode for transmission electron microscopy |
| DE4328649A1 (de) * | 1993-08-26 | 1995-03-02 | Zeiss Carl Fa | Elektronenoptisches Abbildungssystem mit regelbaren Elementen |
| US5578823A (en) * | 1994-12-16 | 1996-11-26 | Hitachi, Ltd. | Transmission electron microscope and method of observing element distribution by using the same |
| JPH08195298A (ja) * | 1995-01-13 | 1996-07-30 | Nissin High Voltage Co Ltd | ビームエネルギー安定化装置 |
| US5640012A (en) * | 1995-08-25 | 1997-06-17 | Gatan, Inc. | Precision-controlled slit mechanism for electron microscope |
-
1996
- 1996-08-07 US US08/684,973 patent/US5798524A/en not_active Expired - Lifetime
-
1997
- 1997-07-10 JP JP10507913A patent/JP2000515675A/ja not_active Ceased
- 1997-07-10 WO PCT/US1997/011896 patent/WO1998006125A1/en not_active Ceased
- 1997-07-10 DE DE69737862T patent/DE69737862T2/de not_active Expired - Lifetime
- 1997-07-10 EP EP97936047A patent/EP0917725B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000515675A (ja) | 2000-11-21 |
| EP0917725A1 (de) | 1999-05-26 |
| EP0917725B1 (de) | 2007-06-27 |
| US5798524A (en) | 1998-08-25 |
| DE69737862T2 (de) | 2008-03-06 |
| WO1998006125A1 (en) | 1998-02-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |