JPS5641832A - Manufacture of titanium dioxide - Google Patents

Manufacture of titanium dioxide

Info

Publication number
JPS5641832A
JPS5641832A JP11852379A JP11852379A JPS5641832A JP S5641832 A JPS5641832 A JP S5641832A JP 11852379 A JP11852379 A JP 11852379A JP 11852379 A JP11852379 A JP 11852379A JP S5641832 A JPS5641832 A JP S5641832A
Authority
JP
Japan
Prior art keywords
diluted
inert gas
tio
concn
steam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11852379A
Other languages
Japanese (ja)
Other versions
JPS6218625B2 (en
Inventor
Toshio Hirai
Shinsuke Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP11852379A priority Critical patent/JPS5641832A/en
Publication of JPS5641832A publication Critical patent/JPS5641832A/en
Publication of JPS6218625B2 publication Critical patent/JPS6218625B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/07—Producing by vapour phase processes, e.g. halide oxidation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE: To freely adjust the rutile type TiO2 and anatase type TiO2 contents of TiO2 by heat reacting steam diluted with an inert gas and a specified mixed gas diluted with an inert gas.
CONSTITUTION: Steam diluted to 0.6W12vol% concn. with an inert gas such as Ar or N is introduced into the heat reactor kept at 400W900°C with electric furnace 1 from inlet 3. Simultaneously, titanium tetrahalide (a) diluted to 0.1W7vol% concn. with an inert gas and stannic halide or silicon tetrahalide (b) diluted to 0.001W14vol% concn. are mixed in a (b)/(a) molar ratio of 0.01W2 and introduced into the reactor from inlet 4 so that the steam/mixed gas molar ratio is adjusted to 0.01W120. By reacting the gases, TiO2 is deposited on substrate 2.
COPYRIGHT: (C)1981,JPO&Japio
JP11852379A 1979-09-14 1979-09-14 Manufacture of titanium dioxide Granted JPS5641832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11852379A JPS5641832A (en) 1979-09-14 1979-09-14 Manufacture of titanium dioxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11852379A JPS5641832A (en) 1979-09-14 1979-09-14 Manufacture of titanium dioxide

Publications (2)

Publication Number Publication Date
JPS5641832A true JPS5641832A (en) 1981-04-18
JPS6218625B2 JPS6218625B2 (en) 1987-04-23

Family

ID=14738713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11852379A Granted JPS5641832A (en) 1979-09-14 1979-09-14 Manufacture of titanium dioxide

Country Status (1)

Country Link
JP (1) JPS5641832A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837649A (en) * 1983-09-21 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Improvements to rotating head assembly in a video tape recording machine
EP0949302A3 (en) * 1998-03-31 2000-06-07 Nippon Aerosil Co., Ltd. Fine powder of hydrophobic titanium oxide, and method for producing it
JP2001503005A (en) * 1996-08-13 2001-03-06 ピルキントン ピーエルシー Method for depositing tin oxide and titanium oxide coatings on flat glass and coated glass obtained by this method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837649A (en) * 1983-09-21 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Improvements to rotating head assembly in a video tape recording machine
JP2001503005A (en) * 1996-08-13 2001-03-06 ピルキントン ピーエルシー Method for depositing tin oxide and titanium oxide coatings on flat glass and coated glass obtained by this method
JP2008100913A (en) * 1996-08-13 2008-05-01 Pilkington Group Ltd Method of depositing tin oxide coating on flat glass and coated glass obtained by the method
EP0949302A3 (en) * 1998-03-31 2000-06-07 Nippon Aerosil Co., Ltd. Fine powder of hydrophobic titanium oxide, and method for producing it

Also Published As

Publication number Publication date
JPS6218625B2 (en) 1987-04-23

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