DE69108430T2 - Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Oxyd. - Google Patents

Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Oxyd.

Info

Publication number
DE69108430T2
DE69108430T2 DE69108430T DE69108430T DE69108430T2 DE 69108430 T2 DE69108430 T2 DE 69108430T2 DE 69108430 T DE69108430 T DE 69108430T DE 69108430 T DE69108430 T DE 69108430T DE 69108430 T2 DE69108430 T2 DE 69108430T2
Authority
DE
Germany
Prior art keywords
producing
thin layer
superconducting oxide
superconducting
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69108430T
Other languages
English (en)
Other versions
DE69108430D1 (de
Inventor
Satoshi Takano
Shigeru Okuda
Noriyuki Yoshida
Noriki Hayashi
Kenichi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69108430D1 publication Critical patent/DE69108430D1/de
Application granted granted Critical
Publication of DE69108430T2 publication Critical patent/DE69108430T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/732—Evaporative coating with superconducting material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
DE69108430T 1990-03-29 1991-03-28 Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Oxyd. Expired - Fee Related DE69108430T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2083192A JP2853250B2 (ja) 1990-03-29 1990-03-29 酸化物超電導薄膜の製造方法

Publications (2)

Publication Number Publication Date
DE69108430D1 DE69108430D1 (de) 1995-05-04
DE69108430T2 true DE69108430T2 (de) 1995-11-09

Family

ID=13795463

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69108430T Expired - Fee Related DE69108430T2 (de) 1990-03-29 1991-03-28 Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Oxyd.

Country Status (5)

Country Link
US (1) US5130296A (de)
EP (1) EP0449317B1 (de)
JP (1) JP2853250B2 (de)
CA (1) CA2038601C (de)
DE (1) DE69108430T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250319A (en) * 1990-01-24 1993-10-05 Fujitsu Limited Process for preparation of electroconductive polymeric material provided within grooves
JP4771632B2 (ja) * 2001-10-12 2011-09-14 富士通株式会社 高温超伝導体膜の形成方法
US9014768B2 (en) * 2011-08-02 2015-04-21 Furukawa Electric Co., Ltd. Method of producing superconducting conductor, superconducting conductor, and substrate for superconducting conductor
DE102014221335A1 (de) * 2014-10-21 2016-04-21 Siemens Aktiengesellschaft Supraleitendes Leiterelement und Verfahren zu dessen Herstellung
EP4033553A1 (de) * 2021-01-26 2022-07-27 IQM Finland Oy Supraleiterübergangsbauelement und dessen herstellung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5880829A (ja) * 1981-11-10 1983-05-16 Nec Corp シリコン単結晶膜の形成法
EP0291050A3 (de) * 1987-05-15 1989-09-27 Hitachi, Ltd. Supraleitende Anordnung
DE68904588T2 (de) * 1988-03-31 1993-08-19 Mitsui Mining & Smelting Co Duenne supraleitende keramische schichten und verfahren zu ihrer herstellung.
JPH02260473A (ja) * 1989-03-31 1990-10-23 Canon Inc ジョセフソン接合素子

Also Published As

Publication number Publication date
EP0449317A3 (en) 1991-11-27
JPH03279203A (ja) 1991-12-10
DE69108430D1 (de) 1995-05-04
CA2038601C (en) 1996-12-10
EP0449317A2 (de) 1991-10-02
US5130296A (en) 1992-07-14
CA2038601A1 (en) 1991-09-30
EP0449317B1 (de) 1995-03-29
JP2853250B2 (ja) 1999-02-03

Similar Documents

Publication Publication Date Title
DE3854208D1 (de) Verfahren zur Herstellung einer Schicht aus supraleitendem Oxidmaterial.
DE69308465T2 (de) Verfahren zur Herstellung einer dünnen Schicht aus einer Zusammensetzung des Typs Chalcopyrit
DE3886586D1 (de) Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Mischoxid.
DE69126949D1 (de) Verfahren zur Herstellung einer einkristallinen Schicht
DE3852510D1 (de) Verfahren zur Herstellung einer leitenden oder supraleitenden dünnen Schicht.
DE3872430D1 (de) Verfahren zur herstellung einer schicht aus supraleitendem material.
DE69116399T2 (de) Verfahren zur Herstellung einer Schicht aus supraleitendem Oxyd
DE3854828T2 (de) Verfahren zur Herstellung einer dünnen Schicht aus zusammengesetztem supraleitendem Oxyd
DE69118676T2 (de) Verfahren zur herstellung einer dünnen schicht aus hochtemperatur-supraleiteroxyd
DE69108430D1 (de) Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Oxyd.
DE69324085T2 (de) Verfahren zur Herstellung einer supraleitenden dünnen Oxydschicht
DE69328537T2 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus hoch-temperatur-supraleitenden-Oxid
DE69205911T3 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus Oxydverbindungen.
DE69219192T2 (de) Verfahren zur Herstellung einer Schichtstruktur mit mindestens einer dünnen Schicht aus Supraleiteroxyd
DE3784756D1 (de) Verfahren zur herstellung einer niedergeschlagenen schicht.
DE69119705D1 (de) Verfahren zur Herstellung einer supraleitenden Oxyd-Dünnschicht
DE3887765D1 (de) Verfahren zur Herstellung einer dicken supraleitenden Schicht.
DE69004148T2 (de) Verfahren zur Herstellung einer oxydsupraleitenden Schicht.
DE69214064D1 (de) Verfahren zur Herstellung einer dünnen Schicht einer supraleitenden Oxid-Verbindung
DE69131611T2 (de) Verfahren zur Herstellung dünner Schichten aus Oxyd-Supraleiter
DE69203294T2 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus einer oxidverbindung.
DE69127425D1 (de) Prozess zur Herstellung einer dünnen supraleitenden Oxyd-Schicht
DE69030520T2 (de) Verfahren zur Herstellung einer supraleitenden Schicht
DE69205645T2 (de) Verfahren zur Herstellung einer supraleitenden Dünnschicht aus Oxydverbindungen.
DE69110450T2 (de) Verfahren zur herstellung einer dünnen supraleitenden schicht.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee