DE69716941T2 - Verfahren zur abscheidung von beschichtungen aus zinnoxid und titanoxid auf flachglas und so beschichtetes glas - Google Patents
Verfahren zur abscheidung von beschichtungen aus zinnoxid und titanoxid auf flachglas und so beschichtetes glasInfo
- Publication number
- DE69716941T2 DE69716941T2 DE69716941T DE69716941T DE69716941T2 DE 69716941 T2 DE69716941 T2 DE 69716941T2 DE 69716941 T DE69716941 T DE 69716941T DE 69716941 T DE69716941 T DE 69716941T DE 69716941 T2 DE69716941 T2 DE 69716941T2
- Authority
- DE
- Germany
- Prior art keywords
- titanium oxide
- coating
- substrate
- oxide coating
- gas mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims description 69
- 238000000034 method Methods 0.000 title claims description 68
- 239000005357 flat glass Substances 0.000 title claims description 30
- 238000000151 deposition Methods 0.000 title description 35
- 238000000576 coating method Methods 0.000 claims description 167
- 239000011248 coating agent Substances 0.000 claims description 134
- 239000007789 gas Substances 0.000 claims description 122
- 239000000203 mixture Substances 0.000 claims description 81
- 239000002243 precursor Substances 0.000 claims description 79
- 239000011521 glass Substances 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 69
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 64
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 60
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 53
- 239000001301 oxygen Substances 0.000 claims description 53
- 229910052760 oxygen Inorganic materials 0.000 claims description 53
- 150000002148 esters Chemical class 0.000 claims description 44
- 230000008021 deposition Effects 0.000 claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 35
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 34
- 150000002894 organic compounds Chemical class 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 31
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 229910044991 metal oxide Inorganic materials 0.000 claims description 20
- 150000004706 metal oxides Chemical class 0.000 claims description 20
- 239000001257 hydrogen Substances 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 16
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 14
- 239000005329 float glass Substances 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 239000001307 helium Substances 0.000 claims description 11
- 229910052734 helium Inorganic materials 0.000 claims description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 239000012159 carrier gas Substances 0.000 claims description 10
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical group CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 claims description 6
- 239000010703 silicon Substances 0.000 claims description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims description 6
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical compound CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 claims description 4
- RMOUBSOVHSONPZ-UHFFFAOYSA-N Isopropyl formate Chemical compound CC(C)OC=O RMOUBSOVHSONPZ-UHFFFAOYSA-N 0.000 claims description 3
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 claims description 3
- 229940011051 isopropyl acetate Drugs 0.000 claims description 3
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 claims description 3
- 238000009826 distribution Methods 0.000 description 23
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 238000000354 decomposition reaction Methods 0.000 description 15
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 13
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 12
- 229910001887 tin oxide Inorganic materials 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 9
- 239000000376 reactant Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 238000006124 Pilkington process Methods 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 238000005019 vapor deposition process Methods 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 239000003570 air Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 150000003606 tin compounds Chemical class 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910001510 metal chloride Inorganic materials 0.000 description 4
- 239000007800 oxidant agent Substances 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Natural products CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000005816 glass manufacturing process Methods 0.000 description 2
- 239000000156 glass melt Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000010348 incorporation Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000006193 liquid solution Substances 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000002895 organic esters Chemical class 0.000 description 2
- 150000004812 organic fluorine compounds Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000010944 pre-mature reactiony Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N Butanol Natural products CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- STSCVKRWJPWALQ-UHFFFAOYSA-N TRIFLUOROACETIC ACID ETHYL ESTER Chemical compound CCOC(=O)C(F)(F)F STSCVKRWJPWALQ-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010960 commercial process Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N n-propyl alcohol Natural products CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2456—Coating containing TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Composite Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9616983.4A GB9616983D0 (en) | 1996-08-13 | 1996-08-13 | Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
| PCT/GB1997/002179 WO1998006675A1 (en) | 1996-08-13 | 1997-08-12 | Method of depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69716941D1 DE69716941D1 (de) | 2002-12-12 |
| DE69716941T2 true DE69716941T2 (de) | 2003-11-27 |
Family
ID=10798419
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69716941T Expired - Lifetime DE69716941T2 (de) | 1996-08-13 | 1997-08-12 | Verfahren zur abscheidung von beschichtungen aus zinnoxid und titanoxid auf flachglas und so beschichtetes glas |
| DE69735145T Expired - Lifetime DE69735145D1 (de) | 1996-08-13 | 1997-08-12 | Verfahren zur Abscheidung von Beschichtungen aus Zinnoxid auf Flachglas und so beschichtetes Glas |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69735145T Expired - Lifetime DE69735145D1 (de) | 1996-08-13 | 1997-08-12 | Verfahren zur Abscheidung von Beschichtungen aus Zinnoxid auf Flachglas und so beschichtetes Glas |
Country Status (15)
| Country | Link |
|---|---|
| EP (2) | EP0944557B1 (enExample) |
| JP (2) | JP4224137B2 (enExample) |
| KR (1) | KR100493566B1 (enExample) |
| CN (1) | CN1094113C (enExample) |
| AU (1) | AU718133B2 (enExample) |
| BR (1) | BR9711058A (enExample) |
| CA (1) | CA2262504C (enExample) |
| CZ (1) | CZ300594B6 (enExample) |
| DE (2) | DE69716941T2 (enExample) |
| ES (1) | ES2186915T3 (enExample) |
| GB (1) | GB9616983D0 (enExample) |
| ID (1) | ID19117A (enExample) |
| MY (1) | MY119292A (enExample) |
| WO (1) | WO1998006675A1 (enExample) |
| ZA (1) | ZA977211B (enExample) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738813B1 (fr) | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| US6027766A (en) | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
| US6312831B1 (en) * | 1999-04-30 | 2001-11-06 | Visteon Global Technologies, Inc. | Highly reflective, durable titanium/tin oxide films |
| JP4430194B2 (ja) | 1999-05-31 | 2010-03-10 | 日本板硝子株式会社 | 透明積層体およびこれを用いたガラス物品 |
| GB9913315D0 (en) | 1999-06-08 | 1999-08-11 | Pilkington Plc | Improved process for coating glass |
| JP2001060702A (ja) | 1999-06-18 | 2001-03-06 | Nippon Sheet Glass Co Ltd | 光電変換装置用基板およびこれを用いた光電変換装置 |
| JP2001060708A (ja) | 1999-06-18 | 2001-03-06 | Nippon Sheet Glass Co Ltd | 透明積層体およびこれを用いたガラス物品 |
| GB0021396D0 (en) | 2000-09-01 | 2000-10-18 | Pilkington Plc | Process for coating glass |
| US6416814B1 (en) * | 2000-12-07 | 2002-07-09 | First Solar, Llc | Volatile organometallic complexes of lowered reactivity suitable for use in chemical vapor deposition of metal oxide films |
| GB0129434D0 (en) | 2001-12-08 | 2002-01-30 | Pilkington Plc | Self-cleaning glazing sheet |
| US6679978B2 (en) | 2002-02-22 | 2004-01-20 | Afg Industries, Inc. | Method of making self-cleaning substrates |
| GB0217553D0 (en) * | 2002-07-30 | 2002-09-11 | Sheel David W | Titania coatings by CVD at atmospheric pressure |
| GB0313029D0 (en) | 2003-06-06 | 2003-07-09 | Pilkington Plc | Coated glass |
| CA2550331A1 (en) | 2003-12-22 | 2005-07-14 | Cardinal Cg Compagny | Graded photocatalytic coatings |
| US7223441B2 (en) * | 2004-03-10 | 2007-05-29 | Pilkington North America, Inc. | Method for depositing gallium oxide coatings on flat glass |
| WO2006017349A1 (en) | 2004-07-12 | 2006-02-16 | Cardinal Cg Company | Low-maintenance coatings |
| US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
| US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| MX2007013312A (es) * | 2005-04-29 | 2008-03-07 | Agc Flat Glass Europe Sa | Sustrato recubierto y proceso para la produccion de un sustrato recubierto. |
| JP2009534563A (ja) | 2006-04-19 | 2009-09-24 | 日本板硝子株式会社 | 同等の単独の表面反射率を有する対向機能コーティング |
| DE102006023375A1 (de) | 2006-05-17 | 2007-11-22 | Nano-X Gmbh | Beschichtungsmaterial |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| KR101512166B1 (ko) | 2007-09-14 | 2015-04-14 | 카디날 씨지 컴퍼니 | 관리가 용이한 코팅 기술 |
| GB0808338D0 (en) * | 2008-05-08 | 2008-06-18 | Pilkington Group Ltd | Production of coated glass |
| US20100062265A1 (en) * | 2008-09-09 | 2010-03-11 | Guardian Industries Corp. | Titanium Dioxide Coatings and Methods of Forming Titanium Dioxide Coatings Having Reduced Crystallite Size |
| US9187825B2 (en) | 2009-02-02 | 2015-11-17 | Pilkington Group Limited | Method of depositing and electrically conductive titanium oxide coating |
| EP2336388B1 (en) * | 2009-12-18 | 2012-08-08 | centrotherm photovoltaics AG | Method for deposition of a layer of a tin oxide onto a substrate |
| JP2014520201A (ja) * | 2011-03-23 | 2014-08-21 | ピルキントン グループ リミテッド | 薄膜コーティングを被覆するための装置およびこのような装置を用いた被覆方法 |
| CN103649000A (zh) * | 2011-07-12 | 2014-03-19 | 旭硝子株式会社 | 带层叠膜的玻璃基板的制造方法 |
| TW201309838A (zh) * | 2011-07-12 | 2013-03-01 | Asahi Glass Co Ltd | 附積層膜之玻璃基板之製造方法 |
| GB201112648D0 (en) | 2011-07-22 | 2011-09-07 | Pilkington Group Ltd | Deposition process |
| US20150122319A1 (en) * | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
| JP5148743B1 (ja) * | 2011-12-20 | 2013-02-20 | シャープ株式会社 | 薄膜成膜装置、薄膜成膜方法および薄膜太陽電池の製造方法 |
| CN102584019B (zh) * | 2012-01-31 | 2014-07-02 | 绥中滨海经济区红杉科技有限公司 | 化学汽相沉积法镀制玻璃减反射膜的设备及方法 |
| EP2879999B1 (en) * | 2012-07-30 | 2019-09-11 | Pilkington Group Limited | A method of depositing a coating utilizing a coating apparatus |
| CN102757183A (zh) * | 2012-08-02 | 2012-10-31 | 金堆城洛阳节能玻璃有限公司 | 一种提高低辐射镀膜玻璃生产效率的方法 |
| CN103466955B (zh) * | 2013-08-20 | 2015-09-09 | 秦皇岛玻璃工业研究设计院 | 一种减反射玻璃的制备方法及其镀膜设备 |
| WO2016038360A1 (en) * | 2014-09-11 | 2016-03-17 | Pilkington Group Limited | Chemical vapour deposition process for depositing a titanium oxide coating |
| GB201521165D0 (en) | 2015-12-01 | 2016-01-13 | Pilkington Group Ltd | Method for depositing a coating |
| GB201523160D0 (en) * | 2015-12-31 | 2016-02-17 | Pilkington Group Ltd | High strength glass containers |
| GB201523156D0 (en) * | 2015-12-31 | 2016-02-17 | Pilkington Group Ltd | High strength glass containers |
| WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
| GB2600168A (en) | 2020-10-26 | 2022-04-27 | Pilkington Group Ltd | Use of coated substrates |
| US20250145521A1 (en) * | 2022-05-24 | 2025-05-08 | Pilkington Group Limited | Process for forming a coating |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US471256A (en) * | 1892-03-22 | Compartment paper bag | ||
| NL132231C (enExample) | 1964-09-04 | |||
| GB1187784A (en) | 1966-03-31 | 1970-04-15 | United Glass Ltd | Strengthening Glassware |
| GB1187783A (en) | 1966-03-31 | 1970-04-15 | United Glass Ltd | Strengthening Glassware |
| GB2026454B (en) | 1978-07-20 | 1982-07-21 | Bfg Glassgroup | Coating glass with tin oxide |
| BE879189A (fr) * | 1978-10-19 | 1980-04-04 | Bfg Glassgroup | Procede de formation d'un revetement d'oxyde d'etain sur un support de verre chaud et produits ainsi obtenus |
| JPS606299B2 (ja) * | 1978-12-27 | 1985-02-16 | 旭硝子株式会社 | 酸化チタン被覆ガラスの製造方法 |
| CH628600A5 (fr) * | 1979-02-14 | 1982-03-15 | Siv Soc Italiana Vetro | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
| JPS5641832A (en) * | 1979-09-14 | 1981-04-18 | Toshio Hirai | Manufacture of titanium dioxide |
| US4731256A (en) * | 1984-04-10 | 1988-03-15 | M&T Chemicals Inc. | Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings |
| ZA852396B (en) * | 1984-04-10 | 1985-11-27 | M & T Chemicals Inc | Liquid coating composition for producing high quality,high performance fluorine-doped tin oxide coating |
| US4590096A (en) | 1984-12-28 | 1986-05-20 | M&T Chemicals Inc. | Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass |
| IN164438B (enExample) * | 1984-12-28 | 1989-03-18 | M & T Chemicals Inc | |
| JPH0682625B2 (ja) | 1985-06-04 | 1994-10-19 | シーメンス ソーラー インダストリーズ，エル．ピー． | 酸化亜鉛膜の蒸着方法 |
| GB8824104D0 (en) * | 1988-10-14 | 1988-11-23 | Pilkington Plc | Process for coating glass |
| JPH02179325A (ja) | 1988-12-29 | 1990-07-12 | Enami Seiki:Kk | 絞り成形機 |
| US5124180A (en) * | 1991-03-11 | 1992-06-23 | Btu Engineering Corporation | Method for the formation of fluorine doped metal oxide films |
| PL169649B1 (pl) * | 1991-12-26 | 1996-08-30 | Atochem North America Elf | Sposób powlekania podloza szklanego PL PL PL PL PL |
| CN1093067A (zh) * | 1993-04-02 | 1994-10-05 | 山东大学 | 玻璃透明隔热膜的制备方法及专用喷头 |
-
1996
- 1996-08-13 GB GBGB9616983.4A patent/GB9616983D0/en active Pending
-
1997
- 1997-08-12 WO PCT/GB1997/002179 patent/WO1998006675A1/en not_active Ceased
- 1997-08-12 AU AU39483/97A patent/AU718133B2/en not_active Expired
- 1997-08-12 CN CN97197266A patent/CN1094113C/zh not_active Expired - Lifetime
- 1997-08-12 DE DE69716941T patent/DE69716941T2/de not_active Expired - Lifetime
- 1997-08-12 EP EP97936780A patent/EP0944557B1/en not_active Expired - Lifetime
- 1997-08-12 JP JP50951898A patent/JP4224137B2/ja not_active Expired - Fee Related
- 1997-08-12 BR BR9711058A patent/BR9711058A/pt not_active IP Right Cessation
- 1997-08-12 CZ CZ0040299A patent/CZ300594B6/cs not_active IP Right Cessation
- 1997-08-12 MY MYPI97003674A patent/MY119292A/en unknown
- 1997-08-12 KR KR10-1999-7001182A patent/KR100493566B1/ko not_active Expired - Fee Related
- 1997-08-12 EP EP02008475A patent/EP1238948B1/en not_active Expired - Lifetime
- 1997-08-12 DE DE69735145T patent/DE69735145D1/de not_active Expired - Lifetime
- 1997-08-12 CA CA002262504A patent/CA2262504C/en not_active Expired - Fee Related
- 1997-08-12 ZA ZA9707211A patent/ZA977211B/xx unknown
- 1997-08-12 ES ES97936780T patent/ES2186915T3/es not_active Expired - Lifetime
- 1997-08-12 ID IDP972805A patent/ID19117A/id unknown
-
2007
- 2007-11-15 JP JP2007297347A patent/JP2008100913A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP4224137B2 (ja) | 2009-02-12 |
| CZ300594B6 (cs) | 2009-06-24 |
| AU718133B2 (en) | 2000-04-06 |
| EP1238948B1 (en) | 2006-01-25 |
| CZ40299A3 (cs) | 1999-08-11 |
| BR9711058A (pt) | 1999-08-17 |
| KR100493566B1 (ko) | 2005-06-10 |
| GB9616983D0 (en) | 1996-09-25 |
| ZA977211B (en) | 1998-02-12 |
| EP1238948A1 (en) | 2002-09-11 |
| JP2001503005A (ja) | 2001-03-06 |
| MY119292A (en) | 2005-04-30 |
| EP0944557B1 (en) | 2002-11-06 |
| CN1228067A (zh) | 1999-09-08 |
| AU3948397A (en) | 1998-03-06 |
| DE69735145D1 (de) | 2006-04-13 |
| ID19117A (id) | 1998-06-18 |
| KR20000029951A (ko) | 2000-05-25 |
| DE69716941D1 (de) | 2002-12-12 |
| CN1094113C (zh) | 2002-11-13 |
| CA2262504A1 (en) | 1998-02-19 |
| JP2008100913A (ja) | 2008-05-01 |
| CA2262504C (en) | 2007-11-27 |
| WO1998006675A1 (en) | 1998-02-19 |
| EP0944557A1 (en) | 1999-09-29 |
| ES2186915T3 (es) | 2003-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8327 | Change in the person/name/address of the patent owner |
Owner name: PILKINGTON NORTH AMERICA, INC., TOLEDO, OHIO, US Owner name: PILKINGTON PLC, ST. HELENS, MERSEYSIDE, GB |
|
| 8364 | No opposition during term of opposition |