DE69029063T2 - Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht - Google Patents

Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht

Info

Publication number
DE69029063T2
DE69029063T2 DE69029063T DE69029063T DE69029063T2 DE 69029063 T2 DE69029063 T2 DE 69029063T2 DE 69029063 T DE69029063 T DE 69029063T DE 69029063 T DE69029063 T DE 69029063T DE 69029063 T2 DE69029063 T2 DE 69029063T2
Authority
DE
Germany
Prior art keywords
producing
thin film
oxide thin
mixed oxide
mixed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029063T
Other languages
English (en)
Other versions
DE69029063D1 (de
Inventor
Masahiro Yoshimura
Yoo Seung Eul
Nobuo Ishizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Publication of DE69029063D1 publication Critical patent/DE69029063D1/de
Application granted granted Critical
Publication of DE69029063T2 publication Critical patent/DE69029063T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
DE69029063T 1989-07-10 1990-07-10 Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht Expired - Fee Related DE69029063T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17749189 1989-07-10

Publications (2)

Publication Number Publication Date
DE69029063D1 DE69029063D1 (de) 1996-12-12
DE69029063T2 true DE69029063T2 (de) 1997-04-10

Family

ID=16031830

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029063T Expired - Fee Related DE69029063T2 (de) 1989-07-10 1990-07-10 Verfahren zur Herstellung einer aus gemischtem Oxyd bestehende Dünnschicht

Country Status (5)

Country Link
US (1) US5427678A (de)
EP (1) EP0408326B1 (de)
JP (1) JP2911186B2 (de)
CA (1) CA2020856C (de)
DE (1) DE69029063T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5720866A (en) * 1996-06-14 1998-02-24 Ara Coating, Inc. Method for forming coatings by electrolyte discharge and coatings formed thereby
US6197178B1 (en) 1999-04-02 2001-03-06 Microplasmic Corporation Method for forming ceramic coatings by micro-arc oxidation of reactive metals
JP3937174B2 (ja) * 2004-03-22 2007-06-27 セイコーエプソン株式会社 強誘電体膜、強誘電体膜の製造方法、強誘電体キャパシタ、強誘電体メモリおよび圧電素子
US20060207884A1 (en) * 2005-03-17 2006-09-21 Volodymyr Shpakovsky Method of producing corundum layer on metal parts
WO2007013596A1 (ja) * 2005-07-29 2007-02-01 Showa Denko K. K. 複合酸化物膜およびその製造方法、複合酸化物膜を含む誘電材料、圧電材料、コンデンサ、圧電素子並びに電子機器
US20080123251A1 (en) * 2006-11-28 2008-05-29 Randall Michael S Capacitor device
KR100946701B1 (ko) * 2007-12-10 2010-03-12 한국전자통신연구원 나노 결정 복합 산화물 박막, 이를 구비한 환경 가스 센서및 환경 가스 센서의 제조방법
KR101038793B1 (ko) * 2008-08-26 2011-06-03 주식회사 포스코 강재의 수소지연파괴 특성 평가를 위한 팔라듐(Ｐｄ) 코팅용 전해액, 이를 이용한 팔라듐(Ｐｄ) 코팅방법과 코팅용 도금조
JP5077419B2 (ja) * 2010-03-22 2012-11-21 株式会社デンソー 化学蓄熱装置
US8808522B2 (en) 2011-09-07 2014-08-19 National Chung Hsing University Method for forming oxide film by plasma electrolytic oxidation

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3141798A (en) * 1961-11-28 1964-07-21 Gen Electric Anodization of aluminum in a solution of calcium hydroxide
US3554881A (en) * 1966-04-23 1971-01-12 Roberto Piontelli Electrochemical process for the surface treatment of titanium,alloys thereof and other analogous metals
US3671410A (en) * 1970-02-16 1972-06-20 Philip Morris Inc Method for making metal oxide membranes
JPS5040480B1 (de) * 1970-03-27 1975-12-24
US3730856A (en) * 1971-02-26 1973-05-01 Ici Ltd Electrolytic preparation of valve group metal equipment for use in chemical plants
US3767541A (en) * 1971-06-29 1973-10-23 Gen Electric Anodized film for electrolytic capacitor and method for preparation thereof
DE2724498C2 (de) * 1977-05-31 1982-06-03 Siemens AG, 1000 Berlin und 8000 München Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung
US4182793A (en) * 1977-06-09 1980-01-08 Murata Manufacturing Co., Ltd. Piezoelectric crystalline film of zinc oxide
US4286009A (en) * 1978-02-16 1981-08-25 Corning Glass Works Composite solar absorber coatings
JPS5942749B2 (ja) * 1979-07-11 1984-10-17 株式会社東芝 多層膜のエツチング方法
DE3069724D1 (en) * 1979-12-15 1985-01-10 Nitto Electric Ind Co Transparent electrically conductive film and process for production thereof
US4619866A (en) * 1980-07-28 1986-10-28 Santrade Limited Method of making a coated cemented carbide body and resulting body
US4382997A (en) * 1980-09-04 1983-05-10 The Dow Chemical Company Spinel surfaced objects
NL8101177A (nl) * 1981-03-11 1982-10-01 Philips Nv Samengesteld lichaam.
US4399194A (en) * 1981-12-30 1983-08-16 Rca Corporation Transparent conductive film
DE3227898C2 (de) * 1982-07-26 1986-11-20 Siemens AG, 1000 Berlin und 8000 München Schichtsystem für optoelektronische Anzeigen
JPS59168950A (ja) * 1983-03-17 1984-09-22 Ricoh Co Ltd 光磁気記録媒体
EP0146284B1 (de) * 1983-11-29 1988-06-29 Sony Corporation Verfahren zur Herstellung von dielektrischen Metalltitanaten
JPS61159701A (ja) * 1984-12-28 1986-07-19 株式会社東芝 サ−マルヘツドおよびその製造方法
JPH0627328B2 (ja) * 1985-07-16 1994-04-13 ソニー株式会社 高誘電率薄膜
US4716071A (en) * 1985-08-22 1987-12-29 Harris Corporation Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines
US4920014A (en) * 1987-02-27 1990-04-24 Sumitomo Metal Mining Co., Ltd. Zirconia film and process for preparing it
DE3853970D1 (de) * 1987-07-22 1995-07-20 Philips Patentverwaltung Optisches Interferenzfilter.
US4929595A (en) * 1988-02-26 1990-05-29 The University Of Alabama At Huntsville Superconducting thin film fabrication
US4882312A (en) * 1988-05-09 1989-11-21 General Electric Company Evaporation of high Tc Y-Ba-Cu-O superconducting thin film on Si and SiO2 with a zirconia buffer layer

Also Published As

Publication number Publication date
CA2020856C (en) 2001-06-05
EP0408326B1 (de) 1996-11-06
JP2911186B2 (ja) 1999-06-23
JPH03138393A (ja) 1991-06-12
EP0408326A1 (de) 1991-01-16
CA2020856A1 (en) 1991-01-11
US5427678A (en) 1995-06-27
DE69029063D1 (de) 1996-12-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: PFENNING MEINIG & PARTNER GBR, 80339 MUENCHEN

8339 Ceased/non-payment of the annual fee