DE3886586D1 - Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Mischoxid. - Google Patents
Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Mischoxid.Info
- Publication number
- DE3886586D1 DE3886586D1 DE88108406T DE3886586T DE3886586D1 DE 3886586 D1 DE3886586 D1 DE 3886586D1 DE 88108406 T DE88108406 T DE 88108406T DE 3886586 T DE3886586 T DE 3886586T DE 3886586 D1 DE3886586 D1 DE 3886586D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- thin layer
- mixed oxide
- superconducting mixed
- superconducting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/80—Constructional details
- H10N60/85—Superconducting active materials
- H10N60/855—Ceramic superconductors
- H10N60/857—Ceramic superconductors comprising copper oxide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
- H10N60/0604—Monocrystalline substrates, e.g. epitaxial growth
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0884—Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
- Y10S505/731—Sputter coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
- Y10S505/732—Evaporative coating with superconducting material
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12877387 | 1987-05-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3886586D1 true DE3886586D1 (de) | 1994-02-10 |
DE3886586T2 DE3886586T2 (de) | 1994-04-28 |
Family
ID=14993113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE88108406T Expired - Fee Related DE3886586T2 (de) | 1987-05-26 | 1988-05-25 | Verfahren zur Herstellung einer dünnen Schicht aus supraleitendem Mischoxid. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4925829A (de) |
EP (1) | EP0292958B1 (de) |
DE (1) | DE3886586T2 (de) |
HK (1) | HK2196A (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910007382B1 (ko) * | 1987-08-07 | 1991-09-25 | 가부시기가이샤 히다찌세이사꾸쇼 | 초전도 재료 및 초전도 박막의 제조방법 |
US5232909A (en) * | 1987-08-20 | 1993-08-03 | Sumitomo Electric Industries, Ltd. | Method for manufacturing superconducting ceramics elongated body |
JP2557486B2 (ja) * | 1987-08-20 | 1996-11-27 | 住友電気工業株式会社 | 超電導セラミックス長尺体の製造方法および超電導セラミックス長尺体 |
US5273954A (en) * | 1987-08-20 | 1993-12-28 | Fukami Patent Office | Method for forming superconducting ceramics elongated body |
DE68922734T2 (de) * | 1988-03-16 | 1995-09-14 | Toshiba Kawasaki Kk | VERFAHREN ZUR HERSTELLUNG EINES DüNNSCHICHTOXYDSUPRALEITERS. |
JPH0286014A (ja) * | 1988-06-17 | 1990-03-27 | Sumitomo Electric Ind Ltd | 複合酸化物超電導薄膜と、その成膜方法 |
JPH02260674A (ja) * | 1989-03-31 | 1990-10-23 | Sumitomo Electric Ind Ltd | トンネル型ジョセフソン素子とその作製方法 |
US5480534A (en) * | 1990-08-22 | 1996-01-02 | Toa Electronics Ltd. | Electrode for measuring PH |
CA2053549A1 (en) * | 1990-11-15 | 1992-05-16 | John A. Agostinelli | Construction of high temperature josephson junction device |
US5962866A (en) * | 1991-01-22 | 1999-10-05 | Biomagnetic Technologies, Inc. | Microbridge superconductor device utilizing stepped junctions |
US5134117A (en) * | 1991-01-22 | 1992-07-28 | Biomagnetic Technologies, Inc. | High tc microbridge superconductor device utilizing stepped edge-to-edge sns junction |
JPH04285012A (ja) * | 1991-03-15 | 1992-10-09 | Fujitsu Ltd | 酸化物超伝導体薄膜の形成方法 |
WO1995002709A2 (en) * | 1993-07-15 | 1995-01-26 | President And Fellows Of Harvard College | EXTENDED NITRIDE MATERIAL COMPRISING β-C3N¿4? |
DE69430230T2 (de) * | 1993-10-14 | 2002-10-31 | Mega Chips Corp., Osaka | Verfahren und Vorrichtung zur Herstellung eines Einkristallinen dünnen Films |
US8182862B2 (en) * | 2003-06-05 | 2012-05-22 | Superpower Inc. | Ion beam-assisted high-temperature superconductor (HTS) deposition for thick film tape |
US20040261707A1 (en) * | 2003-06-26 | 2004-12-30 | Venkat Selvamanickam | Apparatus for and method of cooling and positioning a translating substrate tape for use with a continuous vapor deposition process |
US7758699B2 (en) * | 2003-06-26 | 2010-07-20 | Superpower, Inc. | Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition |
KR20060081015A (ko) * | 2005-01-06 | 2006-07-12 | 삼성에스디아이 주식회사 | 진공 증착기 |
EP1967312A1 (de) * | 2007-03-06 | 2008-09-10 | Siemens Aktiengesellschaft | Verfahren zur Lötreparatur eines Bauteils unter Vakuum und einem eingestellten Sauerstoffpartialdruck |
CN113470883B (zh) * | 2021-06-29 | 2022-11-11 | 南京大学 | 具有高临界参数无毒铜氧化物超导体及其制备方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5565358A (en) * | 1978-11-10 | 1980-05-16 | Nippon Kogaku Kk <Nikon> | Forming method for titanium dioxide by normal temperature reaction evaporation |
JPS6115967A (ja) * | 1984-06-29 | 1986-01-24 | Sumitomo Electric Ind Ltd | 表面処理方法 |
US4888202A (en) * | 1986-07-31 | 1989-12-19 | Nippon Telegraph And Telephone Corporation | Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film |
JP2711253B2 (ja) * | 1987-03-18 | 1998-02-10 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 超伝導膜及びその形成方法 |
CA1332324C (en) * | 1987-03-30 | 1994-10-11 | Jun Shioya | Method for producing thin film of oxide superconductor |
EP0288001B1 (de) * | 1987-04-20 | 1993-01-13 | Nissin Electric Company, Limited | Verfahren zur Herstellung einer supraleitenden dünnen Schicht und Anordnung zu seiner Durchführung |
CA1328242C (en) * | 1987-05-18 | 1994-04-05 | Nobuhiko Fujita | Process for manufacturing a superconductor and a method for producing a superconducting circuit |
-
1988
- 1988-05-25 US US07/198,260 patent/US4925829A/en not_active Expired - Lifetime
- 1988-05-25 EP EP88108406A patent/EP0292958B1/de not_active Expired - Lifetime
- 1988-05-25 DE DE88108406T patent/DE3886586T2/de not_active Expired - Fee Related
-
1996
- 1996-01-04 HK HK2196A patent/HK2196A/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0292958A3 (en) | 1989-10-11 |
EP0292958A2 (de) | 1988-11-30 |
HK2196A (en) | 1996-01-12 |
EP0292958B1 (de) | 1993-12-29 |
US4925829A (en) | 1990-05-15 |
DE3886586T2 (de) | 1994-04-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |