JPS53147698A - Method of producing anataze-rutile layer-like composite material - Google Patents

Method of producing anataze-rutile layer-like composite material

Info

Publication number
JPS53147698A
JPS53147698A JP6361977A JP6361977A JPS53147698A JP S53147698 A JPS53147698 A JP S53147698A JP 6361977 A JP6361977 A JP 6361977A JP 6361977 A JP6361977 A JP 6361977A JP S53147698 A JPS53147698 A JP S53147698A
Authority
JP
Japan
Prior art keywords
anataze
producing
composite material
rutile
rutile layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6361977A
Other languages
Japanese (ja)
Other versions
JPS616012B2 (en
Inventor
Toshio Hirai
Shinsuke Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOHOKU DAIGAKU KINZOKU ZAIRYO
Mitsubishi Kasei Corp
Research Institute for Iron Steel and Other Metals of Tohoku University
Original Assignee
TOHOKU DAIGAKU KINZOKU ZAIRYO
Mitsubishi Kasei Corp
Research Institute for Iron Steel and Other Metals of Tohoku University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOHOKU DAIGAKU KINZOKU ZAIRYO, Mitsubishi Kasei Corp, Research Institute for Iron Steel and Other Metals of Tohoku University filed Critical TOHOKU DAIGAKU KINZOKU ZAIRYO
Priority to JP6361977A priority Critical patent/JPS53147698A/en
Publication of JPS53147698A publication Critical patent/JPS53147698A/en
Publication of JPS616012B2 publication Critical patent/JPS616012B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/405Oxides of refractory metals or yttrium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To accomplish a easy, effective deposition of titanium oxide with almost pure anataze and rutile laminated alternately on a substrate by introducing steam diluted with an inert gas successively while a titanium tetra-halide gas diluted with an inert gas is introduced intermittently so as to allow reaction between the steam and the halide gas.
JP6361977A 1977-05-31 1977-05-31 Method of producing anataze-rutile layer-like composite material Granted JPS53147698A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6361977A JPS53147698A (en) 1977-05-31 1977-05-31 Method of producing anataze-rutile layer-like composite material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6361977A JPS53147698A (en) 1977-05-31 1977-05-31 Method of producing anataze-rutile layer-like composite material

Publications (2)

Publication Number Publication Date
JPS53147698A true JPS53147698A (en) 1978-12-22
JPS616012B2 JPS616012B2 (en) 1986-02-22

Family

ID=13234504

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6361977A Granted JPS53147698A (en) 1977-05-31 1977-05-31 Method of producing anataze-rutile layer-like composite material

Country Status (1)

Country Link
JP (1) JPS53147698A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157788B2 (en) 2001-02-21 2007-01-02 Showa Denko K.K. Metal oxide dispersion for dye-sensitized solar cells, photoactive electrode and dye-sensitized solar cell
US20100075176A1 (en) * 2007-03-19 2010-03-25 Asahi Glass Company, Limited Process for producing electrical conductor
US20100129536A1 (en) * 2007-08-29 2010-05-27 Asahi Glass Company, Limited Process for producing electric conductor layer

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7157788B2 (en) 2001-02-21 2007-01-02 Showa Denko K.K. Metal oxide dispersion for dye-sensitized solar cells, photoactive electrode and dye-sensitized solar cell
US7544536B2 (en) 2001-02-21 2009-06-09 Showa Denko K.K. Metal oxide dispersion for dye-sensitized solar cells, photoactive electrode and dye-sensitized solar cell
US20100075176A1 (en) * 2007-03-19 2010-03-25 Asahi Glass Company, Limited Process for producing electrical conductor
US20100129536A1 (en) * 2007-08-29 2010-05-27 Asahi Glass Company, Limited Process for producing electric conductor layer

Also Published As

Publication number Publication date
JPS616012B2 (en) 1986-02-22

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