DE69429018D1 - Ausgangsschaltung für Ladungsübertragungselement - Google Patents

Ausgangsschaltung für Ladungsübertragungselement

Info

Publication number
DE69429018D1
DE69429018D1 DE69429018T DE69429018T DE69429018D1 DE 69429018 D1 DE69429018 D1 DE 69429018D1 DE 69429018 T DE69429018 T DE 69429018T DE 69429018 T DE69429018 T DE 69429018T DE 69429018 D1 DE69429018 D1 DE 69429018D1
Authority
DE
Germany
Prior art keywords
output circuit
charge transfer
transfer element
charge
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69429018T
Other languages
English (en)
Other versions
DE69429018T2 (de
Inventor
Hiroaki Ohki
Osamu Nishima
Hiroyuki Mori
Junya Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP02054993A external-priority patent/JP3309464B2/ja
Priority claimed from JP9872293A external-priority patent/JPH06291076A/ja
Application filed by Sony Corp filed Critical Sony Corp
Publication of DE69429018D1 publication Critical patent/DE69429018D1/de
Application granted granted Critical
Publication of DE69429018T2 publication Critical patent/DE69429018T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/822Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
    • H01L21/8232Field-effect technology
    • H01L21/8234MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
    • H01L21/823406Combination of charge coupled devices, i.e. CCD, or BBD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76816Output structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid State Image Pick-Up Elements (AREA)
DE69429018T 1993-01-12 1994-01-07 Ausgangsschaltung für Ladungsübertragungselement Expired - Lifetime DE69429018T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP02054993A JP3309464B2 (ja) 1993-01-12 1993-01-12 電荷転送装置
JP9872293A JPH06291076A (ja) 1993-03-31 1993-03-31 接合部構造およびその製造方法

Publications (2)

Publication Number Publication Date
DE69429018D1 true DE69429018D1 (de) 2001-12-13
DE69429018T2 DE69429018T2 (de) 2002-06-13

Family

ID=26357526

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69429018T Expired - Lifetime DE69429018T2 (de) 1993-01-12 1994-01-07 Ausgangsschaltung für Ladungsübertragungselement
DE69409274T Expired - Lifetime DE69409274T2 (de) 1993-01-12 1994-01-07 Ausgangsschaltung für Ladungsübertragungselement

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69409274T Expired - Lifetime DE69409274T2 (de) 1993-01-12 1994-01-07 Ausgangsschaltung für Ladungsübertragungselement

Country Status (4)

Country Link
US (3) US5432364A (de)
EP (2) EP0609658B1 (de)
KR (1) KR100300782B1 (de)
DE (2) DE69429018T2 (de)

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US5528643A (en) * 1989-11-13 1996-06-18 Texas Instruments Incorporated Charge coupled device/charge super sweep image system and method for making
KR100190834B1 (ko) * 1994-12-08 1999-06-01 다니구찌 이찌로오, 기타오카 다카시 반도체장치및그제조방법
FR2732848B1 (fr) * 1995-04-04 1997-05-16 Thomson Csf Semiconducteurs Amplificateur de lecture de registre ccd
JPH0955496A (ja) * 1995-08-17 1997-02-25 Oki Electric Ind Co Ltd 高耐圧mosトランジスタ及びその製造方法
US5926707A (en) * 1995-12-15 1999-07-20 Samsung Electronics Co., Ltd. Methods for forming integrated circuit memory devices having deep storage electrode contact regions therein for improving refresh characteristics
KR0161474B1 (ko) * 1995-12-15 1999-02-01 김광호 셀 플러그 이온주입을 이용한 반도체 메모리장치의 제조방법
US6162668A (en) * 1996-03-07 2000-12-19 Mitsubishi Denki Kabushiki Kaisha Method of manufacturing a semiconductor device having a lightly doped contact impurity region surrounding a highly doped contact impurity region
JP3772916B2 (ja) * 1996-03-07 2006-05-10 株式会社ルネサステクノロジ 半導体装置及びその製造方法
US5981324A (en) * 1996-10-23 1999-11-09 Samsung Electronics Co., Ltd. Methods of forming integrated circuits having memory cell arrays and peripheral circuits therein
JP3578611B2 (ja) * 1997-10-31 2004-10-20 Necエレクトロニクス株式会社 固体撮像装置
JP3214432B2 (ja) * 1998-02-04 2001-10-02 日本電気株式会社 固体撮像装置の製造方法
US6128067A (en) * 1998-04-28 2000-10-03 Kabushiki Kaisha Toshiba Correcting method and correcting system for mask pattern
JP3139465B2 (ja) * 1998-08-27 2001-02-26 日本電気株式会社 固体撮像装置
KR100268440B1 (ko) * 1998-09-21 2000-10-16 윤종용 고감도 고체 촬상 장치
US6407440B1 (en) * 2000-02-25 2002-06-18 Micron Technology Inc. Pixel cell with high storage capacitance for a CMOS imager
JP4845299B2 (ja) * 2001-03-09 2011-12-28 富士通セミコンダクター株式会社 半導体装置の製造方法
US7212241B2 (en) * 2001-05-09 2007-05-01 Sony Corporation Solid-state imaging device and method for driving the same
TWI289905B (en) * 2002-07-23 2007-11-11 Fujitsu Ltd Image sensor and image sensor module
US7405757B2 (en) 2002-07-23 2008-07-29 Fujitsu Limited Image sensor and image sensor module
US7135373B2 (en) * 2003-09-23 2006-11-14 Texas Instruments Incorporated Reduction of channel hot carrier effects in transistor devices
US20050127457A1 (en) * 2003-12-16 2005-06-16 Jae-Seob Roh Signal charge converter for charge transfer element
KR100669858B1 (ko) * 2005-05-13 2007-01-16 삼성전자주식회사 고전압 반도체 장치 및 그 제조 방법
US20070096233A1 (en) * 2005-10-13 2007-05-03 In Gyun Jeon Cmos image sensor
JP5217180B2 (ja) 2007-02-20 2013-06-19 富士通セミコンダクター株式会社 静電放電保護装置の製造方法
KR102560699B1 (ko) 2017-10-30 2023-07-27 삼성전자주식회사 이미지 센서

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4011471A (en) * 1975-11-18 1977-03-08 The United States Of America As Represented By The Secretary Of The Air Force Surface potential stabilizing circuit for charge-coupled devices radiation hardening
JPS54103672A (en) * 1978-02-01 1979-08-15 Nec Corp Production of semiconductor device
JPS5933860A (ja) * 1982-08-19 1984-02-23 Toshiba Corp 半導体装置およびその製造方法
JPS59108204A (ja) * 1982-12-13 1984-06-22 住友電気工業株式会社 電線
US5276346A (en) * 1983-12-26 1994-01-04 Hitachi, Ltd. Semiconductor integrated circuit device having protective/output elements and internal circuits
EP0187016B1 (de) * 1984-12-27 1991-02-20 Kabushiki Kaisha Toshiba MISFET mit niedrigdotiertem Drain und Verfahren zu seiner Herstellung
JPS6221213A (ja) * 1985-07-19 1987-01-29 Pioneer Electronic Corp 半導体装置の配線方法
JP2643930B2 (ja) * 1986-07-17 1997-08-25 三菱電機株式会社 半導体装置の製造方法
US4728578A (en) * 1986-08-13 1988-03-01 The Lubrizol Corporation Compositions containing basic metal salts and/or non-Newtonian colloidal disperse systems and vinyl aromatic containing polymers
US5192990A (en) * 1986-09-18 1993-03-09 Eastman Kodak Company Output circuit for image sensor
JPH01502634A (ja) * 1986-09-18 1989-09-07 イーストマン・コダック・カンパニー イメージセンサ用出力回路
JPS63250859A (ja) * 1987-04-08 1988-10-18 Rohm Co Ltd 電界効果型トランジスタの製造方法
JP2675572B2 (ja) * 1988-03-31 1997-11-12 株式会社東芝 半導体集積回路の製造方法
JPH01264253A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd 半導体装置の製造方法
US4970173A (en) * 1989-07-03 1990-11-13 Motorola, Inc. Method of making high voltage vertical field effect transistor with improved safe operating area
FR2654258A1 (fr) * 1989-11-03 1991-05-10 Philips Nv Procede pour fabriquer un dispositif a transistor mis ayant une electrode de grille en forme de "t" inverse.
KR920007171A (ko) * 1990-09-05 1992-04-28 김광호 고신뢰성 반도체장치
JPH04206742A (ja) * 1990-11-30 1992-07-28 Hitachi Ltd 増幅回路
US5237187A (en) * 1990-11-30 1993-08-17 Hitachi, Ltd. Semiconductor memory circuit device and method for fabricating same
JP2842724B2 (ja) * 1992-02-06 1999-01-06 シャープ株式会社 電荷転送素子
US5293057A (en) * 1992-08-14 1994-03-08 Micron Technology, Inc. Electrostatic discharge protection circuit for semiconductor device
US5341011A (en) * 1993-03-15 1994-08-23 Siliconix Incorporated Short channel trenched DMOS transistor

Also Published As

Publication number Publication date
DE69409274T2 (de) 1998-11-05
EP0789399A2 (de) 1997-08-13
DE69409274D1 (de) 1998-05-07
US5432364A (en) 1995-07-11
EP0609658B1 (de) 1998-04-01
EP0789399A3 (de) 1998-03-04
EP0609658A3 (de) 1994-11-09
KR100300782B1 (ko) 2001-10-22
US5569616A (en) 1996-10-29
EP0789399B1 (de) 2001-11-07
US5498887A (en) 1996-03-12
DE69429018T2 (de) 2002-06-13
EP0609658A2 (de) 1994-08-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition