DE69108627T2 - Verfahren zum Herstellen eines amorphen, magnetischen Films. - Google Patents

Verfahren zum Herstellen eines amorphen, magnetischen Films.

Info

Publication number
DE69108627T2
DE69108627T2 DE69108627T DE69108627T DE69108627T2 DE 69108627 T2 DE69108627 T2 DE 69108627T2 DE 69108627 T DE69108627 T DE 69108627T DE 69108627 T DE69108627 T DE 69108627T DE 69108627 T2 DE69108627 T2 DE 69108627T2
Authority
DE
Germany
Prior art keywords
making
magnetic film
amorphous magnetic
amorphous
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69108627T
Other languages
English (en)
Other versions
DE69108627D1 (de
Inventor
Noboru Takayanagi
Kazuhiro Akihama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Application granted granted Critical
Publication of DE69108627D1 publication Critical patent/DE69108627D1/de
Publication of DE69108627T2 publication Critical patent/DE69108627T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/13—Amorphous metallic alloys, e.g. glassy metals
    • H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation
    • H01F41/205—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation by laser ablation, e.g. pulsed laser deposition [PLD]
DE69108627T 1990-07-24 1991-07-01 Verfahren zum Herstellen eines amorphen, magnetischen Films. Expired - Fee Related DE69108627T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP19692990 1990-07-24
JP3020199A JP2742631B2 (ja) 1990-07-24 1991-02-13 非晶質磁性膜の製造方法

Publications (2)

Publication Number Publication Date
DE69108627D1 DE69108627D1 (de) 1995-05-11
DE69108627T2 true DE69108627T2 (de) 1995-08-31

Family

ID=26357105

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69108627T Expired - Fee Related DE69108627T2 (de) 1990-07-24 1991-07-01 Verfahren zum Herstellen eines amorphen, magnetischen Films.

Country Status (4)

Country Link
US (1) US5203929A (de)
EP (1) EP0468228B1 (de)
JP (1) JP2742631B2 (de)
DE (1) DE69108627T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69125323T2 (de) * 1990-07-24 1997-09-25 Semiconductor Energy Lab Verfahren zum Herstellen isolierender Filme, Kapazitäten und Halbleiteranordnungen
US7335570B1 (en) 1990-07-24 2008-02-26 Semiconductor Energy Laboratory Co., Ltd. Method of forming insulating films, capacitances, and semiconductor devices
US5320881A (en) * 1991-08-27 1994-06-14 Northeastern University Fabrication of ferrite films using laser deposition
AU4194896A (en) * 1994-10-18 1996-05-06 Edsi, Inc. Apparatus for depositing a layer of material on a substrate
US5567336A (en) * 1994-10-24 1996-10-22 Matsushita Electric Industrial Co., Ltd. Laser ablation forward metal deposition with electrostatic assisted bonding
US5683601A (en) * 1994-10-24 1997-11-04 Panasonic Technologies, Inc. Laser ablation forward metal deposition with electrostatic assisted bonding
US5935462A (en) * 1994-10-24 1999-08-10 Matsushita Electric Industrial Co., Ltd. Repair of metal lines by electrostatically assisted laser ablative deposition
US6211080B1 (en) 1996-10-30 2001-04-03 Matsushita Electric Industrial Co., Ltd. Repair of dielectric-coated electrode or circuit defects
US6180912B1 (en) 1998-03-31 2001-01-30 Matsushita Electric Industrial Co., Ltd. Fan-out beams for repairing an open defect
US6060127A (en) * 1998-03-31 2000-05-09 Matsushita Electric Industrial Co., Ltd. Mechanically restricted laser deposition
US6689234B2 (en) * 2000-11-09 2004-02-10 Bechtel Bwxt Idaho, Llc Method of producing metallic materials
GR1003869B (el) * 2001-04-04 2002-04-19 Ιωαννης Γιαπιντζακης Μεθοδος συνθεσης διμεταλλικων σιδηρομαγνητικων υμενιων
US6455815B1 (en) * 2001-11-08 2002-09-24 Despatch Industries, L.L.P. Magnetic annealing oven and method
US7341765B2 (en) * 2004-01-27 2008-03-11 Battelle Energy Alliance, Llc Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates
JP4283263B2 (ja) * 2005-10-20 2009-06-24 本田技研工業株式会社 磁歪式トルクセンサの製造方法
JP6068095B2 (ja) * 2012-10-31 2017-01-25 田中貴金属工業株式会社 連続成膜装置および連続成膜方法
CN107884918A (zh) * 2017-11-13 2018-04-06 中国科学院合肥物质科学研究院 一种强磁场下高能紫外激光导入装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5451919A (en) * 1977-10-03 1979-04-24 Toshiba Corp Method of hardening surface of metallic body with high melting point
US4236946A (en) * 1978-03-13 1980-12-02 International Business Machines Corporation Amorphous magnetic thin films with highly stable easy axis
US4512824A (en) * 1982-04-01 1985-04-23 General Electric Company Dynamic annealing method for optimizing the magnetic properties of amorphous metals
US4469536A (en) * 1982-11-10 1984-09-04 The United States Of America As Represented By The Secretary Of The Navy Alloys and method of making
DE3243964A1 (de) * 1982-11-27 1984-05-30 Fa. J.S. Staedtler, 8500 Nürnberg Schreibspitze fuer schreibgeraete und verfahren zu deren herstellung
JPS6021365A (ja) * 1983-07-12 1985-02-02 Univ Osaka アモルフアス材料と母材との複合材料の製造方法
JPS6021366A (ja) * 1983-07-16 1985-02-02 Univ Osaka アモルフアス金属の製造方法
GB2155042B (en) * 1984-02-21 1987-12-31 Hughes Technology Pty Ltd Laser induced ion beam generator
CA1292646C (en) * 1985-07-03 1991-12-03 Michael A. Tenhover Process for the production of multi-metallic amorphous alloy coatings
DE3611527A1 (de) * 1986-04-05 1987-10-08 Vacuumschmelze Gmbh Verfahren zur erzielung einer flachen magnetisierungsschleife in amorphen kernen durch eine waermebehandlung
JPS62257712A (ja) * 1986-04-30 1987-11-10 Mitsubishi Electric Corp 磁気円板の製造方法およびその装置
JPS63241135A (ja) * 1987-03-27 1988-10-06 Hitachi Metals Ltd 高硬度合金及びその製造法
DE3800680A1 (de) * 1988-01-13 1989-07-27 Leyendecker Toni Verfahren und vorrichtung zur beschichtung eines substrates
US5015492A (en) * 1989-04-03 1991-05-14 Rutgers University Method and apparatus for pulsed energy induced vapor deposition of thin films
JPH0637666B2 (ja) * 1989-04-14 1994-05-18 チャイナ スチール コーポレーション パルス高電流によるアモルファス合金の磁気および機械特性の改良方法

Also Published As

Publication number Publication date
EP0468228A1 (de) 1992-01-29
DE69108627D1 (de) 1995-05-11
EP0468228B1 (de) 1995-04-05
JPH04212404A (ja) 1992-08-04
US5203929A (en) 1993-04-20
JP2742631B2 (ja) 1998-04-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee