DE69214064D1 - Verfahren zur Herstellung einer dünnen Schicht einer supraleitenden Oxid-Verbindung - Google Patents

Verfahren zur Herstellung einer dünnen Schicht einer supraleitenden Oxid-Verbindung

Info

Publication number
DE69214064D1
DE69214064D1 DE69214064T DE69214064T DE69214064D1 DE 69214064 D1 DE69214064 D1 DE 69214064D1 DE 69214064 T DE69214064 T DE 69214064T DE 69214064 T DE69214064 T DE 69214064T DE 69214064 D1 DE69214064 D1 DE 69214064D1
Authority
DE
Germany
Prior art keywords
producing
thin layer
oxide compound
superconducting oxide
superconducting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69214064T
Other languages
English (en)
Other versions
DE69214064T2 (de
Inventor
Tatsuoki Nagaishi
Hidenori Nakanishi
Saburo Tanaka
Hideo Itozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=16607049&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69214064(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69214064D1 publication Critical patent/DE69214064D1/de
Publication of DE69214064T2 publication Critical patent/DE69214064T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
DE69214064T 1991-07-29 1992-07-29 Verfahren zur Herstellung einer dünnen Schicht einer supraleitenden Oxid-Verbindung Revoked DE69214064T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3211505A JPH0532494A (ja) 1991-07-29 1991-07-29 複合酸化物超電導薄膜の成膜方法

Publications (2)

Publication Number Publication Date
DE69214064D1 true DE69214064D1 (de) 1996-10-31
DE69214064T2 DE69214064T2 (de) 1997-03-20

Family

ID=16607049

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69214064T Revoked DE69214064T2 (de) 1991-07-29 1992-07-29 Verfahren zur Herstellung einer dünnen Schicht einer supraleitenden Oxid-Verbindung

Country Status (3)

Country Link
EP (1) EP0527668B1 (de)
JP (1) JPH0532494A (de)
DE (1) DE69214064T2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101684545B (zh) * 2008-09-23 2011-06-22 北京有色金属研究总院 脉冲激光沉积制备纳米硅的方法
CN109855792B (zh) * 2019-01-21 2021-03-02 北京卫星环境工程研究所 电推进试验用羽流粒子沉降防护装置及其真空测试系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material
US4834856A (en) * 1988-01-21 1989-05-30 Wehner Gottfried K Method and apparatus for sputtering a superconductor onto a substrate
DE3816192A1 (de) * 1988-05-11 1989-11-23 Siemens Ag Verfahren zur herstellung einer schicht aus einem metalloxidischen supraleitermaterial mittels laser-verdampfens
DE3914476C1 (de) * 1989-05-02 1990-06-21 Forschungszentrum Juelich Gmbh, 5170 Juelich, De

Also Published As

Publication number Publication date
EP0527668A1 (de) 1993-02-17
EP0527668B1 (de) 1996-09-25
JPH0532494A (ja) 1993-02-09
DE69214064T2 (de) 1997-03-20

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation