DE69116399D1 - Verfahren zur Herstellung einer Schicht aus supraleitendem Oxyd - Google Patents

Verfahren zur Herstellung einer Schicht aus supraleitendem Oxyd

Info

Publication number
DE69116399D1
DE69116399D1 DE69116399T DE69116399T DE69116399D1 DE 69116399 D1 DE69116399 D1 DE 69116399D1 DE 69116399 T DE69116399 T DE 69116399T DE 69116399 T DE69116399 T DE 69116399T DE 69116399 D1 DE69116399 D1 DE 69116399D1
Authority
DE
Germany
Prior art keywords
producing
layer
superconducting oxide
superconducting
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69116399T
Other languages
English (en)
Other versions
DE69116399T2 (de
Inventor
Noriki Hayashi
Satoshi Takano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Electric Power Co Inc
Sumitomo Electric Industries Ltd
Original Assignee
Kansai Electric Power Co Inc
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2057650A external-priority patent/JPH03261606A/ja
Priority claimed from JP2057649A external-priority patent/JPH03261605A/ja
Application filed by Kansai Electric Power Co Inc, Sumitomo Electric Industries Ltd filed Critical Kansai Electric Power Co Inc
Publication of DE69116399D1 publication Critical patent/DE69116399D1/de
Application granted granted Critical
Publication of DE69116399T2 publication Critical patent/DE69116399T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/704—Wire, fiber, or cable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/731—Sputter coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/732—Evaporative coating with superconducting material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/734—From organometallic precursors, e.g. acetylacetonates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
DE69116399T 1990-03-08 1991-03-07 Verfahren zur Herstellung einer Schicht aus supraleitendem Oxyd Expired - Fee Related DE69116399T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2057650A JPH03261606A (ja) 1990-03-08 1990-03-08 酸化物超電導膜の製造方法
JP2057649A JPH03261605A (ja) 1990-03-08 1990-03-08 酸化物超電導膜の製造方法

Publications (2)

Publication Number Publication Date
DE69116399D1 true DE69116399D1 (de) 1996-02-29
DE69116399T2 DE69116399T2 (de) 1996-09-05

Family

ID=26398714

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69116399T Expired - Fee Related DE69116399T2 (de) 1990-03-08 1991-03-07 Verfahren zur Herstellung einer Schicht aus supraleitendem Oxyd

Country Status (4)

Country Link
US (1) US5330966A (de)
EP (1) EP0446789B1 (de)
CA (1) CA2037481C (de)
DE (1) DE69116399T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5741377A (en) * 1995-04-10 1998-04-21 Martin Marietta Energy Systems, Inc. Structures having enhanced biaxial texture and method of fabricating same
JP2734422B2 (ja) * 1995-07-20 1998-03-30 日本電気株式会社 化合物磁気抵抗効果材料およびその製造方法
JP3500787B2 (ja) * 1995-08-22 2004-02-23 ソニー株式会社 ビスマス化合物の製造方法とビスマス化合物の誘電体物質
US6022832A (en) 1997-09-23 2000-02-08 American Superconductor Corporation Low vacuum vapor process for producing superconductor articles with epitaxial layers
US6027564A (en) * 1997-09-23 2000-02-22 American Superconductor Corporation Low vacuum vapor process for producing epitaxial layers
US6428635B1 (en) 1997-10-01 2002-08-06 American Superconductor Corporation Substrates for superconductors
US6458223B1 (en) 1997-10-01 2002-10-01 American Superconductor Corporation Alloy materials
US6143366A (en) * 1998-12-24 2000-11-07 Lu; Chung Hsin High-pressure process for crystallization of ceramic films at low temperatures
US6475311B1 (en) 1999-03-31 2002-11-05 American Superconductor Corporation Alloy materials
JP3489525B2 (ja) * 2000-02-22 2004-01-19 住友電気工業株式会社 超電導線材およびその製造方法
DE10157825C1 (de) * 2001-11-24 2003-06-12 Karlsruhe Forschzent Verfahren für die Sauerstoffbehandlung von HTSL-Schichten durch Nachbehandlung zum Verbessern der mechanischen, thermischen und elektrischen Eigenschaften eines elektrischen Kontaktes
CN111910101B (zh) * 2020-07-14 2021-08-03 中南大学 一种高纯度高强高导铜基靶材及其制备方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311337B1 (de) * 1987-10-02 1993-08-04 Fujikura Ltd. Verfahren zur Darstellung eines oxidischen supraleitenden Leiters und ein oxidischer supraleitender Leiter, hergestellt nach diesem Verfahren
JP2664070B2 (ja) * 1988-08-29 1997-10-15 住友電気工業株式会社 複合酸化物超電導薄膜の作製方法

Also Published As

Publication number Publication date
CA2037481A1 (en) 1991-09-09
EP0446789B1 (de) 1996-01-17
EP0446789A3 (de) 1991-09-25
EP0446789A2 (de) 1991-09-18
US5330966A (en) 1994-07-19
CA2037481C (en) 1998-11-10
DE69116399T2 (de) 1996-09-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee