HK2196A - Method for preparing thin film of compound oxide superconductor - Google Patents

Method for preparing thin film of compound oxide superconductor

Info

Publication number
HK2196A
HK2196A HK2196A HK2196A HK2196A HK 2196 A HK2196 A HK 2196A HK 2196 A HK2196 A HK 2196A HK 2196 A HK2196 A HK 2196A HK 2196 A HK2196 A HK 2196A
Authority
HK
Hong Kong
Prior art keywords
thin film
oxide superconductor
compound oxide
preparing thin
preparing
Prior art date
Application number
HK2196A
Other languages
English (en)
Inventor
Nobuhiko Fujita
Hideo Itozaki
Saburo Tanaka
Shuji Yazu
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of HK2196A publication Critical patent/HK2196A/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic superconductors
    • H10N60/857—Ceramic superconductors comprising copper oxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0381—Processes for depositing or forming copper oxide superconductor layers by evaporation, e.g. MBE
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0604—Monocrystalline substrates, e.g. epitaxial growth
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0884—Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/731—Sputter coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y10S505/732—Evaporative coating with superconducting material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
HK2196A 1987-05-26 1996-01-04 Method for preparing thin film of compound oxide superconductor HK2196A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12877387 1987-05-26

Publications (1)

Publication Number Publication Date
HK2196A true HK2196A (en) 1996-01-12

Family

ID=14993113

Family Applications (1)

Application Number Title Priority Date Filing Date
HK2196A HK2196A (en) 1987-05-26 1996-01-04 Method for preparing thin film of compound oxide superconductor

Country Status (4)

Country Link
US (1) US4925829A (xx)
EP (1) EP0292958B1 (xx)
DE (1) DE3886586T2 (xx)
HK (1) HK2196A (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910007382B1 (ko) * 1987-08-07 1991-09-25 가부시기가이샤 히다찌세이사꾸쇼 초전도 재료 및 초전도 박막의 제조방법
JP2557486B2 (ja) * 1987-08-20 1996-11-27 住友電気工業株式会社 超電導セラミックス長尺体の製造方法および超電導セラミックス長尺体
US5273954A (en) * 1987-08-20 1993-12-28 Fukami Patent Office Method for forming superconducting ceramics elongated body
US5232909A (en) * 1987-08-20 1993-08-03 Sumitomo Electric Industries, Ltd. Method for manufacturing superconducting ceramics elongated body
US5158931A (en) * 1988-03-16 1992-10-27 Kabushiki Kaisha Toshiba Method for manufacturing an oxide superconductor thin film
JPH0286014A (ja) * 1988-06-17 1990-03-27 Sumitomo Electric Ind Ltd 複合酸化物超電導薄膜と、その成膜方法
JPH02260674A (ja) * 1989-03-31 1990-10-23 Sumitomo Electric Ind Ltd トンネル型ジョセフソン素子とその作製方法
US5480534A (en) * 1990-08-22 1996-01-02 Toa Electronics Ltd. Electrode for measuring PH
CA2053549A1 (en) * 1990-11-15 1992-05-16 John A. Agostinelli Construction of high temperature josephson junction device
US5962866A (en) * 1991-01-22 1999-10-05 Biomagnetic Technologies, Inc. Microbridge superconductor device utilizing stepped junctions
US5134117A (en) * 1991-01-22 1992-07-28 Biomagnetic Technologies, Inc. High tc microbridge superconductor device utilizing stepped edge-to-edge sns junction
JPH04285012A (ja) * 1991-03-15 1992-10-09 Fujitsu Ltd 酸化物超伝導体薄膜の形成方法
AU8070294A (en) * 1993-07-15 1995-02-13 President And Fellows Of Harvard College Extended nitride material comprising beta -c3n4
DE69430230T2 (de) * 1993-10-14 2002-10-31 Mega Chips Corp., Osaka Verfahren und Vorrichtung zur Herstellung eines Einkristallinen dünnen Films
US8182862B2 (en) * 2003-06-05 2012-05-22 Superpower Inc. Ion beam-assisted high-temperature superconductor (HTS) deposition for thick film tape
US7758699B2 (en) * 2003-06-26 2010-07-20 Superpower, Inc. Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
US20040261707A1 (en) * 2003-06-26 2004-12-30 Venkat Selvamanickam Apparatus for and method of cooling and positioning a translating substrate tape for use with a continuous vapor deposition process
KR20060081015A (ko) * 2005-01-06 2006-07-12 삼성에스디아이 주식회사 진공 증착기
EP1967312A1 (de) * 2007-03-06 2008-09-10 Siemens Aktiengesellschaft Verfahren zur Lötreparatur eines Bauteils unter Vakuum und einem eingestellten Sauerstoffpartialdruck
CN113470883B (zh) * 2021-06-29 2022-11-11 南京大学 具有高临界参数无毒铜氧化物超导体及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565358A (en) * 1978-11-10 1980-05-16 Nippon Kogaku Kk <Nikon> Forming method for titanium dioxide by normal temperature reaction evaporation
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film
JP2711253B2 (ja) * 1987-03-18 1998-02-10 インターナショナル・ビジネス・マシーンズ・コーポレーション 超伝導膜及びその形成方法
CA1332324C (en) * 1987-03-30 1994-10-11 Jun Shioya Method for producing thin film of oxide superconductor
US4861750A (en) * 1987-04-20 1989-08-29 Nissin Electric Co., Ltd. Process for producing superconducting thin film
CN1035087C (zh) * 1987-05-18 1997-06-04 住友电气工业株式会社 制作超导电路图形的方法

Also Published As

Publication number Publication date
DE3886586T2 (de) 1994-04-28
DE3886586D1 (de) 1994-02-10
EP0292958B1 (en) 1993-12-29
EP0292958A3 (en) 1989-10-11
US4925829A (en) 1990-05-15
EP0292958A2 (en) 1988-11-30

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)