DE69029063D1 - Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht - Google Patents
Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende DünnschichtInfo
- Publication number
- DE69029063D1 DE69029063D1 DE69029063T DE69029063T DE69029063D1 DE 69029063 D1 DE69029063 D1 DE 69029063D1 DE 69029063 T DE69029063 T DE 69029063T DE 69029063 T DE69029063 T DE 69029063T DE 69029063 D1 DE69029063 D1 DE 69029063D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- thin film
- oxide thin
- mixed oxide
- mixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17749189 | 1989-07-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69029063D1 true DE69029063D1 (de) | 1996-12-12 |
DE69029063T2 DE69029063T2 (de) | 1997-04-10 |
Family
ID=16031830
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69029063T Expired - Fee Related DE69029063T2 (de) | 1989-07-10 | 1990-07-10 | Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht |
Country Status (5)
Country | Link |
---|---|
US (1) | US5427678A (de) |
EP (1) | EP0408326B1 (de) |
JP (1) | JP2911186B2 (de) |
CA (1) | CA2020856C (de) |
DE (1) | DE69029063T2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5720866A (en) * | 1996-06-14 | 1998-02-24 | Ara Coating, Inc. | Method for forming coatings by electrolyte discharge and coatings formed thereby |
US6197178B1 (en) | 1999-04-02 | 2001-03-06 | Microplasmic Corporation | Method for forming ceramic coatings by micro-arc oxidation of reactive metals |
JP3937174B2 (ja) * | 2004-03-22 | 2007-06-27 | セイコーエプソン株式会社 | 強誘電体膜、強誘電体膜の製造方法、強誘電体キャパシタ、強誘電体メモリおよび圧電素子 |
US20060207884A1 (en) * | 2005-03-17 | 2006-09-21 | Volodymyr Shpakovsky | Method of producing corundum layer on metal parts |
US8524324B2 (en) * | 2005-07-29 | 2013-09-03 | Showa Denko K.K. | Complex oxide film and method for producing same, dielectric material including complex oxide film, piezoelectric material, capacitor, piezoelectric element, and electronic device |
US20080123251A1 (en) * | 2006-11-28 | 2008-05-29 | Randall Michael S | Capacitor device |
KR100946701B1 (ko) * | 2007-12-10 | 2010-03-12 | 한국전자통신연구원 | 나노 결정 복합 산화물 박막, 이를 구비한 환경 가스 센서및 환경 가스 센서의 제조방법 |
KR101038793B1 (ko) * | 2008-08-26 | 2011-06-03 | 주식회사 포스코 | 강재의 수소지연파괴 특성 평가를 위한 팔라듐(Pd) 코팅용 전해액, 이를 이용한 팔라듐(Pd) 코팅방법과 코팅용 도금조 |
JP5077419B2 (ja) * | 2010-03-22 | 2012-11-21 | 株式会社デンソー | 化学蓄熱装置 |
US8808522B2 (en) * | 2011-09-07 | 2014-08-19 | National Chung Hsing University | Method for forming oxide film by plasma electrolytic oxidation |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3141798A (en) * | 1961-11-28 | 1964-07-21 | Gen Electric | Anodization of aluminum in a solution of calcium hydroxide |
US3554881A (en) * | 1966-04-23 | 1971-01-12 | Roberto Piontelli | Electrochemical process for the surface treatment of titanium,alloys thereof and other analogous metals |
US3671410A (en) * | 1970-02-16 | 1972-06-20 | Philip Morris Inc | Method for making metal oxide membranes |
JPS5040480B1 (de) * | 1970-03-27 | 1975-12-24 | ||
US3730856A (en) * | 1971-02-26 | 1973-05-01 | Ici Ltd | Electrolytic preparation of valve group metal equipment for use in chemical plants |
US3767541A (en) * | 1971-06-29 | 1973-10-23 | Gen Electric | Anodized film for electrolytic capacitor and method for preparation thereof |
DE2724498C2 (de) * | 1977-05-31 | 1982-06-03 | Siemens AG, 1000 Berlin und 8000 München | Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung |
US4182793A (en) * | 1977-06-09 | 1980-01-08 | Murata Manufacturing Co., Ltd. | Piezoelectric crystalline film of zinc oxide |
US4286009A (en) * | 1978-02-16 | 1981-08-25 | Corning Glass Works | Composite solar absorber coatings |
JPS5942749B2 (ja) * | 1979-07-11 | 1984-10-17 | 株式会社東芝 | 多層膜のエツチング方法 |
EP0030732B1 (de) * | 1979-12-15 | 1984-11-28 | Nitto Electric Industrial Co., Ltd. | Transparenter elektrisch leitender Film und Verfahren zu dessen Herstellung |
US4619866A (en) * | 1980-07-28 | 1986-10-28 | Santrade Limited | Method of making a coated cemented carbide body and resulting body |
US4382997A (en) * | 1980-09-04 | 1983-05-10 | The Dow Chemical Company | Spinel surfaced objects |
NL8101177A (nl) * | 1981-03-11 | 1982-10-01 | Philips Nv | Samengesteld lichaam. |
US4399194A (en) * | 1981-12-30 | 1983-08-16 | Rca Corporation | Transparent conductive film |
DE3227898C2 (de) * | 1982-07-26 | 1986-11-20 | Siemens AG, 1000 Berlin und 8000 München | Schichtsystem für optoelektronische Anzeigen |
JPS59168950A (ja) * | 1983-03-17 | 1984-09-22 | Ricoh Co Ltd | 光磁気記録媒体 |
DE3472420D1 (en) * | 1983-11-29 | 1988-08-04 | Sony Corp | Methods of manufacturing dielectric metal titanates |
JPS61159701A (ja) * | 1984-12-28 | 1986-07-19 | 株式会社東芝 | サ−マルヘツドおよびその製造方法 |
JPH0627328B2 (ja) * | 1985-07-16 | 1994-04-13 | ソニー株式会社 | 高誘電率薄膜 |
US4716071A (en) * | 1985-08-22 | 1987-12-29 | Harris Corporation | Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines |
US4920014A (en) * | 1987-02-27 | 1990-04-24 | Sumitomo Metal Mining Co., Ltd. | Zirconia film and process for preparing it |
DE3853970D1 (de) * | 1987-07-22 | 1995-07-20 | Philips Patentverwaltung | Optisches Interferenzfilter. |
US4929595A (en) * | 1988-02-26 | 1990-05-29 | The University Of Alabama At Huntsville | Superconducting thin film fabrication |
US4882312A (en) * | 1988-05-09 | 1989-11-21 | General Electric Company | Evaporation of high Tc Y-Ba-Cu-O superconducting thin film on Si and SiO2 with a zirconia buffer layer |
-
1990
- 1990-07-09 JP JP2182338A patent/JP2911186B2/ja not_active Expired - Fee Related
- 1990-07-10 EP EP90307560A patent/EP0408326B1/de not_active Expired - Lifetime
- 1990-07-10 DE DE69029063T patent/DE69029063T2/de not_active Expired - Fee Related
- 1990-07-10 CA CA002020856A patent/CA2020856C/en not_active Expired - Fee Related
-
1994
- 1994-01-07 US US08/178,619 patent/US5427678A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69029063T2 (de) | 1997-04-10 |
US5427678A (en) | 1995-06-27 |
JPH03138393A (ja) | 1991-06-12 |
EP0408326A1 (de) | 1991-01-16 |
CA2020856C (en) | 2001-06-05 |
EP0408326B1 (de) | 1996-11-06 |
JP2911186B2 (ja) | 1999-06-23 |
CA2020856A1 (en) | 1991-01-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN |
|
8339 | Ceased/non-payment of the annual fee |